JPS6038819A - Projecting and exposing device - Google Patents

Projecting and exposing device

Info

Publication number
JPS6038819A
JPS6038819A JP58146360A JP14636083A JPS6038819A JP S6038819 A JPS6038819 A JP S6038819A JP 58146360 A JP58146360 A JP 58146360A JP 14636083 A JP14636083 A JP 14636083A JP S6038819 A JPS6038819 A JP S6038819A
Authority
JP
Japan
Prior art keywords
mirror
concave mirror
block
groove
frame body
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP58146360A
Other languages
Japanese (ja)
Inventor
Tsutomu Tanaka
勉 田中
Minoru Ikeda
稔 池田
Yoshisada Oshida
良忠 押田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP58146360A priority Critical patent/JPS6038819A/en
Publication of JPS6038819A publication Critical patent/JPS6038819A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/70233Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To obtain the projecting and exposing device with which a refrection mirror can be maintained in high degree of mirror face accuracy even after an assembling work has been finished and that a mask pattern can be image-formed on a wafer with a high degree of resolution. CONSTITUTION:A concave mirror 5 is disc-shaped and it is thick at the edge part and thin in the center part, and it is arranged on the inner circumferential part of a ring- shaped frame body which is used as a supporting means. At a plurality of places on the inner circumferential side face of said concave mirror 5 which is mentioned below, a groove 20 is provided and a bank part 21 is formed between the groove 20 and the back side of the concave mirror 5. Said concave mirror 5 is arranged at the prescribed position of the frame body 23 before a block 24 is inserted. Subsequently, the block 24 is inserted, and it is fitted to the groove 20 of the concave mirror 5. As the bulge of the block 24 is pressure-welded to the metal snap 22 of the bank part 21, the bank part 21 is pinched between the block 24 and another block 26. Also, as the bolt 27 to be used for adjustment which is screwed into the screw hole is contacted to the metal snap located at the bottom of the groove 20, the concave mirror 5 is fixed to the circumferential direction, and it is supported by the frame body 23.

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は、マスクのパターンをウェハ上に高解像度で結
像させる投影露光装置に係ルs特に、反射鏡で光学系を
構成した投影露光装置に係る。
DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to a projection exposure apparatus that images a mask pattern onto a wafer with high resolution.In particular, the present invention relates to a projection exposure apparatus that forms an image of a mask pattern on a wafer with high resolution. Pertains to.

〔発明の背景〕[Background of the invention]

従来より、反射鏡で光学系を構成した投影露光装置は、
結像の解像度が途中の反射鏡面の精度に左右される点に
問題があった。第1図は、反射投影露光装置の一例を示
す概略構成図である。図において、反射投影露光装置3
はフレーム9の内部に反射鏡として凹面鏡5、凸面鏡6
、および3枚の平面鏡7’i配置して構成されている。
Conventionally, projection exposure equipment whose optical system consists of reflecting mirrors
The problem was that the resolution of the image was dependent on the accuracy of the intermediate reflecting mirror surface. FIG. 1 is a schematic configuration diagram showing an example of a reflection projection exposure apparatus. In the figure, a reflection projection exposure device 3
is a concave mirror 5 and a convex mirror 6 as reflecting mirrors inside the frame 9.
, and three plane mirrors 7'i are arranged.

光源装置1から発された紫外線はマスク2を透光し几の
ち、前記の5枚の反射鏡で光路を屈折させられて、マス
ク2と同一の平面に並置されたウェハ4に結像される。
The ultraviolet rays emitted from the light source device 1 pass through the mask 2, and then the optical path is refracted by the five reflecting mirrors, and an image is formed on the wafer 4 arranged on the same plane as the mask 2. .

