JP2022127394A5 - - Google Patents
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- JP2022127394A5 JP2022127394A5 JP2021025523A JP2021025523A JP2022127394A5 JP 2022127394 A5 JP2022127394 A5 JP 2022127394A5 JP 2021025523 A JP2021025523 A JP 2021025523A JP 2021025523 A JP2021025523 A JP 2021025523A JP 2022127394 A5 JP2022127394 A5 JP 2022127394A5
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- Prior art keywords
- measuring device
- distance
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- detection
- processing unit
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- 238000005259 measurement Methods 0.000 claims description 44
- 238000001514 detection method Methods 0.000 claims description 41
- 238000012545 processing Methods 0.000 claims description 32
- 239000000758 substrate Substances 0.000 claims description 13
- 238000012360 testing method Methods 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 8
- 238000001459 lithography Methods 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 238000000605 extraction Methods 0.000 description 12
- 125000004122 cyclic group Chemical group 0.000 description 10
- 239000000463 material Substances 0.000 description 6
- 238000012935 Averaging Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021025523A JP7518782B2 (ja) | 2021-02-19 | 2021-02-19 | 計測装置、リソグラフィ装置、および物品の製造方法 |
| TW111103268A TWI859503B (zh) | 2021-02-19 | 2022-01-26 | 測量設備、微影設備及物品製造方法 |
| US17/671,661 US12585202B2 (en) | 2021-02-19 | 2022-02-15 | Measurement apparatus, lithography apparatus, and method of manufacturing article |
| KR1020220021184A KR102932934B1 (ko) | 2021-02-19 | 2022-02-18 | 계측 장치, 리소그래피 장치, 및 물품의 제조 방법 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021025523A JP7518782B2 (ja) | 2021-02-19 | 2021-02-19 | 計測装置、リソグラフィ装置、および物品の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2022127394A JP2022127394A (ja) | 2022-08-31 |
| JP2022127394A5 true JP2022127394A5 (https=) | 2023-12-04 |
| JP7518782B2 JP7518782B2 (ja) | 2024-07-18 |
Family
ID=82899558
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021025523A Active JP7518782B2 (ja) | 2021-02-19 | 2021-02-19 | 計測装置、リソグラフィ装置、および物品の製造方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US12585202B2 (https=) |
| JP (1) | JP7518782B2 (https=) |
| KR (1) | KR102932934B1 (https=) |
| TW (1) | TWI859503B (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2025021731A (ja) * | 2023-08-01 | 2025-02-14 | キヤノン株式会社 | インプリント装置及び物品の製造方法 |
| JP2025110705A (ja) * | 2024-01-16 | 2025-07-29 | 株式会社ニューフレアテクノロジー | 荷電粒子ビーム描画の偏向位置調整方法及び荷電粒子ビーム描画方法 |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6201609B1 (en) | 1999-08-27 | 2001-03-13 | Zygo Corporation | Interferometers utilizing polarization preserving optical systems |
| US6687013B2 (en) * | 2000-03-28 | 2004-02-03 | Hitachi, Ltd. | Laser interferometer displacement measuring system, exposure apparatus, and electron beam lithography apparatus |
| US7227612B2 (en) * | 2004-09-10 | 2007-06-05 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| JP2006250826A (ja) | 2005-03-11 | 2006-09-21 | Yamagata Prefecture | 計測素子、加工装置および計測方法、屈折率の計測素子 |
| JP2007234685A (ja) | 2006-02-28 | 2007-09-13 | Canon Inc | 測定装置、当該測定装置を有する露光装置及びデバイス製造方法 |
| JP4494438B2 (ja) * | 2007-06-15 | 2010-06-30 | 株式会社オプセル | レーザ走査干渉計 |
| JP2010014536A (ja) | 2008-07-03 | 2010-01-21 | Yamagata Prefecture | 加工装置に搭載される被測定物の計測方法および計測装置 |
| US8120781B2 (en) | 2008-11-26 | 2012-02-21 | Zygo Corporation | Interferometric systems and methods featuring spectral analysis of unevenly sampled data |
| JP5602538B2 (ja) | 2010-03-03 | 2014-10-08 | キヤノン株式会社 | 光波干渉計測装置 |
| US10124410B2 (en) * | 2010-09-25 | 2018-11-13 | Ipg Photonics Corporation | Methods and systems for coherent imaging and feedback control for modification of materials |
| US9223227B2 (en) * | 2011-02-11 | 2015-12-29 | Asml Netherlands B.V. | Inspection apparatus and method, lithographic apparatus, lithographic processing cell and device manufacturing method |
| WO2012117614A1 (ja) | 2011-03-03 | 2012-09-07 | 三洋電機株式会社 | 情報取得装置及びその情報取得装置を有する物体検出装置 |
| JP6082320B2 (ja) | 2013-06-05 | 2017-02-15 | 日本電信電話株式会社 | 光軸調整装置及びその工程 |
| HK1225513A1 (zh) * | 2014-01-16 | 2017-09-08 | 株式会社尼康 | 曝光装置及曝光方法、以及器件制造方法 |
| JP6655888B2 (ja) | 2014-08-20 | 2020-03-04 | キヤノン株式会社 | 計測装置、計測方法、および物品の製造方法 |
| WO2016030227A1 (en) * | 2014-08-29 | 2016-03-03 | Asml Netherlands B.V. | Method for controlling a distance between two objects, inspection apparatus and method |
| CN107430352B (zh) | 2015-03-25 | 2020-01-21 | Asml荷兰有限公司 | 量测方法、量测设备和器件制造方法 |
| KR20180058005A (ko) * | 2016-11-23 | 2018-05-31 | 삼성전자주식회사 | 광학 검사 장치와 방법, 및 그 검사 장치를 이용한 반도체 소자 제조방법 |
| KR101898217B1 (ko) * | 2016-12-29 | 2018-09-12 | 엘지디스플레이 주식회사 | 검사장비 및 이를 이용한 검사방법 |
| JP6285597B1 (ja) * | 2017-06-05 | 2018-02-28 | 大塚電子株式会社 | 光学測定装置および光学測定方法 |
| JP6919458B2 (ja) | 2017-09-26 | 2021-08-18 | オムロン株式会社 | 変位計測装置、計測システム、および変位計測方法 |
| JP7199093B2 (ja) | 2019-01-29 | 2023-01-05 | 大塚電子株式会社 | 光学測定システムおよび光学測定方法 |
-
2021
- 2021-02-19 JP JP2021025523A patent/JP7518782B2/ja active Active
-
2022
- 2022-01-26 TW TW111103268A patent/TWI859503B/zh active
- 2022-02-15 US US17/671,661 patent/US12585202B2/en active Active
- 2022-02-18 KR KR1020220021184A patent/KR102932934B1/ko active Active
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