KR102174876B1 - 주석 합금 도금액 - Google Patents

주석 합금 도금액 Download PDF

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Publication number
KR102174876B1
KR102174876B1 KR1020197024869A KR20197024869A KR102174876B1 KR 102174876 B1 KR102174876 B1 KR 102174876B1 KR 1020197024869 A KR1020197024869 A KR 1020197024869A KR 20197024869 A KR20197024869 A KR 20197024869A KR 102174876 B1 KR102174876 B1 KR 102174876B1
Authority
KR
South Korea
Prior art keywords
tin
plating solution
acid
alloy plating
tin alloy
Prior art date
Application number
KR1020197024869A
Other languages
English (en)
Korean (ko)
Other versions
KR20190103460A (ko
Inventor
고우지 다츠미
츠카사 야소시마
다쿠마 가타세
Original Assignee
미쓰비시 마테리알 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 미쓰비시 마테리알 가부시키가이샤 filed Critical 미쓰비시 마테리알 가부시키가이샤
Priority claimed from PCT/JP2017/044668 external-priority patent/WO2018142776A1/ja
Publication of KR20190103460A publication Critical patent/KR20190103460A/ko
Application granted granted Critical
Publication of KR102174876B1 publication Critical patent/KR102174876B1/ko

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/60—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of tin
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/30—Electroplating: Baths therefor from solutions of tin
    • C25D3/32—Electroplating: Baths therefor from solutions of tin characterised by the organic bath constituents used
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/12—Semiconductors

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
KR1020197024869A 2017-01-31 2017-12-13 주석 합금 도금액 KR102174876B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2017015219 2017-01-31
JPJP-P-2017-015219 2017-01-31
JP2017222433A JP6432667B2 (ja) 2017-01-31 2017-11-20 錫合金めっき液
JPJP-P-2017-222433 2017-11-20
PCT/JP2017/044668 WO2018142776A1 (ja) 2017-01-31 2017-12-13 錫合金めっき液

Publications (2)

Publication Number Publication Date
KR20190103460A KR20190103460A (ko) 2019-09-04
KR102174876B1 true KR102174876B1 (ko) 2020-11-05

Family

ID=63110055

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020197024869A KR102174876B1 (ko) 2017-01-31 2017-12-13 주석 합금 도금액

Country Status (6)

Country Link
US (1) US20190390357A1 (ja)
EP (1) EP3578692A4 (ja)
JP (1) JP6432667B2 (ja)
KR (1) KR102174876B1 (ja)
CN (1) CN110249076A (ja)
TW (1) TWI681084B (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7243002B2 (ja) * 2018-07-20 2023-03-22 三菱マテリアル株式会社 錫めっき液及び錫合金めっき液
US20240116861A1 (en) * 2019-12-12 2024-04-11 Mitsubishi Materials Corporation Dithiapolyether diol, method for producing same, snag plating solution containing dithiapolyether diol, and method for forming plating film with use of snag plating solution
CN111188069A (zh) * 2019-12-31 2020-05-22 大连长丰实业总公司 一种镀锡铋合金溶液及其制备方法
CN112981459A (zh) * 2021-03-12 2021-06-18 昆明理工大学 一种电解精炼粗焊锡的方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006265572A (ja) * 2005-03-22 2006-10-05 Ishihara Chem Co Ltd 非シアン系のスズ−銀合金メッキ浴

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4296358B2 (ja) * 1998-01-21 2009-07-15 石原薬品株式会社 銀及び銀合金メッキ浴
JP3718790B2 (ja) 1998-12-24 2005-11-24 石原薬品株式会社 銀及び銀合金メッキ浴
JP3433291B2 (ja) * 1999-09-27 2003-08-04 石原薬品株式会社 スズ−銅含有合金メッキ浴、スズ−銅含有合金メッキ方法及びスズ−銅含有合金メッキ皮膜が形成された物品
US7628903B1 (en) * 2000-05-02 2009-12-08 Ishihara Chemical Co., Ltd. Silver and silver alloy plating bath
JP4162246B2 (ja) 2005-08-12 2008-10-08 石原薬品株式会社 シアン化物非含有銀系メッキ浴、メッキ体及びメッキ方法
EP2221396A1 (en) * 2008-12-31 2010-08-25 Rohm and Haas Electronic Materials LLC Lead-Free Tin Alloy Electroplating Compositions and Methods
JP2016148085A (ja) * 2015-02-12 2016-08-18 ユケン工業株式会社 スズ−銅めっき液および導電部材
JP6631348B2 (ja) * 2015-03-26 2020-01-15 三菱マテリアル株式会社 ホスホニウム塩を用いためっき液

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006265572A (ja) * 2005-03-22 2006-10-05 Ishihara Chem Co Ltd 非シアン系のスズ−銀合金メッキ浴

Also Published As

Publication number Publication date
EP3578692A1 (en) 2019-12-11
EP3578692A4 (en) 2020-12-09
JP6432667B2 (ja) 2018-12-05
TWI681084B (zh) 2020-01-01
JP2018123421A (ja) 2018-08-09
CN110249076A (zh) 2019-09-17
TW201833391A (zh) 2018-09-16
US20190390357A1 (en) 2019-12-26
KR20190103460A (ko) 2019-09-04

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