KR101902855B1 - 압력식 유량 제어 장치 - Google Patents

압력식 유량 제어 장치 Download PDF

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Publication number
KR101902855B1
KR101902855B1 KR1020167003232A KR20167003232A KR101902855B1 KR 101902855 B1 KR101902855 B1 KR 101902855B1 KR 1020167003232 A KR1020167003232 A KR 1020167003232A KR 20167003232 A KR20167003232 A KR 20167003232A KR 101902855 B1 KR101902855 B1 KR 101902855B1
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South Korea
Prior art keywords
pressure
flow rate
passage
control valve
orifice
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KR1020167003232A
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Korean (ko)
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KR20160028474A (ko
Inventor
타카시 히로세
토시히데 요시다
아츠시 마츠모토
카오루 히라타
노부카즈 이케다
코지 니시노
료스케 도히
카츠유키 스기타
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가부시키가이샤 후지킨
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Publication of KR20160028474A publication Critical patent/KR20160028474A/ko
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Publication of KR101902855B1 publication Critical patent/KR101902855B1/ko
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    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K27/00—Construction of housing; Use of materials therefor
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F16K31/004—Actuating devices; Operating means; Releasing devices actuated by piezoelectric means
    • F16K31/007—Piezoelectric stacks
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K7/00—Diaphragm valves or cut-off apparatus, e.g. with a member deformed, but not moved bodily, to close the passage ; Pinch valves
    • F16K7/12—Diaphragm valves or cut-off apparatus, e.g. with a member deformed, but not moved bodily, to close the passage ; Pinch valves with flat, dished, or bowl-shaped diaphragm
    • F16K7/14—Diaphragm valves or cut-off apparatus, e.g. with a member deformed, but not moved bodily, to close the passage ; Pinch valves with flat, dished, or bowl-shaped diaphragm arranged to be deformed against a flat seat
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0418—Apparatus for fluid treatment for etching
    • H10P72/0421—Apparatus for fluid treatment for etching for drying etching
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0604—Process monitoring, e.g. flow or thickness monitoring

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Flow Control (AREA)
KR1020167003232A 2013-12-05 2014-11-25 압력식 유량 제어 장치 Active KR101902855B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013252167A JP6372998B2 (ja) 2013-12-05 2013-12-05 圧力式流量制御装置
JPJP-P-2013-252167 2013-12-05
PCT/JP2014/005885 WO2015083343A1 (ja) 2013-12-05 2014-11-25 圧力式流量制御装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020187026983A Division KR102087645B1 (ko) 2013-12-05 2014-11-25 압력식 유량 제어 장치

Publications (2)

Publication Number Publication Date
KR20160028474A KR20160028474A (ko) 2016-03-11
KR101902855B1 true KR101902855B1 (ko) 2018-10-01

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KR1020167003232A Active KR101902855B1 (ko) 2013-12-05 2014-11-25 압력식 유량 제어 장치
KR1020187026983A Active KR102087645B1 (ko) 2013-12-05 2014-11-25 압력식 유량 제어 장치

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Country Status (7)

