200935188 九、發明說明 【發明所屬之技術領域】 本發明係關於具有將原版的圖案投影於基板之投影光 學系之曝光裝置及使用該曝光裝置製造設備之設備製造方 法。 【先前技術】 液晶顯示設備，藉由通過光蝕刻工程在基板上形成電 極等電路圖案而被製造。光蝕刻工程，包含藉由曝光裝置 將原版之圖案投影於基板曝光該基板的工程。於日本特開 昭6 0-20 1 3 1 6號公報，記載著被搭載於曝光裝置的投影光 學系。 近年來，進行著液晶顯示設備的大型化，在如日本特 開昭60-20 1 3 1 6號公報所示之具備等倍的投影光學系之曝 光裝置，標線片（reticule )大型化、製造成本上升等問 題越來越顯著。關於此問題，被提出來如日本特開 2006-78592號公報、特開2006-7863 1號公報所示之擴大 投影光學系。 特開昭60-20 1 3 1 6號公報所記載之投影光學系，投影 倍率爲1倍（等倍）’曝光光線分別使用1枚凹面鏡之2 個區域被反射2次。另一方面，在具有等倍以外的投影倍 率之特開2006-78592號公報、特開2006-7863 1號公報所 記載之光學系，第1凹面鏡與凸面鏡之距離不同於第2凹 面鏡與凸面鏡之距離。亦即，第1凹面鏡與第2凹面鏡， -4 -BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exposure apparatus having a projection optical system that projects a pattern of a master on a substrate, and a device manufacturing method using the apparatus for manufacturing the exposure apparatus. [Prior Art] A liquid crystal display device is manufactured by forming a circuit pattern such as an electrode on a substrate by photolithography. The photolithography process includes a project of projecting a pattern of a master onto a substrate by an exposure device to expose the substrate. Japanese Laid-Open Patent Publication No. SHO 60-20-1 3 1 6 discloses a projection optical system mounted on an exposure apparatus. In recent years, the size of the liquid crystal display device has increased, and the reticule has been enlarged, and the exposure apparatus having the projection optical system of the same magnification as shown in Japanese Laid-Open Patent Publication No. Sho 60-20 1 3 16 has been enlarged. Problems such as rising manufacturing costs are becoming more and more significant. In this case, an enlarged projection optical system as disclosed in Japanese Laid-Open Patent Publication No. Hei. No. 2006-78592, No. 2006-7863 No. 1 is proposed. In the projection optical system described in Japanese Laid-Open Patent Publication No. SHO 60-20 No. 1 3, the projection magnification is 1 time (equal magnification). The exposure light is reflected twice by using two concave mirrors. On the other hand, in the optical system described in Japanese Laid-Open Patent Publication No. Hei. No. 2006-78592, the first concave mirror and the convex mirror are different from the second concave mirror and the convex mirror. distance. That is, the first concave mirror and the second concave mirror, -4 -
200935188 有隨著外部振動或溫度變化等影響而個別移動的 結果，在具有第1凹面鏡與第2凹面鏡的構成， 枚凹面鏡提供2個反射面的構成相比，鏡在移動 性能的影像，特別是倍率或歪曲光收差之影響變 響到製造的設備之虞。此外，具有第1凹面鏡與 鏡的構成，對其製造以及組裝的誤差也變得敏感 【發明內容】 本發明係以前述課題認識爲契機所發明者， 制第1凹面鏡及第2凹面鏡之獨立的位置偏移導 能的降低爲目的。 本發明之一態樣，係以具有將原版的圖案投 的投影光學系之曝光裝置爲對象，前述投影光學 述原版與前述基板之間的光徑中，具備由前述原 依序被配置之第1凹面鏡、凸面鏡、第2凹面鏡 述第1凹面鏡與前述第2凹面鏡之支撐機構。前 面鏡的反射面與前述凸面鏡的反射面之距離，與 凹面鏡的反射面與前述凸面鏡的反射面之距離不 支撐機構，包含上部構件、中段構件、下部構件 含連接這些的端部的側部構件之棚形狀的框體； 凹面鏡，藉由前述上部構件及前述中段構件支撐 2凹面鏡，藉由前述下部構件支撐。 根據本發明，例如可以抑制第1凹面鏡及第 之獨立的位置偏移導致成像性能的降低。 可能性。 與藉由1 時對光學 大，有影 第2凹面 例如以抑 致成像性 影於基板 系，於前 版之側起 、支撐前 述第1凹 前述第2 同。前述 、以及包 前述第1 ，前述第 2凹面鏡 -5- 200935188 本發明之其他特徵及優點，參照附圖說明如下。又， 於附圖’相同或者同樣的構成賦予相同的編號。 【實施方式】 以下，參照附圖說明本發明之適切的實施型態。 圖1係顯示本發明之適切的實施型態之曝光裝置的槪 略構成圖。本發明之適切的實施型態之曝光裝置EXP，具 備保持原版（標線片（reticule )) 1之原版平台（stage )2、將藉由未圖示之照明光學系照明之原版1的圖案投 影於基板11之投影光學竭PO、及支撐基板11之基板平 台1 0。 投影光學系PO，包含於原版1與基板11之間的光徑 中由原版1之側起依序被配置的第1凹面鏡6、凸面鏡7 、第2凹面鏡8»連結第1凹面鏡6的曲率中心、凸面鏡 7的曲率中心以及第2凹面鏡8的曲率中心之軸，典型上 爲水平。投影光學系PO’在離開光軸的位置具有輪帶狀 之良好影像區。投影光學系PO’具有1以外之投影倍率 ，典型爲比1還要大的投影倍率。第凹面鏡、凸面鏡7、 第2凹面鏡8之至少有一’其反射面亦可以爲非球面。 在圖1，係以基板11之表面爲XY平面，以與其直交 之軸爲Z軸的方式定義XYZ座標軸。此實施型態之投影 光學系PO，爲了修正凸面鏡7之光收差具有彎月透鏡（ meniscus) 12。