JP2008089832A - Lithography device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a lithography device including a projection optical system for suppressing upsizing of an original plate due to upsizing of the device. <P>SOLUTION: The device includes a projection optical system 10 which has a first concave reflecting surface M11, a convex reflecting surface M12, and a second concave reflecting surface M13 arranged in order on an optical path from an object plane P1 to an image plane P2. The exposure device includes a refracting optical member L13 disposed between the first concave reflecting surface M11 and the convex reflecting surface M12 and refracting optical members L11, L12, and L14 disposed in an optical path from the object plane P1 to the first concave reflecting surface M12 and an optical path from the second concave reflecting surface M13 to the image plane P3. An image magnification β being a magnification factor of an image area of the image plane to the object plane satisfies 1.1≤β≤2.0. At least one of a paraxial curvature center C1 of the first concave reflecting surface M11, a paraxial curvature center of the convex reflecting surface M12, and a paraxial curvature center C3 of the second concave reflecting surface exists between the object plane P1 and the image plane P2. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to an exposure apparatus including a projection optical system including a plurality of reflecting surfaces.

A flat panel display (FPD) such as a liquid crystal display device is generally manufactured using an exposure apparatus that includes a projection optical system including a plurality of reflecting surfaces. In a general FPD exposure apparatus, a projection optical system having an imaging magnification of equal magnification is used.
JP 2006-78592 A JP 2006-78631 A JP 2005-025199 A

  In recent years, the size of FPDs has been increasing rapidly. Since the enlargement of the FPD requires the enlargement of the original plate, the enlargement of the unit on the upstream side of the original plate is inevitable if the imaging magnification remains the same. In addition, an increase in the size of the original plate leads to an increase in the cost of the original plate, as well as an increase in the size and cost of equipment and facilities for transporting and storing the original plate.

  The present invention has been made in view of the above background, and an object thereof is to provide an exposure apparatus including a novel projection optical system for suppressing an increase in size of an original plate accompanying an increase in size of a device to be manufactured. To do.

  The present invention relates to an exposure apparatus including a projection optical system in which a first concave reflection surface, a convex reflection surface, and a second concave reflection surface are sequentially arranged in an optical path from an object plane to an image plane. The projection optical system includes: at least one refractive optical member having power disposed between the first concave reflecting surface and the convex reflecting surface; an optical path from the object plane to the first concave reflecting surface; And at least one refractive optical member having power arranged in at least one of the optical paths from the second concave reflecting surface to the image plane. 1.1 ≦ β ≦ 2.0 is satisfied, where β is an imaging magnification which is an enlargement ratio of the screen area of the image plane with respect to the object plane. At least one of the paraxial curvature center of the first concave reflecting surface, the paraxial curvature center of the convex reflecting surface, and the paraxial curvature center of the second concave reflecting surface exists between the object plane and the image plane. . Here, when an optical member having no power is included in the projection optical system, the object plane and the image plane are respectively obtained when the optical member having no power is excluded from the projection optical system. It means a virtual object plane and a virtual image plane of the projection optical system.

  According to the present invention, there is provided an exposure apparatus including a novel projection optical system for suppressing an increase in size of an original plate accompanying an increase in size of a device to be manufactured.

  Hereinafter, preferred embodiments of the present invention will be described.

  An exposure apparatus according to a preferred embodiment of the present invention includes a projection optical system in which a first concave reflection surface, a convex reflection surface, and a second concave reflection surface are sequentially arranged on an optical path from an object plane to an image plane. The projection optical system includes at least one refractive optical member having power disposed between the first concave reflecting surface and the convex reflecting surface. The projection optical system further has at least one power arranged in at least one of an optical path from the object plane to the first concave reflecting surface and an optical path from the second concave reflecting surface to the image plane. A refractive optical member is included. The projection optical system satisfies 1.1 ≦ β ≦ 2.0, where β is an imaging magnification which is an enlargement ratio of the screen area of the image plane with respect to the object plane.

  In this specification, when an optical member having no power is included in the projection optical system, the object plane and the image plane are respectively the projection optical system when the optical member having no power is excluded from the projection optical system. The virtual object plane and the virtual image plane are meant.

  In the projection optical system of the exposure apparatus according to a preferred embodiment of the present invention, the paraxial curvature center of the first concave reflecting surface, the paraxial curvature center of the convex reflecting surface, and the paraxial curvature center of the second concave reflecting surface are provided. At least one exists between the object plane and the image plane.

  The configuration as described above is suitable for satisfactorily correcting astigmatism over a wide screen area, and may have a ring-shaped best image plane area outside the axis of the image plane.

  When all of the paraxial curvature center of the first concave reflecting surface, the paraxial curvature center of the convex reflecting surface, and the paraxial curvature center of the second concave reflecting surface are arranged between the object plane and the image plane, Astigmatism can be favorably corrected in a wider screen area. Furthermore, the paraxial curvature center of the first concave reflecting surface, the paraxial curvature center of the convex reflecting surface, and the paraxial curvature center of the second concave reflecting surface are sequentially arranged between the object plane and the image plane. As a result, astigmatism can be favorably corrected in a wider screen area.

  When the distance along the optical path from the object plane to the first concave reflecting surface is S1, and the distance along the optical path from the second concave reflecting surface to the image plane is S4, 1.1 ≦ (S4 /S1)/β≦1.3 is preferably satisfied. In this case, while maintaining the flatness of the image plane over the entire wide screen, the tangent component of the principal ray inclination in the object space is 0.05 or less and the tangent component of the principal ray inclination in the image space is 0.01 or less. Telecentric state is obtained.

  When the total power of all surfaces included in the projection optical system is φ1, and the total power of all surfaces of the refractive optical member included in the projection optical system is φ2, 0.05 ≦ | φ2 / φ1 It is preferable to satisfy | ≦ 2.5. In this case, chromatic aberration can be corrected to an allowable range over the entire wavelength range of i-line, h-line, and g-line.

  Preferably, at least one of the first concave reflection surface, the convex reflection surface, and the second concave reflection surface is aspherical. Thereby, it is possible to correct distortion, astigmatism, and field curvature to an allowable range in a wide screen area.

  In a configuration in which the NA on the object plane side is larger than the NA on the image plane side, it is preferable to correct aberrations due to peripheral rays (spherical aberration, coma, and astigmatism) on the object space side. Further, since the effective diameter on the object space side is smaller than the effective diameter on the image space side, it is advantageous in terms of cost to increase the aspheric surface on the object space side. Therefore, it is preferable that the number of aspheric surfaces in the optical path from the object plane to the first concave reflecting surface is larger than the number of aspheric surfaces in the optical path from the second concave reflecting surface to the image plane.

