KR101583693B1 - Ito 스퍼터링 타깃재 및 그 제조 방법 - Google Patents
Ito 스퍼터링 타깃재 및 그 제조 방법 Download PDFInfo
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- KR101583693B1 KR101583693B1 KR1020157033563A KR20157033563A KR101583693B1 KR 101583693 B1 KR101583693 B1 KR 101583693B1 KR 1020157033563 A KR1020157033563 A KR 1020157033563A KR 20157033563 A KR20157033563 A KR 20157033563A KR 101583693 B1 KR101583693 B1 KR 101583693B1
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- ito
- sintered body
- powder
- target material
- sputtering target
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/64—Burning or sintering processes
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/453—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates
- C04B35/457—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates based on tin oxides or stannates
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/626—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
- C04B35/62605—Treating the starting powders individually or as mixtures
- C04B35/62695—Granulation or pelletising
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3286—Gallium oxides, gallates, indium oxides, indates, thallium oxides, thallates or oxide forming salts thereof, e.g. zinc gallate
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3293—Tin oxides, stannates or oxide forming salts thereof, e.g. indium tin oxide [ITO]
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/50—Constituents or additives of the starting mixture chosen for their shape or used because of their shape or their physical appearance
- C04B2235/54—Particle size related information
- C04B2235/5409—Particle size related information expressed by specific surface values
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- C04B2235/60—Aspects relating to the preparation, properties or mechanical treatment of green bodies or pre-forms
- C04B2235/604—Pressing at temperatures other than sintering temperatures
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/65—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes
- C04B2235/656—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes characterised by specific heating conditions during heat treatment
- C04B2235/6562—Heating rate
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/65—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes
- C04B2235/656—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes characterised by specific heating conditions during heat treatment
- C04B2235/6565—Cooling rate
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/65—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes
- C04B2235/658—Atmosphere during thermal treatment
- C04B2235/6583—Oxygen containing atmosphere, e.g. with changing oxygen pressures
- C04B2235/6585—Oxygen containing atmosphere, e.g. with changing oxygen pressures at an oxygen percentage above that of air
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
- C04B2235/74—Physical characteristics
- C04B2235/77—Density
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
- C04B2235/74—Physical characteristics
- C04B2235/78—Grain sizes and shapes, product microstructures, e.g. acicular grains, equiaxed grains, platelet-structures
- C04B2235/786—Micrometer sized grains, i.e. from 1 to 100 micron
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
- C04B2235/80—Phases present in the sintered or melt-cast ceramic products other than the main phase
- C04B2235/85—Intergranular or grain boundary phases
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- Chemical & Material Sciences (AREA)
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- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Structural Engineering (AREA)
- Inorganic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Compositions Of Oxide Ceramics (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014028543 | 2014-02-18 | ||
JPJP-P-2014-028543 | 2014-02-18 | ||
PCT/JP2015/052688 WO2015125588A1 (ja) | 2014-02-18 | 2015-01-30 | Itoスパッタリングターゲット材およびその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20150139623A KR20150139623A (ko) | 2015-12-11 |
KR101583693B1 true KR101583693B1 (ko) | 2016-01-08 |
Family
ID=53878100
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020157033563A KR101583693B1 (ko) | 2014-02-18 | 2015-01-30 | Ito 스퍼터링 타깃재 및 그 제조 방법 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5816394B1 (zh) |
KR (1) | KR101583693B1 (zh) |
CN (2) | CN107253855A (zh) |
TW (1) | TWI522332B (zh) |
WO (1) | WO2015125588A1 (zh) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6291593B2 (ja) * | 2014-11-07 | 2018-03-14 | Jx金属株式会社 | Itoスパッタリングターゲット及びその製造方法並びにito透明導電膜の製造方法 |
WO2016174877A1 (ja) * | 2015-04-30 | 2016-11-03 | 三井金属鉱業株式会社 | Itoスパッタリングターゲット材 |
KR20170113075A (ko) * | 2016-03-28 | 2017-10-12 | 제이엑스금속주식회사 | 원통형 스퍼터링 타겟 및 그 제조 방법 |
JP6756283B2 (ja) * | 2016-04-12 | 2020-09-16 | 三菱マテリアル株式会社 | 円筒型スパッタリングターゲット |
JP2018178251A (ja) * | 2017-04-07 | 2018-11-15 | 三菱マテリアル株式会社 | 円筒型スパッタリングターゲット及びその製造方法 |
CN113149614A (zh) * | 2021-05-28 | 2021-07-23 | 通威太阳能(合肥)有限公司 | 一种烧结体、靶材及其制备方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007231381A (ja) | 2006-03-01 | 2007-09-13 | Tosoh Corp | Itoスパッタリングターゲットおよびその製造方法 |
JP2010150611A (ja) | 2008-12-25 | 2010-07-08 | Tosoh Corp | 透明導電膜用焼結体及びスパッタリングターゲット並びにその製造方法 |
JP2011080116A (ja) | 2009-10-07 | 2011-04-21 | Mitsui Mining & Smelting Co Ltd | Itoスパッタリングターゲットおよびその製造方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3503759B2 (ja) * | 1993-12-14 | 2004-03-08 | 日立金属株式会社 | インジウム・スズ酸化物膜用スパッタリング用ターゲットおよびその製造方法 |
JP4961672B2 (ja) | 2004-03-05 | 2012-06-27 | 東ソー株式会社 | 円筒形スパッタリングターゲット並びにセラミックス焼結体及びその製造方法 |
JP2009040621A (ja) * | 2007-08-06 | 2009-02-26 | Mitsui Mining & Smelting Co Ltd | Ito焼結体およびitoスパッタリングターゲット |
JP2012126937A (ja) | 2010-12-13 | 2012-07-05 | Sumitomo Metal Mining Co Ltd | Itoスパッタリングターゲットとその製造方法 |
CN102718499B (zh) * | 2012-07-10 | 2014-02-26 | 国家钽铌特种金属材料工程技术研究中心 | 一种含In4Sn3O12相ITO溅射靶的制造方法 |
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2015
- 2015-01-30 WO PCT/JP2015/052688 patent/WO2015125588A1/ja active Application Filing
- 2015-01-30 CN CN201710623904.3A patent/CN107253855A/zh active Pending
- 2015-01-30 JP JP2015526439A patent/JP5816394B1/ja active Active
- 2015-01-30 CN CN201580000974.2A patent/CN105308002A/zh active Pending
- 2015-01-30 KR KR1020157033563A patent/KR101583693B1/ko active IP Right Grant
- 2015-02-16 TW TW104105247A patent/TWI522332B/zh active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007231381A (ja) | 2006-03-01 | 2007-09-13 | Tosoh Corp | Itoスパッタリングターゲットおよびその製造方法 |
JP2010150611A (ja) | 2008-12-25 | 2010-07-08 | Tosoh Corp | 透明導電膜用焼結体及びスパッタリングターゲット並びにその製造方法 |
JP2011080116A (ja) | 2009-10-07 | 2011-04-21 | Mitsui Mining & Smelting Co Ltd | Itoスパッタリングターゲットおよびその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
WO2015125588A1 (ja) | 2015-08-27 |
CN107253855A (zh) | 2017-10-17 |
TW201534572A (zh) | 2015-09-16 |
TWI522332B (zh) | 2016-02-21 |
CN105308002A (zh) | 2016-02-03 |
KR20150139623A (ko) | 2015-12-11 |
JPWO2015125588A1 (ja) | 2017-03-30 |
JP5816394B1 (ja) | 2015-11-18 |
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