KR102009739B1 - 가변 광 필터 및 그에 기반한 파장­선택 센서 - Google Patents

가변 광 필터 및 그에 기반한 파장­선택 센서 Download PDF

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KR102009739B1
KR102009739B1 KR1020157023137A KR20157023137A KR102009739B1 KR 102009739 B1 KR102009739 B1 KR 102009739B1 KR 1020157023137 A KR1020157023137 A KR 1020157023137A KR 20157023137 A KR20157023137 A KR 20157023137A KR 102009739 B1 KR102009739 B1 KR 102009739B1
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filter
wavelength
optical filter
array
photodetectors
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KR20150111991A (ko
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카렌 데니스 헨드릭스
찰스 에이. 헐스
리차드 에이. 브레들리
제프리 제임스 쿠나
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비아비 솔루션즈 아이엔씨.
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G01J3/0256—Compact construction
    • G01J3/0259—Monolithic
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/12—Generating the spectrum; Monochromators
    • G01J3/26—Generating the spectrum; Monochromators using multiple reflection, e.g. Fabry-Perot interferometer, variable interference filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/281—Interference filters designed for the infrared light
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/285—Interference filters comprising deposited thin solid films
    • G02B5/288—Interference filters comprising deposited thin solid films comprising at least one thin film resonant cavity, e.g. in bandpass filters
    • H01L27/14621—
    • H01L27/14685—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/011—Manufacture or treatment of image sensors covered by group H10F39/12
    • H10F39/024—Manufacture or treatment of image sensors covered by group H10F39/12 of coatings or optical elements
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10—Integrated devices
    • H10F39/12—Image sensors
    • H10F39/18—Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/805—Coatings
    • H10F39/8053—Colour filters
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/805—Coatings
    • H10F39/8057—Optical shielding
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/807—Pixel isolation structures
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/809—Constructional details of image sensors of hybrid image sensors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/12—Generating the spectrum; Monochromators
    • G01J2003/1226—Interference filters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/12—Generating the spectrum; Monochromators
    • G01J2003/1226—Interference filters
    • G01J2003/1234—Continuously variable IF [CVIF]; Wedge type
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/12—Generating the spectrum; Monochromators
    • G01J2003/1226—Interference filters
    • G01J2003/1239—Interference filters and separate detectors

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Light Receiving Elements (AREA)
  • Spectrometry And Color Measurement (AREA)
KR1020157023137A 2013-01-29 2014-01-28 가변 광 필터 및 그에 기반한 파장­선택 센서 Active KR102009739B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020197023074A KR102401136B1 (ko) 2013-01-29 2014-01-28 가변 광 필터 및 그에 기반한 파장­선택 센서

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201361757846P 2013-01-29 2013-01-29
US61/757,846 2013-01-29
PCT/US2014/013449 WO2014120686A1 (en) 2013-01-29 2014-01-28 A variable optical filter and a wavelength-selective sensor based thereon

Related Child Applications (1)

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KR20150111991A KR20150111991A (ko) 2015-10-06
KR102009739B1 true KR102009739B1 (ko) 2019-08-12

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KR1020197023074A Active KR102401136B1 (ko) 2013-01-29 2014-01-28 가변 광 필터 및 그에 기반한 파장­선택 센서

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US (7) US9261634B2 (enExample)
EP (2) EP3828605B1 (enExample)
JP (3) JP6272627B2 (enExample)
KR (2) KR102009739B1 (enExample)
CN (2) CN108572409B (enExample)
TW (4) TWI662260B (enExample)
WO (1) WO2014120686A1 (enExample)