藉由使彎月透鏡12爲非球面透鏡可以 更良好地修正凸面鏡7的光收差。投影光學系p0’爲了 -6- 200935188 抑制原版1與基板1 1之對焦偏離導致成像性能的降低， 於物體側及成像側均被構成爲遠心的（telecentric )較佳 * 。投影光學系PO，爲了提高光學性能，亦可具備折射光 - 學系3、9。投影光學系PO，應具備供折曲光軸之用的1 個或複數反射鏡4。 基板1 1之曝光，係對投影光學系PO掃描驅動原版1 及基板11而進行的。原版1與基板11之速度比，隨著投 ^ 影光學系PO的投影倍率而決定。結束基板11上之1個 ❹ 照射（shot )區域的曝光後，基板11被步進移動，進行 次一照射區域的曝光。 照明原版1的光，因應設備之圖案而選擇。例如在製 造液晶顯示設備之用的曝光裝置，使用高壓水銀燈，選擇 使用 g 線（436nm) 、11線（405nm)或 i 線（365nm)。 然而，本發明，並沒有把使用的光的波長限定於特別的波 長。 φ 如前所述，投影光學系P〇，被構成爲具有1以外之 投影倍率，典型係比1還要大的投影倍率。換句話說，第 1凹面鏡6的反射面與凸面鏡7的反射面之第1距離與第 2凹面鏡8的反射面與凸面鏡7的反射面之第2距離不同 ，典型爲第1距離比第2距離還小。 圖2係舉例顯示對於由第1凹面鏡6及第2凹面鏡8 之適切位置起的位置偏移之直交於光線的平面內之成像點 的偏移量（倍率.歪曲光收差）。於圖2，「第1凹面」 係顯示起因於往特定方向之第1凹面鏡6的位置偏移之成 200935188 像點的偏移量。於圖2，「第2凹面」係顯示起因於往前 述特定方向之第2凹面鏡8的位置偏移之成像點的偏移量 。於圖2，「第1凹面+第2凹面」，顯示第1凹面鏡6 與第2凹面鏡8之位置偏移的量以及方向相同的場合之成 像點的偏移量。 由圖2可知，在第1凹面鏡6與第2凹面鏡8具有個 別的位置誤差的場合，投影光學系PO之成像性能大幅降 低。此外，由圖2可知，第1凹面鏡6及第2凹面鏡8分 別的位置偏移量以及方向相同的場合，成像點之偏移相互 逆向，而其量幾乎爲相等。總之，如圖2之「第1凹面+ 第2凹面」所例示的，第1凹面鏡6與第2凹面鏡8分別 的位置偏移量以及方向相同的場合，這些位置偏移導致成 像點的位置偏移的大部分被抵銷。 此處，在此實施型態，以分別的位置關係被維持的方 式藉1個支撐機構支撐第1凹面鏡6及第2凹面鏡8。藉 此，第1凹面鏡6及第2凹面鏡8之位移的量以及方向變 成相等。該支撐機構，包含上部構件、中段構件、下部構 件、以及包含連接這些的端部的側部構件之棚形狀的框體 :第1凹面鏡6，藉由前述上部構件及前述中段構件支撐 ，第2凹面鏡8，藉由前述下部構件支撐。 圖3及圖4係顯示本發明之第1實施型態之投影光學 系PO之構成圖。投影光學系p0，於原版1與基板11之 間之光徑中具備由原版1之側起依序被配置之第1凹面鏡 6、凸面鏡7與第2凹面鏡8、及支撐第1凹面鏡6與第2 -8- 200935188 凹面鏡8之支撐機構。此處，第1凹面鏡6的反射面與凸 面鏡7的反射面之距離，與第2凹面鏡8的反射面與凸面 鏡7的反射面之距離不同。在圖3及圖4所示的實施型態 ，第1凹面鏡6的反射面與凸面鏡7的反射面，相互偏移 於Y軸方向。 支撐機構，包含上部構件105、中段構件107、下部 構件108、以及包含連接這些的端部的側部構件111之棚 形狀的框體120。框體120被配置於鏡筒室101之中。第 1凹面鏡6，藉由上部構件105及中段構件107支撐，第 2凹面鏡8，藉由下部構件108支撐。第2凹面鏡8，除 了下部構件108以外，藉由中段構件107支撐亦可。 第1凹面鏡6，中介著被固定於上部構件1〇5的1或 者複數之支撐構件104以及被固定於中段構件1〇7的1或 者複數之支撐構件102藉由上部構件105以及中段構件 107支撐。第1凹面鏡6，例如，於其上部藉由支撐構件 104限制X、Y方向之位置，於其下部藉由支撐構件1〇2 限制X、Y、Z方向之位置。 第2凹面鏡8，中介著被固定於下部構件1〇8的1或 者複數之下部支撐體115以及被固定於中段構件1〇7的1 或者複數之支撐構件106藉由下部構件108以及中段構件 107支撐。第2凹面鏡8，例如，於其下部藉由下部支撐 體115限制X、Y、Z方向之位置，於其上部藉由支撐構 件1 〇6限制Y方向之位置。下部支撐體1 1 5，包含限制第 2凹面鏡8的X方向及Z方向的位置之支撐構件1〇9，與 -9- 200935188 限制第2凹面鏡8的方向的位置之支撐構件110。 框體1 20，最好係以線膨脹係數小的，而且楊氏係數 大的材料，例如鐵鎳合金、鈷合金、超級不變鋼（Invar ，鐵鎳合金）等構成。藉由小的線膨脹係數可以減低熱導 致的伸縮。框體 120，例如以線膨脹係數之絕對値在 1 .5 xl〇_6以下之材料構成較佳。此外，藉由使用楊氏係數 大的材質可以縮小變形，對第1凹面鏡6、第2凹面鏡8 之變形的傳播變少，此外，可以抑制之稱機構全體之振動 固有値的降低。 藉由以上之構造，第1凹面鏡6與第2凹面鏡8係對 框體120固定，可以減低第1凹面鏡6與第2凹面鏡8獨 立移動導致成像性能的變化，特別是倍率變化與歪曲光收 差之變化。 圖5及圖6係顯示本發明之第2實施型態之投影光學 系Ρ〇之構成圖。又，於圖5及圖6，與圖3及圖4所示 之第1實施型態實質相同的構成要素被賦予相同的符號。 第2凹面鏡8藉由下部構件108支撐其下部，同時藉 由包含由下部構件1 0 8延伸的部分（例如柱狀部分）之1 或複數之支撐構件205支撐其上部。第2凹面鏡8，中介 著被固定於下部構件108的1或複數之下部支撐體115藉 由下部構件108支撐。第2凹面鏡8，例如，於其下部藉 由下部支撐體115限制X、Υ、Ζ方向之位置，於其上部 藉由支撐構件205限制Υ方向之位置。下部支撐體1 15， 包含限制第2凹面鏡8的X方向及Ζ方向的位置之支撐 -10- 200935188 構件109，與限制第2凹面鏡8的方向的位置之支撐構件 110° ' 圖7係例示作爲設備的製造方法之一例之液晶顯示設 • 備的製造方法之圖。該製造方法，包含薄膜形成前洗淨工 程、薄膜形成工程、光阻劑塗佈工程、曝光工程、顯影工 程、蝕刻工程、光阻劑剝離工程之反覆進行，以及其後實 施的檢査、修正工程。在薄膜形成前洗淨工程，洗淨玻璃 基板。在薄膜形成工程，於玻璃基板上形成薄膜。在光阻 劑塗佈工程’於薄膜上塗佈光阻劑。在曝光工程，使用前 述曝光裝置曝光玻璃基板在光阻劑形成潛像圖案。在顯影 工程，顯影玻璃基板把潛像圖案改變爲物理的圖案。在蝕 刻工程，蝕刻露出於該物理的圖案的開口之薄膜。在光阻 劑剝離工程，剝離作爲該物理的圖案之光阻劑。藉由由前 述薄膜形成前洗淨工程至光阻劑剝離工程之反覆進行形成 液晶顯示設備。在檢査、修正工程，檢查液晶顯示設備， _ 修正具有不良的液晶顯不設備。 本發明並不以前述實施型態爲限，在不逸脫於本發明 的精神及其範圍的情況下，可以進行種種變更與變形。亦 即，爲了使本發明之範圍明確公開，添附以下之申請專利 範圍。 【圖式簡單說明】 附圖包含於專利說明書，構成其一部份，顯示本發明 之實施型態，與其記載一起用於說明本發明之原理。 -11 - 200935188 圖1係顯示本發明之適切的實施型態之曝光裝置的槪 略構成圖。 圖2係舉例顯示對於由第1凹面鏡及第2凹面鏡8之 · 適切位置起的位置偏移之直交於光線的平面內之成像點的 - 偏移量（倍率•歪曲光收差）之圖。 圖3係顯示本發明之第1實施型態之投影光學系之構 成圖。 圖4係顯示本發明之第1實施型態之投影光學系之構 0 成圖。 圖5係顯示本發明之第2實施型態之投影光學系之構 成圖。 圖6係顯示本發明之第2實施型態之投影光學系之構 成圖。 圖7係舉例顯示本發明之適切的實施型態之設備製造 方法之圖。 ❹ 【主要元件符號說明】 1:原版（標線片（reticule)) 2:原版平台（stage) 3，9 :折射光學系 4 :反射鏡 6 :第1凹面鏡 7 :凸面鏡 8 :第2凹面鏡 -12- 200935188 I 〇 ·基板平台 II :基板 12 :彎月透鏡（meniscus) 1 〇 1 :鏡筒室 102,104,106,109,110:支撐構件 105 :上部構件 107 :中段構件 108 :下部構件 1 1 1 :側部構件 1 1 5 :下部支撐體 120 :框體 EXP :曝光裝置 PO :投影光學系 -13-200935188 The result of the individual movement with the influence of external vibration or temperature change, and the configuration of the first concave mirror and the second concave mirror, and the configuration in which the concave mirror provides two reflecting surfaces, the image of the moving performance of the mirror, especially The effect of the magnification or distortion of the light changes to the point of manufacture of the equipment. Further, the configuration of the first concave mirror and the mirror is sensitive to errors in manufacturing and assembly. [Invention] The present invention has been invented by the above-mentioned problems, and is independent of the first concave mirror and the second concave mirror. The purpose of the positional offset conduction is reduced. An aspect of the present invention is directed to an exposure apparatus having a projection optical system that projects a pattern of a master, and an optical path between the projection optical master and the substrate includes a first order A concave mirror, a convex mirror, and a second concave mirror mirror the first concave mirror and the second concave mirror support mechanism. The distance between the reflecting surface of the front mirror and the reflecting surface of the convex mirror, and the distance between the reflecting surface of the concave mirror and the reflecting surface of the convex mirror are not supported, and the upper member, the middle member, and the lower member include side members connecting the ends of the mirror a frame-shaped frame; the concave mirror is supported by the lower member by the upper member and the middle member supporting the concave mirror. According to the present invention, for example, it is possible to suppress the first concave mirror and the first independent positional shift from causing a decrease in imaging performance. possibility. When the light is large, the second concave surface is shadowed, for example, so that the image formation is affected by the substrate, and the first concave second side is supported from the side of the front plate. The above and the first and second concave mirrors -5 - 200935188 of the present invention are described below with reference to the drawings. In the drawings, the same or similar components are denoted by the same reference numerals. [Embodiment] Hereinafter, an appropriate embodiment of the present invention will be described with reference to the drawings. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic view showing the configuration of an exposure apparatus according to a preferred embodiment of the present invention. The exposure apparatus EXP according to an embodiment of the present invention includes a master stage 2 for holding an original (reticule) 1, and a pattern projection of the original 1 which is illuminated by an illumination optical system (not shown). The projection on the substrate 11 is optically exhausted PO and the substrate platform 10 supporting the substrate 11. The projection optical system PO includes the first concave mirror 6, the convex mirror 7, and the second concave mirror 8» which are arranged in order from the side of the original 1 among the optical paths between the