  In order to satisfactorily correct astigmatism in a wider screen area, at least one of the refractive optical members is preferably aspheric on both sides.

  According to another aspect of the present invention, in an exposure apparatus according to a preferred embodiment of the present invention, a first concave reflection surface, a convex reflection surface, and a second concave reflection surface are sequentially arranged in an optical path from the object plane to the image plane. A projection optical system. The projection optical system includes at least one refractive optical member having power disposed between the first concave reflecting surface and the convex reflecting surface. The projection optical system is further disposed in at least one of an optical path from the object plane to the first concave reflecting surface and an optical path from the second concave reflecting surface to the image plane, and has at least one aspheric surface. And a first aspherical refractive optical member having power. The aspherical surface of the first aspherical refractive optical member and the aspherical surface of the second aspherical refractive optical member reduce an optical path length difference in a direction parallel to the optical axis in a region having good astigmatism. Have a complementary shape. The projection optical system satisfies 1.1 ≦ β ≦ 2.0, where β is an imaging magnification which is an enlargement ratio of the screen area of the image plane with respect to the object plane. Here, it is preferable that the light exit side of the first and second aspherical refractive optical members is a flat surface in terms of a structure in which an eccentric error is unlikely to occur when the optical component is assembled at the horizontal arrangement position.

  The exposure apparatus may be configured as a scanning exposure apparatus, for example, and the projection optical system may be configured as a projection optical system of a scanning exposure apparatus, for example. By constructing the projection optical system so as to satisfy 1.1 ≦ β ≦ 2.0, an exposure apparatus that is smaller than an equal magnification exposure apparatus can be obtained. The projection exposure apparatus includes, for example, an illumination optical system that illuminates an original with irradiation light having an arc shape in cross section based on a light beam provided from a light source, and a projection optical system that projects a pattern on the original onto a substrate. When the substrate is exposed, the original and the substrate can be scanned and driven in synchronization.

  In the following, several embodiments of the present invention will be described.

[First embodiment]
The first embodiment scans the original and the substrate with respect to the projection optical system while projecting the original pattern onto the substrate with a light beam having a ring-shaped cross section, and forms a latent image pattern on the photosensitive agent applied to the substrate. Is a design example of the projection optical system of the scanning exposure apparatus for forming This projection optical system has an imaging magnification (β) = 2.0 times, an exit NA = 0.08, and an image height = 400 mm, while maintaining the flatness of the image plane and the uniformity of the magnification in the use region, This is an example in which chromatic aberration correction is performed for three wavelengths of i-line, h-line, and g-line.

  FIG. 1 is a diagram showing the configuration of the projection optical system 10 of the first embodiment. The object plane P1 is a position where the original plate is disposed, and the image plane P2 is a position where the substrate is disposed. In the projection optical system 10, a first concave reflecting surface M11, a convex reflecting surface M12, and a second concave reflecting surface M13 are sequentially arranged in the optical path from the object plane P1 to the image plane P2.

  Here, a bending plane mirror that bends the optical path may be disposed between the object plane and the first concave reflecting surface and / or between the image plane and the second concave reflecting surface. When the bending plane mirror is arranged, the actual object plane and / or the actual image plane moves. However, in this specification, even when a folding plane mirror is disposed in the projection optical system, the object plane and the image plane of the projection optical system are the virtual planes of the projection optical system when the folding plane mirror is excluded from the optical system. It is assumed to be an object plane and a virtual image plane.

  The projection optical system 10 includes an aspheric lens L13 as at least one refractive optical member having power disposed between the first concave reflecting surface M11 and the convex reflecting surface M12. The projection optical system 10 includes two aspherical lenses L11 and L12 as at least one refractive optical member having power in the optical path from the object plane P1 to the first concave reflecting surface M11. In addition, the projection optical system 10 includes an aspheric lens L14 as at least one refractive optical member having power in the optical path from the second concave reflecting surface M13 to the image plane P2.

  The light from the object plane P1 is reflected by the first concave reflecting surface M11 after passing through the two sheet glasses SG11 and SG12 and the two aspheric lenses L11 and L12, and then after passing through the aspheric lens L13. Reflected by the convex reflecting surface M12. The light reflected by the convex reflecting surface M12 passes through the aspherical lens L12 again, is reflected by the second concave reflecting surface M13, and then passes through the aspherical lens L14 and the two sheet glasses SG13 and SG14. It reaches the plane P12. The glass material of the lens and sheet glass is quartz, and the refractive index n with respect to the dominant wavelength of 365.5 nm (i-line) is 1.47453.

  Here, the sheet glass can finely adjust astigmatism by tilting the two sheet glasses into a V shape after assembling the optical system, and can finely adjust distortion aberration and magnification by bending. It can be carried out. Table 1 shows the specifications of the design values in the first example.

  Here, r is the paraxial radius of curvature, d is the air spacing or glass thickness on the optical axis, and n is the refractive index of the glass. The same applies to the following embodiments.

In addition, the * mark attached to each surface number indicates an aspheric surface, and the aspheric coefficient of each aspheric surface is as follows. In this specification, “ ^EX ” means “× 10 ^−X ”.

