KR101548023B1 - 퍼플루오로엘라스토머 조성물 및 밀봉 재료 - Google Patents
퍼플루오로엘라스토머 조성물 및 밀봉 재료 Download PDFInfo
- Publication number
- KR101548023B1 KR101548023B1 KR1020097022816A KR20097022816A KR101548023B1 KR 101548023 B1 KR101548023 B1 KR 101548023B1 KR 1020097022816 A KR1020097022816 A KR 1020097022816A KR 20097022816 A KR20097022816 A KR 20097022816A KR 101548023 B1 KR101548023 B1 KR 101548023B1
- Authority
- KR
- South Korea
- Prior art keywords
- perfluoroelastomer
- cfcf
- group
- compound
- perfluoro
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/10—Materials in mouldable or extrudable form for sealing or packing joints or covers
- C09K3/1006—Materials in mouldable or extrudable form for sealing or packing joints or covers characterised by the chemical nature of one of its constituents
- C09K3/1009—Fluorinated polymers, e.g. PTFE
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/5406—Silicon-containing compounds containing elements other than oxygen or nitrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L27/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers
- C08L27/02—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment
- C08L27/12—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
- C08L27/18—Homopolymers or copolymers or tetrafluoroethene
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L71/00—Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Sealing Material Composition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007107167A JP5336051B2 (ja) | 2007-04-16 | 2007-04-16 | パーフルオロエラストマー組成物及びシール材 |
| JPJP-P-2007-107167 | 2007-04-16 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20100016109A KR20100016109A (ko) | 2010-02-12 |
| KR101548023B1 true KR101548023B1 (ko) | 2015-08-27 |
Family
ID=39876139
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020097022816A Active KR101548023B1 (ko) | 2007-04-16 | 2008-04-11 | 퍼플루오로엘라스토머 조성물 및 밀봉 재료 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US8013064B2 (enExample) |
| EP (1) | EP2137245A4 (enExample) |
| JP (1) | JP5336051B2 (enExample) |
| KR (1) | KR101548023B1 (enExample) |
| CN (1) | CN101657493B (enExample) |
| BR (1) | BRPI0810363A2 (enExample) |
| TW (1) | TWI432503B (enExample) |
| WO (1) | WO2008130872A2 (enExample) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102422406B (zh) * | 2009-05-06 | 2014-07-09 | 康宁股份有限公司 | 用于玻璃基片的支承件 |
| JP5146690B2 (ja) * | 2009-09-09 | 2013-02-20 | 信越化学工業株式会社 | 室温硬化性フルオロポリエーテル系ゴム組成物及びその硬化物 |
| JP6018444B2 (ja) * | 2011-08-16 | 2016-11-02 | 三菱電線工業株式会社 | 含フッ素エラストマー組成物およびゴム部材 |
| TWI579347B (zh) * | 2012-02-17 | 2017-04-21 | Asahi Glass Co Ltd | A fluorine-containing ether compound, a fluorine-containing ether composition and a coating liquid, and a substrate having a surface treatment layer and a method for producing the same (3) |
| EP2816045B1 (en) * | 2012-02-17 | 2019-04-03 | AGC Inc. | Fluorinated ether compound, fluorinated ether composition and coating fluid, and substrate having surface-treated layer and method for its production |
| WO2013150751A1 (ja) | 2012-04-02 | 2013-10-10 | 東洋ゴム工業株式会社 | ケイ素化合物及びその製造方法、並びにその利用 |
| US9056958B2 (en) * | 2012-06-14 | 2015-06-16 | Xerox Corporation | Fuser member |
| US9592698B2 (en) * | 2012-08-31 | 2017-03-14 | Xerox Corporation | Imaging member for offset printing applications |