original plate 1 and the substrate 11, and connect the center of curvature of the first concave mirror 6. The axis of curvature of the convex mirror 7 and the axis of curvature of the second concave mirror 8 are typically horizontal. The projection optical system PO' has a good image area in the form of a belt at a position away from the optical axis. The projection optical system PO' has a projection magnification other than 1, and is typically a projection magnification larger than 1. At least one of the concave mirror, the convex mirror 7, and the second concave mirror 8 may have an aspherical surface. In Fig. 1, the surface of the substrate 11 is an XY plane, and the XYZ coordinate axis is defined such that the axis orthogonal thereto is the Z axis. The projection optical system PO of this embodiment has a meniscus 12 for correcting the light harvest of the convex mirror 7. The light harvesting of the convex mirror 7 can be corrected more favorably by making the meniscus lens 12 an aspherical lens. The projection optical system p0' for suppressing the focus deviation of the original plate 1 from the substrate 1 1 for -6-200935188 causes a decrease in imaging performance, and is preferably telecentrically formed on both the object side and the image side. The projection optical system PO may have refracted light systems 3 and 9 in order to improve optical performance. The projection optical system PO should have one or a plurality of mirrors 4 for bending the optical axis. The exposure of the substrate 11 is performed by scanning and driving the original plate 1 and the substrate 11 to the projection optical system PO. The speed ratio of the original plate 1 to the substrate 11 is determined in accordance with the projection magnification of the projection optical system PO. After the exposure of one of the shot irradiation areas on the substrate 11 is completed, the substrate 11 is stepwise moved to expose the next irradiation region. The light of the original 1 is selected in accordance with the pattern of the device. For example, in an exposure apparatus for manufacturing a liquid crystal display device, a high-pressure mercury lamp is used, and a g line (436 nm), an eleven line (405 nm), or an i line (365 nm) is selected. However, the present invention does not limit the wavelength of light used to a particular wavelength. φ As described above, the projection optical system P〇 is configured to have a projection magnification other than 1, and a typical projection magnification larger than 1. In other words, the first distance between the reflecting surface of the first concave mirror 6 and the reflecting surface of the convex mirror 7 is different from the second distance between the reflecting surface of the second concave mirror 8 and the reflecting surface of the convex mirror 7, and is typically the first distance to the second distance. Still small. Fig. 2 is an example showing an offset (magnification. distortion) of an image point which is orthogonal to the position of the first concave mirror 6 and the second concave mirror 8 which is orthogonal to the plane of the light. In Fig. 2, the "first concave surface" indicates the amount of shift of the image dot due to the positional deviation of the first concave mirror 6 in a specific direction. In Fig. 2, the "second concave surface" indicates the amount of shift of the image