KR101477026B1 - 옥심에스테르계 화합물, 광중합 개시제, 광중합성 조성물, 컬러 필터 및 액정 표시 장치 - Google Patents

옥심에스테르계 화합물, 광중합 개시제, 광중합성 조성물, 컬러 필터 및 액정 표시 장치 Download PDF

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KR101477026B1
KR101477026B1 KR1020137028822A KR20137028822A KR101477026B1 KR 101477026 B1 KR101477026 B1 KR 101477026B1 KR 1020137028822 A KR1020137028822 A KR 1020137028822A KR 20137028822 A KR20137028822 A KR 20137028822A KR 101477026 B1 KR101477026 B1 KR 101477026B1
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group
carbon atoms
ring
photopolymerizable composition
acid
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KR20130130872A (ko
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준지 미즈카미
도시유키 다나카
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미쓰비시 가가꾸 가부시키가이샤
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56—Ring systems containing three or more rings
    • C07D209/80—[b, c]- or [b, d]-condensed
    • C07D209/82—Carbazoles; Hydrogenated carbazoles
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56—Ring systems containing three or more rings
    • C07D209/80—[b, c]- or [b, d]-condensed
    • C07D209/82—Carbazoles; Hydrogenated carbazoles
    • C07D209/86—Carbazoles; Hydrogenated carbazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D409/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
    • C07D409/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
    • C07D409/06—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Indole Compounds (AREA)
  • Polymerisation Methods In General (AREA)
KR1020137028822A 2006-12-20 2007-12-06 옥심에스테르계 화합물, 광중합 개시제, 광중합성 조성물, 컬러 필터 및 액정 표시 장치 Active KR101477026B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2006343065 2006-12-20
JPJP-P-2006-343065 2006-12-20
PCT/JP2007/073560 WO2008075564A1 (ja) 2006-12-20 2007-12-06 オキシムエステル系化合物、光重合開始剤、光重合性組成物、カラーフィルターおよび液晶表示装置

Related Parent Applications (1)

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KR1020127033270A Division KR101370818B1 (ko) 2006-12-20 2007-12-06 옥심에스테르계 화합물, 광중합 개시제, 광중합성 조성물, 컬러 필터 및 액정 표시 장치

Publications (2)

Publication Number Publication Date
KR20130130872A KR20130130872A (ko) 2013-12-02
KR101477026B1 true KR101477026B1 (ko) 2014-12-29

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KR1020137028822A Active KR101477026B1 (ko) 2006-12-20 2007-12-06 옥심에스테르계 화합물, 광중합 개시제, 광중합성 조성물, 컬러 필터 및 액정 표시 장치
KR1020127033270A Active KR101370818B1 (ko) 2006-12-20 2007-12-06 옥심에스테르계 화합물, 광중합 개시제, 광중합성 조성물, 컬러 필터 및 액정 표시 장치
KR1020097004732A Active KR101337283B1 (ko) 2006-12-20 2007-12-06 옥심에스테르계 화합물, 광중합 개시제, 광중합성 조성물, 컬러 필터 및 액정 표시 장치

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KR1020097004732A Active KR101337283B1 (ko) 2006-12-20 2007-12-06 옥심에스테르계 화합물, 광중합 개시제, 광중합성 조성물, 컬러 필터 및 액정 표시 장치

Country Status (5)

Country Link
JP (1) JP5151433B2 (https=)
KR (3) KR101477026B1 (https=)
CN (2) CN104030969B (https=)
TW (1) TWI448453B (https=)
WO (1) WO2008075564A1 (https=)

