KR101037278B1 - 노광장치 - Google Patents

노광장치 Download PDF

Info

Publication number
KR101037278B1
KR101037278B1 KR1020090011244A KR20090011244A KR101037278B1 KR 101037278 B1 KR101037278 B1 KR 101037278B1 KR 1020090011244 A KR1020090011244 A KR 1020090011244A KR 20090011244 A KR20090011244 A KR 20090011244A KR 101037278 B1 KR101037278 B1 KR 101037278B1
Authority
KR
South Korea
Prior art keywords
projection optical
optical system
substrate
scanning direction
mirrors
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020090011244A
Other languages
English (en)
Korean (ko)
Other versions
KR20090088805A (ko
Inventor
미치오 코노
Original Assignee
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20090088805A publication Critical patent/KR20090088805A/ko
Application granted granted Critical
Publication of KR101037278B1 publication Critical patent/KR101037278B1/ko
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/70—Reflectors in printing beam
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020090011244A 2008-02-15 2009-02-12 노광장치 Expired - Fee Related KR101037278B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JPJP-P-2008-035040 2008-02-15
JP2008035040 2008-02-15
JPJP-P-2008-320382 2008-12-17
JP2008320382A JP5335397B2 (ja) 2008-02-15 2008-12-17 露光装置

Publications (2)

Publication Number Publication Date
KR20090088805A KR20090088805A (ko) 2009-08-20
KR101037278B1 true KR101037278B1 (ko) 2011-05-26

Family

ID=40997968

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020090011244A Expired - Fee Related KR101037278B1 (ko) 2008-02-15 2009-02-12 노광장치

Country Status (4)

Country Link
US (1) US8294874B2 (enExample)
JP (1) JP5335397B2 (enExample)
KR (1) KR101037278B1 (enExample)
TW (1) TWI414898B (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5335397B2 (ja) * 2008-02-15 2013-11-06 キヤノン株式会社 露光装置
WO2023282214A1 (ja) * 2021-07-05 2023-01-12 株式会社ニコン 空間光変調ユニットおよび露光装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004093953A (ja) 2002-08-30 2004-03-25 Nikon Corp 投影光学系、露光装置、及びマイクロデバイスの製造方法
JP2007249169A (ja) 2006-02-16 2007-09-27 Nikon Corp 露光方法、露光装置、フォトマスク及びフォトマスクの製造方法
JP2007286580A (ja) 2006-03-20 2007-11-01 Nikon Corp 走査型露光装置、マイクロデバイスの製造方法、マスク、投影光学装置、及びマスクの製造方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57133447A (en) * 1981-02-12 1982-08-18 Canon Inc Variable magnification optical device
US4372670A (en) * 1981-02-23 1983-02-08 Xerox Corporation Precession scanning system
US5614988A (en) * 1993-12-06 1997-03-25 Nikon Corporation Projection exposure apparatus and method with a plurality of projection optical units
JPH09293676A (ja) * 1996-04-24 1997-11-11 Nikon Corp 投影光学系及び投影露光装置
JPH1064807A (ja) * 1996-08-19 1998-03-06 Nikon Corp 縮小投影走査型露光装置
DE19757074A1 (de) 1997-12-20 1999-06-24 Zeiss Carl Fa Projektionsbelichtungsanlage und Belichtungsverfahren
KR20010075157A (ko) * 1998-09-17 2001-08-09 오노 시게오 투영광학계의 조정방법
KR100827874B1 (ko) * 2000-05-22 2008-05-07 가부시키가이샤 니콘 노광 장치, 노광 장치의 제조 방법, 노광 방법, 마이크로 장치의 제조 방법, 및 디바이스의 제조 방법
TWI232348B (en) * 2001-12-26 2005-05-11 Pentax Corp Projection aligner
SE0200547D0 (sv) * 2002-02-25 2002-02-25 Micronic Laser Systems Ab An image forming method and apparatus
JP4490165B2 (ja) * 2004-05-18 2010-06-23 大日本印刷株式会社 露光装置
US7283210B2 (en) * 2005-03-22 2007-10-16 Nikon Corporation Image shift optic for optical system
WO2007119292A1 (ja) * 2006-03-20 2007-10-25 Nikon Corporation 反射屈折投影光学系、反射屈折光学装置、走査露光装置、マイクロデバイスの製造方法
US20080165333A1 (en) * 2007-01-04 2008-07-10 Nikon Corporation Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method
JP5335397B2 (ja) * 2008-02-15 2013-11-06 キヤノン株式会社 露光装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004093953A (ja) 2002-08-30 2004-03-25 Nikon Corp 投影光学系、露光装置、及びマイクロデバイスの製造方法
JP2007249169A (ja) 2006-02-16 2007-09-27 Nikon Corp 露光方法、露光装置、フォトマスク及びフォトマスクの製造方法
JP2007286580A (ja) 2006-03-20 2007-11-01 Nikon Corp 走査型露光装置、マイクロデバイスの製造方法、マスク、投影光学装置、及びマスクの製造方法