forming point due to the positional deviation of the second concave mirror 8 in the specific direction described above. In Fig. 2, the "first concave surface + the second concave surface" shows the amount of shift of the image forming point when the position of the first concave mirror 6 and the second concave mirror 8 is shifted and the direction is the same. As is apparent from Fig. 2, when the first concave mirror 6 and the second concave mirror 8 have different positional errors, the imaging performance of the projection optical system PO is greatly reduced. Further, as is clear from Fig. 2, when the first concave mirror 6 and the second concave mirror 8 have the same positional shift amount and the same direction, the offsets of the image forming points are opposite to each other, and the amounts thereof are almost equal. In short, as illustrated in the "first concave surface + the second concave surface" of Fig. 2, when the positional shift amount and the direction of the first concave mirror 6 and the second concave mirror 8 are the same, the positional deviation causes the position of the image point to be shifted. Most of the shift was offset. Here, in this embodiment, the first concave mirror 6 and the second concave mirror 8 are supported by one support mechanism in a manner in which the respective positional relationships are maintained. Thereby, the amounts and directions of displacement of the first concave mirror 6 and the second concave mirror 8 become equal. The support mechanism includes an upper member, a middle member, a lower member, and a shed-shaped frame including a side member that connects the end portions: the first concave mirror 6 is supported by the upper member and the middle member, and the second member The concave mirror 8 is supported by the aforementioned lower member. Figs. 3 and 4 are views showing the configuration of a projection optical system PO according to the first embodiment of the present invention. The projection optical system p0 includes a first concave mirror 6, a convex mirror 7 and a second concave mirror 8 which are arranged in order from the side of the original 1 in the optical path between the original plate 1 and the substrate 11, and a first concave mirror 6 and a second concave mirror 6 2 -8- 200935188 Support mechanism for concave mirror 8. Here, the distance between the reflecting surface of the first concave mirror 6 and the reflecting surface of the convex mirror 7 is different from the distance between the reflecting surface of the second concave mirror 8 and the reflecting surface of the convex mirror 7. In the embodiment shown in Figs. 3 and 4, the reflecting surface of the first concave mirror 6 and the reflecting surface of the convex mirror 7 are offset from each other in the Y-axis direction. The support mechanism includes an upper member 105, a middle member 107, a lower member 108, and a shed-shaped frame 120 including side members 111 connecting the ends thereof. The frame 120 is disposed in the barrel chamber 101. The first concave mirror 6 is supported by the upper member 105 and the middle member 107, and the second concave mirror 8 is supported by the lower member 108. The second concave mirror 8 may be supported by the middle member 107 in addition to the lower member 108. The first concave mirror 6 interposes one or a plurality of support members 104 fixed to the