Families Citing this family (46)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014120686A1 (en) 2013-01-29 2014-08-07 Jds Uniphase Corporation A variable optical filter and a wavelength-selective sensor based thereon
JP2015149366A (ja) * 2014-02-05 2015-08-20 キヤノン株式会社 半導体装置の製造方法
DE102014014983A1 (de) * 2014-10-07 2016-04-07 Technische Universität Dresden Optisches Filterelement für spektroskopische Einrichtungen zur Umwandlung von spektralen Informationen in Ortsinformationen
JP6432270B2 (ja) * 2014-10-14 2018-12-05 岩崎電気株式会社 波長選択フィルター及び光照射装置
JP6671860B2 (ja) * 2015-04-28 2020-03-25 浜松ホトニクス株式会社 光検出装置
US20160327474A1 (en) * 2015-05-06 2016-11-10 Goodrich Corporation Infrared spectrometers
JP6464919B2 (ja) * 2015-05-15 2019-02-06 コニカミノルタ株式会社 分光フィルタおよび分光測定装置
US9702689B2 (en) * 2015-06-18 2017-07-11 Xerox Corporation Use of a full width array imaging sensor to measure real time film thicknesses on film manufacturing equipment
CN105405912A (zh) * 2015-12-15 2016-03-16 重庆鹰谷光电有限公司 具备自滤光功能的硅光电探测器芯片
US9923007B2 (en) 2015-12-29 2018-03-20 Viavi Solutions Inc. Metal mirror based multispectral filter array
US9960199B2 (en) 2015-12-29 2018-05-01 Viavi Solutions Inc. Dielectric mirror based multispectral filter array
US10170509B2 (en) 2016-02-12 2019-01-01 Viavi Solutions Inc. Optical filter array
US10663866B2 (en) 2016-09-20 2020-05-26 Asml Netherlands B.V. Wavelength-based optical filtering
US10168459B2 (en) * 2016-11-30 2019-01-01 Viavi Solutions Inc. Silicon-germanium based optical filter
FR3059823B1 (fr) * 2016-12-07 2019-08-23 Lynred Dispositif de detection multispectrale ameliore.
JP6806603B2 (ja) * 2017-03-17 2021-01-06 倉敷紡績株式会社 分光フィルタおよび分光測光装置
DE102017004828B4 (de) * 2017-05-20 2019-03-14 Optics Balzers Ag Optischer Filter und Verfahren zur Herstellung eines optischen Filters
US10782460B2 (en) 2017-05-22 2020-09-22 Viavi Solutions Inc. Multispectral filter
CN107367885A (zh) * 2017-07-13 2017-11-21 复旦大学 一种基于线性滤光片的超光谱摄像机
US11156753B2 (en) * 2017-12-18 2021-10-26 Viavi Solutions Inc. Optical filters
WO2019219215A1 (en) * 2018-05-18 2019-11-21 Telefonaktiebolaget Lm Ericsson (Publ) Optical filtering module and method
TWI688793B (zh) * 2018-06-07 2020-03-21 簡佐翰 光合波/分波多工器
US11187834B2 (en) * 2018-06-14 2021-11-30 Intevac, Inc. Multi-colored dielectric coating
US11143803B2 (en) * 2018-07-30 2021-10-12 Viavi Solutions Inc. Multispectral filter
US10651220B2 (en) * 2018-07-30 2020-05-12 Taiwan Semiconductor Manufacturing Co., Ltd. Narrow band filter with high transmission
US11650361B2 (en) 2018-12-27 2023-05-16 Viavi Solutions Inc. Optical filter
EP3913341A4 (en) * 2019-01-16 2022-02-23 Panasonic Intellectual Property Management Co., Ltd. OPTICAL FILTER, PHOTO DETECTION DEVICE AND PHOTO DETECTION SYSTEM
CN109798979B (zh) * 2019-03-12 2021-02-12 天津津航技术物理研究所 宽光谱范围的半导体工艺兼容高光谱成像芯片设计方法
KR102655348B1 (ko) 2019-03-19 2024-04-04 어플라이드 머티어리얼스, 인코포레이티드 소수성 및 아이스포빅 코팅
US11314004B2 (en) * 2019-04-08 2022-04-26 Visera Technologies Company Limited Optical filters and methods for forming the same
KR102755265B1 (ko) * 2019-05-20 2025-01-15 삼성디스플레이 주식회사 백라이트 유닛 및 이를 포함하는 표시 장치
WO2021005961A1 (ja) * 2019-07-11 2021-01-14 ソニーセミコンダクタソリューションズ株式会社 撮像素子および撮像装置
JP7680191B2 (ja) * 2019-07-11 2025-05-20 ソニーセミコンダクタソリューションズ株式会社 撮像素子および撮像装置
US12259276B2 (en) 2019-07-16 2025-03-25 Ams International Ag Reconstructing light wavelength spectrum with thin-film device
KR102151947B1 (ko) 2019-07-26 2020-09-04 송영진 광학필터 및 이를 포함하는 센서시스템, 그리고 광학필터용 할로겐화 비정질 실리콘 박막 제조방법
KR20210014491A (ko) * 2019-07-30 2021-02-09 삼성전자주식회사 광 필터 및 이를 포함하는 분광기
US11693164B2 (en) 2019-10-09 2023-07-04 Viavi Solutions Inc. Multi-transmission optical filter
CN110672207A (zh) * 2019-11-04 2020-01-10 中国电子科技集团公司第四十四研究所 基于滤光器片上集成多像素传感器的微型光谱仪
WO2021142319A1 (en) 2020-01-08 2021-07-15 Array Photonics, Inc. Broadband uv-to-swir photodetectors, sensors and systems
US11575245B2 (en) * 2020-02-28 2023-02-07 Marvell Asia Pte Ltd. Thin-film filter for tunable laser
JP7531290B2 (ja) * 2020-03-04 2024-08-09 キヤノン電子株式会社 光学装置
KR102857450B1 (ko) * 2020-04-08 2025-09-09 삼성전자주식회사 광 필터 및 이를 포함하는 분광기
CN116324351A (zh) * 2020-10-30 2023-06-23 松下知识产权经营株式会社 光检测装置、结构体的制造方法及光检测装置的制造方法
DE102022207959A1 (de) 2022-08-02 2024-02-08 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein Optischer Interferenzfilter, sowie Verfahren und Vorrichtung zu seiner Herstellung
US12372701B2 (en) * 2023-03-21 2025-07-29 Vactronics Technologies Inc. Narrow bandpass filtering element
CN120519858B (zh) * 2025-07-23 2025-09-23 深圳市中达瑞和科技有限公司 红外线性渐变滤光片及其制备方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005037762A (ja) 2003-07-17 2005-02-10 Sun Tec Kk 光学素子、波長可変光フィルタ、光アドドロップモジュールおよび波長可変光源
US20070127126A1 (en) 2005-12-07 2007-06-07 Murakami Corporation Dielectric multilayer filter
JP2011022432A (ja) 2009-07-17 2011-02-03 Sony Corp 多層膜光学フィルタ、固体撮像素子、撮像装置、表示装置、通信装置
WO2012169447A1 (ja) 2011-06-06 2012-12-13 旭硝子株式会社 光学フィルタ、固体撮像素子、撮像装置用レンズおよび撮像装置

Family Cites Families (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4790615A (en) * 1986-03-06 1988-12-13 Nippon Sheet Glass Co., Ltd. Demultiplexing and/or multiplexing optical circuit
US4957371A (en) * 1987-12-11 1990-09-18 Santa Barbara Research Center Wedge-filter spectrometer
US5218473A (en) 1990-07-06 1993-06-08 Optical Coating Laboratories, Inc. Leakage-corrected linear variable filter
JPH04107505A (ja) 1990-08-29 1992-04-09 Nippon Shinku Kogaku Kk くさび型干渉フィルター
CN1059968A (zh) * 1990-09-20 1992-04-01 托木斯克国立库伊比谢瓦大学 有选择性的干涉光学滤光系统
US5872655A (en) * 1991-07-10 1999-02-16 Optical Coating Laboratory, Inc. Monolithic linear variable filter and method of manufacture
JPH1078510A (ja) * 1996-09-05 1998-03-24 Yokogawa Electric Corp フィルタ
US5926317A (en) 1996-11-06 1999-07-20 Jds Fitel Inc. Multilayer thin film dielectric bandpass filter
US6057925A (en) 1998-08-28 2000-05-02 Optical Coating Laboratory, Inc. Compact spectrometer device
US6091502A (en) 1998-12-23 2000-07-18 Micronics, Inc. Device and method for performing spectral measurements in flow cells with spatial resolution
GB9901858D0 (en) * 1999-01-29 1999-03-17 Secr Defence Optical filters
US6469303B1 (en) * 2000-05-17 2002-10-22 Rae Systems, Inc. Non-dispersive infrared gas sensor
US6700690B1 (en) * 2000-10-02 2004-03-02 Ocean Optics, Inc. Tunable variable bandpass optical filter
TW528891B (en) * 2000-12-21 2003-04-21 Ind Tech Res Inst Polarization-independent ultra-narrow bandpass filter
JP3879411B2 (ja) * 2001-02-14 2007-02-14 日本電気株式会社 分散補償器
JP2002267998A (ja) * 2001-03-07 2002-09-18 Sumitomo Osaka Cement Co Ltd 波長分散補償モジュール、光受信回路、及び光通信システム
US6785002B2 (en) * 2001-03-16 2004-08-31 Optical Coating Laboratory, Inc. Variable filter-based optical spectrometer
JP2002311236A (ja) * 2001-04-11 2002-10-23 Sun Tec Kk 波長可変型干渉光フィルタとその製造方法及び波長可変型干渉光フィルタ装置
US20020191268A1 (en) * 2001-05-17 2002-12-19 Optical Coating Laboratory, Inc, A Delaware Corporation Variable multi-cavity optical device
US20030087121A1 (en) * 2001-06-18 2003-05-08 Lawrence Domash Index tunable thin film interference coatings
JP2004252214A (ja) 2003-02-20 2004-09-09 Sun Tec Kk 任意波長選択フィルタ、マルチチャネルモニタおよび生体検査装置
US7050215B1 (en) * 2003-08-01 2006-05-23 Ball Aerospace & Technologies Corp. Method and apparatus for providing a gas correlation filter for remote sensing of atmospheric trace gases
US7319560B2 (en) * 2003-09-29 2008-01-15 Teledyne Licensing, Llc Partitioned-cavity tunable fabry-perot filter
JP2005114812A (ja) 2003-10-03 2005-04-28 Sun Tec Kk 複合誘電体多層膜フィルタ
US20050205758A1 (en) * 2004-03-19 2005-09-22 Almeida Leo A Method and apparatus for multi-spectral photodetection
US20070030563A1 (en) * 2005-06-07 2007-02-08 Unaxis Balzers Ltd. Multi-bandpass filter for projection arrangements
US8437582B2 (en) * 2005-12-22 2013-05-07 Palo Alto Research Center Incorporated Transmitting light with lateral variation
