KR101788362B1 - 임프린트 장치, 물품의 제조 방법 및 위치정렬 장치 - Google Patents

임프린트 장치, 물품의 제조 방법 및 위치정렬 장치 Download PDF

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KR101788362B1
KR101788362B1 KR1020140039142A KR20140039142A KR101788362B1 KR 101788362 B1 KR101788362 B1 KR 101788362B1 KR 1020140039142 A KR1020140039142 A KR 1020140039142A KR 20140039142 A KR20140039142 A KR 20140039142A KR 101788362 B1 KR101788362 B1 KR 101788362B1
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KR20140120844A (ko
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히로시 사토
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캐논 가부시끼가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Engineering & Computer Science (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
KR1020140039142A 2013-04-03 2014-04-02 임프린트 장치, 물품의 제조 방법 및 위치정렬 장치 Expired - Fee Related KR101788362B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2013-078093 2013-04-03
JP2013078093A JP6188382B2 (ja) 2013-04-03 2013-04-03 インプリント装置および物品の製造方法

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Publication Number Publication Date
KR20140120844A KR20140120844A (ko) 2014-10-14
KR101788362B1 true KR101788362B1 (ko) 2017-10-19

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KR1020140039142A Expired - Fee Related KR101788362B1 (ko) 2013-04-03 2014-04-02 임프린트 장치, 물품의 제조 방법 및 위치정렬 장치

Country Status (4)

Country Link
US (1) US9946156B2 (enExample)
JP (1) JP6188382B2 (enExample)
KR (1) KR101788362B1 (enExample)
CN (1) CN104102090B (enExample)

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* Cited by examiner, † Cited by third party
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JP6138189B2 (ja) * 2015-04-08 2017-05-31 キヤノン株式会社 インプリント装置および物品の製造方法
CN105182702B (zh) * 2015-10-30 2017-08-11 京东方科技集团股份有限公司 对位标记搜寻方法、显示基板和显示装置
JP6671160B2 (ja) 2015-11-30 2020-03-25 キヤノン株式会社 インプリント装置、物品製造方法および位置合わせ方法
CN105425478B (zh) * 2016-01-04 2019-09-17 京东方科技集团股份有限公司 一种对盒装置
JP7038562B2 (ja) 2018-02-13 2022-03-18 キヤノン株式会社 検出装置、リソグラフィ装置、および物品の製造方法
JP7116605B2 (ja) * 2018-06-28 2022-08-10 キヤノン株式会社 インプリント材のパターンを形成するための方法、インプリント装置、インプリント装置の調整方法、および、物品製造方法
KR102722244B1 (ko) * 2018-10-22 2024-10-25 삼성디스플레이 주식회사 표시 장치 및 표시 장치의 제조 방법
JP7337670B2 (ja) * 2019-11-15 2023-09-04 キヤノン株式会社 インプリント装置、インプリント方法、および、物品の製造方法
CN111016149B (zh) * 2019-12-27 2022-10-04 江苏源美竹木业有限责任公司 同步对花压印系统及压印方法
JP7603395B2 (ja) 2020-08-26 2024-12-20 キヤノン株式会社 インプリント装置、および物品の製造方法
CN119065213A (zh) * 2024-11-01 2024-12-03 粤芯半导体技术股份有限公司 一种晶圆级标记的曝光方法及装置

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JP2005167030A (ja) 2003-12-03 2005-06-23 Sony Corp マスクおよび露光方法

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JP2006267191A (ja) * 2005-03-22 2006-10-05 Pentax Industrial Instruments Co Ltd 露光装置
JP4185941B2 (ja) 2006-04-04 2008-11-26 キヤノン株式会社 ナノインプリント方法及びナノインプリント装置
JP4848832B2 (ja) 2006-05-09 2011-12-28 凸版印刷株式会社 ナノインプリント装置及びナノインプリント方法
JP5096965B2 (ja) 2008-02-29 2012-12-12 キヤノン株式会社 位置合わせ方法、位置合わせ装置、露光方法及びデバイス製造方法
US8432548B2 (en) * 2008-11-04 2013-04-30 Molecular Imprints, Inc. Alignment for edge field nano-imprinting
CN101833238A (zh) 2009-03-13 2010-09-15 鸿富锦精密工业（深圳）有限公司 压印模具
NL2005259A (en) * 2009-09-29 2011-03-30 Asml Netherlands Bv Imprint lithography.
US8691124B2 (en) * 2009-11-24 2014-04-08 Asml Netherlands B.V. Alignment and imprint lithography
JP5697345B2 (ja) * 2010-02-17 2015-04-08 キヤノン株式会社 インプリント装置、及び物品の製造方法
NL2005975A (en) * 2010-03-03 2011-09-06 Asml Netherlands Bv Imprint lithography.
JP5539011B2 (ja) * 2010-05-14 2014-07-02 キヤノン株式会社 インプリント装置、検出装置、位置合わせ装置、及び物品の製造方法
JP5597031B2 (ja) 2010-05-31 2014-10-01 キヤノン株式会社 リソグラフィ装置及び物品の製造方法
JP2012084732A (ja) 2010-10-13 2012-04-26 Canon Inc インプリント方法及び装置
CN102096348B (zh) * 2010-12-09 2013-01-02 西安交通大学 提高压印对准过程中莫尔条纹图像质量的数字莫尔条纹方法
JP5637931B2 (ja) 2011-05-17 2014-12-10 キヤノン株式会社 インプリント装置、インプリント方法およびデバイス製造方法
JP5938218B2 (ja) * 2012-01-16 2016-06-22 キヤノン株式会社 インプリント装置、物品の製造方法およびインプリント方法
JP6066565B2 (ja) * 2012-01-31 2017-01-25 キヤノン株式会社 インプリント装置、および、物品の製造方法
JP6333039B2 (ja) * 2013-05-16 2018-05-30 キヤノン株式会社 インプリント装置、デバイス製造方法およびインプリント方法
JP6242099B2 (ja) * 2013-07-23 2017-12-06 キヤノン株式会社 インプリント方法、インプリント装置およびデバイス製造方法
JP6097704B2 (ja) * 2014-01-06 2017-03-15 キヤノン株式会社 インプリント装置、インプリント方法及び物品の製造方法
JP2015170815A (ja) * 2014-03-10 2015-09-28 キヤノン株式会社 インプリント装置、アライメント方法及び物品の製造方法
US10331027B2 (en) * 2014-09-12 2019-06-25 Canon Kabushiki Kaisha Imprint apparatus, imprint system, and method of manufacturing article
JP2016100366A (ja) * 2014-11-18 2016-05-30 キヤノン株式会社 リソグラフィ装置、及び物品の製造方法
JP6570914B2 (ja) * 2015-08-03 2019-09-04 東芝メモリ株式会社 インプリント方法
JP6799397B2 (ja) * 2015-08-10 2020-12-16 キヤノン株式会社 インプリント装置、および物品の製造方法

Patent Citations (1)

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Publication number Priority date Publication date Assignee Title
JP2005167030A (ja) 2003-12-03 2005-06-23 Sony Corp マスクおよび露光方法

Also Published As

Publication number Publication date
CN104102090B (zh) 2017-12-29
CN104102090A (zh) 2014-10-15
JP6188382B2 (ja) 2017-08-30
US20140300016A1 (en) 2014-10-09
US9946156B2 (en) 2018-04-17
KR20140120844A (ko) 2014-10-14
JP2014203935A (ja) 2014-10-27

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