6th K: -33.448191,
A: 0.537084E-08, B: 0.184652E-13, C: -0.153967E-19, D: -0.554823E-23,
E: -0.408650E-28, F: 0.124133E-32, G: -0.682727E-38
7th K: -55.040165,
A: 0.584837E-08, B: -0.162691E-13, C: -0.499340E-19, D: 0.158699E-23,
E: -0.523521E-29, F: -0.906049E-33, G: 0.882140E-38
9 sides K: 0.006109,
A: -0.202146E-10, B: -0.173364E-15, C: 0.261146E-20, D: -0.373565E-25,
E: 0.307140E-30, F: -0.139516E-35, G: 0.266502E-41
10 sides K: -16.052478,
A: 0.309141E-07, B: 0.210388E-12, C: -0.110183E-15, D: 0.235477E-19,
E: -0.372263E-23, F: 0.335713E-27, G: -0.124565E-31
11th K: -2.769334,
A: 0.322713E-07, B: 0.428604E-12, C: -0.235114E-15, D: 0.588223E-19,
E: -0.987974E-23, F: 0.934081E-27, G: -0.366033E-31
12 sides K: -3.078104,
A: -0.132470E-08, B: -0.167875E-12, C: 0.866752E-16, D: -0.281390E-19,
E: 0.566603E-23, F: -0.632259E-27, G: 0.292911E-31
13th K: -2.769334,
A: 0.322713E-07, B: 0.428604E-12, C: -0.235114E-15, D: 0.588223E-19
E: -0.987974E-23, F: 0.934081E-27, G: -0.366033E-31
14 sides K: -16.052478
A: 0.309141E-07, B: 0.210388E-12, C: -0.110183E-15, D: 0.235477E-19
E: -0.372263E-23, F: 0.335713E-27, G: -0.124565E-31
15th K: -0.163091
A: 0.496252E-12, B: -0.721594E-17, C: 0.385461E-22, D: -0.198415E-27
E: 0.619694E-33, F: -0.113476E-38, G: 0.916397E-45
16 sides K: -99.999996
A: 0.538815E-09, B: -0.162570E-14, C: -0.186585E-20, D: 0.118351E-25
E: 0.139989E-30, F: -0.101826E-35, G: 0.188347E-41
The aspherical shape is defined as h in the direction perpendicular to the optical axis at any point on the aspherical surface, x in the direction along the optical axis, r in the paraxial radius of curvature, and K in the curved surface coefficient. When the aspheric coefficient is an alphabet from A to G, it is expressed by equation (1).

^{x = h 2 / r / [} 1+ {1- (1 + K) (h / r) 2} 1/2] + Ah 4 + Bh 6 + Ch 8 + Dh 10 + Eh 12 + Fh 14 + Gh 16

  In the above configuration, S1, S2, S3, S4, R1, R2, R3, and (S4 / S1) / β are as follows. Here, S1 is a distance along the optical path from the object plane P1 to the first concave reflecting surface M11. S2 is a distance along the optical path from the first concave reflecting surface M11 to the convex reflecting surface M12. S3 is a distance along the optical path from the convex reflecting surface M12 to the second concave reflecting surface M13. S4 is a distance along the optical path from the second concave reflecting surface M13 to the image plane P2. R1 is the paraxial radius of curvature of the first concave reflecting surface M11, R2 is the paraxial radius of curvature of the convex reflecting surface M12, and R3 is the paraxial radius of curvature of the second concave reflecting surface M13.

S1 = 798.68
S2 = 478.94
S3 = 776.54
S4 = 1888.56
R1 = −909.67
R2 = −610.14
R3 = -1613.26
(S4 / S1) /β=1.18
That is, in the first embodiment, 1.1 ≦ (S4 / S1) /β≦1.3.

  The positions of the paraxial curvature centers C1, C2, and C3 and the image plane P2 of the first, second, and third reflecting surfaces M11, M12, and M13 when the object plane P1 is set to 0 mm are as follows. φ1 is the total power of all surfaces included in the projection optical system 10, and φ2 is the total power of all surfaces of the refractive optical member included in the projection optical system 10.

P1: 0
C1: 110.99
C2: 290.40
C3: 516.98
P2: 792.28
φ1 = -4.20E-03
φ2 = −4.36E-03
φ2 / φ1 = 1.04
That is, in the first embodiment, C1, C2, and C3 are arranged in order from the object plane P1 between the object plane P1 and the image plane P2. In the first embodiment, 0.05 ≦ | φ2 / φ1 | ≦ 2.5 is satisfied.

  2 and 3 are diagrams showing aberrations of the projection optical system in the above design example, FIG. 2 is a diagram showing astigmatism, and FIG. 3 is a diagram showing distortion aberration. According to the first embodiment, the astigmatism is well corrected and a flat image surface can be obtained within a wide image height range while the magnification ratio of the irradiation range is twice.

  The telecentricity is as follows when the tangent of the principal ray maximum inclination in the object plane is T1, and the tangent of the principal ray maximum inclination in the image plane is T2.

T1: 4.25E-02
T2: -6.41E-04
That is, a telecentricity is obtained in which the tangent of the maximum inclination of the principal ray is 0.05 or less in the object space and the tangent of the maximum inclination of the principal ray is 0.01 or less in the image space.

  By the way, when the imaging magnification becomes 2.0 or more, halo of higher-order aberration starts to be noticeable at the outer edge of the effective light beam, and the resolution is lowered. Therefore, the imaging magnification β is preferably 2.0 or less.

  In the first embodiment, as illustrated in FIG. 1, the lens L11 and the lens L12 are arranged so that the planes face each other, the aspheric surfaces are opposed to each other, and the aspherical irregularities are canceled from each other. Is done. That is, the two aspheric surfaces in the two optical members having power have complementary shapes so as to reduce the optical path length difference in the direction parallel to the optical axis at an arbitrary height from the optical axis.

  Alternatively, the lens L11 and the lens L12 may be rotated 180 degrees, the planes may be opposed, and the aspherical surface may be directed outward.

  Further, the first surface and the second surface may be reversed only in L11 of FIG.

  Further, when the projection optical system is incorporated in the exposure apparatus, in the configuration illustrated in FIG. 4, a bending reflecting mirror is disposed at 45 degrees with respect to the optical axis between the lens L2 and the reflecting surface M1, and the object plane P1, The refractive optical members (lenses) L1 and L2 may be arranged horizontally. Further, a bending reflecting mirror may be arranged at 45 degrees with respect to the optical axis between the lens L4 and the reflecting surface M3, and the image plane P2 and the refractive optical members (lenses) L3 and L4 may be arranged horizontally. In such a case, it is preferable that the light exit side of the two refractive optical members L1 and L2 is a plane. Further, it is preferable that the light exit side of the two refractive optical members L3 and L4 is a plane. According to such a configuration, since the optical material member can be assembled by dropping it into the metal frame with the flat portion facing downward, there is an effect of suppressing the occurrence of an eccentric error of the optical material in the assembled state, and it is more stable. Optical performance can be realized.

[Second Embodiment]
The second embodiment scans the original and the substrate with respect to the projection optical system while projecting the original pattern onto the substrate with a light beam having a ring-shaped cross section, and forms a latent image pattern on the photosensitive agent applied to the substrate. Is a design example of the projection optical system of the scanning exposure apparatus for forming This projection optical system has an imaging magnification (β) = 1.5 times, an exit NA = 0.08, and an image height = 400 mm, while maintaining the flatness of the image surface and the uniformity of magnification in the use region, This is an example in which chromatic aberration correction is performed for three wavelengths of i-line, h-line, and g-line.