upper member 1〇5, and one or a plurality of support members 102 fixed to the middle member 1〇7 are supported by the upper member 105 and the middle member 107. . The first concave mirror 6 restricts the positions in the X and Y directions by the support member 104 at its upper portion, and limits the positions in the X, Y, and Z directions by the support member 1〇2 at the lower portion thereof. The second concave mirror 8 is interposed with 1 or a plurality of lower support bodies 115 fixed to the lower member 1〇8 and 1 or a plurality of support members 106 fixed to the middle member 1〇7 by the lower member 108 and the middle member 107. support. For example, the second concave mirror 8 restricts the positions in the X, Y, and Z directions by the lower support 115 at its lower portion, and the position of the Y direction is restricted by the support members 1 〇 6 at the upper portion thereof. The lower support body 1 15 includes a support member 1〇9 that restricts the positions of the second concave mirror 8 in the X direction and the Z direction, and a support member 110 that limits the position of the second concave mirror 8 in the direction of -9-200935188. The frame body 20 is preferably made of a material having a small coefficient of linear expansion and a large Young's modulus, such as an iron-nickel alloy, a cobalt alloy, a super-invariant steel (Invar, an iron-nickel alloy). Thermal expansion can be reduced by a small coefficient of linear expansion. The frame 120 is preferably made of, for example, a material having an absolute coefficient of linear expansion of 1.5 liters or less. Further, by using a material having a large Young's modulus, the deformation can be reduced, and the propagation of the deformation of the first concave mirror 6 and the second concave mirror 8 is reduced, and the reduction of the inherent vibration of the entire mechanism can be suppressed. According to the above configuration, the first concave mirror 6 and the second concave mirror 8 are fixed to the housing 120, and the first concave mirror 6 and the second concave mirror 8 can be independently moved to cause a change in imaging performance, in particular, magnification change and distortion of the distortion. Change. Fig. 5 and Fig. 6 are views showing the configuration of a projection optical system according to a second embodiment of the present invention. In addition, in FIGS. 5 and 6, substantially the same components as those in the first embodiment shown in FIGS. 3 and 4 are denoted by the same reference numerals. The second concave mirror 8 supports the lower portion thereof by the lower member 108 while supporting the upper portion thereof by one or a plurality of supporting members 205 including a portion (e.g., a columnar portion) extending from the lower member 108. The second concave mirror 8 is supported by the lower member 108 via one or a plurality of lower support members 115 fixed to the lower member 108. For example, the second concave mirror 8 restricts the positions of the X, Υ, and Ζ directions by the lower support body 115 at its lower portion, and the position of the Υ direction is restricted by the support member 205 at the upper portion thereof. The lower support body 1 15 includes a support for restricting the position of the second concave mirror 8 in the X direction and the x direction. - 200935188 The member 109 and the