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JP4855312B2 (ja) * 2007-03-27 2012-01-18 東京応化工業株式会社 感光性組成物
JP2009040762A (ja) * 2007-08-09 2009-02-26 Ciba Holding Inc オキシムエステル光開始剤
KR101947474B1 (ko) * 2008-07-09 2019-02-13 도쿄 오카 고교 가부시키가이샤 착색 감광성 수지 조성물 및 옥심계 광중합 개시제
KR101678028B1 (ko) * 2009-06-17 2016-11-21 토요잉크Sc홀딩스주식회사 옥심에스테르 화합물, 라디칼 중합개시제, 중합성 조성물, 네가티브형 레지스트 및 화상 패턴
CN102639501B (zh) 2009-12-07 2015-04-29 爱克发印艺公司 用于uv-led可固化组合物和墨水的光引发剂
AU2010330040B2 (en) 2009-12-07 2013-12-19 Agfa Nv UV-LED curable compositions and inks
WO2011152066A1 (ja) * 2010-06-04 2011-12-08 ダイトーケミックス株式会社 オキシムエステル化合物、オキシムエステル化合物の製造方法、光重合開始剤および感光性組成物
JP2013101337A (ja) * 2011-10-20 2013-05-23 Mitsubishi Chemicals Corp 着色樹脂組成物、カラーフィルタ、液晶表示装置及び有機ｅｌ表示装置
JP6175259B2 (ja) * 2012-03-26 2017-08-02 大阪ガスケミカル株式会社 酸無水物変性フルオレン含有アクリル系樹脂及びその製造方法
KR101664121B1 (ko) 2012-12-13 2016-10-10 제일모직 주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터
KR101609634B1 (ko) 2012-12-26 2016-04-06 제일모직 주식회사 감광성 수지 조성물 및 이를 이용한 차광층
KR102281546B1 (ko) * 2013-08-05 2021-07-27 도쿄 오카 고교 가부시키가이샤 안료 분산액, 그것을 포함하는 감광성 수지 조성물 및 분산 조제
CN105531260B (zh) 2013-09-10 2019-05-31 巴斯夫欧洲公司 肟酯光引发剂
TWI668210B (zh) * 2013-11-28 2019-08-11 塔可馬科技股份有限公司 光起始劑及包括該光起始劑之光敏性組合物
WO2017077662A1 (ja) * 2015-11-02 2017-05-11 互応化学工業株式会社 感光性樹脂組成物、ドライフィルム、プリント配線板
CN107325206B (zh) * 2016-04-12 2018-12-18 常州强力先端电子材料有限公司 一种含硝基咔唑肟酯类光引发剂及其制备方法和应用
JP6713112B2 (ja) * 2016-04-27 2020-06-24 東京応化工業株式会社 化合物及びその製造方法
JP7151215B2 (ja) * 2017-07-06 2022-10-12 三菱ケミカル株式会社 光重合性組成物、硬化物、画像表示装置及びオキシムエステル系化合物
KR102532379B1 (ko) * 2018-06-12 2023-05-12 후지필름 가부시키가이샤 광학 이방성층의 제조 방법
CN109233540A (zh) * 2018-08-13 2019-01-18 宁波高新区诠宝绶新材料科技有限公司 一种具有优异热稳定性的聚醚醚酮包线漆新材料的制备方法
CN112111028A (zh) * 2019-06-21 2020-12-22 江苏英力科技发展有限公司 一种含有酰基咔唑衍生物和咔唑基肟酯的光引发剂组合物及其在光固化组合物中的应用
US12172962B2 (en) 2019-06-21 2024-12-24 IGM (Anqing) High Technology Development Co., Ltd. Diaroyl carbazole compound and use thereof as sensitising agent
JP2022060893A (ja) * 2020-10-05 2022-04-15 三菱ケミカル株式会社 オキシムエステル系化合物の製造方法及び感光性樹脂組成物の製造方法
KR102743077B1 (ko) * 2022-09-29 2024-12-16 송원산업 주식회사 옥심 에스테르계 광중합 개시제
WO2025225377A1 (ja) * 2024-04-23 2025-10-30 富士フイルム株式会社 光硬化性組成物、画素の製造方法、膜、光学フィルタ、固体撮像素子、画像表示装置および光重合開始剤

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JP2004359639A (ja) * 2003-06-06 2004-12-24 Asahi Denka Kogyo Kk オキシムエステル化合物および該化合物を含有する光重合開始剤
JP2006053569A (ja) * 2003-06-10 2006-02-23 Mitsubishi Chemicals Corp 光重合性組成物及びこれを用いたカラーフィルター
KR20060121954A (ko) * 2004-08-09 2006-11-29 미쓰비시 가가꾸 가부시키가이샤 감광성 수지 조성물, 컬러 필터 및 액정 디스플레이
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Also Published As

Publication number Publication date
TWI448453B (zh) 2014-08-11
KR20090090296A (ko) 2009-08-25
WO2008075564A1 (ja) 2008-06-26
KR20130130872A (ko) 2013-12-02
JP5151433B2 (ja) 2013-02-27
KR101337283B1 (ko) 2013-12-06
KR20130018934A (ko) 2013-02-25
JP2008179611A (ja) 2008-08-07
TW200840813A (en) 2008-10-16
CN101528693A (zh) 2009-09-09
CN104030969A (zh) 2014-09-10
CN101528693B (zh) 2014-07-02
KR101370818B1 (ko) 2014-03-07
CN104030969B (zh) 2016-09-07

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