  FIG. 5 is a diagram showing the configuration of the projection optical system 20 of the second embodiment. In the second embodiment, only C1 of the paraxial curvature center C1 of the first concave reflection surface M21, the paraxial curvature center C2 of the convex reflection surface M22, and the paraxial curvature center C3 of the second concave reflection surface M23 is the object plane P1. And the image plane P2.

  Light from the object plane P1 passes through the sheet glass SG21 and the two aspheric lenses L21 and L22 and then is reflected by the first concave reflection surface M21, and then passes through the aspheric lens L23 and then passes through the convex reflection surface M22. Reflected. The light reflected by the convex reflecting surface M22 passes through the aspheric lens L23 again, is reflected by the second concave reflecting surface M23, passes through the sheet glass SG23, and reaches the image plane P2. The glass material of the lens and sheet glass is quartz, and the refractive index n with respect to the main wavelength of 365.5 nm is 1.47453. Table 2 shows the specifications of the design values in the second embodiment.

  Also, the * mark attached to each surface number is an aspheric surface, and the aspheric coefficient of each aspheric surface is as follows.

3 sides K: -31.981648,
A: 0.264837E-08, B: -0.223286E-13, C: -0.424284E-19, D: 0.154614E-23,
E: 0.266066E-29, F: -0.204661E-33, G: 0.123053E-38
4 sides K: -40.0,
A: -0.117837E-08, B: 0.482421E-13, C: -0.895314E-18, D: 0.565708E-23,
E: 0.271308E-28, F: -0.603883E-33, G: 0.264213E-38
5th page K: 3.888957,
A: 0.165908E-08, B: -0.222907E-13, C: 0.217244E-18, D: -0.111490E-23,
E: 0.771426E-30, F: 0.327881E-34, G: -0.128052E-39
6th K: -39.975522,
A: -0.881579E-09, B: -0.261310E-14, C: 0.516706E-19, D: -0.269109E-24,
E: -0.860540E-30, F: 0.242313E-34, G: -0.902287E-40
7th K: -0.317111,
A: -0.936473E-11, B: -0.297616E-16, C: 0.237506E-21, D: -0.139331E-26,
E: 0.484071E-32, F: -0.935349E-38, G: 0.773191E-44
8th K: -18.982772,
A: -0.478290E-08, B: 0.877538E-13, C: -0.540132E-17, D: 0.510412E-21,
E: -0.326348E-25, F: 0.115335E-29, G: -0.170906E-34
9th K: -15.584866,
A: -0.594528E-08, B: 0.351684E-12, C: -0.774709E-16, D: 0.149626E-19,
E: -0.192928E-23, F: 0.140552E-27, G: -0.432533E-32
10 sides K: -1.193890,
A: 0.114835E-09, B: -0.125453E-12, C: 0.287130E-16, D: -0.451989E-20,
E: 0.497569E-24, F: -0.330254E-28, G: 0.971603E-33
11th K: -15.584866,
A: -0.594528E-08, B: 0.351684E-12, C: -0.774709E-16, D: 0.149626E-19,
E: -0.192928E-23, F: 0.140552E-27, G: -0.432533E-32
12th K: -18.982772,
A: -0.478290E-08, B: 0.877538E-13, C: -0.540132E-17, D: 0.510412E-21,
E: -0.326348E-25, F: 0.115335E-29, G: -0.170906E-34
13th surface K: -0.200235,
A: -0.200886E-11, B: -0.857440E-17, C: 0.720662E-22, D: -0.426818E-27
E: 0.147351E-32, F: -0.275210E-38, G: 0.214037E-44

  In the above configuration, S1, S2, S3, S4, R1, R2, R3, and (S4 / S1) / β are as follows. Here, S1 is a distance along the optical path from the object plane P1 to the first concave reflecting surface M21. S2 is a distance along the optical path from the first concave reflecting surface M21 to the convex reflecting surface M22. S3 is a distance along the optical path from the convex reflecting surface M22 to the second concave reflecting surface M23. S4 is a distance along the optical path from the second concave reflecting surface M23 to the image plane P2. R1 is the paraxial radius of curvature of the first concave reflecting surface M21, R2 is the paraxial radius of curvature of the convex reflecting surface M22, and R3 is the paraxial radius of curvature of the second concave reflecting surface M23.

S1 = 1586.59
S2 = 1046.65
S3 = 1115.41
S4 = 1956.63
R1 = −1729.70
R2 = −1074.64
R3 = -2193.40
(S4 / S1) /β=0.82

  The positions of the first, second, and third reflecting surfaces M21, M22, and M23 when the object plane P1 is set to 0 mm as a reference to the paraxial curvature centers C1, C2, and C3 and the image plane P2 are as follows. It is. Φ1 is the total power of all surfaces included in each projection optical system 20, and φ2 is the total power of all surfaces of only the refractive optical member system included in the projection optical system 10.

P1: 0
C1: 143.12
C2: 534.71
C3: 538.06
P2: 301.29
φ1 = 4.57E-04
φ2 = 2.50E-04
φ2 / φ1 = 0.55

  That is, in the second embodiment, only C1 is disposed between the object plane P1 and the image plane P2. In the second embodiment, 0.05 ≦ | φ2 / φ1 | ≦ 2.5 is satisfied.

  6 and 7 are diagrams showing aberrations of the projection optical system in the above design example, FIG. 6 is a diagram showing astigmatism, and FIG. 7 is a diagram showing distortion aberration. According to the second embodiment, astigmatism is favorably corrected within a wide image height range, and a flat image surface can be obtained.

  The telecentricity is as follows when the tangent of the principal ray maximum inclination in the object plane is T1, and the tangent of the principal ray maximum inclination in the image plane is T2.

T1: 1.90E-01
T2: -1.05E-03

  By the way, when none of the three central positions of the reflecting surface is arranged between the object plane and the image plane, a high-order aberration halo starts to be noticeable at the outer edge of the effective light beam and the resolution is lowered. Therefore, it is important to satisfy at least one of the performances by disposing at least one of the paraxial curvature centers C1, C2, and C3 of the reflecting surface between the object plane P1 and the image plane P2.

[Third embodiment]
The third embodiment scans the original and the substrate with respect to the projection optical system while projecting the original pattern on the substrate with a light beam having a ring-shaped cross section, and forms a latent image pattern on the photosensitive agent applied to the substrate. Is a design example of the projection optical system of the scanning exposure apparatus for forming This projection optical system has a magnification of 1.5 times, an exit NA of 0.08, a maximum image height of 400 mm, i-line, h while maintaining flatness of the image surface and uniformity of magnification in the use region. This is an example in which chromatic aberration correction is performed for the three wavelengths of the line and the g line.

