KR102155239B1 - 착색 경화성 수지 조성물 - Google Patents

착색 경화성 수지 조성물 Download PDF

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Publication number
KR102155239B1
KR102155239B1 KR1020130059531A KR20130059531A KR102155239B1 KR 102155239 B1 KR102155239 B1 KR 102155239B1 KR 1020130059531 A KR1020130059531 A KR 1020130059531A KR 20130059531 A KR20130059531 A KR 20130059531A KR 102155239 B1 KR102155239 B1 KR 102155239B1
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KR
South Korea
Prior art keywords
group
substituted
carbon atoms
mass
resin composition
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KR1020130059531A
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English (en)
Korean (ko)
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KR20130133675A (ko
Inventor
겐지 이치오카
Original Assignee
스미또모 가가꾸 가부시키가이샤
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Publication of KR20130133675A publication Critical patent/KR20130133675A/ko
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Publication of KR102155239B1 publication Critical patent/KR102155239B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nonlinear Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Chemistry (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Graft Or Block Polymers (AREA)
KR1020130059531A 2012-05-29 2013-05-27 착색 경화성 수지 조성물 KR102155239B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2012-121760 2012-05-29
JP2012121760 2012-05-29

Publications (2)

Publication Number Publication Date
KR20130133675A KR20130133675A (ko) 2013-12-09
KR102155239B1 true KR102155239B1 (ko) 2020-09-11

Family

ID=49737388

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020130059531A KR102155239B1 (ko) 2012-05-29 2013-05-27 착색 경화성 수지 조성물

Country Status (4)

Country Link
JP (3) JP2014005451A (ja)
KR (1) KR102155239B1 (ja)
CN (1) CN103454859A (ja)
TW (1) TWI592751B (ja)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6115281B2 (ja) * 2012-06-07 2017-04-19 Jsr株式会社 着色組成物、カラーフィルタ及び表示素子
JP6808921B2 (ja) * 2014-10-30 2021-01-06 住友化学株式会社 化合物および着色硬化性樹脂組成物
JP6551085B2 (ja) * 2015-09-09 2019-07-31 東洋インキＳｃホールディングス株式会社 カラーフィルタ用着色組成物及びカラーフィルタ
TW201730675A (zh) * 2016-02-26 2017-09-01 奇美實業股份有限公司 感光性樹脂組成物及其應用
JP6971055B2 (ja) * 2016-07-20 2021-11-24 東友ファインケム株式会社Dongwoo Fine−Chem Co., Ltd. 青色硬化性樹脂組成物、カラーフィルタ、及び表示装置
JP7007119B2 (ja) * 2016-08-24 2022-02-10 東友ファインケム株式会社 着色硬化性樹脂組成物、カラーフィルタ、及び表示装置
KR102466334B1 (ko) * 2016-10-06 2022-11-14 스미또모 가가꾸 가부시키가이샤 착색 경화성 수지 조성물
KR102545896B1 (ko) * 2016-12-14 2023-06-21 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치
JP6912885B2 (ja) * 2016-12-26 2021-08-04 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 着色樹脂組成物、カラーフィルタ、表示装置、固体撮像素子、及び化合物
TWI751313B (zh) * 2017-03-29 2022-01-01 日商住友化學股份有限公司 著色硬化性樹脂組成物
CN109976094B (zh) * 2017-12-27 2023-09-15 东友精细化工有限公司 着色树脂组合物、滤光片以及显示装置
JP7077012B2 (ja) * 2017-12-27 2022-05-30 東友ファインケム株式会社 赤色硬化性樹脂組成物、カラーフィルタ、及び表示装置
KR102684570B1 (ko) * 2018-01-09 2024-07-17 가부시키가이샤 아데카 조성물, 경화물, 광학 필터 및 경화물의 제조 방법
TWI830714B (zh) * 2018-01-09 2024-02-01 南韓商東友精細化工有限公司 自發光感光性樹脂組合物、顏色轉換層及顯示裝置
KR20210016324A (ko) * 2018-06-04 2021-02-15 가부시키가이샤 아데카 조성물, 경화물, 광학 필터 및 경화물의 제조 방법
CN112384543B (zh) * 2018-07-06 2023-07-07 魁北克电力公司 含缩水甘油基的聚合物、包含它们的聚合物组合物及其在电化学电池中的用途
KR102357316B1 (ko) * 2018-11-26 2022-01-27 삼성에스디아이 주식회사 감광성 수지 조성물, 이를 이용한 감광성 수지막 및 컬러필터
WO2022050051A1 (ja) * 2020-09-01 2022-03-10 住友化学株式会社 化合物

