KR101856722B1 - 파워 절연 게이트형 전계 효과 트랜지스터 - Google Patents
파워 절연 게이트형 전계 효과 트랜지스터 Download PDFInfo
- Publication number
- KR101856722B1 KR101856722B1 KR1020110091130A KR20110091130A KR101856722B1 KR 101856722 B1 KR101856722 B1 KR 101856722B1 KR 1020110091130 A KR1020110091130 A KR 1020110091130A KR 20110091130 A KR20110091130 A KR 20110091130A KR 101856722 B1 KR101856722 B1 KR 101856722B1
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- KR
- South Korea
- Prior art keywords
- semiconductor layer
- electrode
- drain electrode
- oxide semiconductor
- source electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/674—Thin-film transistors [TFT] characterised by the active materials
- H10D30/6755—Oxide semiconductors, e.g. zinc oxide, copper aluminium oxide or cadmium stannate
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/01—Manufacture or treatment
- H10D30/021—Manufacture or treatment of FETs having insulated gates [IGFET]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/01—Manufacture or treatment
- H10D30/021—Manufacture or treatment of FETs having insulated gates [IGFET]
- H10D30/028—Manufacture or treatment of FETs having insulated gates [IGFET] of double-diffused metal oxide semiconductor [DMOS] FETs
- H10D30/0291—Manufacture or treatment of FETs having insulated gates [IGFET] of double-diffused metal oxide semiconductor [DMOS] FETs of vertical DMOS [VDMOS] FETs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/64—Double-diffused metal-oxide semiconductor [DMOS] FETs
- H10D30/66—Vertical DMOS [VDMOS] FETs
Landscapes
- Thin Film Transistor (AREA)
- Electrodes Of Semiconductors (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2010-212185 | 2010-09-22 | ||
| JP2010212185 | 2010-09-22 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20120031127A KR20120031127A (ko) | 2012-03-30 |
| KR101856722B1 true KR101856722B1 (ko) | 2018-05-10 |
Family
ID=45816933
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020110091130A Expired - Fee Related KR101856722B1 (ko) | 2010-09-22 | 2011-09-08 | 파워 절연 게이트형 전계 효과 트랜지스터 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US8994003B2 (https=) |
| JP (1) | JP5938182B2 (https=) |
| KR (1) | KR101856722B1 (https=) |
| CN (1) | CN102412305B (https=) |
| TW (1) | TWI529935B (https=) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5825744B2 (ja) | 2011-09-15 | 2015-12-02 | 株式会社半導体エネルギー研究所 | パワー絶縁ゲート型電界効果トランジスタ |
| US8765570B2 (en) * | 2012-06-12 | 2014-07-01 | Intermolecular, Inc. | Manufacturable high-k DRAM MIM capacitor structure |
| US9343288B2 (en) | 2013-07-31 | 2016-05-17 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
| US9401432B2 (en) * | 2014-01-16 | 2016-07-26 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and electronic device |
| JP6281146B2 (ja) * | 2014-07-22 | 2018-02-21 | 株式会社Flosfia | 結晶性半導体膜および板状体ならびに半導体装置 |
| US9818880B2 (en) * | 2015-02-12 | 2017-11-14 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and display device including the semiconductor device |
| JP7155534B2 (ja) * | 2018-02-16 | 2022-10-19 | 富士電機株式会社 | 半導体装置 |
| US20220093650A1 (en) * | 2019-02-04 | 2022-03-24 | Sharp Kabushiki Kaisha | Display device |
| US11916121B2 (en) | 2020-06-29 | 2024-02-27 | Taiwan Semiconductor Manufacturing Company Limited | Tri-gate orthogonal channel transistor and methods of forming the same |
| KR102841804B1 (ko) * | 2022-07-29 | 2025-08-05 | 한국항공대학교산학협력단 | 노멀리-오프 반도체 소자 및 그 제조 방법 |
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- 2011-09-08 KR KR1020110091130A patent/KR101856722B1/ko not_active Expired - Fee Related
- 2011-09-14 TW TW100133012A patent/TWI529935B/zh not_active IP Right Cessation
- 2011-09-19 US US13/236,035 patent/US8994003B2/en not_active Expired - Fee Related
- 2011-09-21 JP JP2011205447A patent/JP5938182B2/ja not_active Expired - Fee Related
- 2011-09-22 CN CN201110303682.XA patent/CN102412305B/zh not_active Expired - Fee Related
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Also Published As
| Publication number | Publication date |
|---|---|
| KR20120031127A (ko) | 2012-03-30 |
| CN102412305A (zh) | 2012-04-11 |
| CN102412305B (zh) | 2017-03-22 |
| JP5938182B2 (ja) | 2016-06-22 |
| US8994003B2 (en) | 2015-03-31 |
| TW201230337A (en) | 2012-07-16 |
| JP2012089831A (ja) | 2012-05-10 |
| US20120068183A1 (en) | 2012-03-22 |
| TWI529935B (zh) | 2016-04-11 |
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