  FIG. 8 is a diagram showing the configuration of the projection optical system 30 of the third embodiment. In the third embodiment, the paraxial curvature center C1 of the first concave reflecting surface M31, the paraxial curvature center C2 of the convex reflecting surface M32, and the paraxial curvature center C3 of the second concave reflecting surface M33 are the object plane P1 and the image plane P2. It is arranged between.

  The light from the object plane P1 is reflected by the first concave reflecting surface M31 after passing through the sheet glass SG31 and the two aspherical lenses L31 and L32, and then passed through the aspherical lens L33 and then on the convex reflecting surface M32. Reflected. The light reflected by the convex reflecting surface M32 passes through the aspherical lens L33 again, is reflected by the second concave reflecting surface M33, passes through the aspherical lens L34 and the sheet glass SG33, and reaches the image plane P2. . The glass material of the lens and sheet glass is quartz, and the refractive index n with respect to the main wavelength of 365.5 nm is 1.47453. Table 3 shows the specifications of the design values in the third example.

  Also, the * mark attached to each surface number is an aspheric surface, and the aspheric coefficient of each aspheric surface is as follows.

4 sides K: -3.996010,
A: 0.259606E-08, B: -0.128461E-13, C: 0.888237E-19, D: 0.282824E-24,
E: 0.567822E-31, F: 0.536937E-34, G: -0.372617E-39
5th K: -9.439849,
A: 0.965329E-09, B: -0.139259E-14, C: 0.243834E-19, D: 0.312708E-24,
E: 0.361243E-29, F: -0.241170E-34, G: -0.915661E-41
7th surface K: -0.001462,
A: -0.117023E-10, B: -0.659539E-16, C: 0.321578E-21, D: -0.326423E-26,
E: 0.177351E-31, F: -0.591863E-37, G: 0.890249E-43
8 sides K: 10.0,
A: 0.247382E-07, B: 0.420607E-12, C: -0.139654E-15, D: 0.315241E-19,
E: -0.448387E-23, F: 0.345270E-27, G: -0.112165E-31
9 sides K: 9.99978,
A: 0.257794E-07, B: 0.581093E-12, C: -0.230401E-15, D: 0.587533E-19,
E: -0.949081E-23, F: 0.844445E-27, G: -0.321343E-31
10 sides K: -3.215032,
A: -0.124151E-08, B: -0.871071E-13, C: 0.168154E-16, D: 0.404406E-20,
E: -0.260790E-23, F: 0.487785E-27, G: -0.326422E-31
11 sides K: 9.99978,
A: 0.257794E-07, B: 0.581093E-12, C: -0.230401E-15, D: 0.587533E-19.
E: -0.949081E-23, F: 0.844445E-27, G: -0.321343E-31
12 sides K: 10.0,
A: 0.247382E-07, B: 0.420607E-12, C: -0.139654E-15, D: 0.315241E-19,
E: -0.448387E-23, F: 0.345270E-27, G: -0.112165E-31
13 sides K: -0.103350,
A: 0.172577E-12, B: -0.558699E-17, C: 0.287676E-22, D: -0.143015E-27,
E: 0.396280E-33, F: -0.609790E-39, G: 0.396834E-45
14 sides K: -40.0,
A: 0.282057E-09, B: 0.202246E-15, C: -0.368575E-20, D: -0.156301E-25,
E: 0.229974E-30, F: -0.778667E-36, G: 0.900664E-42

  In the above configuration, S1, S2, S3, S4, R1, R2, R3, and (S4 / S1) / β are as follows. Here, S1 is a distance along the optical path from the object plane P1 to the first concave reflecting surface M31. S2 is a distance along the optical path from the first concave reflecting surface M31 to the convex reflecting surface M32. S3 is a distance along the optical path from the convex reflecting surface M32 to the second concave reflecting surface M33. S4 is a distance along the optical path from the second concave reflecting surface M33 to the image plane P2. R1 is the paraxial radius of curvature of the first concave reflecting surface M31, R2 is the paraxial radius of curvature of the convex reflecting surface M32, and R3 is the paraxial radius of curvature of the second concave reflecting surface M33.

S1 = 896.61
S2 = 472.31
S3 = 794.13
S4 = 1758.79
R1 = −987.00
R2 = −624.80
R3 = −1563.09
(S4 / S1) /β=1.31

  The positions of the first, second, and third reflecting surfaces M31, M32, and M33 to the paraxial curvature centers C1, C2, and C3 and the image plane P2 when the object plane P1 is set to 0 mm are as follows. is there. Φ1 is the total power of all surfaces included in each projection optical system 30, and φ2 is the total power of all surfaces of only the refractive optical member system included in the projection optical system 30.

P1: 0
C1: 90.39
C2: 200.50
C3: 344.67
P2: 540.37
φ1 = 2.65E-04
φ2 = 1.60E-04
φ2 / φ1 = 0.60

  That is, in the third embodiment, C1, C2, and C3 are sequentially arranged from the object plane P1 between the object plane P1 and the image plane P2. In the third embodiment, 0.05 ≦ | φ2 / φ1 | ≦ 2.5 is satisfied.

  9 and 10 are diagrams showing aberrations of the projection optical system in the above design example, FIG. 9 is a diagram showing astigmatism, and FIG. 10 is a diagram showing distortion aberration. According to the third embodiment, astigmatism is favorably corrected within a wide image height range, and a flat image surface can be obtained.

  The telecentricity is as follows when the tangent of the principal ray maximum inclination in the object plane is T1, and the tangent of the principal ray maximum inclination in the image plane is T2.

T1: 1.91E-03
T2: -1.02E-03

  That is, a telecentricity is obtained in which the tangent of the maximum inclination of the principal ray is 0.05 or less in the object space and the tangent of the maximum inclination of the principal ray is 0.01 or less in the image space.

  By the way, when the value of (S4 / S1) / β is further increased in the configuration shown in the third embodiment, the higher-order aberration halo starts to be noticeable at the outer edge of the effective light beam, and the resolution is lowered. Therefore, the value of (S4 / S1) / β is preferably 1.3 or less.

