JP5335397B2 - 露光装置 - Google Patents

露光装置 Download PDF

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Publication number
JP5335397B2
JP5335397B2 JP2008320382A JP2008320382A JP5335397B2 JP 5335397 B2 JP5335397 B2 JP 5335397B2 JP 2008320382 A JP2008320382 A JP 2008320382A JP 2008320382 A JP2008320382 A JP 2008320382A JP 5335397 B2 JP5335397 B2 JP 5335397B2
Authority
JP
Japan
Prior art keywords
projection optical
optical system
scanning direction
substrate
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2008320382A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009217244A (ja
JP2009217244A5 (enExample
Inventor
道生 河野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2008320382A priority Critical patent/JP5335397B2/ja
Priority to KR1020090011244A priority patent/KR101037278B1/ko
Priority to US12/370,959 priority patent/US8294874B2/en
Priority to TW098104708A priority patent/TWI414898B/zh
Publication of JP2009217244A publication Critical patent/JP2009217244A/ja
Publication of JP2009217244A5 publication Critical patent/JP2009217244A5/ja
Application granted granted Critical
Publication of JP5335397B2 publication Critical patent/JP5335397B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/70—Reflectors in printing beam
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2008320382A 2008-02-15 2008-12-17 露光装置 Expired - Fee Related JP5335397B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2008320382A JP5335397B2 (ja) 2008-02-15 2008-12-17 露光装置
KR1020090011244A KR101037278B1 (ko) 2008-02-15 2009-02-12 노광장치
US12/370,959 US8294874B2 (en) 2008-02-15 2009-02-13 Exposure apparatus
TW098104708A TWI414898B (zh) 2008-02-15 2009-02-13 曝光設備

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2008035040 2008-02-15
JP2008035040 2008-02-15
JP2008320382A JP5335397B2 (ja) 2008-02-15 2008-12-17 露光装置

Publications (3)

Publication Number Publication Date
JP2009217244A JP2009217244A (ja) 2009-09-24
JP2009217244A5 JP2009217244A5 (enExample) 2012-02-02
JP5335397B2 true JP5335397B2 (ja) 2013-11-06

Family

ID=40997968

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008320382A Expired - Fee Related JP5335397B2 (ja) 2008-02-15 2008-12-17 露光装置

Country Status (4)

Country Link
US (1) US8294874B2 (enExample)
JP (1) JP5335397B2 (enExample)
KR (1) KR101037278B1 (enExample)
TW (1) TWI414898B (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5335397B2 (ja) * 2008-02-15 2013-11-06 キヤノン株式会社 露光装置
WO2023282214A1 (ja) * 2021-07-05 2023-01-12 株式会社ニコン 空間光変調ユニットおよび露光装置

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57133447A (en) * 1981-02-12 1982-08-18 Canon Inc Variable magnification optical device
US4372670A (en) * 1981-02-23 1983-02-08 Xerox Corporation Precession scanning system
US5614988A (en) * 1993-12-06 1997-03-25 Nikon Corporation Projection exposure apparatus and method with a plurality of projection optical units
JPH09293676A (ja) * 1996-04-24 1997-11-11 Nikon Corp 投影光学系及び投影露光装置
JPH1064807A (ja) * 1996-08-19 1998-03-06 Nikon Corp 縮小投影走査型露光装置
DE19757074A1 (de) 1997-12-20 1999-06-24 Zeiss Carl Fa Projektionsbelichtungsanlage und Belichtungsverfahren
KR20010075157A (ko) * 1998-09-17 2001-08-09 오노 시게오 투영광학계의 조정방법
KR100827874B1 (ko) * 2000-05-22 2008-05-07 가부시키가이샤 니콘 노광 장치, 노광 장치의 제조 방법, 노광 방법, 마이크로 장치의 제조 방법, 및 디바이스의 제조 방법
TWI232348B (en) * 2001-12-26 2005-05-11 Pentax Corp Projection aligner
SE0200547D0 (sv) * 2002-02-25 2002-02-25 Micronic Laser Systems Ab An image forming method and apparatus
JP4707924B2 (ja) 2002-08-30 2011-06-22 株式会社ニコン 投影光学系、露光装置、及びマイクロデバイスの製造方法
JP4490165B2 (ja) * 2004-05-18 2010-06-23 大日本印刷株式会社 露光装置
US7283210B2 (en) * 2005-03-22 2007-10-16 Nikon Corporation Image shift optic for optical system
JP4984810B2 (ja) * 2006-02-16 2012-07-25 株式会社ニコン 露光方法、露光装置及びフォトマスク
JP4952182B2 (ja) * 2006-03-20 2012-06-13 株式会社ニコン 走査型露光装置、マイクロデバイスの製造方法、走査露光方法、及びマスク
WO2007119292A1 (ja) * 2006-03-20 2007-10-25 Nikon Corporation 反射屈折投影光学系、反射屈折光学装置、走査露光装置、マイクロデバイスの製造方法
US20080165333A1 (en) * 2007-01-04 2008-07-10 Nikon Corporation Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method
JP5335397B2 (ja) * 2008-02-15 2013-11-06 キヤノン株式会社 露光装置

Also Published As

Publication number Publication date
US20090213348A1 (en) 2009-08-27
JP2009217244A (ja) 2009-09-24
US8294874B2 (en) 2012-10-23
KR101037278B1 (ko) 2011-05-26
KR20090088805A (ko) 2009-08-20
TWI414898B (zh) 2013-11-11
TW200951627A (en) 2009-12-16

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