JP7285648B2 - 搬送装置、露光装置および搬送方法 - Google Patents

搬送装置、露光装置および搬送方法 Download PDF

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Publication number
JP7285648B2
JP7285648B2 JP2019015524A JP2019015524A JP7285648B2 JP 7285648 B2 JP7285648 B2 JP 7285648B2 JP 2019015524 A JP2019015524 A JP 2019015524A JP 2019015524 A JP2019015524 A JP 2019015524A JP 7285648 B2 JP7285648 B2 JP 7285648B2
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Japan
Prior art keywords
rail
slide member
braking portion
braking
gas
Prior art date
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Active
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JP2019015524A
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English (en)
Japanese (ja)
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JP2020123689A (ja
Inventor
稔 水端
章人 波多野
康幸 小八木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Screen Holdings Co Ltd
Original Assignee
Screen Holdings Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Screen Holdings Co Ltd filed Critical Screen Holdings Co Ltd
Priority to JP2019015524A priority Critical patent/JP7285648B2/ja
Priority to TW109101434A priority patent/TWI793392B/zh
Priority to KR1020200010458A priority patent/KR102402362B1/ko
Publication of JP2020123689A publication Critical patent/JP2020123689A/ja
Application granted granted Critical
Publication of JP7285648B2 publication Critical patent/JP7285648B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C29/00—Bearings for parts moving only linearly
    • F16C29/008—Systems with a plurality of bearings, e.g. four carriages supporting a slide on two parallel rails
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C29/00—Bearings for parts moving only linearly
    • F16C29/02—Sliding-contact bearings
    • F16C29/025—Hydrostatic or aerostatic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67784—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations using air tracks

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Toxicology (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Power Engineering (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Bearings For Parts Moving Linearly (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Magnetic Bearings And Hydrostatic Bearings (AREA)
  • Non-Mechanical Conveyors (AREA)
JP2019015524A 2019-01-31 2019-01-31 搬送装置、露光装置および搬送方法 Active JP7285648B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2019015524A JP7285648B2 (ja) 2019-01-31 2019-01-31 搬送装置、露光装置および搬送方法
TW109101434A TWI793392B (zh) 2019-01-31 2020-01-16 搬送裝置、曝光裝置及搬送方法
KR1020200010458A KR102402362B1 (ko) 2019-01-31 2020-01-29 반송 장치, 노광 장치 및 반송 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2019015524A JP7285648B2 (ja) 2019-01-31 2019-01-31 搬送装置、露光装置および搬送方法

Publications (2)

Publication Number Publication Date
JP2020123689A JP2020123689A (ja) 2020-08-13
JP7285648B2 true JP7285648B2 (ja) 2023-06-02

Family

ID=71993660

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2019015524A Active JP7285648B2 (ja) 2019-01-31 2019-01-31 搬送装置、露光装置および搬送方法

Country Status (3)

Country Link
JP (1) JP7285648B2 (zh)
KR (1) KR102402362B1 (zh)
TW (1) TWI793392B (zh)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001110699A (ja) 1999-10-05 2001-04-20 Canon Inc ステージ装置および該ステージ装置を用いた露光装置
JP2005268335A (ja) 2004-03-16 2005-09-29 Taiheiyo Cement Corp ステージ装置
JP2006322531A (ja) 2005-05-18 2006-11-30 Oiles Ind Co Ltd 静圧気体軸受を有したエアスライド装置
WO2009069423A1 (ja) 2007-11-30 2009-06-04 Kabushiki Kaisha Yaskawa Denki スライドステージおよびｘｙ方向可動スライドステージ
WO2011059003A1 (ja) 2009-11-10 2011-05-19 株式会社アルバック 検査装置
JP2016166924A (ja) 2015-03-09 2016-09-15 株式会社ニューフレアテクノロジー ステージ装置
JP2018170412A (ja) 2017-03-30 2018-11-01 ピー・ヂー・ダブリュー株式会社 スライダ装置およびその製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2325900A (en) * 1999-03-12 2000-10-04 Nikon Corporation Exposure device, exposure method, and device manufacturing method
JP3849932B2 (ja) * 2002-08-12 2006-11-22 キヤノン株式会社 移動ステージ装置
JP2004087832A (ja) * 2002-08-27 2004-03-18 Nikon Corp ステージ装置、露光装置、及びステージ駆動方法
KR20050060238A (ko) * 2003-12-16 2005-06-22 삼성전자주식회사 반도체 기판 검사 장치
KR20080062900A (ko) * 2006-12-29 2008-07-03 엘지디스플레이 주식회사 노광시스템 및 노광방법
JP5121511B2 (ja) * 2008-03-04 2013-01-16 キヤノン株式会社 移動装置、露光装置およびデバイス製造方法
US20110042874A1 (en) * 2009-08-20 2011-02-24 Nikon Corporation Object processing apparatus, exposure apparatus and exposure method, and device manufacturing method
US8598538B2 (en) 2010-09-07 2013-12-03 Nikon Corporation Movable body apparatus, object processing device, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method
JP5741834B2 (ja) * 2011-05-13 2015-07-01 株式会社ニコン 物体の搬出方法、物体の交換方法、物体保持装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
KR101903921B1 (ko) * 2011-08-09 2018-10-02 카티바, 인크. 하향 인쇄 장치 및 방법
JP5902909B2 (ja) * 2011-10-21 2016-04-13 高野化成工業株式会社 移動装置

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001110699A (ja) 1999-10-05 2001-04-20 Canon Inc ステージ装置および該ステージ装置を用いた露光装置
JP2005268335A (ja) 2004-03-16 2005-09-29 Taiheiyo Cement Corp ステージ装置
JP2006322531A (ja) 2005-05-18 2006-11-30 Oiles Ind Co Ltd 静圧気体軸受を有したエアスライド装置
WO2009069423A1 (ja) 2007-11-30 2009-06-04 Kabushiki Kaisha Yaskawa Denki スライドステージおよびｘｙ方向可動スライドステージ
WO2011059003A1 (ja) 2009-11-10 2011-05-19 株式会社アルバック 検査装置
JP2016166924A (ja) 2015-03-09 2016-09-15 株式会社ニューフレアテクノロジー ステージ装置
JP2018170412A (ja) 2017-03-30 2018-11-01 ピー・ヂー・ダブリュー株式会社 スライダ装置およびその製造方法

Also Published As

Publication number Publication date
KR102402362B1 (ko) 2022-05-26
JP2020123689A (ja) 2020-08-13
TW202101124A (zh) 2021-01-01
TWI793392B (zh) 2023-02-21
KR20200095405A (ko) 2020-08-10

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