Citations (4)

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Publication number Priority date Publication date Assignee Title
JP2011028236A (ja) * 2009-06-24 2011-02-10 Sumitomo Chemical Co Ltd 着色感光性組成物
JP2011100114A (ja) 2009-10-07 2011-05-19 Sumitomo Chemical Co Ltd 着色感光性樹脂組成物
JP2011116818A (ja) * 2009-12-01 2011-06-16 Yamamoto Chem Inc テトラアザポルフィリン化合物およびディスプレイ用フィルタ
JP2011118368A (ja) 2009-10-28 2011-06-16 Sumitomo Chemical Co Ltd 着色感光性樹脂組成物

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DE69018197T2 (de) * 1989-11-13 1995-09-07 Agfa Gevaert Nv Elektrophotographisches Aufzeichnungsmaterial.
JP3311720B2 (ja) * 1999-01-22 2002-08-05 三井化学株式会社 ディスプレイ用フィルター
US6969764B2 (en) * 1999-12-28 2005-11-29 Mitsui Chemicals, Inc. Optical recording medium and novel azaporphyrin compounds
JP3834479B2 (ja) * 2000-02-01 2006-10-18 三井化学株式会社 プラズマディスプレイ用フィルタ、表示装置およびその製造方法
CN1234107C (zh) * 2000-02-01 2005-12-28 三井化学株式会社 显示器用滤光片、显示装置及其制造方法
JP2006079011A (ja) * 2004-09-13 2006-03-23 Mitsubishi Chemicals Corp カラーフィルター構造体及び液晶ディスプレイ装置
US20060121392A1 (en) * 2004-11-24 2006-06-08 Dai Nippon Printing Co., Ltd. Optical filter and display using the same
JP5504627B2 (ja) * 2008-07-01 2014-05-28 住友化学株式会社 着色感光性樹脂組成物
KR101333695B1 (ko) * 2010-07-06 2013-11-27 제일모직주식회사 컬러필터용 청색 수지 조성물 및 이를 이용한 컬러필터
JP5770672B2 (ja) * 2012-03-30 2015-08-26 富士フイルム株式会社 着色硬化性組成物、カラーフィルタ、カラーフィルタの製造方法、および表示装置

Patent Citations (4)

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Publication number Priority date Publication date Assignee Title
JP2011028236A (ja) * 2009-06-24 2011-02-10 Sumitomo Chemical Co Ltd 着色感光性組成物
JP2011100114A (ja) 2009-10-07 2011-05-19 Sumitomo Chemical Co Ltd 着色感光性樹脂組成物
JP2011118368A (ja) 2009-10-28 2011-06-16 Sumitomo Chemical Co Ltd 着色感光性樹脂組成物
JP2011116818A (ja) * 2009-12-01 2011-06-16 Yamamoto Chem Inc テトラアザポルフィリン化合物およびディスプレイ用フィルタ

Also Published As

Publication number Publication date
JP2019065288A (ja) 2019-04-25
KR20130133675A (ko) 2013-12-09
TW201411283A (zh) 2014-03-16
JP2014005451A (ja) 2014-01-16
CN103454859A (zh) 2013-12-18
JP2018012839A (ja) 2018-01-25
JP6777129B2 (ja) 2020-10-28
TWI592751B (zh) 2017-07-21

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