support member 110 in which the position of the second concave mirror 8 is restricted. FIG. 7 is exemplified as A diagram of a method of manufacturing a liquid crystal display device as an example of a method of manufacturing a device. The manufacturing method includes a pre-film cleaning process, a film forming process, a photoresist coating process, an exposure process, a development process, an etching process, a photoresist stripping process, and an inspection and correction process performed thereafter. . The glass substrate was cleaned by washing the film before the film formation. In the film forming process, a film is formed on a glass substrate. A photoresist is applied to the film in a photoresist coating process. In the exposure process, the exposure substrate is used to expose the glass substrate to form a latent image pattern on the photoresist. In the development project, the developing glass substrate changes the latent image pattern to a physical pattern. In the etching process, a film exposed to the opening of the physical pattern is etched. In the photoresist stripping process, the photoresist as the physical pattern is peeled off. The liquid crystal display device is formed by repeating the pre-film formation cleaning process to the photoresist stripping process. Inspecting, correcting the project, checking the liquid crystal display device, _ Correcting the device with poor LCD display. The present invention is not limited to the above-described embodiments, and various changes and modifications can be made without departing from the spirit and scope of the invention. That is, in order to make the scope of the present invention expressly disclosed, the following patent application scope is attached. BRIEF DESCRIPTION OF THE DRAWINGS The accompanying drawings, which are incorporated in the claims -11 - 200935188 Fig. 1 is a schematic view showing the configuration of an exposure apparatus according to an embodiment of the present invention. Fig. 2 is a view showing, by way of example, a shift amount (magnification/magnification) of an image point which is orthogonal to the position of the first concave mirror and the second concave mirror 8 which is orthogonal to the position of the light beam. Fig. 3 is a view showing the construction of a projection optical system according to a first embodiment of the present invention. Fig. 4 is a view showing a configuration of a projection optical system according to a first embodiment of the present invention. Fig. 5 is a view showing the construction of a projection optical system according to a second embodiment of the present invention. Fig. 6 is a view showing the construction of a projection optical system according to a second embodiment of the present invention. Fig. 7 is a view showing an example of a method of manufacturing an apparatus according to a preferred embodiment of the present invention. ❹ [Main component symbol description] 1: Original (reticule) 2: Original platform 3, 9: Refractive optical system 4: Mirror 6: 1st concave mirror 7: Convex mirror 8: 2nd concave mirror - 12- 200935188 I 基板·substrate platform II: substrate 12: meniscus 1 〇1: barrel chamber 102, 104, 106, 109, 110: support member 105: upper member 107: middle member 108: lower member 1 1 1 : side member 1 1 5 : Lower support body 120 : Frame EXP: Exposure device PO : Projection optical system - 13 -