[Fourth embodiment]
The fourth embodiment scans the original and the substrate with respect to the projection optical system while projecting the original pattern onto the substrate with a light beam having a ring-shaped cross section, and forms a latent image pattern on the photosensitive agent applied to the substrate. Is a design example of the projection optical system of the scanning exposure apparatus for forming This projection optical system has a magnification of 1.5 times, an exit NA of 0.08, a maximum image height of 400 mm, i-line, h while maintaining flatness of the image surface and uniformity of magnification in the use region. This is an example in which chromatic aberration correction is performed for the three wavelengths of the line and the g line.

  FIG. 11 is a diagram showing the configuration of the projection optical system 40 of the fourth embodiment. In the fourth embodiment, the paraxial curvature center C1 of the first concave reflecting surface M41, the paraxial curvature center C2 of the convex reflecting surface M42, and the paraxial curvature center C3 of the second concave reflecting surface M43 are the object plane P1 and the image plane P2. It is arranged between.

  The light from the object plane P1 is reflected by the first concave reflecting surface M41 after passing through the sheet glass SG41 and the aspheric lens L41, and then reflected by the convex reflecting surface M42 after passing through the aspheric lens L42. The light reflected by the convex reflecting surface M42 passes through the aspheric lens L42 again, is reflected by the second concave reflecting surface M43, passes through the aspheric lens L43 and the sheet glass SG42, and reaches the image plane P2. . The glass material of the lens and sheet glass is quartz, and the refractive index n with respect to the main wavelength of 365.5 nm is 1.47453. Table 4 shows the specifications of the design values in the fourth example.

  Also, the * mark attached to each surface number is an aspheric surface, and the aspheric coefficient of each aspheric surface is as follows.

3 sides K: 20.0,
A: -0.424360E-09, B: -0.114766E-13, C: 0.426059E-19, D: -0.250534E-24,
E: -0.769762E-29, F: -0.479147E-34, G: 0.865124E-39
4 sides K: 5.0,
A: -0.892570E-09, B: 0.364641E-14, C: -0.946640E-19, D: -0.213415E-24,
E: 0.947554E-30, F: -0.376178E-34, G: 0.461573E-39
5th surface K: -0.027711,
A: -0.788903E-11, B: -0.683790E-17, C: 0.254708E-22, D: -0.255320E-27,
E: 0.129255E-32, F: -0.348469E-38, G: 0.383667E-44
6th K: -22.510371,
A: 0.922146E-08, B: -0.817948E-13, C: -0.612618E-16, D: 0.175640E-19,
E: -0.257201E-23, F: 0.192010E-27, G: -0.573096E-32
7th K: -40.0,
A: 0.967513E-08, B: -0.138373E-13, C: -0.116280E-15, D: 0.354546E-19,
E: -0.563614E-23, F: 0.457818E-27, G: -0.149018E-31
9 side K: -40.0,
A: 0.967513E-08, B: -0.138373E-13, C: -0.116280E-15, D: 0.354546E-19,
E: -0.563614E-23, F: 0.457818E-27, G: -0.149018E-31
10th K: -22.510371,
A: 0.922146E-08, B: -0.817948E-13, C: -0.612618E-16, D: 0.175640E-19,
E: -0.257201E-23, F: 0.192010E-27, G: -0.573096E-32
1 side K: -40.0,
A: 0.417666E-09, B: -0.339801E-15, C: -0.101155E-19, D: -0.355545E-25,
E: 0.243034E-30, F: -0.680235E-36, G: 0.123643E-41
13 sides K: -40.0,
A: 0.560923E-09, B: -0.156352E-14, C: -0.837951E-20, D: -0.499984E-26,
E: 0.232328E-32, F: -0.218980E-36, G: 0.125766E-41

  In the above configuration, S1, S2, S3, S4, R1, R2, R3, and (S4 / S1) / β are as follows. Here, S1 is a distance along the optical path from the object plane P1 to the first concave reflecting surface M41. S2 is a distance along the optical path from the first concave reflecting surface M41 to the convex reflecting surface M42. S3 is a distance along the optical path from the convex reflecting surface M42 to the second concave reflecting surface M43. S4 is a distance along the optical path from the second concave reflecting surface M43 to the image plane P2. R1 is the paraxial radius of curvature of the first concave reflecting surface M41, R2 is the paraxial radius of curvature of the convex reflecting surface M42, and R3 is the paraxial radius of curvature of the second concave reflecting surface M43.

S1 = 1260.03
S2 = 780.66
S3 = 953.27
S4 = 1995.65
R1 = −1391.04
R2 = −813.96
R3 = −1893.77
(S4 / S1) /β=1.06
That is, in the fourth embodiment, 1.1 ≦ (S4 / S1) /β≦1.3.

  The positions of the first, second, and third reflecting surfaces M41, M42, and M43 to the paraxial curvature centers C1, C2, and C3 and the image plane P2 when the object plane P1 is set to 0 mm are as follows. is there. Φ1 is the total power of all surfaces included in each projection optical system 40, and φ2 is the total power of all surfaces of only the refractive optical member system included in the projection optical system 40.

P1: 0
C1: 131.01
C2: 334.59
C3: 461.14
P2: 563.01
φ1 = -2.80E-05
φ2 = −6.99E-05
φ2 / φ1 = 2.50

  That is, in the fourth embodiment, C1, C2, and C3 are sequentially arranged from the object plane P1 between the object plane P1 and the image plane P2. In the fourth embodiment, 0.05 ≦ | φ2 / φ1 | ≦ 2.5 is satisfied.

  12 and 13 are diagrams showing aberrations of the projection optical system in the above design example, FIG. 12 is a diagram showing astigmatism, and FIG. 13 is a diagram showing distortion aberration. According to the fourth embodiment, astigmatism is favorably corrected within a wide image height range, and a flat image surface can be obtained.

  The telecentricity is as follows when the tangent of the principal ray maximum inclination in the object plane is T1, and the tangent of the principal ray maximum inclination in the image plane is T2.

T1: 4.73E-02
T2: 9.11E-04
By the way, in the fourth embodiment, when the value of (S4 / S1) / β is made smaller than 1.06 or the value of | φ2 / φ1 | is made larger than 2.5, halo of higher-order aberrations becomes conspicuous. For the first time, the resolution decreases. The value of (S4 / S1) / β is preferably 1.1 or more, and the value of | φ2 / φ1 | is preferably 2.5 or less.

