TWI609251B - 投影光學系統、曝光設備及裝置製造方法 - Google Patents
投影光學系統、曝光設備及裝置製造方法 Download PDFInfo
- Publication number
- TWI609251B TWI609251B TW106111174A TW106111174A TWI609251B TW I609251 B TWI609251 B TW I609251B TW 106111174 A TW106111174 A TW 106111174A TW 106111174 A TW106111174 A TW 106111174A TW I609251 B TWI609251 B TW I609251B
- Authority
- TW
- Taiwan
- Prior art keywords
- optical system
- convex mirror
- projection optical
- reflective surface
- support member
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 title claims description 199
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 230000007246 mechanism Effects 0.000 claims description 48
- 239000000758 substrate Substances 0.000 claims description 29
- 238000005286 illumination Methods 0.000 claims description 12
- 238000003384 imaging method Methods 0.000 claims description 12
- 230000002093 peripheral effect Effects 0.000 description 8
- 229920002430 Fibre-reinforced plastic Polymers 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 239000011151 fibre-reinforced plastic Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 229910000831 Steel Inorganic materials 0.000 description 3
- 238000006073 displacement reaction Methods 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- 201000009310 astigmatism Diseases 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/02—Catoptric systems, e.g. image erecting and reversing system
- G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
- G02B17/0605—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/02—Catoptric systems, e.g. image erecting and reversing system
- G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
- G02B17/0605—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors
- G02B17/0615—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors off-axis or unobscured systems in wich all of the mirrors share a common axis of rotational symmetry
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/14—Details
- G03B21/28—Reflectors in projection beam
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Optics & Photonics (AREA)
- Toxicology (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Engineering & Computer Science (AREA)
- Atmospheric Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Lenses (AREA)
- Optical Elements Other Than Lenses (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014244333A JP6386896B2 (ja) | 2014-12-02 | 2014-12-02 | 投影光学系、露光装置、および、デバイス製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201734668A TW201734668A (zh) | 2017-10-01 |
| TWI609251B true TWI609251B (zh) | 2017-12-21 |
Family
ID=56091280
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW106111174A TWI609251B (zh) | 2014-12-02 | 2015-11-20 | 投影光學系統、曝光設備及裝置製造方法 |
| TW104138518A TWI588623B (zh) | 2014-12-02 | 2015-11-20 | 投影光學系統、曝光設備及裝置製造方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW104138518A TWI588623B (zh) | 2014-12-02 | 2015-11-20 | 投影光學系統、曝光設備及裝置製造方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US10495978B2 (enExample) |
| JP (1) | JP6386896B2 (enExample) |
| KR (1) | KR101968432B1 (enExample) |
| CN (1) | CN107003615B (enExample) |
| TW (2) | TWI609251B (enExample) |
| WO (1) | WO2016088314A1 (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7075302B2 (ja) | 2018-07-23 | 2022-05-25 | キヤノン株式会社 | 光学装置、投影光学系、露光装置、および物品の製造方法 |
| JP7204400B2 (ja) * | 2018-09-28 | 2023-01-16 | キヤノン株式会社 | 露光装置及び物品の製造方法 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005345582A (ja) * | 2004-06-01 | 2005-12-15 | Dainippon Screen Mfg Co Ltd | 投影光学系およびパターン描画装置 |
| US20060092393A1 (en) * | 2004-10-28 | 2006-05-04 | Asml Holding N.V. | Lithographic apparatus having an adjustable projection system and device manufacturing method |
| TW200935188A (en) * | 2007-12-26 | 2009-08-16 | Canon Kk | Exposure apparatus and equipment manufacturing method |
| JP2011108793A (ja) * | 2009-11-16 | 2011-06-02 | Canon Inc | 露光装置およびデバイス製造方法 |
| TW201350902A (zh) * | 2012-06-04 | 2013-12-16 | 佳能股份有限公司 | 光學系統、曝光裝置及製造設備的方法 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0689844A (ja) * | 1992-09-09 | 1994-03-29 | Toshiba Corp | 露光装置 |