ここで、マスク2のパターンを高い解像度でウェハ4に
結像させるためには、紫外線が経由する途中の反射鏡面
の精度全高位に保つ必要がある。例えば、反射鏡面の精
度を、λ=63釦1m として、λ/10〜λ/20 
の精度に保つ必要があるが、鏡面の加工工程の技術が上
記の精度をかなえたとしても、投影露光装置の組立工程
や取付は後の反射鏡の姿勢、保持方法によっては歪みを
生じ、精度を落すことになる。特に、凹面鏡5は、約3
0度前傾してフレーム9に取付けられることもあって精
度を保つのが難しい。
Here, in order to image the pattern of the mask 2 on the wafer 4 with high resolution, it is necessary to maintain the precision of the reflecting mirror surface on the way through which the ultraviolet rays pass. For example, assuming the accuracy of the reflective mirror surface is λ=63 buttons 1m, λ/10 to λ/20
However, even if the mirror surface processing technology achieves the above accuracy, the assembly process and installation of the projection exposure equipment may cause distortion depending on the posture and holding method of the reflecting mirror afterwards, and the accuracy may be reduced. will be dropped. In particular, the concave mirror 5 is about 3
It is difficult to maintain accuracy because it is sometimes attached to the frame 9 with a forward tilt of 0 degrees.

すなわち、従来の反射投影露光装置の欠点は鏡面精度を
保つのが難しいことである。これ全史に説明する。
That is, a drawback of the conventional reflection projection exposure apparatus is that it is difficult to maintain mirror precision. This will be explained throughout history.

第2図(α)および(b)は、反射投影露光装置におけ
る凹面鏡保持方法の一例を示す正面図および断面図であ
る。両図において、中薄円盤形状である凹面鏡5は、前
記投影露光装置のフレームに固定された保持手段である
リング形状の枠体8の内周に、当て金11、座12およ
びネジ13ヲ介して嵌装されている。当て金11、座1
2およびネジ13は6組あり、リングの円周′t−3等
分する位置にそれぞれ配設されている。凹面鏡5および
その枠体8は約30度前傾して前記フレーム9に取付け
られるので、凹面鏡5が枠体8からはずれな−ように枠
体8の円周弧に対して弧状に、押え10が固着されてい
る。このような凹面鏡取付は方法の欠点としては、言う
までもなく、凹面鏡5の自重が押え10にかかつて応力
によシ鏡面に歪みを生じ易いことで、その他にも、装置
の移動時にガタ防止のためネジ13ヲ強めに締めると凹
面鏡5を側面から押圧してこれも歪みの原因となる。こ
れらは、いずれも凹面鏡5の鏡面精度に影響を及はし、
鏡面加工時には満足できるものであった高精度を数句は
方法の欠点で下落させることになる。
FIGS. 2(α) and 2(b) are a front view and a sectional view showing an example of a concave mirror holding method in a reflection projection exposure apparatus. In both figures, a concave mirror 5 having a medium-thin disk shape is attached to the inner periphery of a ring-shaped frame 8, which is a holding means fixed to the frame of the projection exposure apparatus, through a pad 11, a seat 12, and a screw 13. It is fitted. 11 pins, 1 seat
There are six sets of screws 2 and screws 13, and they are arranged at positions equally dividing the circumference 't-3 of the ring. Since the concave mirror 5 and its frame 8 are attached to the frame 9 at an angle of approximately 30 degrees forward, the presser foot 10 is placed in an arc with respect to the circumferential arc of the frame 8 so that the concave mirror 5 does not come off the frame 8. is fixed. Needless to say, the disadvantage of this method of mounting a concave mirror is that the weight of the concave mirror 5 is applied to the presser foot 10 and the mirror surface is likely to be distorted due to stress. If the screw 13 is tightened too tightly, the concave mirror 5 will be pressed from the side, which will also cause distortion. All of these affect the mirror surface accuracy of the concave mirror 5,
The high accuracy, which was satisfactory during mirror finishing, will be degraded due to several flaws in the method.

〔発明の目的〕[Purpose of the invention]

本発明は、上記の欠点を除いて、反射鏡の鏡面精度を組
立工程以後でも高位に維持することができ、マスクのパ
ターンを高い解像度でウェハ上に結像できる投影露光装
置を提供することを目的とする。
SUMMARY OF THE INVENTION The present invention aims to provide a projection exposure apparatus that can maintain the mirror surface accuracy of a reflecting mirror at a high level even after the assembly process and image a mask pattern onto a wafer with high resolution, excluding the above-mentioned drawbacks. purpose.