[Fifth embodiment]
The fifth embodiment scans the original and the substrate with respect to the projection optical system while projecting the original pattern on the substrate with a light beam having a ring-shaped cross section, and forms a latent image pattern on the photosensitive agent applied to the substrate. Is a design example of the projection optical system of the scanning exposure apparatus for forming This projection optical system has a magnification of 1.1 times, an exit NA of 0.08, and a maximum image height of 400 mm, while maintaining the flatness of the image plane and the uniformity of the magnification in the use area, i-line, h This is an example in which chromatic aberration correction is performed for the three wavelengths of the line and the g line.

  FIG. 14 is a diagram showing the configuration of the projection optical system 50 of the fifth embodiment. In the fifth embodiment, the paraxial curvature center C1 of the first concave reflecting surface M51, the paraxial curvature center C2 of the convex reflecting surface M52, and the paraxial curvature center C3 of the second concave reflecting surface M53 are the object plane P1 and the image plane P2. It is arranged between.

  The light from the object plane P1 passes through the two sheet glasses SG51 and SG52 and the aspheric lens L51, is reflected by the concave reflecting surface M51, and then passes through the aspheric lens L52 and then is reflected by the convex anti-reflecting mirror M52. Is done. The light reflected by the convex reflecting surface M52 passes through L52 again, is reflected by the second concave mirror M53, passes through the aspheric lens L53 and the two sheet glasses SG53 and SG54, and reaches the image plane P2. . The glass material of the lens and sheet glass is quartz, and the refractive index n with respect to the main wavelength of 365.5 nm is 1.47453. Table 5 shows the specifications of the design values in the fifth example.

  Also, the * mark attached to each surface number is an aspheric surface, and the aspheric coefficient of each aspheric surface is as follows.

6 sides K: 1.0
A: 0.820233E-09, B: -0.656957E-14, C: 0.568505E-19, D: -0.108678E-25,
E: -0.310025E-29, F: 0.198007E-34, G: -0.393219E-40
7th K: 0.0057,
A: -0.124560E-11, B: -0.2204964E-16, C: 0.551244E-22, D: -0.192201E-27,
E: -0.408044E-33, F: 0.332659E-38, G: -0.560388E-44
8 side K: -32.124076,
A: 0.488462E-08, B: 0.425099E-12, C: -0.120204E-15, D: 0.275019E-19,
E: -0.393436E-23, F: 0.302898E-27, G: -0.963272E-32
9th K: -39.216164,
A: 0.940464E-08, B: 0.357908E-12, C: -0.263970E-15, D: 0.799963E-19,
E: -0.134955E-22, F: 0.120027E-26, G: -0.440764E-31
10th K: -2.129307,
A: -0.935375E-09, B: -0.283449E-12, C: 0.211911E-15, D: -0.860523E-19
E: 0.203208E-22, F: -0.259753E-26, G: 0.137052E-30
11th K: -39.216164
A: 0.940464E-08, B: 0.357908E-12, C: -0.263970E-15, D: 0.799963E-19,
E: -0.134955E-22, F: 0.120027E-26, G: -0.440764E-31
12 sides K: -32.124076,
A: 0.488462E-08, B: 0.425099E-12, C: -0.120204E-15, D: 0.275019E-19,
E: -0.393436E-23, F: 0.302898E-27, G: -0.963272E-32
13 sides K: -0.111277,
A: -0.429614E-11, B: -0.840927E-17, C: -0.178333E-22, D: 0.170909E-27,
E: -0.832578E-33, F: 0.183207E-38, G: -0.161126E-44
14th K: -17.442489,
A: 0.142648E-09, B: 0.621719E-15, C: 0.212097E-20, D: -0.403668E-25,
E: 0.160241E-30, F: -0.145617E-36, G: -0.162735E-42

  In the above configuration, S1, S2, S3, S4, R1, R2, R3, and (S4 / S1) / β are as follows. Here, S1 is a distance along the optical path from the object plane P1 to the first concave reflecting surface M51. S2 is a distance along the optical path from the first concave reflecting surface M51 to the convex reflecting surface M52. S3 is a distance along the optical path from the convex reflecting surface M52 to the second concave reflecting surface M53. S4 is a distance along the optical path from the second concave reflecting surface M53 to the image plane P2. R1 is a paraxial radius of curvature of the first concave reflecting surface M51, R2 is a paraxial radius of curvature of the convex reflecting surface M52, and R3 is a paraxial radius of curvature of the second concave reflecting surface M53.

S1 = 1180.09
S2 = 568.06
S3 = 668.11
S4 = 1401.99
R1 = −1198.18
R2 = −661.83
R3 = −1358.42
(S4 / S1) /β=1.08 That is, in the fifth embodiment, 1.1 ≦ (S4 / S1) /β≦1.3.

  The positions of the first, second, and third reflecting surfaces M51, M52, and M53 to the paraxial curvature centers C1, C2, and C3 and the image plane P2 when the object plane P1 is set to 0 mm are as follows. is there. Φ1 is the total power of all surfaces included in each projection optical system 50, and φ2 is the total power of all surfaces of only the refractive optical member system included in the projection optical system 50.

P1: 0
C1: 18.09
C2: 49.80
C3: 78.27
P2: 121.85
φ1 = 1.55E-03
φ2 = 7.90E-05
φ2 / φ1 = 0.051

  That is, C1, C2, and C3 are sequentially arranged from the object plane P1 side between the object plane P1 and the image plane P2.

  FIG. 15 shows astigmatism and FIG. 16 shows distortion aberration of the optical system configured as described above. As shown in FIG. 15, it is possible to obtain a favorable astigmatism and a flat image surface within a wide image height range with respect to three wavelengths of i-line, h-line, and g-line.

  The telecentricity is as follows when the tangent of the principal ray maximum inclination in the object plane is T1, and the tangent of the principal ray maximum inclination in the image plane is T2.

T1: -2.73E-02
T2: 9.19E-04
That is, a telecentricity is obtained in which the tangent of the maximum inclination of the principal ray is 0.05 or less in the object space and the tangent of the maximum inclination of the principal ray is 0.01 or less in the image space.

  By the way, when the imaging magnification is 1.1 or less, the substantial value as an enlargement system is low. Further, in the configuration of the fifth embodiment, when an absolute value of φ2 / φ1 is set to 0.05 or less and astigmatism and distortion are to be corrected favorably, a high-order aberration halo starts to be noticeable and the resolution is lowered. Accordingly, the imaging magnification is preferably 1.1 or more, and the absolute value of φ2 / φ1 is preferably 0.05 or more.