WO2008104928A1 (en) * 2007-03-01 2008-09-04 Philips Intellectual Property & Standards Gmbh Optical detector device
US7576860B2 (en) * 2007-05-11 2009-08-18 Hewlett-Packard Development Company, L.P. Light filter having a wedge-shaped profile
US20080285165A1 (en) * 2007-05-14 2008-11-20 Wu Kuohua Angus Thin film filter system and method
US8410607B2 (en) 2007-06-15 2013-04-02 Taiwan Semiconductor Manufacturing Co., Ltd. Semiconductor memory structures
JP2009132989A (ja) 2007-11-09 2009-06-18 Epson Toyocom Corp 光学薄膜の形成方法およびその光学薄膜を備えた光学素子
US20110038028A1 (en) 2008-04-23 2011-02-17 Saman Dharmatilleke Optical Imaging Lens systems and components
JP5229075B2 (ja) * 2008-07-28 2013-07-03 日本電気硝子株式会社 広帯域反射鏡
US8581174B2 (en) * 2008-08-26 2013-11-12 Omnivision Technologies, Inc. Image sensor with prismatic de-multiplexing
GB0818822D0 (en) * 2008-10-14 2008-11-19 Edinburgh Instr Reduction of stray light
US8405115B2 (en) 2009-01-28 2013-03-26 Maxim Integrated Products, Inc. Light sensor using wafer-level packaging
JP2010186147A (ja) * 2009-02-13 2010-08-26 Panasonic Electric Works Co Ltd 赤外線光学フィルタおよびその製造方法
JP5399731B2 (ja) 2009-02-13 2014-01-29 パナソニック株式会社 赤外線光学フィルタ
US20110310472A1 (en) * 2009-02-13 2011-12-22 Takahiko Hirai Infrared optical filter and manufacturing method of the infrared optical filter
US8441710B2 (en) * 2010-01-08 2013-05-14 Semrock, Inc. Tunable thin-film filter
US9067381B2 (en) * 2010-02-19 2015-06-30 Fujifilm Corporation Manufacturing method of functional film and functional film
JP2011204797A (ja) * 2010-03-24 2011-10-13 Sony Corp 固体撮像装置とその製造方法、及び電子機器
WO2012007147A1 (de) * 2010-07-15 2012-01-19 Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. . Optisches bandpass-filtersystem, insbesondere für mehrkanalige spektralselektive messungen
EP2597495A4 (en) 2010-07-24 2013-12-11 Konica Minolta Holdings Inc NEAR INFRARED REFLECTIVE FILM AND NEAR INFRARED REFLECTOR
TWM421600U (en) * 2011-07-28 2012-01-21 Super Nova Optoelectronics Corp Light emitting device with optical filter structure and the optical filter structure thereof
TWI509292B (zh) * 2011-09-07 2015-11-21 Hon Hai Prec Ind Co Ltd 鏡片及具有該鏡片的鏡頭模組
WO2014120686A1 (en) * 2013-01-29 2014-08-07 Jds Uniphase Corporation A variable optical filter and a wavelength-selective sensor based thereon

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005037762A (ja) 2003-07-17 2005-02-10 Sun Tec Kk 光学素子、波長可変光フィルタ、光アドドロップモジュールおよび波長可変光源
US20070127126A1 (en) 2005-12-07 2007-06-07 Murakami Corporation Dielectric multilayer filter
JP2007183525A (ja) 2005-12-07 2007-07-19 Murakami Corp 誘電体多層膜フィルタ
JP2011022432A (ja) 2009-07-17 2011-02-03 Sony Corp 多層膜光学フィルタ、固体撮像素子、撮像装置、表示装置、通信装置
WO2012169447A1 (ja) 2011-06-06 2012-12-13 旭硝子株式会社 光学フィルタ、固体撮像素子、撮像装置用レンズおよび撮像装置

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