KR102358180B1 - 표면조화방법 - Google Patents
표면조화방법 Download PDFInfo
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- KR102358180B1 KR102358180B1 KR1020167020998A KR20167020998A KR102358180B1 KR 102358180 B1 KR102358180 B1 KR 102358180B1 KR 1020167020998 A KR1020167020998 A KR 1020167020998A KR 20167020998 A KR20167020998 A KR 20167020998A KR 102358180 B1 KR102358180 B1 KR 102358180B1
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- KR
- South Korea
- Prior art keywords
- organic resin
- layer
- substrate
- etching
- surface roughening
- Prior art date
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- 238000007788 roughening Methods 0.000 title claims abstract description 82
- 238000000034 method Methods 0.000 title claims abstract description 44
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- 239000011347 resin Substances 0.000 claims abstract description 161
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- 238000005530 etching Methods 0.000 claims abstract description 60
- 239000010954 inorganic particle Substances 0.000 claims abstract description 29
- 238000001035 drying Methods 0.000 claims abstract description 10
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- 239000000243 solution Substances 0.000 claims description 45
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 31
- 230000002378 acidificating effect Effects 0.000 claims description 16
- 239000007864 aqueous solution Substances 0.000 claims description 16
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 16
- 239000001301 oxygen Substances 0.000 claims description 16
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- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 12
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- 125000003277 amino group Chemical group 0.000 claims description 11
- 238000001039 wet etching Methods 0.000 claims description 11
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- KJIFKLIQANRMOU-UHFFFAOYSA-N oxidanium;4-methylbenzenesulfonate Chemical compound O.CC1=CC=C(S(O)(=O)=O)C=C1 KJIFKLIQANRMOU-UHFFFAOYSA-N 0.000 description 4
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- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/85—Arrangements for extracting light from the devices
- H10K50/854—Arrangements for extracting light from the devices comprising scattering means
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- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1259—Multistep manufacturing methods
- H01L27/1262—Multistep manufacturing methods with a particular formation, treatment or coating of the substrate
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- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/875—Arrangements for extracting light from the devices
- H10K59/877—Arrangements for extracting light from the devices comprising scattering means
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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JP5214284B2 (ja) | 2008-03-10 | 2013-06-19 | 株式会社東芝 | 発光装置用光取り出し層、およびそれを用いた有機エレクトロルミネッセンス素子 |
WO2010078071A1 (en) * | 2008-12-30 | 2010-07-08 | 3M Innovative Properties Company | Antireflective articles and methods of making the same |
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