CN107003615B - 投影光学系统、曝光装置和器件制造方法 - Google Patents

投影光学系统、曝光装置和器件制造方法 Download PDF

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Publication number
CN107003615B
CN107003615B CN201580064782.8A CN201580064782A CN107003615B CN 107003615 B CN107003615 B CN 107003615B CN 201580064782 A CN201580064782 A CN 201580064782A CN 107003615 B CN107003615 B CN 107003615B
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CN
China
Prior art keywords
optical system
projection optical
convex mirror
support member
mirror
Prior art date
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Active
Application number
CN201580064782.8A
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English (en)
Chinese (zh)
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CN107003615A (zh
Inventor
佐佐木康人
关美津留
中岛猛
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Canon Inc
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Canon Inc
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Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of CN107003615A publication Critical patent/CN107003615A/zh
Application granted granted Critical
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0605—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0605—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors
    • G02B17/0615—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors off-axis or unobscured systems in wich all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G03B21/14—Details
    • G03B21/28—Reflectors in projection beam
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Toxicology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Optical Elements Other Than Lenses (AREA)
CN201580064782.8A 2014-12-02 2015-11-17 投影光学系统、曝光装置和器件制造方法 Active CN107003615B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2014244333A JP6386896B2 (ja) 2014-12-02 2014-12-02 投影光学系、露光装置、および、デバイス製造方法
JP2014-244333 2014-12-02
PCT/JP2015/005744 WO2016088314A1 (en) 2014-12-02 2015-11-17 Projection optical system, exposure apparatus, and device manufacturing method

Publications (2)

Publication Number Publication Date
CN107003615A CN107003615A (zh) 2017-08-01
CN107003615B true CN107003615B (zh) 2019-01-25

Family

ID=56091280

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201580064782.8A Active CN107003615B (zh) 2014-12-02 2015-11-17 投影光学系统、曝光装置和器件制造方法

Country Status (6)

Country Link
US (1) US10495978B2 (enExample)
JP (1) JP6386896B2 (enExample)
KR (1) KR101968432B1 (enExample)
CN (1) CN107003615B (enExample)
TW (2) TWI609251B (enExample)
WO (1) WO2016088314A1 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7075302B2 (ja) 2018-07-23 2022-05-25 キヤノン株式会社 光学装置、投影光学系、露光装置、および物品の製造方法
JP7204400B2 (ja) * 2018-09-28 2023-01-16 キヤノン株式会社 露光装置及び物品の製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1704797A (zh) * 2004-06-01 2005-12-07 大日本网目版制造株式会社 投影光学系统和图形描画装置
CN101286012A (zh) * 2007-04-13 2008-10-15 株式会社Orc制作所 投影曝光装置
CN103454769A (zh) * 2012-06-04 2013-12-18 佳能株式会社 光学系统、曝光装置以及制造器件的方法
JP5595015B2 (ja) * 2009-11-16 2014-09-24 キヤノン株式会社 投影光学系、露光装置およびデバイス製造方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0689844A (ja) * 1992-09-09 1994-03-29 Toshiba Corp 露光装置
JP2001326160A (ja) * 2000-05-16 2001-11-22 Seiko Epson Corp 反射投影露光装置の歪み検出機構
US7184124B2 (en) 2004-10-28 2007-02-27 Asml Holding N.V. Lithographic apparatus having an adjustable projection system and device manufacturing method
TW200841134A (en) * 2007-04-13 2008-10-16 Orc Mfg Co Ltd Projection exposure apparatus
JP2008311498A (ja) * 2007-06-15 2008-12-25 Orc Mfg Co Ltd 反射型露光装置
JP5201979B2 (ja) 2007-12-26 2013-06-05 キヤノン株式会社 露光装置およびデバイス製造方法
JP5398185B2 (ja) * 2008-07-09 2014-01-29 キヤノン株式会社 投影光学系、露光装置およびデバイス製造方法
US8508735B2 (en) 2008-09-22 2013-08-13 Nikon Corporation Movable body apparatus, movable body drive method, exposure apparatus, exposure method, and device manufacturing method
US8773635B2 (en) 2008-12-19 2014-07-08 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
JP5116726B2 (ja) * 2009-06-01 2013-01-09 キヤノン株式会社 露光装置およびデバイス製造方法
JP5595001B2 (ja) * 2009-10-06 2014-09-24 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法
JP6410406B2 (ja) 2012-11-16 2018-10-24 キヤノン株式会社 投影光学系、露光装置および物品の製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1704797A (zh) * 2004-06-01 2005-12-07 大日本网目版制造株式会社 投影光学系统和图形描画装置
CN101286012A (zh) * 2007-04-13 2008-10-15 株式会社Orc制作所 投影曝光装置
JP5595015B2 (ja) * 2009-11-16 2014-09-24 キヤノン株式会社 投影光学系、露光装置およびデバイス製造方法
CN103454769A (zh) * 2012-06-04 2013-12-18 佳能株式会社 光学系统、曝光装置以及制造器件的方法

Also Published As

Publication number Publication date
JP6386896B2 (ja) 2018-09-05
US10495978B2 (en) 2019-12-03
KR101968432B1 (ko) 2019-04-11
JP2016109741A (ja) 2016-06-20
KR20170088938A (ko) 2017-08-02
TW201734668A (zh) 2017-10-01
TW201621476A (zh) 2016-06-16
TWI609251B (zh) 2017-12-21
US20170315448A1 (en) 2017-11-02
WO2016088314A1 (en) 2016-06-09
CN107003615A (zh) 2017-08-01
TWI588623B (zh) 2017-06-21

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