KR101222387B1 - 기판 도포 장치 및 기판 도포 방법 - Google Patents

기판 도포 장치 및 기판 도포 방법 Download PDF

Info

Publication number
KR101222387B1
KR101222387B1 KR1020100026320A KR20100026320A KR101222387B1 KR 101222387 B1 KR101222387 B1 KR 101222387B1 KR 1020100026320 A KR1020100026320 A KR 1020100026320A KR 20100026320 A KR20100026320 A KR 20100026320A KR 101222387 B1 KR101222387 B1 KR 101222387B1
Authority
KR
South Korea
Prior art keywords
substrate
nozzle
stage
board
gas flow
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020100026320A
Other languages
English (en)
Korean (ko)
Other versions
KR20100108238A (ko
Inventor
요시노리 다카기
Original Assignee
다이니폰 스크린 세이조우 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 다이니폰 스크린 세이조우 가부시키가이샤 filed Critical 다이니폰 스크린 세이조우 가부시키가이샤
Publication of KR20100108238A publication Critical patent/KR20100108238A/ko
Application granted granted Critical
Publication of KR101222387B1 publication Critical patent/KR101222387B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0225Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work characterised by flow controlling means, e.g. valves, located proximate the outlet
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B05C11/1002Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
    • B05C11/1015Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves responsive to a conditions of ambient medium or target, e.g. humidity, temperature ; responsive to position or movement of the coating head relative to the target
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C13/00Means for manipulating or holding work, e.g. for separate articles
    • B05C13/02Means for manipulating or holding work, e.g. for separate articles for particular articles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C9/00Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor

Landscapes

  • Coating Apparatus (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Liquid Crystal (AREA)
  • Optical Filters (AREA)
KR1020100026320A 2009-03-27 2010-03-24 기판 도포 장치 및 기판 도포 방법 Active KR101222387B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2009079303A JP5346643B2 (ja) 2009-03-27 2009-03-27 基板塗布装置および基板塗布方法
JPJP-P-2009-079303 2009-03-27

Publications (2)

Publication Number Publication Date
KR20100108238A KR20100108238A (ko) 2010-10-06
KR101222387B1 true KR101222387B1 (ko) 2013-01-15

Family

ID=43044236

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020100026320A Active KR101222387B1 (ko) 2009-03-27 2010-03-24 기판 도포 장치 및 기판 도포 방법

Country Status (3)

Country Link
JP (1) JP5346643B2 (enrdf_load_stackoverflow)
KR (1) KR101222387B1 (enrdf_load_stackoverflow)
TW (1) TWI433731B (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20180082960A (ko) * 2017-01-11 2018-07-19 가부시키가이샤 스크린 홀딩스 기판 반송 장치 및 기판 반송 방법 그리고 기판 처리 장치

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102974508B (zh) * 2012-12-10 2016-08-10 京东方科技集团股份有限公司 涂布嘴防护件、涂布喷头组件
JP6737649B2 (ja) * 2016-07-04 2020-08-12 株式会社Screenホールディングス 塗布装置および塗布方法
JP2018043200A (ja) * 2016-09-15 2018-03-22 株式会社Screenホールディングス 塗布装置および塗布方法
JP2018113327A (ja) * 2017-01-11 2018-07-19 株式会社Screenホールディングス 基板処理装置
JP7029248B2 (ja) * 2017-08-22 2022-03-03 Hoya株式会社 レジスト膜付マスクブランク、及びフォトマスクの製造方法
CN107790329A (zh) * 2017-10-27 2018-03-13 珠海市博杰电子有限公司 一种高速高精密点胶机
US10804133B2 (en) * 2017-11-21 2020-10-13 Taiwan Semiconductor Manufacturing Co., Ltd. Article transferring method in semiconductor fabrication
JP6738373B2 (ja) * 2018-05-31 2020-08-12 株式会社Screenホールディングス 基板処理装置および基板処理方法
ES3034603T3 (en) * 2021-08-05 2025-08-20 Lg Energy Solution Ltd Drying apparatus for manufacturing electrode and method for manufacturing electrode using same
CN119972446B (zh) * 2025-04-15 2025-07-08 德沪涂膜设备(苏州)有限公司 一种涂布系统以及涂布方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006019396A (ja) 2004-06-30 2006-01-19 Tokyo Electron Ltd 基板処理装置
JP2007105623A (ja) 2005-10-13 2007-04-26 Tokyo Electron Ltd 塗布装置及び塗布方法
KR20070074482A (ko) * 2006-01-06 2007-07-12 도쿄 엘렉트론 가부시키가이샤 기판 반송 장치, 기판 반송 방법 및 컴퓨터 판독 가능한기억 매체
KR20090023243A (ko) * 2007-08-30 2009-03-04 도오꾜오까고오교 가부시끼가이샤 도포 장치 및 도포 방법