Also Published As

Publication number Publication date
US20090213348A1 (en) 2009-08-27
JP2009217244A (ja) 2009-09-24
US8294874B2 (en) 2012-10-23
JP5335397B2 (ja) 2013-11-06
KR20090088805A (ko) 2009-08-20
TWI414898B (zh) 2013-11-11
TW200951627A (en) 2009-12-16

Similar Documents

Publication Publication Date Title
US8411249B2 (en) Surface position detecting apparatus, exposure apparatus, surface position detecting method, and device manufacturing method
JP7124212B2 (ja) マークの位置を測定するための装置及び方法
JP5577625B2 (ja) 面位置検出装置、露光装置、面位置検出方法およびデバイス製造方法
KR101121029B1 (ko) 투영 광학계, 노광 장치 및 디바이스 제조 방법
KR101605567B1 (ko) 노광방법, 노광장치 및 디바이스 제조방법
JP2010066256A (ja) 面位置検出装置、露光装置、面位置検出方法およびデバイス製造方法
KR102372650B1 (ko) 투영 광학계, 노광 장치, 물품의 제조 방법, 및 조정 방법
KR20090088805A (ko) 노광장치
JP2009031169A (ja) 位置検出装置、露光装置、及びデバイスの製造方法
JP2007101592A (ja) 走査型露光装置及びマイクロデバイスの製造方法
JP6139870B2 (ja) 露光方法、露光装置および物品の製造方法
JP2010197628A (ja) 露光装置、露光方法、およびデバイス製造方法
KR20140079287A (ko) 노광 장치, 노광 방법 및 디바이스 제조 방법
WO2009093594A1 (ja) 面位置検出装置、露光装置、およびデバイス製造方法
JP2004119663A (ja) 位置検出装置、位置検出方法、露光装置、および露光方法
KR20080009629A (ko) 투영 노광 장치
JPH08339959A (ja) 位置合わせ方法
CN112596342A (zh) 投影光学系统、扫描曝光装置以及物品制造方法
JP6980443B2 (ja) 露光装置及び物品製造方法
JP4258378B2 (ja) 位置検出装置、露光装置、および露光方法
JPH0883743A (ja) 照明光学装置
KR20000057078A (ko) 주사형 투영노광장치 및 노광방법
JP5055649B2 (ja) 投影光学装置、露光装置、デバイス製造方法、像面情報検出装置、および投影光学系の調整方法
JP2010010240A (ja) 面位置検出装置、露光装置、およびデバイス製造方法
JP2017198757A (ja) 露光装置

Legal Events

Date Code Title Description
A201 Request for examination
PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U11-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

FPAY Annual fee payment

Payment date: 20140424

Year of fee payment: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

FPAY Annual fee payment

Payment date: 20150424

Year of fee payment: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

FPAY Annual fee payment

Payment date: 20160425

Year of fee payment: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

FPAY Annual fee payment

Payment date: 20170424

Year of fee payment: 7

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

FPAY Annual fee payment

Payment date: 20180425

Year of fee payment: 8

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 8

FPAY Annual fee payment

Payment date: 20190521

Year of fee payment: 9

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 9

PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20200520

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20200520

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000