〔発明の概要〕[Summary of the invention]

本発明は、この目的全達成するために、反射鏡の側面の
複数個所に溝全刻設することにより反射鏡の裏面と前記
溝との間に央部を形成し、一方、これを保持する枠体に
も前記溝に対向する位置に挟持部材全備え、その挟持部
材で前記央部を挾持して、鏡面に影響を与えることなく
反射鏡全保持することを特徴とする。
In order to achieve all of these objectives, the present invention forms a central portion between the back surface of the reflective mirror and the grooves by fully carving grooves at multiple locations on the side surface of the reflective mirror, and also holds the central portion. It is characterized in that the frame body is also provided with all clamping members at positions facing the grooves, and the clamping members clamp the central portion to hold the entire reflecting mirror without affecting the mirror surface.

〔発明の実施例〕[Embodiments of the invention]

以下、本発明の1実施例を図面に基づいて説明する。 Hereinafter, one embodiment of the present invention will be described based on the drawings.

第3図(a)および(b)は、本発明全実施した凹面鏡
保持方法の一例の概要を示す正面図および断面図である
。図において、凹面鏡5は縁厚中薄の円盤形状で、保持
手段であるリング形状の枠体5の内周部に配置されてい
る。凹面鏡50円周側面の後記する複数個所には、溝2
0が刻設され、溝20と凹面鏡5の裏面との間に央部2
1を形成している。前記溝20の位置は、円周を3等分
する間隔で、円周の弧に対して弦をなす位置である。一
方、枠体23の内周側には、前記溝20および前記央部
21と対向する位置に、挾持部材の1つとしてブロック
24t−突設して前記溝20に係合させている。更に、
枠体23のフレーム側、すなわち凹面鏡の裏面側の内縁
に壁部が一体形成されていて、この壁部に挟持部材の他
の1つとして配設されたコマ26がバネで付勢されて凹
面鏡5の裏面に圧接し、前記ブロック24との間に前記
丸部21t−挾持して、鏡面に影響することなく、凹面
鏡5t−枠体23に保持する。なお、コマ26と前記央
部21とが接する部分、前記央部21と前記ブロック2
4とが接する部分、および前記ブロック24と前記溝2
0の底面とが接する部分には、当て金22がそれぞれ凹
面鏡5に着設されている。
FIGS. 3(a) and 3(b) are a front view and a sectional view schematically showing an example of a concave mirror holding method according to the present invention. In the figure, the concave mirror 5 has a disk shape with a medium-thin edge thickness, and is arranged on the inner circumference of a ring-shaped frame 5 that is a holding means. Grooves 2 are provided at multiple locations on the circumferential side of the concave mirror 50, which will be described later.
0 is carved in the center part 2 between the groove 20 and the back surface of the concave mirror 5.
1 is formed. The positions of the grooves 20 are at intervals that equally divide the circumference into three, and are at positions that form a chord with respect to the arc of the circumference. On the other hand, on the inner peripheral side of the frame body 23, a block 24t as one of the clamping members is protruded and engaged with the groove 20 at a position facing the groove 20 and the central portion 21. Furthermore,
A wall portion is integrally formed on the inner edge of the frame side of the frame body 23, that is, on the back side of the concave mirror, and a piece 26 disposed on this wall portion as another holding member is biased by a spring to hold the concave mirror. The concave mirror 5t is held in the frame 23 without affecting the mirror surface by being pressed against the back surface of the concave mirror 5t and sandwiched between the round part 21t and the block 24. In addition, the part where the piece 26 and the central part 21 touch, the central part 21 and the block 2
4, and the part where the block 24 and the groove 2 are in contact with each other.
A pad 22 is attached to the concave mirror 5 at a portion where the concave mirror 5 contacts the bottom surface of the concave mirror 5.

次に、本実施例を更に詳細に説明する。Next, this embodiment will be explained in more detail.