Country Link
US (1) US10372145B2 (cg-RX-API-DMAC7.html)
JP (1) JP6372998B2 (cg-RX-API-DMAC7.html)
KR (2) KR101902855B1 (cg-RX-API-DMAC7.html)
CN (1) CN105556411A (cg-RX-API-DMAC7.html)
DE (1) DE112014005572T5 (cg-RX-API-DMAC7.html)
TW (2) TWI566067B (cg-RX-API-DMAC7.html)
WO (1) WO2015083343A1 (cg-RX-API-DMAC7.html)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9904299B2 (en) * 2015-04-08 2018-02-27 Tokyo Electron Limited Gas supply control method
DE112016002024B4 (de) * 2015-06-25 2023-11-09 Illinois Tool Works Inc. Piezoaktortyp-ventil
KR102024449B1 (ko) 2015-08-24 2019-09-23 가부시키가이샤 후지킨 유체 제어 장치에 있어서의 시일 부재의 고정 구조, 커넥터 및 유체 제어 장치
JP6799862B2 (ja) 2015-10-28 2020-12-16 株式会社フジキン 流量信号補正方法およびこれを用いた流量制御装置
KR102056140B1 (ko) * 2016-02-29 2019-12-16 가부시키가이샤 후지킨 유량 제어 장치
US10665430B2 (en) * 2016-07-11 2020-05-26 Tokyo Electron Limited Gas supply system, substrate processing system and gas supply method
JP6786096B2 (ja) * 2016-07-28 2020-11-18 株式会社フジキン 圧力式流量制御装置
WO2018070464A1 (ja) * 2016-10-14 2018-04-19 株式会社フジキン 流体制御装置
JP7245600B2 (ja) 2016-12-15 2023-03-24 株式会社堀場エステック 流量制御装置、及び、流量制御装置用プログラム
KR102162045B1 (ko) * 2016-12-26 2020-10-06 가부시키가이샤 후지킨 압전 소자 구동식 밸브 및 유량 제어 장치
CN106876304B (zh) * 2017-02-24 2019-09-10 成都京东方光电科技有限公司 一种湿法刻蚀排气系统及湿法刻蚀装置
CN111373182A (zh) * 2017-11-24 2020-07-03 株式会社富士金 阀装置以及使用该阀装置的控制装置的控制方法、流体控制装置以及半导体制造装置
JP7529664B2 (ja) * 2019-07-08 2024-08-06 株式会社堀場エステック 流量制御装置、流量測定方法、及び、流量制御装置用プログラム
KR20220058536A (ko) * 2019-09-05 2022-05-09 가부시키가이샤 호리바 에스텍 유량 제어 밸브 또는 유량 제어 장치
WO2021131577A1 (ja) * 2019-12-25 2021-07-01 株式会社フジキン 圧力制御装置
US12306647B2 (en) 2020-03-05 2025-05-20 Fujikin Incorporated Flow rate control device and flow rate control method wherein an internal command signal is generated by a combination of first order lag process and ramp process
JP2022029854A (ja) 2020-08-05 2022-02-18 株式会社堀場エステック 流量制御装置、流量制御方法、及び、流量制御プログラム
US20240101446A1 (en) 2021-03-11 2024-03-28 Fujikin Incorporated Vaporizer and vaporization supply device
JP7045738B1 (ja) * 2021-03-23 2022-04-01 株式会社リンテック 常時閉型流量制御バルブ
KR20230000975A (ko) * 2021-06-25 2023-01-03 가부시키가이샤 호리바 에스텍 유체 제어 장치, 유체 제어 시스템, 유체 제어 장치용 프로그램 및 유체 제어 방법
CN113977451B (zh) * 2021-10-25 2023-08-25 长鑫存储技术有限公司 半导体设备的检测系统及检测方法
CN119103392B (zh) * 2024-11-08 2025-01-28 陕西星环聚能科技有限公司 一种用于可控核聚变装置的压电阀和可控核聚变装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001296198A (ja) * 2000-04-14 2001-10-26 Nagano Keiki Co Ltd 圧力センサ
JP2005149075A (ja) 2003-11-14 2005-06-09 Fujikin Inc 流体制御装置

