KR101859361B1 - 반도체 장치 - Google Patents

반도체 장치 Download PDF

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Publication number
KR101859361B1
KR101859361B1 KR1020137003401A KR20137003401A KR101859361B1 KR 101859361 B1 KR101859361 B1 KR 101859361B1 KR 1020137003401 A KR1020137003401 A KR 1020137003401A KR 20137003401 A KR20137003401 A KR 20137003401A KR 101859361 B1 KR101859361 B1 KR 101859361B1
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South Korea
Prior art keywords
transistor
electrically connected
source
gate
line
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Expired - Fee Related
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Korean (ko)
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KR20130097719A (ko
Inventor
기요시 가토
다카노리 마츠자키
히로키 이노우에
슈헤이 나가츠카
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가부시키가이샤 한도오따이 에네루기 켄큐쇼
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B41/00Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates
    • H10B41/70Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates the floating gate being an electrode shared by two or more components
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
    • G11C11/40Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
    • G11C11/401Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells
    • G11C11/403Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells with charge regeneration common to a multiplicity of memory cells, i.e. external refresh
    • G11C11/404Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells with charge regeneration common to a multiplicity of memory cells, i.e. external refresh with one charge-transfer gate, e.g. MOS transistor, per cell
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/04Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0408Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors
    • G11C16/0441Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors comprising cells containing multiple floating gate devices, e.g. separate read-and-write FAMOS transistors with connected floating gates
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B41/00Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates
    • H10B41/30Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates characterised by the memory core region
    • H10B41/35Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates characterised by the memory core region with a cell select transistor, e.g. NAND
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D87/00Integrated devices comprising both bulk components and either SOI or SOS components on the same substrate
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C2211/00Indexing scheme relating to digital stores characterized by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C2211/401Indexing scheme relating to cells needing refreshing or charge regeneration, i.e. dynamic cells
    • G11C2211/4016Memory devices with silicon-on-insulator cells

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Semiconductor Memories (AREA)
  • Thin Film Transistor (AREA)
  • Electroluminescent Light Sources (AREA)
  • Non-Volatile Memory (AREA)
  • Dram (AREA)
KR1020137003401A 2010-07-16 2011-06-20 반도체 장치 Expired - Fee Related KR101859361B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2010-162219 2010-07-16
JP2010162219 2010-07-16
PCT/JP2011/064599 WO2012008286A1 (en) 2010-07-16 2011-06-20 Semiconductor device

Publications (2)

Publication Number Publication Date
KR20130097719A KR20130097719A (ko) 2013-09-03
KR101859361B1 true KR101859361B1 (ko) 2018-05-21

Family

ID=45466880

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020137003401A Expired - Fee Related KR101859361B1 (ko) 2010-07-16 2011-06-20 반도체 장치

Country Status (5)

Country Link
US (1) US8576636B2 (enrdf_load_stackoverflow)
JP (1) JP5767880B2 (enrdf_load_stackoverflow)
KR (1) KR101859361B1 (enrdf_load_stackoverflow)
TW (1) TWI543165B (enrdf_load_stackoverflow)
WO (1) WO2012008286A1 (enrdf_load_stackoverflow)

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