KR101968432B1 - 투영 광학계, 노광 장치, 및 디바이스 제조 방법 - Google Patents

투영 광학계, 노광 장치, 및 디바이스 제조 방법 Download PDF

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Publication number
KR101968432B1
KR101968432B1 KR1020177017295A KR20177017295A KR101968432B1 KR 101968432 B1 KR101968432 B1 KR 101968432B1 KR 1020177017295 A KR1020177017295 A KR 1020177017295A KR 20177017295 A KR20177017295 A KR 20177017295A KR 101968432 B1 KR101968432 B1 KR 101968432B1
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South Korea
Prior art keywords
convex mirror
optical system
concave
support member
projection optical
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English (en)
Korean (ko)
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KR20170088938A (ko
Inventor
야스히토 사사키
미츠루 세키
다케시 나카지마
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캐논 가부시끼가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0605—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0605—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors
    • G02B17/0615—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors off-axis or unobscured systems in wich all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G03B21/14—Details
    • G03B21/28—Reflectors in projection beam
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Toxicology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Optical Elements Other Than Lenses (AREA)
KR1020177017295A 2014-12-02 2015-11-17 투영 광학계, 노광 장치, 및 디바이스 제조 방법 Active KR101968432B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2014244333A JP6386896B2 (ja) 2014-12-02 2014-12-02 投影光学系、露光装置、および、デバイス製造方法
JPJP-P-2014-244333 2014-12-02
PCT/JP2015/005744 WO2016088314A1 (en) 2014-12-02 2015-11-17 Projection optical system, exposure apparatus, and device manufacturing method

Publications (2)

Publication Number Publication Date
KR20170088938A KR20170088938A (ko) 2017-08-02
KR101968432B1 true KR101968432B1 (ko) 2019-04-11

Family

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KR1020177017295A Active KR101968432B1 (ko) 2014-12-02 2015-11-17 투영 광학계, 노광 장치, 및 디바이스 제조 방법

Country Status (6)

Country Link
US (1) US10495978B2 (enExample)
JP (1) JP6386896B2 (enExample)
KR (1) KR101968432B1 (enExample)
CN (1) CN107003615B (enExample)
TW (2) TWI609251B (enExample)
WO (1) WO2016088314A1 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7075302B2 (ja) 2018-07-23 2022-05-25 キヤノン株式会社 光学装置、投影光学系、露光装置、および物品の製造方法
JP7204400B2 (ja) * 2018-09-28 2023-01-16 キヤノン株式会社 露光装置及び物品の製造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080252871A1 (en) * 2007-04-13 2008-10-16 Orc Manufacturing Co., Ltd. Projection exposure apparatus
JP5428701B2 (ja) 2008-09-22 2014-02-26 株式会社ニコン 移動体装置及び移動体駆動方法、露光装置及び露光方法、並びにデバイス製造方法
JP5625345B2 (ja) 2008-12-19 2014-11-19 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0689844A (ja) * 1992-09-09 1994-03-29 Toshiba Corp 露光装置
JP2001326160A (ja) * 2000-05-16 2001-11-22 Seiko Epson Corp 反射投影露光装置の歪み検出機構
JP2005345582A (ja) 2004-06-01 2005-12-15 Dainippon Screen Mfg Co Ltd 投影光学系およびパターン描画装置
US7184124B2 (en) 2004-10-28 2007-02-27 Asml Holding N.V. Lithographic apparatus having an adjustable projection system and device manufacturing method
JP2008263092A (ja) 2007-04-13 2008-10-30 Orc Mfg Co Ltd 投影露光装置
JP2008311498A (ja) * 2007-06-15 2008-12-25 Orc Mfg Co Ltd 反射型露光装置
JP5201979B2 (ja) 2007-12-26 2013-06-05 キヤノン株式会社 露光装置およびデバイス製造方法
JP5398185B2 (ja) * 2008-07-09 2014-01-29 キヤノン株式会社 投影光学系、露光装置およびデバイス製造方法
JP5116726B2 (ja) * 2009-06-01 2013-01-09 キヤノン株式会社 露光装置およびデバイス製造方法
JP5595001B2 (ja) * 2009-10-06 2014-09-24 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法
JP5595015B2 (ja) * 2009-11-16 2014-09-24 キヤノン株式会社 投影光学系、露光装置およびデバイス製造方法
JP6041541B2 (ja) 2012-06-04 2016-12-07 キヤノン株式会社 露光装置及びデバイス製造方法
JP6410406B2 (ja) 2012-11-16 2018-10-24 キヤノン株式会社 投影光学系、露光装置および物品の製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080252871A1 (en) * 2007-04-13 2008-10-16 Orc Manufacturing Co., Ltd. Projection exposure apparatus
JP5428701B2 (ja) 2008-09-22 2014-02-26 株式会社ニコン 移動体装置及び移動体駆動方法、露光装置及び露光方法、並びにデバイス製造方法
JP5625345B2 (ja) 2008-12-19 2014-11-19 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法

Also Published As

Publication number Publication date
JP6386896B2 (ja) 2018-09-05
US10495978B2 (en) 2019-12-03
JP2016109741A (ja) 2016-06-20
KR20170088938A (ko) 2017-08-02
CN107003615B (zh) 2019-01-25
TW201734668A (zh) 2017-10-01
TW201621476A (zh) 2016-06-16
TWI609251B (zh) 2017-12-21
US20170315448A1 (en) 2017-11-02
WO2016088314A1 (en) 2016-06-09
CN107003615A (zh) 2017-08-01
TWI588623B (zh) 2017-06-21

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