KR101783062B1 - 다작용성 양이온을 포함하는 중합성 이온성 액체 및 정전기 방지 코팅 - Google Patents
다작용성 양이온을 포함하는 중합성 이온성 액체 및 정전기 방지 코팅 Download PDFInfo
- Publication number
- KR101783062B1 KR101783062B1 KR1020127007828A KR20127007828A KR101783062B1 KR 101783062 B1 KR101783062 B1 KR 101783062B1 KR 1020127007828 A KR1020127007828 A KR 1020127007828A KR 20127007828 A KR20127007828 A KR 20127007828A KR 101783062 B1 KR101783062 B1 KR 101783062B1
- Authority
- KR
- South Korea
- Prior art keywords
- delete delete
- ionic liquid
- polymerizable
- polymerizable ionic
- nitrogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- LCKBCOPTVDNFEV-UHFFFAOYSA-O CCCC[NH+](C)CCC(OCCOC(C(C)=C)=O)=O Chemical compound CCCC[NH+](C)CCC(OCCOC(C(C)=C)=O)=O LCKBCOPTVDNFEV-UHFFFAOYSA-O 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/10—Esters
- C08F222/12—Esters of phenols or saturated alcohols
- C08F222/22—Esters containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
- C07D233/54—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members
- C07D233/56—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, attached to ring carbon atoms
- C07D233/60—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, attached to ring carbon atoms with hydrocarbon radicals, substituted by oxygen or sulfur atoms, attached to ring nitrogen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C219/00—Compounds containing amino and esterified hydroxy groups bound to the same carbon skeleton
- C07C219/02—Compounds containing amino and esterified hydroxy groups bound to the same carbon skeleton having esterified hydroxy groups and amino groups bound to acyclic carbon atoms of the same carbon skeleton
- C07C219/04—Compounds containing amino and esterified hydroxy groups bound to the same carbon skeleton having esterified hydroxy groups and amino groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated
- C07C219/06—Compounds containing amino and esterified hydroxy groups bound to the same carbon skeleton having esterified hydroxy groups and amino groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having the hydroxy groups esterified by carboxylic acids having the esterifying carboxyl groups bound to hydrogen atoms or to acyclic carbon atoms of an acyclic saturated carbon skeleton
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C229/00—Compounds containing amino and carboxyl groups bound to the same carbon skeleton
- C07C229/02—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton
- C07C229/04—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated
- C07C229/06—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having only one amino and one carboxyl group bound to the carbon skeleton
- C07C229/10—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having only one amino and one carboxyl group bound to the carbon skeleton the nitrogen atom of the amino group being further bound to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
- C07C229/16—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having only one amino and one carboxyl group bound to the carbon skeleton the nitrogen atom of the amino group being further bound to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings to carbon atoms of hydrocarbon radicals substituted by amino or carboxyl groups, e.g. ethylenediamine-tetra-acetic acid, iminodiacetic acids
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
- C07C271/06—Esters of carbamic acids
- C07C271/08—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
- C07C271/10—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms
- C07C271/16—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms to carbon atoms of hydrocarbon radicals substituted by singly-bound oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F22/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
- C08F22/10—Esters
- C08F22/12—Esters of phenols or saturated alcohols
- C08F22/22—Esters containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/10—Esters
- C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
- C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US23799209P | 2009-08-28 | 2009-08-28 | |
| US61/237,992 | 2009-08-28 | ||
| US28907209P | 2009-12-22 | 2009-12-22 | |
| US61/289,072 | 2009-12-22 | ||
| PCT/US2010/046411 WO2011031442A2 (en) | 2009-08-28 | 2010-08-24 | Polymerizable ionic liquid comprising multifunctional cation and antistatic coatings |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20120079079A KR20120079079A (ko) | 2012-07-11 |
| KR101783062B1 true KR101783062B1 (ko) | 2017-09-28 |
Family
ID=43499809
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020127007828A Expired - Fee Related KR101783062B1 (ko) | 2009-08-28 | 2010-08-24 | 다작용성 양이온을 포함하는 중합성 이온성 액체 및 정전기 방지 코팅 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US8742047B2 (https=) |
| EP (1) | EP2470497A2 (https=) |
| JP (1) | JP5781075B2 (https=) |
| KR (1) | KR101783062B1 (https=) |
| CN (1) | CN103168026B (https=) |
| WO (1) | WO2011031442A2 (https=) |
Families Citing this family (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5157570B2 (ja) * | 2008-03-25 | 2013-03-06 | 日油株式会社 | 重合性イミダゾール塩、その重合体および機能性膜 |
| CN103168026B (zh) * | 2009-08-28 | 2016-06-29 | 3M创新有限公司 | 包含多官能阳离子的可聚合离子液体及抗静电涂料 |
| EP2470509A2 (en) | 2009-08-28 | 2012-07-04 | 3M Innovative Properties Company | Compositions and articles comprising polymerizable ionic liquid mixture, and methods of curing |
| KR101927542B1 (ko) | 2009-08-28 | 2018-12-10 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 정전기 방지 코팅을 갖는 광학 디바이스 |
| EP2515827A2 (en) | 2009-12-22 | 2012-10-31 | 3M Innovative Properties Company | Curable dental compositions and articles comprising polymerizable ionic liquids |
| JP5818879B2 (ja) | 2010-05-18 | 2015-11-18 | スリーエム イノベイティブ プロパティズ カンパニー | 芳香族カルボキシレートアニオンを含む重合性イオン液体 |
| JP5832370B2 (ja) * | 2012-05-14 | 2015-12-16 | 日本合成化学工業株式会社 | イオン液体 |
| KR20150129057A (ko) | 2012-09-20 | 2015-11-18 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 나노입자 및 알킬렌 옥사이드 반복 단위를 포함하는 단량체를 포함하는 미세구조화 필름 |
| JP6836900B6 (ja) | 2013-05-02 | 2021-03-31 | スリーエム イノベイティブ プロパティズ カンパニー | 部分フッ素化エラストマー並びにその製造方法及びその使用方法 |
| US9508371B2 (en) * | 2014-05-06 | 2016-11-29 | Seagate Technology Llc | Slider and/or hard disc including coating, and optionally one or more additives that can dissipate electrical charge |
| WO2015191436A1 (en) | 2014-06-13 | 2015-12-17 | 3M Innovative Properties Company | Curable compositions and methods for isolating a working area |
| CA2959118A1 (en) * | 2014-10-01 | 2016-04-07 | Halliburton Energy Services, Inc. | Polymerizable ionic liquids for use in subterranean formation operations |
| US10308753B2 (en) | 2014-12-16 | 2019-06-04 | 3M Innovative Properties Company | Ionic diol, antistatic polyurethane, and method of making the same |
| US10227426B2 (en) | 2014-12-16 | 2019-03-12 | 3M Innovative Properties Company | Antistatic polymers and methods of making the same |
| EP3233947A1 (en) | 2014-12-16 | 2017-10-25 | 3M Innovative Properties Company | Antistatic polymers and methods of making the same |
| CN104529901A (zh) * | 2014-12-31 | 2015-04-22 | 西北工业大学 | 一种咪唑类不饱和离子液体及其制备方法 |
| CN104710895A (zh) * | 2015-03-24 | 2015-06-17 | 湖州国信物资有限公司 | 一种新型酚醛环氧基建筑涂料及其制备方法 |
| CN106328995A (zh) * | 2015-07-07 | 2017-01-11 | 中国科学院过程工程研究所 | 一种锂离子电池电解液添加剂 |
| EP3402847B1 (de) * | 2016-02-25 | 2020-08-19 | HWK Kronbichler GmbH | Vernetzbare zusammensetzung und verfahren zur herstellung eines beschichteten artikels |
| US9834850B1 (en) | 2016-08-08 | 2017-12-05 | Seagate Technology Llc | Method of forming one or more metal and/or metal alloy layers in processes for making transducers in sliders, and related sliders |
| EP3564324B1 (en) * | 2016-12-29 | 2020-06-03 | Fundacion Cidetec | Coatings having repellent function and use thereof |
| CN111100490A (zh) * | 2017-12-21 | 2020-05-05 | 金华联创塑粉科技有限公司 | 一种产生负氧离子环保涂料的制备方法 |
| CN112423910B (zh) | 2018-07-18 | 2022-09-13 | 阿科玛法国公司 | 使用基于能够聚合的离子型物质的能够固化的组合物而制备的物品 |
| CN110563595A (zh) * | 2019-09-24 | 2019-12-13 | 安徽清科瑞洁新材料有限公司 | 一种低毒低害环保型分散紫27的合成方法 |
| WO2021097532A1 (en) * | 2019-11-22 | 2021-05-27 | Deakin University | Organic corrosion inhibitors |
| WO2021097531A1 (en) * | 2019-11-22 | 2021-05-27 | Deakin University | Polyionic corrosion inhibitors |
| WO2023132214A1 (ja) * | 2022-01-07 | 2023-07-13 | 株式会社カネカ | 硬化性組成物および硬化物 |
| CN116328842B (zh) * | 2022-12-29 | 2024-07-19 | 石家庄铁道大学 | 一种核壳型活化过硫酸盐电催化剂的制备方法 |
| CN116969861A (zh) * | 2023-07-31 | 2023-10-31 | 长沙新宇高分子科技有限公司 | 一种改性二苯甲酮光引发剂及其制备方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007112722A (ja) * | 2005-10-18 | 2007-05-10 | Nof Corp | 重合性イミダゾール塩 |
Family Cites Families (142)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3250808A (en) | 1963-10-31 | 1966-05-10 | Du Pont | Fluorocarbon ethers derived from hexafluoropropylene epoxide |
| US3780092A (en) | 1969-10-20 | 1973-12-18 | Kendall & Co | Monomeric emulsion stabilizers |
| US4049705A (en) | 1976-04-01 | 1977-09-20 | E. I. Du Pont De Nemours And Company | 2-Alkyl-1-naphthol-4-sulfonic acids |
| JPS53282A (en) | 1976-06-24 | 1978-01-05 | Nippon Paint Co Ltd | Thermosetting resin, method of preparing same, and coating composition containing same as main component |
| DE2750030A1 (de) | 1977-11-09 | 1979-05-10 | Basf Ag | Insektizide mittel |
| US4262072A (en) | 1979-06-25 | 1981-04-14 | Minnesota Mining And Manufacturing Company | Poly(ethylenically unsaturated alkoxy) heterocyclic protective coatings |
| JPS6136355Y2 (https=) | 1980-12-04 | 1986-10-22 | ||
| US4619979A (en) | 1984-03-28 | 1986-10-28 | Minnesota Mining And Manufacturing Company | Continuous free radial polymerization in a wiped-surface reactor |
| US4843134A (en) | 1984-03-28 | 1989-06-27 | Minnesota Mining And Manufacturing Company | Acrylate pressure-sensitive adhesives containing insolubles |
| US4503169A (en) | 1984-04-19 | 1985-03-05 | Minnesota Mining And Manufacturing Company | Radiopaque, low visual opacity dental composites containing non-vitreous microparticles |
| DE3536076A1 (de) | 1985-10-09 | 1987-04-09 | Muehlbauer Ernst Kg | Polymerisierbare zementmischungen |
| US4933405A (en) | 1986-06-10 | 1990-06-12 | The Dow Chemical Company | Homogeneous copolymerization of non-polar monomers with ionic amphiphilic monomers |
| US5159035A (en) | 1986-06-10 | 1992-10-27 | The Dow Chemical Company | Homogenous copolymerization of non-polar monomers with ionic amphiphilic monomers |
| CA1323949C (en) | 1987-04-02 | 1993-11-02 | Michael C. Palazzotto | Ternary photoinitiator system for addition polymerization |
| AU618772B2 (en) | 1987-12-30 | 1992-01-09 | Minnesota Mining And Manufacturing Company | Photocurable ionomer cement systems |
| JPH0627047B2 (ja) | 1988-12-16 | 1994-04-13 | 而至歯科工業株式会社 | 歯科用グラスアイオノマーセメント組成物 |
| US5175030A (en) | 1989-02-10 | 1992-12-29 | Minnesota Mining And Manufacturing Company | Microstructure-bearing composite plastic articles and method of making |
| US5183597A (en) | 1989-02-10 | 1993-02-02 | Minnesota Mining And Manufacturing Company | Method of molding microstructure bearing composite plastic articles |
| US5161041A (en) | 1990-04-26 | 1992-11-03 | Ois Optical Imaging Systems, Inc. | Lighting assembly for a backlit electronic display including an integral image splitting and collimating means |
| US5154762A (en) | 1991-05-31 | 1992-10-13 | Minnesota Mining And Manufacturing Company | Universal water-based medical and dental cement |
| JPH0741528Y2 (ja) | 1991-06-18 | 1995-09-27 | 株式会社盛光 | 折曲機用前受台 |
| DE4129244A1 (de) | 1991-09-03 | 1993-03-04 | Henkel Kgaa | Waessrige dispersionen von neuen amphiphilen co-oligomeren fuer die wasch- und reinigungsbestaendige fettende ausruestung von leder und pelzfellen sowie ihre verwendung |
| JP3068284B2 (ja) | 1991-10-04 | 2000-07-24 | 帝人株式会社 | 帯電防止性合成樹脂成形品 |
| EP0537774B1 (en) | 1991-10-18 | 1998-01-07 | Kuraray Co., Ltd. | Antimicrobial polymerizable composition, the polymer and article obtained from the same |
| JPH05163317A (ja) | 1991-12-17 | 1993-06-29 | Nippon Kayaku Co Ltd | 樹脂組成物、光ディスク用材料及びその硬化物 |
| US5367002A (en) | 1992-02-06 | 1994-11-22 | Dentsply Research & Development Corp. | Dental composition and method |
| US5227413A (en) | 1992-02-27 | 1993-07-13 | Minnesota Mining And Manufacturing Company | Cements from β-dicarbonyl polymers |
| US5427835A (en) | 1992-06-04 | 1995-06-27 | Minnesota Mining And Manufacturing Company | Sulfopolymer/vanadium oxide antistatic compositions |
| JPH06128501A (ja) | 1992-10-20 | 1994-05-10 | Nippon Kayaku Co Ltd | 樹脂組成物、光ディスク用材料及びその硬化物 |
| JPH06180859A (ja) | 1992-12-11 | 1994-06-28 | Mitsubishi Rayon Co Ltd | 耐擦傷性および帯電防止性に優れた光ディスク用コーティング材および光ディスク |
| US5534322A (en) | 1993-06-29 | 1996-07-09 | Kao Corporation | Recording medium |
| JPH0741528A (ja) * | 1993-08-02 | 1995-02-10 | Nippon Kayaku Co Ltd | 放射線硬化性樹脂組成物およびその硬化物 |
| US5882774A (en) | 1993-12-21 | 1999-03-16 | Minnesota Mining And Manufacturing Company | Optical film |
| US5828488A (en) | 1993-12-21 | 1998-10-27 | Minnesota Mining And Manufacturing Co. | Reflective polarizer display |
| US5501727A (en) | 1994-02-28 | 1996-03-26 | Minnesota Mining And Manufacturing Company | Color stability of dental compositions containing metal complexed ascorbic acid |
| JP3471431B2 (ja) | 1994-07-18 | 2003-12-02 | 株式会社ジーシー | 歯科用グラスアイオノマーセメント組成物 |
| US5804610A (en) | 1994-09-09 | 1998-09-08 | Minnesota Mining And Manufacturing Company | Methods of making packaged viscoelastic compositions |
| WO1996027757A1 (en) | 1995-03-03 | 1996-09-12 | Minnesota Mining And Manufacturing Company | Light directing film having variable height structured surface and light directing article constructed therefrom |
| GB9515720D0 (en) | 1995-08-01 | 1995-10-04 | Zeneca Ltd | Bacterial coating compositions |
| US5626654A (en) | 1995-12-05 | 1997-05-06 | Xerox Corporation | Ink compositions containing liposomes |
| US5637646A (en) | 1995-12-14 | 1997-06-10 | Minnesota Mining And Manufacturing Company | Bulk radical polymerization using a batch reactor |
| US5783120A (en) | 1996-02-29 | 1998-07-21 | Minnesota Mining And Manufacturing Company | Method for making an optical film |
| US5825543A (en) | 1996-02-29 | 1998-10-20 | Minnesota Mining And Manufacturing Company | Diffusely reflecting polarizing element including a first birefringent phase and a second phase |
| JP3092511B2 (ja) | 1996-03-29 | 2000-09-25 | 荒川化学工業株式会社 | 活性エネルギー線硬化型プラスチック用コーティング剤および該コーティング剤で表面処理してなるプラスチック成形物 |
| US5919551A (en) | 1996-04-12 | 1999-07-06 | 3M Innovative Properties Company | Variable pitch structured optical film |
| US5871360A (en) | 1996-12-31 | 1999-02-16 | Gc Corporation | Method for restoration of a cavity of a tooth using a resin reinforced type glass ionomer cement |
| US5788749A (en) * | 1997-02-14 | 1998-08-04 | Xerox Corporation | Pigmented ink compositions containing liposomes |
| JP4083257B2 (ja) | 1997-03-19 | 2008-04-30 | 株式会社ジーシー | 歯科充填用レジン組成物 |
| US6280063B1 (en) | 1997-05-09 | 2001-08-28 | 3M Innovative Properties Company | Brightness enhancement article |
| US5965632A (en) | 1997-06-20 | 1999-10-12 | Scientific Pharmaceuticals Inc. | Dental cement compositions |
| US6577358B1 (en) | 1997-06-25 | 2003-06-10 | Dai Nippon Printing Co., Ltd. | Lens film with conductive lens layer or conductive layer |
| US5859089A (en) | 1997-07-01 | 1999-01-12 | The Kerr Corporation | Dental restorative compositions |
| KR100235229B1 (ko) | 1997-11-26 | 1999-12-15 | 이행우 | 광경화형 방무성 조성물용 4급 암모늄염, 이의 제법 및 이를 포함하는 광경화형 방무성 조성물 |
| EP1975649A1 (en) | 1998-02-18 | 2008-10-01 | Minnesota Mining And Manufacturing Company | Optical film |
| JP3576862B2 (ja) | 1998-04-28 | 2004-10-13 | キヤノン株式会社 | インク、画像形成方法及び光重合開始剤 |
| US6030606A (en) | 1998-06-22 | 2000-02-29 | 3M Innovative Properties Company | Dental restoratives comprising Bis-EMA6 |
| AU763355B2 (en) | 1998-08-20 | 2003-07-17 | Kuraray Co., Ltd. | Bonding compositions for dental use |
| US6277471B1 (en) | 1999-06-18 | 2001-08-21 | Shih Chieh Tang | Brightness enhancement film |
| US6372829B1 (en) | 1999-10-06 | 2002-04-16 | 3M Innovative Properties Company | Antistatic composition |
| US6572693B1 (en) | 1999-10-28 | 2003-06-03 | 3M Innovative Properties Company | Aesthetic dental materials |
| US6387981B1 (en) | 1999-10-28 | 2002-05-14 | 3M Innovative Properties Company | Radiopaque dental materials with nano-sized particles |
| DE60042038D1 (de) | 1999-10-28 | 2009-05-28 | 3M Innovative Properties Co | Siliziumdioxid-Nanoteilchen in Form eines trockenen Pulvers |
| US6730156B1 (en) | 1999-10-28 | 2004-05-04 | 3M Innovative Properties Company | Clustered particle dental fillers |
| JP4636644B2 (ja) * | 2000-01-17 | 2011-02-23 | 富士フイルム株式会社 | 電解質組成物、電気化学電池およびイオン性液晶モノマー |
| JP2001199961A (ja) * | 2000-01-21 | 2001-07-24 | Fuji Photo Film Co Ltd | 重合性溶融塩モノマー、電解質組成物および電気化学電池 |
| US6581286B2 (en) | 2000-04-05 | 2003-06-24 | 3M Innovative Properties Company | Method of making tool to produce optical film |
| CN1177002C (zh) | 2000-05-22 | 2004-11-24 | 可乐丽股份有限公司 | 抗菌性组合物 |
| JP4667575B2 (ja) | 2000-09-27 | 2011-04-13 | 富士フイルム株式会社 | 1,3−ジアルキルイミダゾリウムヨウ素塩の製造方法 |
| DE10100455A1 (de) | 2001-01-08 | 2002-07-11 | Creavis Tech & Innovation Gmbh | Neuartige Polymerbindersysteme mit ionischen Flüssigkeiten |
| IL156901A0 (en) * | 2001-01-16 | 2004-02-08 | Univ Ben Gurion | Amphiphilic derivatives for the production of vesicles, micelles and complexants, and precursors thereof |
| DE10106372A1 (de) | 2001-02-12 | 2002-08-29 | Ivoclar Vivadent Ag | Thermochromer Dentalwerkstoff |
| US6765038B2 (en) | 2001-07-27 | 2004-07-20 | 3M Innovative Properties Company | Glass ionomer cement |
| EP2275077A3 (en) | 2001-08-15 | 2014-07-16 | 3M Innovative Properties Co. | Hardenable self-supporting structures and methods |
| DE60232942D1 (de) | 2001-10-09 | 2009-08-27 | Mitsubishi Chem Corp | Strahlungshärtbare Beschichtungszusammensetzung |
| US6740413B2 (en) | 2001-11-05 | 2004-05-25 | 3M Innovative Properties Company | Antistatic compositions |
| JP2003149875A (ja) | 2001-11-08 | 2003-05-21 | Fuji Photo Film Co Ltd | 静電写真用液体現像剤 |
| JP2004006232A (ja) | 2001-12-27 | 2004-01-08 | Sanyo Chem Ind Ltd | 高分子電解質 |
| CN1319507C (zh) | 2002-01-31 | 2007-06-06 | 3M创新有限公司 | 牙科糊剂、牙科制品和方法 |
| DE10206117A1 (de) | 2002-02-13 | 2003-08-14 | Basf Ag | Acyl- und Bisacylphosphinderivate |
| EP1507814B1 (en) | 2002-05-24 | 2007-11-21 | 3M Innovative Properties Company | Fluorochemical composition comprising a fluorinated polyether and treatment of a fibrous substrate therewith |
| US20040185013A1 (en) | 2003-01-30 | 2004-09-23 | Burgio Paul A. | Dental whitening compositions and methods |
| JP4134306B2 (ja) | 2003-02-25 | 2008-08-20 | 独立行政法人科学技術振興機構 | カーボンナノチューブ/ポリマー複合体及びその製法 |
| TW582552U (en) | 2003-03-24 | 2004-04-01 | Shih-Chieh Tang | Brightness unit structure for a brightness enhancement film |
| AU2004266623B8 (en) | 2003-08-12 | 2011-10-27 | 3M Deutschland Gmbh | Self-etching dental compositions and methods |
| US7074463B2 (en) | 2003-09-12 | 2006-07-11 | 3M Innovative Properties Company | Durable optical element |
| JP2005223967A (ja) | 2004-02-03 | 2005-08-18 | Matsushita Electric Ind Co Ltd | 柔軟アクチュエータ |
| JP4780269B2 (ja) * | 2004-03-11 | 2011-09-28 | 日清紡ホールディングス株式会社 | 無溶剤型液状組成物 |
| US7090721B2 (en) | 2004-05-17 | 2006-08-15 | 3M Innovative Properties Company | Use of nanoparticles to adjust refractive index of dental compositions |
| US7649029B2 (en) | 2004-05-17 | 2010-01-19 | 3M Innovative Properties Company | Dental compositions containing nanozirconia fillers |
| US7156911B2 (en) | 2004-05-17 | 2007-01-02 | 3M Innovative Properties Company | Dental compositions containing nanofillers and related methods |
| US7090722B2 (en) | 2004-05-17 | 2006-08-15 | 3M Innovative Properties Company | Acid-reactive dental fillers, compositions, and methods |
| US8168830B2 (en) | 2004-07-23 | 2012-05-01 | Sigma-Aldrich Co. Llc | High stability diionic liquid salts |
| US8449652B2 (en) | 2004-08-05 | 2013-05-28 | University Of Wyoming | Poly(ionic liquid)s as new materials for CO2 separation and other applications |
| US20060035997A1 (en) | 2004-08-10 | 2006-02-16 | Orlowski Jan A | Curable acrylate polymer compositions featuring improved flexural characteristics |
| US7345137B2 (en) | 2004-10-18 | 2008-03-18 | 3M Innovative Properties Company | Modified copolyesters and optical films including modified copolyesters |
| US8703902B2 (en) | 2004-11-10 | 2014-04-22 | University Of Wyoming | Polymers and copolymers of ionic liquids as radio frequency absorbing materials |
| JP4888680B2 (ja) | 2004-11-15 | 2012-02-29 | パイオトレック株式会社 | 帯電防止剤およびその使用方法 |
| US7241437B2 (en) | 2004-12-30 | 2007-07-10 | 3M Innovative Properties Company | Zirconia particles |
| JP5039567B2 (ja) | 2005-02-16 | 2012-10-03 | ダウ・コーニング・コーポレイション | ポリマー粒子、および、有機ボランアミン錯体を用いた封入(encapsulated)組成物 |
| JP4830314B2 (ja) | 2005-02-28 | 2011-12-07 | 住友ベークライト株式会社 | イオン伝導性電解質用組成物、イオン伝導性電解質、及び該イオン伝導性電解質を用いた二次電池 |
| US20060216524A1 (en) | 2005-03-23 | 2006-09-28 | 3M Innovative Properties Company | Perfluoropolyether urethane additives having (meth)acryl groups and hard coats |
| JP2006282877A (ja) * | 2005-03-31 | 2006-10-19 | Fuji Photo Film Co Ltd | インク組成物、並びに、これを用いた画像形成方法および記録物 |
| TWI274896B (en) | 2005-06-30 | 2007-03-01 | Efun Technology Co Ltd | Brightness enhancement film having reinforcing layer |
| WO2007030679A2 (en) | 2005-09-07 | 2007-03-15 | The Regents Of The University Of California | Materials for the formation of polymer junction diodes |
| US20080251065A1 (en) | 2005-09-11 | 2008-10-16 | Gurin Michael H | Supercritical Flat Panel Collector and Methods of Use |
| TWI391711B (zh) | 2005-09-13 | 2013-04-01 | 迎輝科技股份有限公司 | 具有導光構造之聚光片 |
| JP5145938B2 (ja) | 2005-09-16 | 2013-02-20 | 大日本印刷株式会社 | 帯電防止防眩フィルム |
| BRPI0620365A2 (pt) | 2005-12-23 | 2011-11-08 | Basf Se | processo para a preparação de biopolìmeros regenerados na forma de carboidratos, biopolìmero regenerado na forma de carboidratos, fibras fiadas, sistema de solução para biopolìmeros na forma de carboidratos, e, processo para a preparação de um sistema de solução |
| JP2007234339A (ja) * | 2006-02-28 | 2007-09-13 | Three M Innovative Properties Co | 溶媒組成物及び電気化学デバイス |
| JP5067728B2 (ja) * | 2006-03-15 | 2012-11-07 | 独立行政法人国立高等専門学校機構 | ポリマー電解質、及びその製造方法 |
| EP1849450B1 (de) | 2006-04-28 | 2009-11-25 | Ivoclar Vivadent AG | Dentalwerkstoffe auf der Basis radikalisch polymerisierbarer Makromere mit antimikrobieller Wirkung |
| JP4992077B2 (ja) | 2006-05-19 | 2012-08-08 | 国立大学法人 鹿児島大学 | セルロース−高分子イオン液体ハイブリッドの製造方法 |
| JP4672600B2 (ja) | 2006-05-31 | 2011-04-20 | 大日精化工業株式会社 | 帯電防止フィルムおよび帯電防止層形成用塗料 |
| BRPI0713591A2 (pt) | 2006-06-14 | 2012-11-06 | Ciba Holding Inc. | composições antimicrobianas |
| WO2008021533A2 (en) | 2006-08-18 | 2008-02-21 | The Government Of The United States Of America, As Represented By The Secretary Of The Navy | Polymerizable sulfonate ionic liquids and liquid polymers therefrom and methods of making same |
| JP5600863B2 (ja) | 2006-09-29 | 2014-10-08 | 東レ株式会社 | シリコーンポリマー、眼用レンズおよびコンタクトレンズ |
| US20080124555A1 (en) | 2006-11-29 | 2008-05-29 | 3M Innovative Properties Company | Polymerizable composition comprising perfluoropolyether urethane having ethylene oxide repeat units |
| US8043418B2 (en) | 2006-12-08 | 2011-10-25 | General Electric Company | Gas separator apparatus |
| JP5239164B2 (ja) | 2007-01-24 | 2013-07-17 | セイコーエプソン株式会社 | カプセル化物の製造方法及びカプセル化物 |
| JP5041518B2 (ja) | 2007-04-05 | 2012-10-03 | 日本カーリット株式会社 | 帯電防止用組成物および帯電防止ハードコート形成物 |
| GB2449926A (en) | 2007-06-08 | 2008-12-10 | Seiko Epson Corp | Method for manufacturing an electrolyte pattern |
| US8986812B2 (en) | 2007-07-09 | 2015-03-24 | 3M Innovative Properties Company | Thin microstructured optical films |
| JP5298680B2 (ja) | 2007-07-24 | 2013-09-25 | 住友化学株式会社 | 有機トランジスタ絶縁膜用組成物 |
| WO2009029438A1 (en) | 2007-08-31 | 2009-03-05 | 3M Innovative Properties Company | Hardcoats |
| EP2033626A3 (de) | 2007-09-05 | 2010-03-17 | Basf Se | Imidazoliumalkyl(meth)acrylat-Polymere |
| JP2009149828A (ja) | 2007-12-25 | 2009-07-09 | Sanyo Chem Ind Ltd | マイクロ波硬化性組成物 |
| JP5260273B2 (ja) | 2007-12-27 | 2013-08-14 | 三洋化成工業株式会社 | 活性エネルギー線硬化型帯電防止性樹脂組成物 |
| JP2009179671A (ja) * | 2008-01-30 | 2009-08-13 | Toyo Ink Mfg Co Ltd | 難水溶性帯電防止性重合性化合物、及び該化合物を含有する帯電防止性重合性組成物、並びに帯電防止性を有する重合体 |
| JP5398992B2 (ja) | 2008-01-31 | 2014-01-29 | 三洋化成工業株式会社 | 活性エネルギー線硬化型帯電防止性樹脂組成物 |
| JP2009227949A (ja) | 2008-02-28 | 2009-10-08 | Sanyo Chem Ind Ltd | マイクロ波硬化性組成物 |
| JP4964806B2 (ja) | 2008-02-29 | 2012-07-04 | 三洋化成工業株式会社 | 導電性樹脂組成物および帯電防止性樹脂組成物 |
| JP5214490B2 (ja) | 2008-03-31 | 2013-06-19 | 三洋化成工業株式会社 | 活性エネルギー線硬化型帯電防止性樹脂組成物 |
| JP2009269974A (ja) | 2008-05-02 | 2009-11-19 | Three M Innovative Properties Co | ゲル状組成物とその製造方法、およびそれを用いた衝撃吸収材 |
| US20110076424A1 (en) | 2008-06-03 | 2011-03-31 | 3M Innovative Properties Company | Microstructures comprising polyalkyl nitrogen or phosphorus onium fluoroalkyl sulfonyl salts |
| JP5163317B2 (ja) | 2008-06-30 | 2013-03-13 | オムロン株式会社 | 接点装置 |
| MY158742A (en) | 2008-12-19 | 2016-11-15 | Sanyo Chemical Ind Ltd | Cleaning agent for electronic materials |
| CN103168026B (zh) * | 2009-08-28 | 2016-06-29 | 3M创新有限公司 | 包含多官能阳离子的可聚合离子液体及抗静电涂料 |
| EP2470509A2 (en) * | 2009-08-28 | 2012-07-04 | 3M Innovative Properties Company | Compositions and articles comprising polymerizable ionic liquid mixture, and methods of curing |
| KR101927542B1 (ko) | 2009-08-28 | 2018-12-10 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 정전기 방지 코팅을 갖는 광학 디바이스 |
| EP2515827A2 (en) | 2009-12-22 | 2012-10-31 | 3M Innovative Properties Company | Curable dental compositions and articles comprising polymerizable ionic liquids |
| WO2011146326A1 (en) | 2010-05-18 | 2011-11-24 | 3M Innovative Properties Company | Polymerizable ionic liquid compositions |
| JP5818879B2 (ja) | 2010-05-18 | 2015-11-18 | スリーエム イノベイティブ プロパティズ カンパニー | 芳香族カルボキシレートアニオンを含む重合性イオン液体 |
-
2010
- 2010-08-24 CN CN201080040459.4A patent/CN103168026B/zh not_active Expired - Fee Related
- 2010-08-24 KR KR1020127007828A patent/KR101783062B1/ko not_active Expired - Fee Related
- 2010-08-24 WO PCT/US2010/046411 patent/WO2011031442A2/en not_active Ceased
- 2010-08-24 US US13/380,252 patent/US8742047B2/en active Active
- 2010-08-24 EP EP10750202A patent/EP2470497A2/en not_active Withdrawn
- 2010-08-24 JP JP2012526891A patent/JP5781075B2/ja not_active Expired - Fee Related
-
2014
- 2014-04-02 US US14/243,049 patent/US9458327B2/en active Active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007112722A (ja) * | 2005-10-18 | 2007-05-10 | Nof Corp | 重合性イミダゾール塩 |
Non-Patent Citations (1)
| Title |
|---|
| 논문 Polymer Composites, Vol. 30, No. 5, pp. 612-618 (2009.05) |
Also Published As
| Publication number | Publication date |
|---|---|
| US9458327B2 (en) | 2016-10-04 |
| US8742047B2 (en) | 2014-06-03 |
| JP5781075B2 (ja) | 2015-09-16 |
| US20120149800A1 (en) | 2012-06-14 |
| CN103168026A (zh) | 2013-06-19 |
| JP2013506008A (ja) | 2013-02-21 |
| EP2470497A2 (en) | 2012-07-04 |
| WO2011031442A2 (en) | 2011-03-17 |
| US20140213726A1 (en) | 2014-07-31 |
| KR20120079079A (ko) | 2012-07-11 |
| WO2011031442A3 (en) | 2015-09-17 |
| CN103168026B (zh) | 2016-06-29 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR101783062B1 (ko) | 다작용성 양이온을 포함하는 중합성 이온성 액체 및 정전기 방지 코팅 | |
| US11807795B2 (en) | Optical device with antistatic coating | |
| JP5800812B2 (ja) | 重合性イオン液体混合物を含む組成物及び物品並びに硬化方法 | |
| KR101729342B1 (ko) | 중합성 자외선 흡수제를 포함하는 미세구조화 광학 필름 | |
| JP5818879B2 (ja) | 芳香族カルボキシレートアニオンを含む重合性イオン液体 | |
| TWI488910B (zh) | 光硬化性樹脂組成物、使用其的光學膜的製造方法及含有其的光學膜 | |
| TWI593755B (zh) | Polymerizable composition and hardened | cured material | |
| CN104804150A (zh) | 微结构光学薄膜 | |
| TWI461757B (zh) | 偏光板及其製法 | |
| EP1258742B1 (en) | Light-resistant microlens array and resin composition for use therein | |
| TW201404787A (zh) | 包覆材料用樹脂組合物 | |
| WO2012147708A1 (ja) | 硬化性組成物および光学用接着剤 | |
| EP1316820A1 (en) | Lens made of synthetic resin and process for producing the same | |
| EP0284374A2 (en) | Polymerizable vinyl compound having polythioether skeleton, process for preparation thereof and optical element made therefrom | |
| JP2003506499A (ja) | 透明ポリマー基質の製造用の重合可能な組成物、得られる透明ポリマー基質およびその光学的利用 | |
| JP2009057560A (ja) | 熱可塑性ポリマーおよび熱硬化性ポリマーのブレンドに基づく透明成形品の製造方法 | |
| JPH10182770A (ja) | 光重合性組成物及び透明硬化体 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0105 | International application |
St.27 status event code: A-0-1-A10-A15-nap-PA0105 |
|
| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
|
| A201 | Request for examination | ||
| AMND | Amendment | ||
| E13-X000 | Pre-grant limitation requested |
St.27 status event code: A-2-3-E10-E13-lim-X000 |
|
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| PA0201 | Request for examination |
St.27 status event code: A-1-2-D10-D11-exm-PA0201 |
|
| P22-X000 | Classification modified |
St.27 status event code: A-2-2-P10-P22-nap-X000 |
|
| D13-X000 | Search requested |
St.27 status event code: A-1-2-D10-D13-srh-X000 |
|
| D14-X000 | Search report completed |
St.27 status event code: A-1-2-D10-D14-srh-X000 |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
St.27 status event code: A-1-2-D10-D21-exm-PE0902 |
|
| AMND | Amendment | ||
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| E601 | Decision to refuse application | ||
| PE0601 | Decision on rejection of patent |
St.27 status event code: N-2-6-B10-B15-exm-PE0601 |
|
| AMND | Amendment | ||
| E13-X000 | Pre-grant limitation requested |
St.27 status event code: A-2-3-E10-E13-lim-X000 |
|
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| PX0901 | Re-examination |
St.27 status event code: A-2-3-E10-E12-rex-PX0901 |
|
| PX0701 | Decision of registration after re-examination |
St.27 status event code: A-3-4-F10-F13-rex-PX0701 |
|
| X701 | Decision to grant (after re-examination) | ||
| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
St.27 status event code: A-2-4-F10-F11-exm-PR0701 |
|
| PR1002 | Payment of registration fee |
St.27 status event code: A-2-2-U10-U12-oth-PR1002 Fee payment year number: 1 |
|
| PG1601 | Publication of registration |
St.27 status event code: A-4-4-Q10-Q13-nap-PG1601 |
|
| PC1903 | Unpaid annual fee |
St.27 status event code: A-4-4-U10-U13-oth-PC1903 Not in force date: 20200923 Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE |
|
| PC1903 | Unpaid annual fee |
St.27 status event code: N-4-6-H10-H13-oth-PC1903 Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE Not in force date: 20200923 |
|
| P22-X000 | Classification modified |
St.27 status event code: A-4-4-P10-P22-nap-X000 |