KR101414343B1 - 포토마스크의 제조 방법, 포토마스크, 패턴 전사 방법 및 플랫 패널 디스플레이의 제조 방법 - Google Patents
포토마스크의 제조 방법, 포토마스크, 패턴 전사 방법 및 플랫 패널 디스플레이의 제조 방법 Download PDFInfo
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- KR101414343B1 KR101414343B1 KR1020130112126A KR20130112126A KR101414343B1 KR 101414343 B1 KR101414343 B1 KR 101414343B1 KR 1020130112126 A KR1020130112126 A KR 1020130112126A KR 20130112126 A KR20130112126 A KR 20130112126A KR 101414343 B1 KR101414343 B1 KR 101414343B1
- Authority
- KR
- South Korea
- Prior art keywords
- film
- light
- translucent
- semi
- photomask
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/80—Etching
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012212030A JP5635577B2 (ja) | 2012-09-26 | 2012-09-26 | フォトマスクの製造方法、フォトマスク、パターン転写方法、及びフラットパネルディスプレイの製造方法 |
JPJP-P-2012-212030 | 2012-09-26 |
Publications (2)
Publication Number | Publication Date |
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KR20140040645A KR20140040645A (ko) | 2014-04-03 |
KR101414343B1 true KR101414343B1 (ko) | 2014-07-02 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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KR1020130112126A KR101414343B1 (ko) | 2012-09-26 | 2013-09-17 | 포토마스크의 제조 방법, 포토마스크, 패턴 전사 방법 및 플랫 패널 디스플레이의 제조 방법 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5635577B2 (zh) |
KR (1) | KR101414343B1 (zh) |
CN (1) | CN103676468B (zh) |
TW (1) | TWI477891B (zh) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102157644B1 (ko) * | 2014-08-13 | 2020-09-21 | (주)에스앤에스텍 | 다계조 포토 마스크 및 그의 제조 방법 |
JP2016224289A (ja) * | 2015-06-01 | 2016-12-28 | Hoya株式会社 | フォトマスクの製造方法、フォトマスク及び表示装置の製造方法 |
JP6767735B2 (ja) * | 2015-06-30 | 2020-10-14 | Hoya株式会社 | フォトマスク、フォトマスクの設計方法、フォトマスクブランク、および表示装置の製造方法 |
JP6514143B2 (ja) * | 2016-05-18 | 2019-05-15 | Hoya株式会社 | フォトマスクの製造方法、フォトマスク、及び表示装置の製造方法 |
JP6556673B2 (ja) * | 2016-07-26 | 2019-08-07 | Hoya株式会社 | フォトマスクの製造方法、描画装置、表示装置の製造方法、フォトマスク基板の検査方法、及びフォトマスク基板の検査装置 |
TW201823855A (zh) * | 2016-09-21 | 2018-07-01 | 日商Hoya股份有限公司 | 光罩之製造方法、光罩、及顯示裝置之製造方法 |
CN106991931B (zh) * | 2017-05-11 | 2019-07-23 | 武汉华星光电技术有限公司 | 显示面板及其膜层检测系统 |
CN111965887A (zh) * | 2020-09-18 | 2020-11-20 | 信利(仁寿)高端显示科技有限公司 | 一种掩膜版的制作方法及彩膜基板的制作工艺 |
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JP2009258250A (ja) | 2008-04-15 | 2009-11-05 | Hoya Corp | 多階調フォトマスク、多階調フォトマスクの製造方法、パターン転写方法、及び薄膜トランジスタの製造方法 |
KR20100127718A (ko) * | 2009-05-26 | 2010-12-06 | 호야 가부시키가이샤 | 다계조 포토마스크, 다계조 포토마스크의 제조 방법, 및 패턴 전사 방법 |
KR20100131404A (ko) * | 2006-02-20 | 2010-12-15 | 호야 가부시키가이샤 | 4계조 포토마스크 및 그 사용 방법 |
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CN1325994A (zh) * | 2000-05-31 | 2001-12-12 | 上海博德基因开发有限公司 | 一种新的多肽——丝氨酸蛋白酶12和编码这种多肽的多核苷酸 |
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TWI286663B (en) * | 2003-06-30 | 2007-09-11 | Hoya Corp | Method for manufacturing gray tone mask, and gray tone mask |
JP4393290B2 (ja) * | 2003-06-30 | 2010-01-06 | Hoya株式会社 | グレートーンマスクの製造方法及び薄膜トランジスタ基板の製造方法 |
JP2006030320A (ja) * | 2004-07-12 | 2006-02-02 | Hoya Corp | グレートーンマスク及びグレートーンマスクの製造方法 |
JP4587837B2 (ja) * | 2005-02-18 | 2010-11-24 | Hoya株式会社 | グレートーンマスクの製造方法及びグレートーンマスク |
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2012
- 2012-09-26 JP JP2012212030A patent/JP5635577B2/ja active Active
-
2013
- 2013-09-17 KR KR1020130112126A patent/KR101414343B1/ko active IP Right Grant
- 2013-09-17 TW TW102133708A patent/TWI477891B/zh active
- 2013-09-24 CN CN201310439264.2A patent/CN103676468B/zh active Active
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Also Published As
Publication number | Publication date |
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JP2014066863A (ja) | 2014-04-17 |
KR20140040645A (ko) | 2014-04-03 |
TW201418873A (zh) | 2014-05-16 |
TWI477891B (zh) | 2015-03-21 |
CN103676468A (zh) | 2014-03-26 |
CN103676468B (zh) | 2015-03-11 |
JP5635577B2 (ja) | 2014-12-03 |
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