KR101963488B1 - 패턴 묘화 장치, 패턴 묘화 방법, 디바이스 제조 방법, 레이저 광원 장치, 빔 주사 장치 및 빔 주사 방법 - Google Patents

패턴 묘화 장치, 패턴 묘화 방법, 디바이스 제조 방법, 레이저 광원 장치, 빔 주사 장치 및 빔 주사 방법 Download PDF

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KR101963488B1
KR101963488B1 KR1020167029590A KR20167029590A KR101963488B1 KR 101963488 B1 KR101963488 B1 KR 101963488B1 KR 1020167029590 A KR1020167029590 A KR 1020167029590A KR 20167029590 A KR20167029590 A KR 20167029590A KR 101963488 B1 KR101963488 B1 KR 101963488B1
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KR
South Korea
Prior art keywords
scanning
light
delete delete
substrate
incident
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KR1020167029590A
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English (en)
Korean (ko)
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KR20160145611A (ko
Inventor
마사키 가토
Original Assignee
가부시키가이샤 니콘
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Priority claimed from JP2014092862A external-priority patent/JP6349924B2/ja
Priority claimed from JP2015083669A external-priority patent/JP6569281B2/ja
Application filed by 가부시키가이샤 니콘 filed Critical 가부시키가이샤 니콘
Publication of KR20160145611A publication Critical patent/KR20160145611A/ko
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Publication of KR101963488B1 publication Critical patent/KR101963488B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/12—Scanning systems using multifaceted mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/03—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on ceramics or electro-optical crystals, e.g. exhibiting Pockels effect or Kerr effect
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/11—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on acousto-optical elements, e.g. using variable diffraction by sound or like mechanical waves
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35—Non-linear optics
    • G02F1/37—Non-linear optics for second-harmonic generation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70025—Production of exposure light, i.e. light sources by lasers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mechanical Optical Scanning Systems (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020167029590A 2014-04-28 2015-04-27 패턴 묘화 장치, 패턴 묘화 방법, 디바이스 제조 방법, 레이저 광원 장치, 빔 주사 장치 및 빔 주사 방법 KR101963488B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2014092862A JP6349924B2 (ja) 2014-04-28 2014-04-28 パターン描画装置
JPJP-P-2014-092862 2014-04-28
JPJP-P-2015-083669 2015-04-15
JP2015083669A JP6569281B2 (ja) 2015-04-15 2015-04-15 ビーム走査装置およびビーム走査方法
PCT/JP2015/062692 WO2015166910A1 (ja) 2014-04-28 2015-04-27 パターン描画装置、パターン描画方法、デバイス製造方法、レーザ光源装置、ビーム走査装置、および、ビーム走査方法

Related Child Applications (3)

Application Number Title Priority Date Filing Date
KR1020197002361A Division KR101967598B1 (ko) 2014-04-28 2015-04-27 패턴 노광 장치
KR1020187027312A Division KR101998541B1 (ko) 2014-04-28 2015-04-27 패턴 묘화 장치, 패턴 묘화 방법 및 디바이스 제조 방법
KR1020197008297A Division KR101988825B1 (ko) 2014-04-28 2015-04-27 패턴 묘화용 광원 장치 및 노광용 광원 장치

Publications (2)

Publication Number Publication Date
KR20160145611A KR20160145611A (ko) 2016-12-20
KR101963488B1 true KR101963488B1 (ko) 2019-03-28

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Family Applications (7)

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KR1020207004046A KR102164337B1 (ko) 2014-04-28 2015-04-27 패턴 노광 장치
KR1020197009529A KR102060289B1 (ko) 2014-04-28 2015-04-27 패턴 묘화 장치
KR1020197008297A KR101988825B1 (ko) 2014-04-28 2015-04-27 패턴 묘화용 광원 장치 및 노광용 광원 장치
KR1020167029590A KR101963488B1 (ko) 2014-04-28 2015-04-27 패턴 묘화 장치, 패턴 묘화 방법, 디바이스 제조 방법, 레이저 광원 장치, 빔 주사 장치 및 빔 주사 방법
KR1020187027312A KR101998541B1 (ko) 2014-04-28 2015-04-27 패턴 묘화 장치, 패턴 묘화 방법 및 디바이스 제조 방법
KR1020197016105A KR102078979B1 (ko) 2014-04-28 2015-04-27 패턴 노광 장치
KR1020197002361A KR101967598B1 (ko) 2014-04-28 2015-04-27 패턴 노광 장치

Family Applications Before (3)

Application Number Title Priority Date Filing Date
KR1020207004046A KR102164337B1 (ko) 2014-04-28 2015-04-27 패턴 노광 장치
KR1020197009529A KR102060289B1 (ko) 2014-04-28 2015-04-27 패턴 묘화 장치
KR1020197008297A KR101988825B1 (ko) 2014-04-28 2015-04-27 패턴 묘화용 광원 장치 및 노광용 광원 장치

