KR102238958B1 - 하중 측정 장치 및 하중 측정 방법 - Google Patents

하중 측정 장치 및 하중 측정 방법 Download PDF

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Publication number
KR102238958B1
KR102238958B1 KR1020160019058A KR20160019058A KR102238958B1 KR 102238958 B1 KR102238958 B1 KR 102238958B1 KR 1020160019058 A KR1020160019058 A KR 1020160019058A KR 20160019058 A KR20160019058 A KR 20160019058A KR 102238958 B1 KR102238958 B1 KR 102238958B1
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KR
South Korea
Prior art keywords
load
roll
cleaning tool
substrate
roll cleaning
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KR1020160019058A
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English (en)
Korean (ko)
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KR20160103520A (ko
Inventor
히데아키 다나카
Original Assignee
가부시키가이샤 에바라 세이사꾸쇼
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Publication of KR20160103520A publication Critical patent/KR20160103520A/ko
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01G—WEIGHING
    • G01G5/00—Weighing apparatus wherein the balancing is effected by fluid action
    • G01G5/003—Weighing apparatus wherein the balancing is effected by fluid action load-cell construction or mountings
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
    • B08B1/14—Wipes; Absorbent members, e.g. swabs or sponges
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
    • B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
    • B08B1/34—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members rotating about an axis parallel to the surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01G—WEIGHING
    • G01G19/00—Weighing apparatus or methods adapted for special purposes not provided for in the preceding groups
    • G01G19/22—Weighing apparatus or methods adapted for special purposes not provided for in the preceding groups for apportioning materials by weighing prior to mixing them
    • G01G19/24—Weighing apparatus or methods adapted for special purposes not provided for in the preceding groups for apportioning materials by weighing prior to mixing them using a single weighing apparatus
    • G01G19/30—Weighing apparatus or methods adapted for special purposes not provided for in the preceding groups for apportioning materials by weighing prior to mixing them using a single weighing apparatus having electrical weight-sensitive devices
    • G01G19/306—Weighing apparatus or methods adapted for special purposes not provided for in the preceding groups for apportioning materials by weighing prior to mixing them using a single weighing apparatus having electrical weight-sensitive devices involving comparison with a reference value
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01G—WEIGHING
    • G01G19/00—Weighing apparatus or methods adapted for special purposes not provided for in the preceding groups
    • G01G19/22—Weighing apparatus or methods adapted for special purposes not provided for in the preceding groups for apportioning materials by weighing prior to mixing them
    • G01G19/34—Weighing apparatus or methods adapted for special purposes not provided for in the preceding groups for apportioning materials by weighing prior to mixing them with electrical control means
    • G01G19/346—Weighing apparatus or methods adapted for special purposes not provided for in the preceding groups for apportioning materials by weighing prior to mixing them with electrical control means involving comparison with a reference value
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01G—WEIGHING
    • G01G19/00—Weighing apparatus or methods adapted for special purposes not provided for in the preceding groups
    • G01G19/52—Weighing apparatus combined with other objects, e.g. furniture
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L1/00—Measuring force or stress, in general
    • G01L1/04—Measuring force or stress, in general by measuring elastic deformation of gauges, e.g. of springs
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L1/00—Measuring force or stress, in general
    • G01L1/04—Measuring force or stress, in general by measuring elastic deformation of gauges, e.g. of springs
    • G01L1/048—Measuring force or stress, in general by measuring elastic deformation of gauges, e.g. of springs of torsionally deformable elements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L5/00—Apparatus for, or methods of, measuring force, work, mechanical power, or torque, specially adapted for specific purposes
    • G01L5/0061—Force sensors associated with industrial machines or actuators
    • G01L5/0076—Force sensors associated with manufacturing machines
    • G01L5/0085—Force sensors adapted for insertion between cooperating machine elements, e.g. for measuring the nip force between rollers
    • H01L22/12—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0412—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H10P74/27—Structural arrangements therefor

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Force Measurement Appropriate To Specific Purposes (AREA)
KR1020160019058A 2015-02-24 2016-02-18 하중 측정 장치 및 하중 측정 방법 Active KR102238958B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015033910A JP6328577B2 (ja) 2015-02-24 2015-02-24 荷重測定装置および荷重測定方法
JPJP-P-2015-033910 2015-02-24

Publications (2)

Publication Number Publication Date
KR20160103520A KR20160103520A (ko) 2016-09-01
KR102238958B1 true KR102238958B1 (ko) 2021-04-13

Family

ID=56690215

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020160019058A Active KR102238958B1 (ko) 2015-02-24 2016-02-18 하중 측정 장치 및 하중 측정 방법

Country Status (6)