| JP6034689B2 (ja) * | 2012-12-19 | 2016-11-30 | 三菱電線工業株式会社 | 含フッ素エラストマー組成物およびゴム部材 |
| CN105884811A (zh) * | 2014-12-24 | 2016-08-24 | 江南大学 | 一种全氟聚醚二烷氧基硅烷的制备方法 |
| WO2018125790A1 (en) | 2016-12-28 | 2018-07-05 | 3M Innovative Properties Company | Silicon-containing halogenated elastomers |
| US11597816B2 (en) | 2017-12-22 | 2023-03-07 | 3M Innovative Properties Company | Peroxide-cured halogenated elastomers having a silicon-containing superficial layer |
| EP3732235A1 (en) * | 2017-12-28 | 2020-11-04 | 3M Innovative Properties Company | Fluoropolymer compositions including nanoparticles functionalized with functional fluorinated silane compounds |
| JP7105171B2 (ja) * | 2018-10-30 | 2022-07-22 | 三菱電線工業株式会社 | シール材及びそれに用いるコーティング剤 |
| WO2020102271A2 (en) | 2018-11-14 | 2020-05-22 | 3M Innovative Properties Company | Copolymers of perfluorocycloaliphatic methyl vinyl ether |
| JP7200718B2 (ja) * | 2019-02-06 | 2023-01-10 | Agc株式会社 | 組成物、粉体組成物および被覆物品の製造方法 |
| KR20210108673A (ko) | 2020-02-26 | 2021-09-03 | 삼성전자주식회사 | 불소 함유 (폴리)에테르기를 갖는 실란 화합물, 이를 포함하는 조성물, 이로부터 형성된 필름, 표시 장치 및 물품 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003292761A (ja) | 2002-04-01 | 2003-10-15 | Shin Etsu Chem Co Ltd | 硬化性フルオロポリエーテル系ゴム組成物及びゴム製品 |
| JP2006256310A (ja) | 2005-02-16 | 2006-09-28 | Konica Minolta Opto Inc | 反射防止フィルム、反射防止フィルムの製造方法、偏光板及び表示装置 |
| JP2006342241A (ja) * | 2005-06-08 | 2006-12-21 | Nippon Valqua Ind Ltd | フッ素ゴムシール材 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5268405A (en) * | 1993-03-31 | 1993-12-07 | E. I. Du Pont De Nemours And Company | Low temperature perfluoroelastomers |
| JP2704167B2 (ja) * | 1995-01-13 | 1998-01-26 | 工業技術院長 | 含フッ素ケイ素化合物および該化合物からなる機能性流体 |
| JP3140314B2 (ja) * | 1995-02-02 | 2001-03-05 | 株式会社金陽社 | 定着用ロール |
| IT1292361B1 (it) * | 1997-05-20 | 1999-01-29 | Ausimont Spa | Composizioni fluoroelastomeriche volcanizzabili |
| JP5079187B2 (ja) * | 1998-08-21 | 2012-11-21 | デュポン パフォーマンス エラストマーズ エルエルシー | 良好な加工性および低温特性を有するフルオロエラストマー組成物 |
| JP4240716B2 (ja) * | 1999-02-01 | 2009-03-18 | ユニマテック株式会社 | 含フッ素エラストマー組成物 |
| US20040126708A1 (en) * | 2002-12-31 | 2004-07-01 | 3M Innovative Properties Company | Method for modifying the surface of a polymeric substrate |
| JP2006036884A (ja) | 2004-07-26 | 2006-02-09 | Nippon Valqua Ind Ltd | シール材、その製造方法および処理剤 |
| JP2006117878A (ja) | 2004-10-25 | 2006-05-11 | Three M Innovative Properties Co | パーフルオロエラストマー用非粘着処理剤のための溶剤及びそれを用いた非粘着処理剤溶液 |
| KR20070104369A (ko) * | 2004-12-30 | 2007-10-25 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 입자 감소용 코팅 |
| JP2006316112A (ja) * | 2005-05-10 | 2006-11-24 | Daikin Ind Ltd | 含フッ素エラストマー組成物およびそれからなる成形品 |
| KR20070005865A (ko) * | 2005-07-06 | 2007-01-10 | 삼성전자주식회사 | 헬륨 치환기를 갖는 과불소탄성체 조성물 및 그에 의해제조된 오링 |
| CN1931925A (zh) * | 2005-09-12 | 2007-03-21 | 3M创新有限公司 | 不粘性硅橡胶混炼胶及其制备方法 |
| US9134461B2 (en) * | 2006-03-27 | 2015-09-15 | Essilor International (Compagnie Generale D'optique) | Edging process of lens using transparent coating layer for protecting lens |
-
2007
- 2007-04-16 JP JP2007107167A patent/JP5336051B2/ja active Active
-
2008
- 2008-04-11 BR BRPI0810363-1A2A patent/BRPI0810363A2/pt not_active Application Discontinuation
- 2008-04-11 WO PCT/US2008/060018 patent/WO2008130872A2/en not_active Ceased
