KR101793337B1 - 절단 장치 및 절단 방법 - Google Patents
절단 장치 및 절단 방법 Download PDFInfo
- Publication number
- KR101793337B1 KR101793337B1 KR1020150145374A KR20150145374A KR101793337B1 KR 101793337 B1 KR101793337 B1 KR 101793337B1 KR 1020150145374 A KR1020150145374 A KR 1020150145374A KR 20150145374 A KR20150145374 A KR 20150145374A KR 101793337 B1 KR101793337 B1 KR 101793337B1
- Authority
- KR
- South Korea
- Prior art keywords
- cleaning
- cleaning mechanism
- cut
- cutting
- substrate
- Prior art date
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies
- H01L24/799—Apparatus for disconnecting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/98—Methods for disconnecting semiconductor or solid-state bodies
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Dicing (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning In General (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2014-215266 | 2014-10-22 | ||
JP2014215266A JP2016082195A (ja) | 2014-10-22 | 2014-10-22 | 切断装置及び切断方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20160047397A KR20160047397A (ko) | 2016-05-02 |
KR101793337B1 true KR101793337B1 (ko) | 2017-11-20 |
Family
ID=55831103
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020150145374A KR101793337B1 (ko) | 2014-10-22 | 2015-10-19 | 절단 장치 및 절단 방법 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2016082195A (zh) |
KR (1) | KR101793337B1 (zh) |
CN (1) | CN105551996B (zh) |
TW (1) | TWI593002B (zh) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2018164964A (ja) * | 2017-03-28 | 2018-10-25 | Towa株式会社 | レジノイド砥石、レジノイド砥石の製造方法、及び、加工装置 |
JP6866217B2 (ja) * | 2017-04-21 | 2021-04-28 | 株式会社ディスコ | 切削装置 |
JP6973922B2 (ja) * | 2017-09-08 | 2021-12-01 | 株式会社ディスコ | ウェーハの加工方法 |
JP6990588B2 (ja) * | 2018-01-05 | 2022-01-12 | 株式会社ディスコ | 切削装置 |
JP7161411B2 (ja) * | 2019-01-15 | 2022-10-26 | 株式会社ディスコ | 乾燥機構 |
JP7154195B2 (ja) * | 2019-07-26 | 2022-10-17 | Towa株式会社 | 切断装置及び切断品の製造方法 |
WO2021132133A1 (ja) * | 2019-12-26 | 2021-07-01 | ヤマハロボティクスホールディングス株式会社 | 半導体チップ洗浄方法及び半導体チップ洗浄装置 |
JP7394712B2 (ja) * | 2020-06-24 | 2023-12-08 | Towa株式会社 | 切断装置及び切断品の製造方法 |
JPWO2022091451A1 (zh) * | 2020-10-26 | 2022-05-05 | ||
KR102617780B1 (ko) * | 2020-11-19 | 2023-12-26 | 세메스 주식회사 | 반도체 스트립 절단 및 분류 설비에서 공기 분사 장치 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007194367A (ja) * | 2006-01-18 | 2007-08-02 | Tokyo Seimitsu Co Ltd | 洗浄装置及び該洗浄装置を備えるダイシング装置 |
JP2009218397A (ja) * | 2008-03-11 | 2009-09-24 | Towa Corp | 基板の切断方法及び装置 |
JP2009253160A (ja) * | 2008-04-09 | 2009-10-29 | Towa Corp | 基板の切断方法及び装置 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5487168A (en) * | 1977-12-23 | 1979-07-11 | Hitachi Ltd | Manufacture for semiconductor device and its unit |
TW353784B (en) * | 1996-11-19 | 1999-03-01 | Tokyo Electron Ltd | Apparatus and method for washing substrate |
JP2000288490A (ja) * | 1999-04-01 | 2000-10-17 | Furontekku:Kk | ウェット処理装置 |
JP3990073B2 (ja) * | 1999-06-17 | 2007-10-10 | 株式会社荏原製作所 | 基板洗浄装置及び基板洗浄方法 |
JP2001077057A (ja) * | 1999-09-06 | 2001-03-23 | Disco Abrasive Syst Ltd | Csp基板分割装置 |
JP2002043267A (ja) * | 2000-07-21 | 2002-02-08 | Ebara Corp | 基板洗浄装置、基板洗浄方法及び基板処理装置 |
JP4079205B2 (ja) * | 2000-08-29 | 2008-04-23 | 東京エレクトロン株式会社 | 基板洗浄装置及び基板洗浄方法 |
JP2003209089A (ja) * | 2002-01-17 | 2003-07-25 | Sony Corp | ウェハの洗浄方法、洗浄装置およびダイシング装置 |
US7766566B2 (en) * | 2005-08-03 | 2010-08-03 | Tokyo Electron Limited | Developing treatment apparatus and developing treatment method |
JP5325003B2 (ja) * | 2009-04-16 | 2013-10-23 | 株式会社ディスコ | 研削装置 |
JP5866227B2 (ja) * | 2012-02-23 | 2016-02-17 | 株式会社荏原製作所 | 基板洗浄方法 |
JP6265702B2 (ja) * | 2012-12-06 | 2018-01-24 | 株式会社荏原製作所 | 基板洗浄装置及び基板洗浄方法 |
JP6172957B2 (ja) * | 2013-02-04 | 2017-08-02 | 株式会社ディスコ | 洗浄装置 |
-
2014
- 2014-10-22 JP JP2014215266A patent/JP2016082195A/ja active Pending
-
2015
- 2015-08-12 TW TW104126197A patent/TWI593002B/zh active
- 2015-08-21 CN CN201510516440.7A patent/CN105551996B/zh not_active Expired - Fee Related
- 2015-10-19 KR KR1020150145374A patent/KR101793337B1/ko active IP Right Grant
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007194367A (ja) * | 2006-01-18 | 2007-08-02 | Tokyo Seimitsu Co Ltd | 洗浄装置及び該洗浄装置を備えるダイシング装置 |
JP2009218397A (ja) * | 2008-03-11 | 2009-09-24 | Towa Corp | 基板の切断方法及び装置 |
JP2009253160A (ja) * | 2008-04-09 | 2009-10-29 | Towa Corp | 基板の切断方法及び装置 |
Also Published As
Publication number | Publication date |
---|---|
TWI593002B (zh) | 2017-07-21 |
TW201615347A (zh) | 2016-05-01 |
KR20160047397A (ko) | 2016-05-02 |
CN105551996B (zh) | 2019-01-25 |
CN105551996A (zh) | 2016-05-04 |
JP2016082195A (ja) | 2016-05-16 |
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A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E90F | Notification of reason for final refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant |