KR101697231B1 - 노광 장치 및 디바이스 제조 방법 - Google Patents

노광 장치 및 디바이스 제조 방법 Download PDF

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Publication number
KR101697231B1
KR101697231B1 KR1020130066235A KR20130066235A KR101697231B1 KR 101697231 B1 KR101697231 B1 KR 101697231B1 KR 1020130066235 A KR1020130066235 A KR 1020130066235A KR 20130066235 A KR20130066235 A KR 20130066235A KR 101697231 B1 KR101697231 B1 KR 101697231B1
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South Korea
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exposure
vibration
substrate
control unit
stage
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Korean (ko)
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KR20130139177A (ko
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마사토시 엔도
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캐논 가부시끼가이샤
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

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  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020130066235A 2012-06-12 2013-06-11 노광 장치 및 디바이스 제조 방법 Active KR101697231B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012133273A JP6066592B2 (ja) 2012-06-12 2012-06-12 露光装置及びデバイス製造方法
JPJP-P-2012-133273 2012-06-12

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020170004131A Division KR101839358B1 (ko) 2012-06-12 2017-01-11 노광 장치 및 디바이스 제조 방법

Publications (2)

Publication Number Publication Date
KR20130139177A KR20130139177A (ko) 2013-12-20
KR101697231B1 true KR101697231B1 (ko) 2017-01-17

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ID=49715063

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020130066235A Active KR101697231B1 (ko) 2012-06-12 2013-06-11 노광 장치 및 디바이스 제조 방법
KR1020170004131A Active KR101839358B1 (ko) 2012-06-12 2017-01-11 노광 장치 및 디바이스 제조 방법

Family Applications After (1)

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KR1020170004131A Active KR101839358B1 (ko) 2012-06-12 2017-01-11 노광 장치 및 디바이스 제조 방법

Country Status (4)

Country Link
US (1) US9946169B2 (https=)
JP (1) JP6066592B2 (https=)
KR (2) KR101697231B1 (https=)
CN (2) CN103488053B (https=)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003258559A (ja) * 2002-03-04 2003-09-12 Matsushita Electric Ind Co Ltd ポップノイズ防止用ミュート回路およびスピーカー駆動回路
JP6438219B2 (ja) * 2014-06-17 2018-12-12 キヤノン株式会社 ステージ装置、リソグラフィ装置、物品の製造方法、および決定方法
CN117859984A (zh) 2016-07-28 2024-04-12 莱施菲公司 人造睫毛嫁接物
US9835959B1 (en) * 2016-10-17 2017-12-05 Cymer, Llc Controlling for wafer stage vibration
CN113425069B (zh) 2016-12-20 2025-07-08 拉什菲股份有限公司 施用器和制造施用器的方法
JP7005183B2 (ja) * 2017-06-19 2022-01-21 キヤノン株式会社 露光方法、露光装置および、物品製造方法
US11647802B2 (en) 2018-10-19 2023-05-16 Lashify, Inc. Cases for storing lash extensions and methods for use and manufacture thereof
USD863679S1 (en) 2018-10-19 2019-10-15 Lashify, Inc. False eyelash applicator
JP1670874S (https=) 2018-10-19 2020-10-26
USD995914S1 (en) 2022-07-20 2023-08-15 Lashify, Inc. Combined tweezer and applicator for artificial lash extensions
USD984050S1 (en) 2022-07-20 2023-04-18 Lashify, Inc. Combined curler and applicator for natural lashes and artificial lash extensions
USD980521S1 (en) 2022-07-20 2023-03-07 Lashify, Inc. Artificial lash extension separating comb
USD1072354S1 (en) 2024-01-08 2025-04-22 Lashify, Inc. Rounded tweezer and applicator for artificial lash extensions

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000082662A (ja) * 1998-06-23 2000-03-21 Canon Inc 露光装置及び除振装置、システム同定装置及びその方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5760878A (en) 1995-08-30 1998-06-02 Canon Kabushiki Kaisha Exposure apparatus and alignment discrimination method
JP3564833B2 (ja) * 1995-11-10 2004-09-15 株式会社ニコン 露光方法
JPH09219361A (ja) * 1996-02-09 1997-08-19 Nikon Corp 露光装置
JPH10199795A (ja) * 1997-01-14 1998-07-31 Nikon Corp 走査露光方法及び装置
JPH1187233A (ja) * 1997-09-08 1999-03-30 Canon Inc 投影露光装置
JP4194160B2 (ja) 1998-02-19 2008-12-10 キヤノン株式会社 投影露光装置
JP2001291662A (ja) * 2000-02-04 2001-10-19 Nikon Corp 露光方法及び露光装置、並びにデバイス製造方法
JP2002110526A (ja) * 2000-10-03 2002-04-12 Canon Inc 走査露光方法及び走査露光装置
KR100629390B1 (ko) 2004-09-21 2006-09-29 삼성전자주식회사 광학계 위치제어수단을 갖는 반도체 제조용 노광장치 및이를 이용한 노광방법
US7417714B2 (en) 2004-11-02 2008-08-26 Nikon Corporation Stage assembly with measurement system initialization, vibration compensation, low transmissibility, and lightweight fine stage
EP2357529A3 (en) 2005-06-02 2015-09-02 Carl Zeiss SMT GmbH Optical imaging arrangement
US7804579B2 (en) 2007-06-21 2010-09-28 Asml Netherlands B.V. Control system, lithographic projection apparatus, method of controlling a support structure, and a computer program product

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000082662A (ja) * 1998-06-23 2000-03-21 Canon Inc 露光装置及び除振装置、システム同定装置及びその方法

Also Published As

Publication number Publication date
US20130329207A1 (en) 2013-12-12
KR101839358B1 (ko) 2018-03-16
JP2013258283A (ja) 2013-12-26
JP6066592B2 (ja) 2017-01-25
CN103488053A (zh) 2014-01-01
US9946169B2 (en) 2018-04-17
CN105242498A (zh) 2016-01-13
KR20130139177A (ko) 2013-12-20
CN103488053B (zh) 2015-11-18
KR20170010027A (ko) 2017-01-25

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