第4図(αL (b)はそれぞれ本実施例の凹面鏡保持
手段全史に詳細に示す断面図である。図において、ブロ
ック24は、枠体23の外周側から挿入されるよりにな
っていて、その尾部は枠体25ノ外周に合致する円弧状
に形成され、その尾部によって枠体23に位置合わせと
ネジ止めがされている。
FIG. 4 (αL (b) is a sectional view showing in detail the entire history of the concave mirror holding means of this embodiment. In the figure, the block 24 is inserted from the outer peripheral side of the frame 23. , its tail is formed in an arc shape that matches the outer periphery of the frame 25, and is positioned and screwed to the frame 23 by the tail.

ブロック24の頂部はフレーム側にふくらみを有する菖
碑状板体で、主ネジ穴が中央のふくらみ部分でブロック
24の挿入方向へ貫通している。
The top of the block 24 is an irises-shaped plate having a bulge on the frame side, and the main screw hole passes through the central bulge in the insertion direction of the block 24.

凹面鏡5は、前記ブロック24が挿入される以前に、枠
体23の所定の位置に配置され、その後で前記ブロック
24が挿入されて、凹面鏡5の溝20に嵌合される。ブ
ロック24のふくらみが前記撮部21の当て金22に圧
接しているので、前記撮部21はブロック24とコマ2
6との間に挾持されていることになシ%また、前記主ネ
ジ穴に螺入された調整用のポルト27が前記溝20の底
面の当て金22に当接しているので、凹面鏡5は円周方
向にも固定され、枠体23に保持されることになる。
The concave mirror 5 is placed at a predetermined position on the frame 23 before the block 24 is inserted, and then the block 24 is inserted and fitted into the groove 20 of the concave mirror 5. Since the bulge of the block 24 is in pressure contact with the pad 22 of the photographing section 21, the photographing section 21 is connected to the block 24 and the frame 2.
Also, since the adjustment port 27 screwed into the main screw hole is in contact with the stopper 22 on the bottom of the groove 20, the concave mirror 5 It is also fixed in the circumferential direction and held by the frame 23.

次に、本発明の別な実施例として、平面反射鏡の取付は
方法について説明する。
Next, as another embodiment of the present invention, a method for attaching a flat reflecting mirror will be described.

第5図は従来の平面鏡保持方法の一例を示す正面図およ
び断面図である。図におりて、平面鏡7は投影露光装置
のサイドフレーム間に止り木状にかけ渡された保持手段
である板形状の保持台31に、接着剤32で固定されて
いる。但し、接着剤32の使用法は、添着式ではなく、
保持台51の板面に穴33ヲ設け、その穴35の内側面
と平面鏡7の裏面と金べったり接着剤32で満たし、1
つなぎ”の形で接着するもので、接着剤32の塗布状況
は必ずしも均一ではなく、硬化の進行と共に鏡面へ影響
を与える怖れもあツ九。このような平面鏡の取付けにも
本発明は適用可能である。
FIG. 5 is a front view and a sectional view showing an example of a conventional plane mirror holding method. In the figure, a plane mirror 7 is fixed with an adhesive 32 to a plate-shaped holding base 31, which is a holding means that extends like a perch between side frames of the projection exposure apparatus. However, the usage of the adhesive 32 is not an adhesive type, but
A hole 33 is provided in the plate surface of the holding base 51, and the inner surface of the hole 35 and the back surface of the plane mirror 7 are filled with gold adhesive 32.
The adhesive 32 is not necessarily applied uniformly, and there is a risk that it may affect the mirror surface as it hardens.The present invention is also applicable to the installation of such flat mirrors. It is possible.

第6図は、本発明【実施しlヒ平面鏡保持方法の一例を
示す断面図である。図において、平面鏡7は厚みを有す
る矩形状板材で、上側面両端部と下側面中央部との3個
所に溝64ヲ刻設され、裏面と溝との間に丸部65全形
成されている。一方、保持手段である保持台37け、通
常の板形状のものがサイドフレーム間にかけ渡されてい
て、この保持台57VC着脱自在に装着された鈎38の
先端が、凹面鏡の場合のブロックと同様に、平面鏡7の
前記溝54に挿入され、平面鏡7全把持して込る。その
3個では、保持台37の前記撮部35に対応する板面に
ネジ穴が貝連され、このネジ穴に螺入された押しネジ3
9と前記鈎!+8とが挾持部材として前記板部55i挾
持し、保持手段たる保持台37は鏡面に影#會与えるこ
となく平面鏡7會保持している。なお、鈎68および押
しネジ39が平面鏡7に圧接する部位には、平面鏡7(
/C当て金36が着設されている。
FIG. 6 is a sectional view showing an example of a method for holding a plane mirror according to the present invention. In the figure, the plane mirror 7 is a thick rectangular plate material, with grooves 64 carved in three places at both ends of the upper side and at the center of the lower side, and a round part 65 entirely formed between the back side and the grooves. . On the other hand, holding stands 57VC, which are holding means, have a normal plate shape and are stretched between the side frames. Then, it is inserted into the groove 54 of the plane mirror 7, and the plane mirror 7 is fully grasped. In these three, screw holes are connected in a plate surface corresponding to the photographing section 35 of the holding table 37, and a push screw 3 is screwed into the screw hole.
9 and the hook! +8 serves as a clamping member to clamp the plate portion 55i, and a holding base 37 as a holding means holds the plane mirror 7 without casting a shadow on the mirror surface. Note that the plane mirror 7 (
/C pad 36 is installed.

上記いずれの場合に本、反射鏡の側面にSt−刻設する
ことによって撮部會形成し、その撮部を挾持部材で挾持
して反射鏡を保持手段に固定するので、応力はその撮部
にのみ加わり、鏡面には、影響を及はさない。また、本
実施例では。
In any of the above cases, the photographing section is formed by stamping St on the side surface of the book and the reflecting mirror, and the photographing section is held between the clamping members and the reflecting mirror is fixed to the holding means, so that the stress is reduced to the photographing section. It only affects the mirror surface, and has no effect on the mirror surface. Also, in this example.

溝によって撮部を形成したが、側面の加工によって突起
部全形成し、これを挾持する方法も考えられる。
Although the photographing section is formed by a groove, it is also possible to form the entire protrusion by processing the side surface and hold the protrusion.

〔発明の効果〕〔Effect of the invention〕

以上、説明したように、本発明によれば、反射鏡の側面
の複数個所にW#ヲ創設することによって機部全形成し
、この撮部を保持手段に備えた挾持部材で挾持して、反
射鏡の鏡面に応力などの影響を与えることなく、反射鏡
を保持手段に固定させるようにして、鏡面加工時の高い
面精度を組立工程以後においても維持することを可能に
し、マスクのパターンを高い解像度でウェハに結像させ
、今後の半導体製品の高密度化、微細パターン化に多大
の効果をあげるものである。
As explained above, according to the present invention, the entire camera part is formed by creating W# at a plurality of locations on the side surface of the reflecting mirror, and the photographing part is held by the holding member provided in the holding means. By fixing the reflecting mirror to the holding means without applying stress to the mirror surface of the reflecting mirror, it is possible to maintain high surface accuracy during mirror finishing even after the assembly process, and the pattern of the mask can be improved. By forming an image on a wafer with high resolution, it will have a great effect on increasing the density and fine patterning of future semiconductor products.

