KR101074222B1 - 고강도 광기록 매체 보호막 형성용 스퍼터링 타깃 - Google Patents

고강도 광기록 매체 보호막 형성용 스퍼터링 타깃 Download PDF

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KR101074222B1
KR101074222B1 KR1020087029624A KR20087029624A KR101074222B1 KR 101074222 B1 KR101074222 B1 KR 101074222B1 KR 1020087029624 A KR1020087029624 A KR 1020087029624A KR 20087029624 A KR20087029624 A KR 20087029624A KR 101074222 B1 KR101074222 B1 KR 101074222B1
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silicon dioxide
oxide
target
protective film
mixed powder
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KR20090007787A (ko
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슈빈 장
하야또 사사끼
쇼오조 고미야마
아끼후미 미시마
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미츠비시 마테리알 가부시키가이샤
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    • G11B7/257—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of layers having properties involved in recording or reproduction, e.g. optical interference layers or sensitising layers or dielectric layers, which are protecting the recording layers
    • G11B2007/25705—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of layers having properties involved in recording or reproduction, e.g. optical interference layers or sensitising layers or dielectric layers, which are protecting the recording layers consisting essentially of inorganic materials
    • G11B2007/25715—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of layers having properties involved in recording or reproduction, e.g. optical interference layers or sensitising layers or dielectric layers, which are protecting the recording layers consisting essentially of inorganic materials containing oxygen

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WO2020044798A1 (ja) * 2018-08-27 2020-03-05 三菱マテリアル株式会社 酸化物スパッタリングターゲット、及び、酸化物スパッタリングターゲットの製造方法
JP7227473B2 (ja) * 2018-09-25 2023-02-22 日亜化学工業株式会社 光学薄膜の製造方法、薄膜形成材料、光学薄膜、及び光学部材
JP2021088730A (ja) 2019-12-02 2021-06-10 三菱マテリアル株式会社 酸化物スパッタリングターゲット、及び、酸化物スパッタリングターゲットの製造方法
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