Country Link
US (1) US9719869B2 (https=)
JP (1) JP6328577B2 (https=)
KR (1) KR102238958B1 (https=)
CN (1) CN105914166B (https=)
SG (1) SG10201601246RA (https=)
TW (1) TWI666712B (https=)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6767834B2 (ja) 2016-09-29 2020-10-14 株式会社荏原製作所 基板洗浄装置及び基板処理装置
JP6792512B2 (ja) 2017-05-16 2020-11-25 株式会社荏原製作所 基板洗浄装置および基板処理装置
JP6823541B2 (ja) * 2017-05-30 2021-02-03 株式会社荏原製作所 キャリブレーション方法およびキャリブレーションプログラム
JP7079164B2 (ja) 2018-07-06 2022-06-01 株式会社荏原製作所 基板洗浄装置および基板洗浄方法
CN108955846A (zh) * 2018-08-14 2018-12-07 安徽中联九通机械设备有限公司 一种配料机控制系统
DE102020133121B4 (de) 2019-12-12 2024-06-20 Alfred Schöpf Verfahren und Vorrichtung zur Überlaufmessung einer Flüssigkeit über eine Überlaufkante eines Beckens
WO2022054605A1 (ja) * 2020-09-10 2022-03-17 東京エレクトロン株式会社 厚み測定装置及び厚み測定方法
JP7093390B2 (ja) * 2020-10-15 2022-06-29 株式会社荏原製作所 基板洗浄装置
CN117772662A (zh) * 2023-12-25 2024-03-29 北京晶亦精微科技股份有限公司 一种基板清洗装置以及清洗方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110138891A1 (en) 2008-05-20 2011-06-16 Vincent Agache Device For The Gravimetric Detection Of Particles In A Fluid Medium, Comprising An Oscillator Between Two Fluid Channels, Production And Method Of Employing The Device
JP2014038983A (ja) 2012-08-20 2014-02-27 Ebara Corp 基板洗浄装置及び基板処理装置
JP2014103387A (ja) 2012-10-25 2014-06-05 Ebara Corp 基板洗浄装置及び基板洗浄方法

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US4248317A (en) * 1979-09-10 1981-02-03 Cardinal Scale Manufacturing Company Load cell apparatus
US4425808A (en) * 1982-02-26 1984-01-17 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Thin film strain transducer
JPS61278724A (ja) * 1985-06-04 1986-12-09 Nippon Kokan Kk <Nkk> 脱水機圧力測定装置
JP3341872B2 (ja) * 1995-04-03 2002-11-05 大日本スクリーン製造株式会社 回転式基板洗浄装置
KR19980022571A (ko) * 1996-09-23 1998-07-06 김광호 반도체 스크러버(Scrubber)장비
JP3540524B2 (ja) * 1996-10-28 2004-07-07 大日本スクリーン製造株式会社 基板処理装置および基板処理方法
JPH10189512A (ja) * 1996-12-26 1998-07-21 Sony Corp 基板洗浄装置
JP2000228382A (ja) * 1999-02-05 2000-08-15 Sony Corp ウエハ洗浄装置
US6579797B1 (en) * 2000-01-25 2003-06-17 Agere Systems Inc. Cleaning brush conditioning apparatus
JP2002051497A (ja) * 2000-07-28 2002-02-15 Mitsumi Electric Co Ltd モータ駆動軸の側圧機構及び側圧機構を備えたモータ
US7743449B2 (en) * 2002-06-28 2010-06-29 Lam Research Corporation System and method for a combined contact and non-contact wafer cleaning module
KR20080044825A (ko) * 2005-09-15 2008-05-21 가부시키가이샤 에바라 세이사꾸쇼 세정부재, 기판세정장치 및 기판처리장치
US9312159B2 (en) * 2009-06-09 2016-04-12 Nikon Corporation Transport apparatus and exposure apparatus
US9254510B2 (en) * 2012-02-03 2016-02-09 Stmicroelectronics, Inc. Drying apparatus with exhaust control cap for semiconductor wafers and associated methods
JP6279276B2 (ja) * 2013-10-03 2018-02-14 株式会社荏原製作所 基板洗浄装置及び基板処理装置
US9127968B2 (en) * 2013-11-18 2015-09-08 Ford Global Technologies, Llc Flexible optical impact detection sensor for front rail mounted airbag
SG10201601095UA (en) * 2015-02-18 2016-09-29 Ebara Corp Substrate cleaning apparatus, substrate cleaning method, and substrate processing apparatus

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110138891A1 (en) 2008-05-20 2011-06-16 Vincent Agache Device For The Gravimetric Detection Of Particles In A Fluid Medium, Comprising An Oscillator Between Two Fluid Channels, Production And Method Of Employing The Device
JP2014038983A (ja) 2012-08-20 2014-02-27 Ebara Corp 基板洗浄装置及び基板処理装置
JP2014103387A (ja) 2012-10-25 2014-06-05 Ebara Corp 基板洗浄装置及び基板洗浄方法

Also Published As

Publication number Publication date
CN105914166B (zh) 2019-03-01
CN105914166A (zh) 2016-08-31
US9719869B2 (en) 2017-08-01
KR20160103520A (ko) 2016-09-01
SG10201601246RA (en) 2016-09-29
TW201631680A (zh) 2016-09-01
TWI666712B (zh) 2019-07-21
US20160243592A1 (en) 2016-08-25
JP2016157778A (ja) 2016-09-01
JP6328577B2 (ja) 2018-05-23

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