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4325084B2 (ja) * 2000-06-19 2009-09-02 東レ株式会社 塗布方法およびそれを用いたカラーフィルタの製造方法
JP4670182B2 (ja) * 2001-05-25 2011-04-13 凸版印刷株式会社 単板連続塗布装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006019396A (ja) 2004-06-30 2006-01-19 Tokyo Electron Ltd 基板処理装置
JP2007105623A (ja) 2005-10-13 2007-04-26 Tokyo Electron Ltd 塗布装置及び塗布方法
KR20070074482A (ko) * 2006-01-06 2007-07-12 도쿄 엘렉트론 가부시키가이샤 기판 반송 장치, 기판 반송 방법 및 컴퓨터 판독 가능한기억 매체
KR20090023243A (ko) * 2007-08-30 2009-03-04 도오꾜오까고오교 가부시끼가이샤 도포 장치 및 도포 방법

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20180082960A (ko) * 2017-01-11 2018-07-19 가부시키가이샤 스크린 홀딩스 기판 반송 장치 및 기판 반송 방법 그리고 기판 처리 장치
KR102117745B1 (ko) * 2017-01-11 2020-06-01 가부시키가이샤 스크린 홀딩스 기판 처리 방법 그리고 기판 처리 장치

Also Published As

Publication number Publication date
TW201039928A (en) 2010-11-16
JP2010227850A (ja) 2010-10-14
JP5346643B2 (ja) 2013-11-20
TWI433731B (zh) 2014-04-11
KR20100108238A (ko) 2010-10-06

Similar Documents

Publication Publication Date Title
KR101222387B1 (ko) 기판 도포 장치 및 기판 도포 방법
KR20100108194A (ko) 기판 반송 장치 및 기판 처리 장치
JP2010034309A (ja) 塗布装置および基板処理システム
JP2011210985A (ja) 基板搬送装置および基板処理装置
JP2008076170A (ja) 基板検査装置
JP2018043200A (ja) 塗布装置および塗布方法
KR100892088B1 (ko) 에어 플로팅을 이용한 비접촉식 필름 검사장치
KR20120116880A (ko) 도포장치
CN108525941B (zh) 涂覆装置以及涂覆方法
JP5372824B2 (ja) 基板処理装置および基板処理方法
JP6737649B2 (ja) 塗布装置および塗布方法
KR102305397B1 (ko) 기판 반송 장치 및 도포 장치
KR102525265B1 (ko) 기판 처리 장치 및 기판 처리 방법
JP2018114475A (ja) 塗布装置および塗布方法
KR101202455B1 (ko) 코팅 영역의 기판 이송 유닛에 사용되는 이송 캐리어의 피딩 장치, 및 이를 구비한 기판 이송 유닛 및 코팅 장치
JP2018152441A (ja) 基板搬送装置、基板搬送方法および塗布装置
JP5663297B2 (ja) 塗布装置
CN111822234B (zh) 涂布装置及涂布方法
KR101212817B1 (ko) 코팅 영역의 기판 이송 유닛에 사용되는 이송 캐리어의 피딩 장치를 구비한 코팅 장치
KR101141146B1 (ko) 기판 반송 방법
JP5789416B2 (ja) 塗布装置及び塗布方法
KR20250091954A (ko) 기판 부상 어셈블리, 이를 포함하는 기판 처리 장치 및 기판 처리 방법
JP2023172594A (ja) 基板搬送装置、基板搬送方法および記憶媒体
WO2023199749A1 (ja) 液滴吐出装置、液滴吐出方法および記憶媒体
KR101212816B1 (ko) 이송 캐리어의 피딩 장치를 구비한 코팅 영역의 기판 이송 유닛

Legal Events

Date Code Title Description
A201 Request for examination
PA0109 Patent application

Patent event code: PA01091R01D

Comment text: Patent Application

Patent event date: 20100324

PA0201 Request for examination
PG1501 Laying open of application
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20120424

Patent event code: PE09021S01D

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

Patent event code: PE07011S01D

Comment text: Decision to Grant Registration

Patent event date: 20121126

GRNT Written decision to grant
PR0701 Registration of establishment

Comment text: Registration of Establishment

Patent event date: 20130108

Patent event code: PR07011E01D

PR1002 Payment of registration fee

Payment date: 20130108

End annual number: 3

Start annual number: 1

PG1601 Publication of registration
FPAY Annual fee payment

Payment date: 20151217

Year of fee payment: 4

PR1001 Payment of annual fee

Payment date: 20151217

Start annual number: 4

End annual number: 4

FPAY Annual fee payment

Payment date: 20161219

Year of fee payment: 5

PR1001 Payment of annual fee

Payment date: 20161219

Start annual number: 5

End annual number: 5

FPAY Annual fee payment

Payment date: 20171219

Year of fee payment: 6

PR1001 Payment of annual fee

Payment date: 20171219

Start annual number: 6

End annual number: 6

FPAY Annual fee payment

Payment date: 20181219

Year of fee payment: 7

PR1001 Payment of annual fee

Payment date: 20181219

Start annual number: 7

End annual number: 7

FPAY Annual fee payment

Payment date: 20191219

Year of fee payment: 8

PR1001 Payment of annual fee

Payment date: 20191219

Start annual number: 8

End annual number: 8

PR1001 Payment of annual fee

Payment date: 20201217

Start annual number: 9

End annual number: 9

PR1001 Payment of annual fee

Payment date: 20211222

Start annual number: 10

End annual number: 10

PR1001 Payment of annual fee

Payment date: 20231204

Start annual number: 12

End annual number: 12

PR1001 Payment of annual fee

Payment date: 20241219

Start annual number: 13

End annual number: 13