また、上記効果の副産物として、製品の歩留り向上とい
う経済的効用もあり、更に、組立工程時に歪防止へ過大
力配慮を払う必要もなくなって、組立の簡便化と作業の
高速化にも寄与することになる。
In addition, as a by-product of the above effects, there is an economical effect of improving product yield, and it also eliminates the need to pay excessive force to prevent distortion during the assembly process, contributing to easier assembly and faster work. It turns out.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は投影露光装置の概略構成図、第2図は従来の凹
面鏡保持方法の一例を示すもので、同図(α)はその正
面図%(A)はその断面図、第3図は本発明を実施した
凹面鏡保持方法の一例を示すもので、同図(α)はその
正面図、同図<b)uその断面図、第4図は第3図(A
)の部分拡大図で、第4図(α)は第6図(−)のA−
A線断面図、第4図(h)は同図(cL)のE−E線断
面図、第5図は従来の平面鏡保持方法の一例を示すもの
で、同図(α)はその斜視図、同図(b)は同図(α)
のC−C線断面図、第6図は本発明を実施した平面鏡保
持方法の一例を示すもので、同図(α)は一部断面側面
図、同図Cb)は同図(a)のD−D線断面図である。 1・・・光源装置 2・・・マスク 3・・・反射投影露光装置 4・・・ウェハ5・・・凹
面鏡 6・・・凸面鏡 7・・・平面鏡 8・・・枠体 9・・・フレーム 1o・・・押工 11・・・当て金 12・・・座 13・・・押しネジ 2o・・・溝 21・・・板部 22・・・当て金 ゛23・・・枠体 24・・・ブロック25・・・バネ
 26・・・コマ 27・・・ボにト 31bよび67 ・・・保持台34
・・・溝 35・・・板部 36・・・当て金 38・・・鈎 39・・・押しネジ 囁1 図 晒?7 狛3図 (α)(b) A」 喘4図 箔S図 ((IL) (b)
Fig. 1 is a schematic diagram of a projection exposure apparatus, Fig. 2 shows an example of a conventional concave mirror holding method, (α) is a front view thereof, (A) is a sectional view thereof, and Fig. 3 is a cross-sectional view. Fig. 4 shows an example of a concave mirror holding method according to the present invention; Fig. 3 (α) is a front view thereof, Fig.
), and Figure 4 (α) is a partial enlarged view of Figure 6 (-).
4(h) is a sectional view taken along the line E-E in FIG. 4(cL), FIG. 5 shows an example of a conventional plane mirror holding method, and FIG. , the same figure (b) is the same figure (α)
6 shows an example of the plane mirror holding method according to the present invention. FIG. 6 (α) is a partially sectional side view, and FIG. It is a sectional view taken along the line DD. 1... Light source device 2... Mask 3... Reflection projection exposure device 4... Wafer 5... Concave mirror 6... Convex mirror 7... Plane mirror 8... Frame 9... Frame 1o...Press 11...Batch 12...Seat 13...Press screw 2o...Groove 21...Plate part 22...Batch 23...Frame body 24...・Block 25... Spring 26... Piece 27... Bonito 31b and 67... Holding stand 34
...Groove 35...Plate part 36...Ball 38...Hook 39...Press screw whisper 1 Figure exposed? 7 Koma 3 figure (α) (b) A'' 4 figure foil S figure ((IL) (b)

Claims (1)

【特許請求の範囲】[Claims] マスクのパターンを透光した紫外線を保持手段に取付け
られた1個もしくは1個以上の反射鏡で屈折させ、ウェ
ハに結像させる投影露光装置において、反射鏡の側面の
複数個所に溝を刻設することにより、反・射鏡の裏面と
前記壽との間に撮部を形成し、一方で保持手段にこの撮
部と対応する複数組の挾持部材を備え、それらの挾持部
材で前記撮部を挾持して反射鏡全保持することを特徴と
する投影露光装置。
In a projection exposure apparatus that refracts the ultraviolet light that has passed through the mask pattern by one or more reflecting mirrors attached to a holding means and forms an image on the wafer, grooves are carved in multiple places on the side surface of the reflecting mirror. By doing so, a photographing section is formed between the back surface of the reflecting mirror and the above-mentioned box, and the holding means is provided with a plurality of pairs of clamping members corresponding to the photographing section, and these clamping members are used to hold the photographing section. A projection exposure device characterized in that a reflecting mirror is entirely held by holding it in place.
JP58146360A 1983-08-12 1983-08-12 Projecting and exposing device Pending JPS6038819A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58146360A JPS6038819A (en) 1983-08-12 1983-08-12 Projecting and exposing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58146360A JPS6038819A (en) 1983-08-12 1983-08-12 Projecting and exposing device

Publications (1)

Publication Number Publication Date
JPS6038819A true JPS6038819A (en) 1985-02-28

Family

ID=15405954

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58146360A Pending JPS6038819A (en) 1983-08-12 1983-08-12 Projecting and exposing device

Country Status (1)

Country Link
JP (1) JPS6038819A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009158719A (en) * 2007-12-26 2009-07-16 Canon Inc Exposure apparatus and method of manufacturing device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009158719A (en) * 2007-12-26 2009-07-16 Canon Inc Exposure apparatus and method of manufacturing device

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