[Sixth embodiment]
In the sixth embodiment, the original pattern and the substrate are scanned with respect to the projection optical system while projecting the pattern of the original pattern onto the substrate with a light beam whose section is shaped like an annular zone, and a latent image pattern is formed on the photosensitive agent applied to the substrate. Is a design example of the projection optical system of the scanning exposure apparatus for forming

FIG. 17 is a diagram showing a schematic configuration of the scanning exposure apparatus of the sixth embodiment. As the projection optical system of the scanning exposure apparatus of the sixth embodiment, a projection optical system exemplified as the first to fifth embodiments can be adopted. In FIG. 17, the first concave reflecting surface is shown as M1, the convex reflecting surface is shown as M2, and the second concave reflecting surface is shown as M3. In the sixth embodiment,
Reflection that bends the optical path between the object plane (virtual object plane) P1 and the first concave reflecting surface M1, and between the image plane (virtual image plane) P2 and the second concave reflecting surface M3, respectively. Planes MP1 and MP2 are arranged. The actual object plane is at the position where the original 65 is disposed, and the actual image plane is at the position where the substrate 67 is disposed.

  The light beam emitted from the light source unit 61 is shaped into a light beam having a rectangular cross section by the light beam shaping unit 62. The light beam having a rectangular cross section emitted from the light beam shaping unit 62 is converted into a ring-shaped light beam by the arc slit 63.

  The annular light beam illuminates the original 65 with a predetermined magnification by the slit imaging unit 64. Light emitted from the original 65 is projected onto the substrate 67 via the projection optical system 66. The circuit pattern is transferred to the entire surface of the substrate 67 by moving the original stage holding the original 65 and the substrate stage holding the substrate 67 in conjunction with each other.

[Application example]
Next, a device manufacturing method using the above exposure apparatus will be described. This device manufacturing method includes a step of projecting a pattern of an original on a substrate such as a glass substrate coated with a photosensitive agent using the exposure apparatus described above to form a latent image pattern on the photosensitive agent, And developing the formed latent image pattern to form a physical pattern. The layer can be patterned by etching the layer exposed in the opening of the physical pattern.

It is a figure which shows the structure of the projection optical system of 1st Example of this invention. It is a figure which shows the astigmatism of the projection optical system of 1st Example of this invention. It is a figure which shows the distortion aberration of the projection optical system of 1st Example of this invention. It is a figure which shows the structure of the projection optical system of 1st Example of this invention. It is a figure which shows the structure of the projection optical system of 2nd Example of this invention. It is a figure which shows the astigmatism of the projection optical system of 2nd Example of this invention. It is a figure which shows the distortion aberration of the projection optical system of 2nd Example of this invention. It is a figure which shows the structure of the projection optical system of 3rd Example of this invention. It is a figure which shows the astigmatism of the projection optical system of 3rd Example of this invention. It is a figure which shows the distortion aberration of the projection optical system of 3rd Example of this invention. It is a figure which shows the structure of the projection optical system of 4th Example of this invention. It is a figure which shows the astigmatism of the projection optical system of 4th Example of this invention. It is a figure which shows the distortion aberration of the projection optical system of 4th Example of this invention. It is a figure which shows the structure of the projection optical system of 2nd Example of this invention. It is a figure which shows the astigmatism of the projection optical system of 2nd Example of this invention. It is a figure which shows the distortion aberration of the projection optical system of 2nd Example of this invention. It is a figure which shows schematic structure of the scanning exposure apparatus of 6th Example of this invention.

Explanation of symbols

L11, L21, L31, L41, L51: First lens L12, L22, L32, L42, L52: Second lens L13, L23, L33, L43: L53: Third lens L14, L34: Fourth lens M11, M21, M31, M41, M51: first concave reflecting surfaces M12, M22, M32, M42, M52: convex reflecting surfaces M13, M23, M33, M43, M53: second concave reflecting surfaces SG11, SG21, SG31, SG41, SG51: sheet Glass SG12, SG22, SG32, SG42, SG52: Sheet glass SG13, SG53: Sheet glass SG14, SG54: Sheet glass P1: Object plane P2: Image plane 61: Light source section 62: Light beam shaping section 63: Arc slit 64: Slit connection Image unit 65: Original plate 66: Projection unit 67: Substrate

Claims (7)

An exposure apparatus including a projection optical system in which a first concave reflection surface, a convex reflection surface, and a second concave reflection surface are sequentially arranged in an optical path from an object plane to an image plane,
The projection optical system includes: at least one refractive optical member having power disposed between the first concave reflecting surface and the convex reflecting surface; an optical path from the object plane to the first concave reflecting surface; And at least one refractive optical member having power disposed in at least one of the optical paths from the second concave reflecting surface to the image plane,
When an image magnification that is an enlargement ratio of the screen area of the image plane with respect to the object plane is β, 1.1 ≦ β ≦ 2.0 is satisfied,
At least one of the paraxial center of curvature of the first concave reflecting surface, the paraxial center of curvature of the convex reflecting surface, and the paraxial center of curvature of the second concave reflecting surface exists between the object plane and the image plane. ,
Here, when an optical member having no power is included in the projection optical system, the object plane and the image plane are respectively obtained when the optical member having no power is excluded from the projection optical system. Means a virtual object plane and a virtual image plane of the projection optical system;
An exposure apparatus characterized by that.   When the distance along the optical path from the object plane to the first concave reflecting surface is S1, and the distance along the optical path from the second concave reflecting surface to the image plane is S4, 1.1 ≦ (S4 The exposure apparatus according to claim 1, wherein /S1)/β≤1.3 is satisfied.   When the total power of all surfaces included in the projection optical system is φ1, and the total power of all surfaces of the refractive optical member included in the projection optical system is φ2, 0.05 ≦ | φ2 / φ1 The exposure apparatus according to claim 1, wherein | ≦ 2.5 is satisfied.   The number of aspheric surfaces in the optical path from the object plane to the first concave reflecting surface is larger than the number of aspheric surfaces in the optical path from the second concave reflecting surface to the image plane. 4. The exposure apparatus according to any one of 3 above.   5. The exposure apparatus according to claim 1, wherein at least one of the refractive optical members has two aspheric surfaces. Two refractive optical members having power in at least one of an optical path from the object plane to the first concave reflecting surface and an optical path from the second concave reflecting surface to the image plane in the projection optical system;
The two refractive optical members having the power have two aspheric surfaces,
6. The exposure apparatus according to claim 1, wherein the two aspheric surfaces are complementary to each other. A device manufacturing method comprising:
A step of exposing the substrate by the exposure apparatus according to claim 1;
Developing the exposed substrate;
A device manufacturing method comprising:

Images