Family Applications After (3)

Application Number Title Priority Date Filing Date
KR1020187027312A KR101998541B1 (ko) 2014-04-28 2015-04-27 패턴 묘화 장치, 패턴 묘화 방법 및 디바이스 제조 방법
KR1020197016105A KR102078979B1 (ko) 2014-04-28 2015-04-27 패턴 노광 장치
KR1020197002361A KR101967598B1 (ko) 2014-04-28 2015-04-27 패턴 노광 장치

Country Status (4)

Country Link
KR (7) KR102164337B1 (zh)
CN (5) CN109212748B (zh)
TW (5) TWI624689B (zh)
WO (1) WO2015166910A1 (zh)

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KR20180018568A (ko) * 2015-06-17 2018-02-21 가부시키가이샤 니콘 패턴 묘화 장치 및 패턴 묘화 방법
JP6651768B2 (ja) * 2015-09-28 2020-02-19 株式会社ニコン パターン描画装置
JP6607002B2 (ja) * 2015-11-30 2019-11-20 株式会社ニコン パターン描画装置
JP6547609B2 (ja) * 2015-12-02 2019-07-24 株式会社ニコン デバイス形成装置およびパターン形成装置
JP6690214B2 (ja) * 2015-12-09 2020-04-28 株式会社ニコン パターン描画装置
CN108885408B (zh) * 2016-03-30 2021-02-05 株式会社尼康 图案描绘装置
KR102496906B1 (ko) * 2016-05-06 2023-02-08 가부시키가이샤 니콘 빔 주사 장치 및 묘화 장치
WO2018061633A1 (ja) * 2016-09-29 2018-04-05 株式会社ニコン ビーム走査装置およびパターン描画装置
TWI736621B (zh) * 2016-10-04 2021-08-21 日商尼康股份有限公司 圖案描繪裝置及圖案描繪方法
WO2018066286A1 (ja) * 2016-10-04 2018-04-12 株式会社ニコン ビーム走査装置およびパターン描画装置
JP7040453B2 (ja) * 2016-10-04 2022-03-23 株式会社ニコン ビーム走査装置、パターン描画装置、およびパターン描画装置の精度検査方法
JP7021637B2 (ja) * 2016-10-05 2022-02-17 株式会社ニコン パターン描画装置
JP7036041B2 (ja) * 2017-02-20 2022-03-15 株式会社ニコン パターン描画装置、及びパターン描画方法
WO2018164087A1 (ja) * 2017-03-10 2018-09-13 株式会社ニコン パターン描画装置、及びパターン露光装置
CN111279244B (zh) * 2017-10-25 2022-03-18 株式会社尼康 图案描绘装置
JP2020021079A (ja) * 2019-09-04 2020-02-06 株式会社ニコン パターン描画装置
JP7441076B2 (ja) * 2020-03-03 2024-02-29 株式会社Ｓｃｒｅｅｎホールディングス 描画装置
JP2022105463A (ja) * 2021-01-02 2022-07-14 大船企業日本株式会社 プリント基板のレーザ加工方法およびプリント基板のレーザ加工機

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Publication number Publication date
CN109212748A (zh) 2019-01-15
CN110095862B (zh) 2021-08-27
TW202040212A (zh) 2020-11-01
CN109343214B (zh) 2021-05-18
CN106489093B (zh) 2019-04-19
KR20190011826A (ko) 2019-02-07
TWI684789B (zh) 2020-02-11
CN106489093A (zh) 2017-03-08
TWI695187B (zh) 2020-06-01
KR20190033661A (ko) 2019-03-29
TW201602636A (zh) 2016-01-16
CN110095862A (zh) 2019-08-06
KR20160145611A (ko) 2016-12-20
KR101967598B1 (ko) 2019-04-09
TW201819986A (zh) 2018-06-01
KR101998541B1 (ko) 2019-07-09
TWI712820B (zh) 2020-12-11
CN109061874B (zh) 2021-05-18
TWI624689B (zh) 2018-05-21
WO2015166910A1 (ja) 2015-11-05
KR102060289B1 (ko) 2019-12-27
CN109343214A (zh) 2019-02-15
KR20190039610A (ko) 2019-04-12
KR20180108870A (ko) 2018-10-04
KR20200018727A (ko) 2020-02-19
TW202040211A (zh) 2020-11-01
TWI712819B (zh) 2020-12-11
KR102078979B1 (ko) 2020-02-19
KR101988825B1 (ko) 2019-06-12
TW202014756A (zh) 2020-04-16
KR20190067259A (ko) 2019-06-14
CN109212748B (zh) 2021-05-18
KR102164337B1 (ko) 2020-10-12
CN109061874A (zh) 2018-12-21

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