KR102402362B1 - 반송 장치, 노광 장치 및 반송 방법 - Google Patents

반송 장치, 노광 장치 및 반송 방법 Download PDF

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Publication number
KR102402362B1
KR102402362B1 KR1020200010458A KR20200010458A KR102402362B1 KR 102402362 B1 KR102402362 B1 KR 102402362B1 KR 1020200010458 A KR1020200010458 A KR 1020200010458A KR 20200010458 A KR20200010458 A KR 20200010458A KR 102402362 B1 KR102402362 B1 KR 102402362B1
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KR
South Korea
Prior art keywords
rail
sliding member
unit
braking
gas
Prior art date
Application number
KR1020200010458A
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English (en)
Korean (ko)
Other versions
KR20200095405A (ko
Inventor
미노루 미즈바타
아키토 하타노
야스유키 고야기
Original Assignee
가부시키가이샤 스크린 홀딩스
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 가부시키가이샤 스크린 홀딩스 filed Critical 가부시키가이샤 스크린 홀딩스
Publication of KR20200095405A publication Critical patent/KR20200095405A/ko
Application granted granted Critical
Publication of KR102402362B1 publication Critical patent/KR102402362B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C29/00—Bearings for parts moving only linearly
    • F16C29/008—Systems with a plurality of bearings, e.g. four carriages supporting a slide on two parallel rails
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C29/00—Bearings for parts moving only linearly
    • F16C29/02—Sliding-contact bearings
    • F16C29/025—Hydrostatic or aerostatic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67784—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations using air tracks

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Toxicology (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Power Engineering (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Bearings For Parts Moving Linearly (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Magnetic Bearings And Hydrostatic Bearings (AREA)
  • Non-Mechanical Conveyors (AREA)
KR1020200010458A 2019-01-31 2020-01-29 반송 장치, 노광 장치 및 반송 방법 KR102402362B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019015524A JP7285648B2 (ja) 2019-01-31 2019-01-31 搬送装置、露光装置および搬送方法
JPJP-P-2019-015524 2019-01-31

Publications (2)

Publication Number Publication Date
KR20200095405A KR20200095405A (ko) 2020-08-10
KR102402362B1 true KR102402362B1 (ko) 2022-05-26

Family

ID=71993660

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020200010458A KR102402362B1 (ko) 2019-01-31 2020-01-29 반송 장치, 노광 장치 및 반송 방법

Country Status (3)

Country Link
JP (1) JP7285648B2 (zh)
KR (1) KR102402362B1 (zh)
TW (1) TWI793392B (zh)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004087832A (ja) * 2002-08-27 2004-03-18 Nikon Corp ステージ装置、露光装置、及びステージ駆動方法
JP2009210033A (ja) * 2008-03-04 2009-09-17 Canon Inc エアスライダー装置、ステージ、露光装置およびデバイス製造方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2325900A (en) * 1999-03-12 2000-10-04 Nikon Corporation Exposure device, exposure method, and device manufacturing method
JP2001110699A (ja) * 1999-10-05 2001-04-20 Canon Inc ステージ装置および該ステージ装置を用いた露光装置
JP3849932B2 (ja) * 2002-08-12 2006-11-22 キヤノン株式会社 移動ステージ装置
KR20050060238A (ko) * 2003-12-16 2005-06-22 삼성전자주식회사 반도체 기판 검사 장치
JP2005268335A (ja) * 2004-03-16 2005-09-29 Taiheiyo Cement Corp ステージ装置
JP2006322531A (ja) 2005-05-18 2006-11-30 Oiles Ind Co Ltd 静圧気体軸受を有したエアスライド装置
KR20080062900A (ko) * 2006-12-29 2008-07-03 엘지디스플레이 주식회사 노광시스템 및 노광방법
TWI460047B (zh) 2007-11-30 2014-11-11 Yaskawa Denki Seisakusho Kk Sliding table and XY direction movable sliding table
US20110042874A1 (en) * 2009-08-20 2011-02-24 Nikon Corporation Object processing apparatus, exposure apparatus and exposure method, and device manufacturing method
JPWO2011059003A1 (ja) 2009-11-10 2013-04-04 株式会社アルバック 検査装置
US8598538B2 (en) 2010-09-07 2013-12-03 Nikon Corporation Movable body apparatus, object processing device, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method
JP5741834B2 (ja) * 2011-05-13 2015-07-01 株式会社ニコン 物体の搬出方法、物体の交換方法、物体保持装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
KR101903921B1 (ko) * 2011-08-09 2018-10-02 카티바, 인크. 하향 인쇄 장치 및 방법
JP5902909B2 (ja) * 2011-10-21 2016-04-13 高野化成工業株式会社 移動装置
JP2016166924A (ja) * 2015-03-09 2016-09-15 株式会社ニューフレアテクノロジー ステージ装置
JP6960653B2 (ja) * 2017-03-30 2021-11-05 ピー・ヂー・ダブリュー株式会社 スライダ装置およびその製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004087832A (ja) * 2002-08-27 2004-03-18 Nikon Corp ステージ装置、露光装置、及びステージ駆動方法
JP2009210033A (ja) * 2008-03-04 2009-09-17 Canon Inc エアスライダー装置、ステージ、露光装置およびデバイス製造方法

Also Published As

Publication number Publication date
JP7285648B2 (ja) 2023-06-02
JP2020123689A (ja) 2020-08-13
TW202101124A (zh) 2021-01-01
TWI793392B (zh) 2023-02-21
KR20200095405A (ko) 2020-08-10

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