| JP2001326160A (ja) * | 2000-05-16 | 2001-11-22 | Seiko Epson Corp | 反射投影露光装置の歪み検出機構 |
| TW200841134A (en) * | 2007-04-13 | 2008-10-16 | Orc Mfg Co Ltd | Projection exposure apparatus |
| JP2008263092A (ja) | 2007-04-13 | 2008-10-30 | Orc Mfg Co Ltd | 投影露光装置 |
| JP2008311498A (ja) * | 2007-06-15 | 2008-12-25 | Orc Mfg Co Ltd | 反射型露光装置 |
| JP5398185B2 (ja) * | 2008-07-09 | 2014-01-29 | キヤノン株式会社 | 投影光学系、露光装置およびデバイス製造方法 |
| US8508735B2 (en) | 2008-09-22 | 2013-08-13 | Nikon Corporation | Movable body apparatus, movable body drive method, exposure apparatus, exposure method, and device manufacturing method |
| US8773635B2 (en) | 2008-12-19 | 2014-07-08 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
| JP5116726B2 (ja) * | 2009-06-01 | 2013-01-09 | キヤノン株式会社 | 露光装置およびデバイス製造方法 |
| JP5595001B2 (ja) * | 2009-10-06 | 2014-09-24 | キヤノン株式会社 | 投影光学系、露光装置及びデバイス製造方法 |
| JP6410406B2 (ja) | 2012-11-16 | 2018-10-24 | キヤノン株式会社 | 投影光学系、露光装置および物品の製造方法 |
-
2014
- 2014-12-02 JP JP2014244333A patent/JP6386896B2/ja active Active
-
2015
- 2015-11-17 WO PCT/JP2015/005744 patent/WO2016088314A1/en not_active Ceased
- 2015-11-17 KR KR1020177017295A patent/KR101968432B1/ko active Active
- 2015-11-17 CN CN201580064782.8A patent/CN107003615B/zh active Active
- 2015-11-17 US US15/526,277 patent/US10495978B2/en active Active
- 2015-11-20 TW TW106111174A patent/TWI609251B/zh active
- 2015-11-20 TW TW104138518A patent/TWI588623B/zh active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005345582A (ja) * | 2004-06-01 | 2005-12-15 | Dainippon Screen Mfg Co Ltd | 投影光学系およびパターン描画装置 |
| US20060092393A1 (en) * | 2004-10-28 | 2006-05-04 | Asml Holding N.V. | Lithographic apparatus having an adjustable projection system and device manufacturing method |
| TW200935188A (en) * | 2007-12-26 | 2009-08-16 | Canon Kk | Exposure apparatus and equipment manufacturing method |
| JP2011108793A (ja) * | 2009-11-16 | 2011-06-02 | Canon Inc | 露光装置およびデバイス製造方法 |
| TW201350902A (zh) * | 2012-06-04 | 2013-12-16 | 佳能股份有限公司 | 光學系統、曝光裝置及製造設備的方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP6386896B2 (ja) | 2018-09-05 |
| US10495978B2 (en) | 2019-12-03 |
| KR101968432B1 (ko) | 2019-04-11 |
| JP2016109741A (ja) | 2016-06-20 |
| KR20170088938A (ko) | 2017-08-02 |
| CN107003615B (zh) | 2019-01-25 |
| TW201734668A (zh) | 2017-10-01 |
| TW201621476A (zh) | 2016-06-16 |
| US20170315448A1 (en) | 2017-11-02 |
| WO2016088314A1 (en) | 2016-06-09 |
| CN107003615A (zh) | 2017-08-01 |
| TWI588623B (zh) | 2017-06-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US8767172B2 (en) | Projection optical device and exposure apparatus | |
| TW200923593A (en) | Lithographic apparatus, projection assembly and active damping | |
| JP6563600B2 (ja) | 振動絶縁デバイス、リソグラフィ装置、および振動絶縁システムを調節する方法 | |
| JP5149675B2 (ja) | リソグラフィ装置及びデバイス製造方法 | |
| TWI609251B (zh) | 投影光學系統、曝光設備及裝置製造方法 | |
| JP5109661B2 (ja) | 露光装置及び露光方法 | |
| KR20090097826A (ko) | 광학소자 지지장치, 경통, 노광장치 및 디바이스 제조 방법 | |
| JP5206132B2 (ja) | 光学素子保持装置、光学系、露光装置、デバイスの製造方法 | |
| JP6336108B2 (ja) | 振動補償光学系、リソグラフィー装置、及びその製造方法 | |
| KR102193387B1 (ko) | 보유 지지 장치, 투영 광학계, 노광 장치 및 물품 제조 방법 | |
| US8064152B2 (en) | Supporting device, optical apparatus, exposure apparatus, and device manufacturing method | |
| US7333179B2 (en) | Moving mechanism with high bandwidth response and low force transmissibility | |
| JP7075302B2 (ja) | 光学装置、投影光学系、露光装置、および物品の製造方法 | |
| US20160026097A1 (en) | Vibration control device, lithography apparatus, and article manufacturing method | |
| JP2008311498A (ja) | 反射型露光装置 | |
| JP2018066958A (ja) | 光学装置、投影光学系、露光装置及び物品の製造方法 | |
| KR102202272B1 (ko) | 위치 조정 기구, 노광 장치 및 물품의 제조 방법 | |
| US20110065051A1 (en) | Supporting device, optical apparatus, exposure apparatus, and device manufacturing method | |
| JP5328297B2 (ja) | 露光装置およびデバイス製造方法 | |
| JP7446096B2 (ja) | 照明光学系、および物品製造方法 | |
| JP2010197517A (ja) | 照明光学装置、露光装置およびデバイス製造方法 | |
| KR20100073577A (ko) | 노광 공정용 레티클의 위치 계측장치 | |
| WO2012137699A1 (ja) | 光学装置、露光装置、およびデバイス製造方法 | |
| JP2000003850A (ja) | ウエハ周辺露光装置 | |
| JP2012053259A (ja) | レンズの固定構造，光走査装置，画像形成装置 |