- 2008-04-11 CN CN2008800119916A patent/CN101657493B/zh not_active Expired - Fee Related
- 2008-04-11 EP EP08745598A patent/EP2137245A4/en not_active Withdrawn
- 2008-04-11 KR KR1020097022816A patent/KR101548023B1/ko active Active
- 2008-04-11 US US12/532,466 patent/US8013064B2/en active Active
- 2008-04-15 TW TW097113679A patent/TWI432503B/zh not_active IP Right Cessation
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003292761A (ja) | 2002-04-01 | 2003-10-15 | Shin Etsu Chem Co Ltd | 硬化性フルオロポリエーテル系ゴム組成物及びゴム製品 |
| JP2006256310A (ja) | 2005-02-16 | 2006-09-28 | Konica Minolta Opto Inc | 反射防止フィルム、反射防止フィルムの製造方法、偏光板及び表示装置 |
| JP2006342241A (ja) * | 2005-06-08 | 2006-12-21 | Nippon Valqua Ind Ltd | フッ素ゴムシール材 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101657493A (zh) | 2010-02-24 |
| JP2008266364A (ja) | 2008-11-06 |
| KR20100016109A (ko) | 2010-02-12 |
| EP2137245A2 (en) | 2009-12-30 |
| US20100105819A1 (en) | 2010-04-29 |
| US8013064B2 (en) | 2011-09-06 |
| BRPI0810363A2 (pt) | 2014-10-29 |
| CN101657493B (zh) | 2011-12-14 |
| WO2008130872A3 (en) | 2008-12-24 |
| TW200911904A (en) | 2009-03-16 |
| EP2137245A4 (en) | 2011-06-22 |
| TWI432503B (zh) | 2014-04-01 |
| JP5336051B2 (ja) | 2013-11-06 |
| WO2008130872A2 (en) | 2008-10-30 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0105 | International application |
St.27 status event code: A-0-1-A10-A15-nap-PA0105 |
|
| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
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| A201 | Request for examination | ||
| AMND | Amendment | ||
| E13-X000 | Pre-grant limitation requested |
St.27 status event code: A-2-3-E10-E13-lim-X000 |
|
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
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| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
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| PA0201 | Request for examination |
St.27 status event code: A-1-2-D10-D11-exm-PA0201 |
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| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
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| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-3-3-R10-R18-oth-X000 |
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St.27 status event code: A-2-2-P10-P11-nap-X000 |
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| P13-X000 | Application amended |
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| E601 | Decision to refuse application | ||
| PE0601 | Decision on rejection of patent |
St.27 status event code: N-2-6-B10-B15-exm-PE0601 |
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| PJ0201 | Trial against decision of rejection |
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| PB0901 | Examination by re-examination before a trial |
St.27 status event code: A-6-3-E10-E12-rex-PB0901 |
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| B701 | Decision to grant | ||
| PB0701 | Decision of registration after re-examination before a trial |
St.27 status event code: A-3-4-F10-F13-rex-PB0701 |
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| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
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| PR1002 | Payment of registration fee |
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