Family Cites Families (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63115970A (ja) * 1986-10-31 1988-05-20 Motoyama Seisakusho:Kk ダイヤフラム弁
JP3291161B2 (ja) * 1995-06-12 2002-06-10 株式会社フジキン 圧力式流量制御装置
ZA974798B (en) * 1996-05-31 1998-11-30 Sastech Pty Ltd Termpolymerization
JP3580645B2 (ja) * 1996-08-12 2004-10-27 忠弘 大見 圧力式流量制御装置
US5851004A (en) * 1996-10-16 1998-12-22 Parker-Hannifin Corporation High pressure actuated metal seated diaphragm valve
JP3522535B2 (ja) * 1998-05-29 2004-04-26 忠弘 大見 圧力式流量制御装置を備えたガス供給設備
CN1128395C (zh) * 1999-06-25 2003-11-19 富准精密工业(深圳)有限公司 散热装置扣件
EP1300619B1 (en) * 2000-06-05 2006-08-02 Fujikin Incorporated Orifice-built-in valve
JP4102564B2 (ja) * 2001-12-28 2008-06-18 忠弘 大見 改良型圧力式流量制御装置
JP4195819B2 (ja) * 2003-01-17 2008-12-17 忠弘 大見 弗化水素ガスの流量制御方法及びこれに用いる弗化水素ガス用流量制御装置
JP2007525622A (ja) * 2003-10-03 2007-09-06 スワゲロック カンパニー 流れ制御デバイスのためのダイヤフラムモニタリング
JP4572139B2 (ja) 2005-05-23 2010-10-27 株式会社フジキン 改良型圧力式流量制御装置
JP4690827B2 (ja) * 2005-08-26 2011-06-01 株式会社フジキン ガスケット型オリフィス及びこれを用いた圧力式流量制御装置
JP4743763B2 (ja) * 2006-01-18 2011-08-10 株式会社フジキン 圧電素子駆動式金属ダイヤフラム型制御弁
JP4605790B2 (ja) * 2006-06-27 2011-01-05 株式会社フジキン 原料の気化供給装置及びこれに用いる圧力自動調整装置。
JP4971030B2 (ja) * 2007-05-21 2012-07-11 シーケーディ株式会社 流体制御弁
US9099231B2 (en) * 2007-10-23 2015-08-04 Brooks Instrument, Llc Pressure retaining sleeve
WO2009141947A1 (ja) 2008-05-21 2009-11-26 株式会社フジキン 圧力式流量制御装置を用いた流体の非連続式流量切替制御方法
JP5177864B2 (ja) * 2008-06-04 2013-04-10 株式会社フジキン 熱式質量流量調整器用自動圧力調整器
JP4977669B2 (ja) * 2008-09-05 2012-07-18 忠弘 大見 差圧式流量計
DE102009006445B3 (de) * 2009-01-28 2010-07-15 Hydac Fluidtechnik Gmbh Proportional-Druckregelventil
JP5669384B2 (ja) * 2009-12-01 2015-02-12 株式会社フジキン 圧電駆動式バルブ及び圧電駆動式流量制御装置
WO2011067877A1 (ja) * 2009-12-01 2011-06-09 株式会社フジキン 圧力式流量制御装置
JP5508875B2 (ja) * 2010-01-26 2014-06-04 株式会社フジキン 流体制御器および流量制御装置
JP5501806B2 (ja) * 2010-03-05 2014-05-28 サーパス工業株式会社 圧力センサ、差圧式流量計及び流量コントローラ
TW201234155A (en) * 2010-07-09 2012-08-16 Entegris Inc Flow controller
JP5576991B2 (ja) 2011-09-30 2014-08-20 株式会社フジキン ガス供給装置
JP5665793B2 (ja) * 2012-04-26 2015-02-04 株式会社フジキン 可変オリフィス型圧力制御式流量制御器
CN105659177B (zh) * 2013-10-31 2018-07-10 株式会社富士金 压力式流量控制装置
JP6321972B2 (ja) * 2014-01-21 2018-05-09 株式会社フジキン 圧力式流量制御装置及びその流量制御開始時のオーバーシュート防止方法
TWM489440U (en) * 2014-06-27 2014-11-01 Cheng-Yu Huang Portable cylinder audio speaker
JP6336345B2 (ja) * 2014-06-30 2018-06-06 株式会社フジキン ダイヤフラム弁、流体制御装置、半導体製造装置および半導体製造方法
JP6416529B2 (ja) * 2014-07-23 2018-10-31 株式会社フジキン 圧力式流量制御装置
JP6475441B2 (ja) * 2014-09-01 2019-02-27 株式会社フジキン 圧電素子駆動式バルブ及び圧電素子駆動式バルブを備えた流量制御装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001296198A (ja) * 2000-04-14 2001-10-26 Nagano Keiki Co Ltd 圧力センサ
JP2005149075A (ja) 2003-11-14 2005-06-09 Fujikin Inc 流体制御装置

Also Published As

Publication number Publication date
KR102087645B1 (ko) 2020-03-11
TWI566067B (zh) 2017-01-11
JP6372998B2 (ja) 2018-08-15
KR20180108851A (ko) 2018-10-04
US10372145B2 (en) 2019-08-06
JP2015109022A (ja) 2015-06-11
TW201535081A (zh) 2015-09-16
US20160349763A1 (en) 2016-12-01
KR20160028474A (ko) 2016-03-11
TWI658351B (zh) 2019-05-01
TW201701095A (zh) 2017-01-01
CN105556411A (zh) 2016-05-04
DE112014005572T5 (de) 2016-12-01
WO2015083343A1 (ja) 2015-06-11

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