JP2009217244A5 - - Google Patents

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Publication number
JP2009217244A5
JP2009217244A5 JP2008320382A JP2008320382A JP2009217244A5 JP 2009217244 A5 JP2009217244 A5 JP 2009217244A5 JP 2008320382 A JP2008320382 A JP 2008320382A JP 2008320382 A JP2008320382 A JP 2008320382A JP 2009217244 A5 JP2009217244 A5 JP 2009217244A5
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JP
Japan
Prior art keywords
projection optical
optical system
scanning direction
exposure apparatus
optical systems
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2008320382A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009217244A (ja
JP5335397B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2008320382A priority Critical patent/JP5335397B2/ja
Priority claimed from JP2008320382A external-priority patent/JP5335397B2/ja
Priority to KR1020090011244A priority patent/KR101037278B1/ko
Priority to US12/370,959 priority patent/US8294874B2/en
Priority to TW098104708A priority patent/TWI414898B/zh
Publication of JP2009217244A publication Critical patent/JP2009217244A/ja
Publication of JP2009217244A5 publication Critical patent/JP2009217244A5/ja
Application granted granted Critical
Publication of JP5335397B2 publication Critical patent/JP5335397B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2008320382A 2008-02-15 2008-12-17 露光装置 Expired - Fee Related JP5335397B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2008320382A JP5335397B2 (ja) 2008-02-15 2008-12-17 露光装置
KR1020090011244A KR101037278B1 (ko) 2008-02-15 2009-02-12 노광장치
US12/370,959 US8294874B2 (en) 2008-02-15 2009-02-13 Exposure apparatus
TW098104708A TWI414898B (zh) 2008-02-15 2009-02-13 曝光設備

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2008035040 2008-02-15
JP2008035040 2008-02-15
JP2008320382A JP5335397B2 (ja) 2008-02-15 2008-12-17 露光装置

Publications (3)

Publication Number Publication Date
JP2009217244A JP2009217244A (ja) 2009-09-24
JP2009217244A5 true JP2009217244A5 (enExample) 2012-02-02
JP5335397B2 JP5335397B2 (ja) 2013-11-06

Family

ID=40997968

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008320382A Expired - Fee Related JP5335397B2 (ja) 2008-02-15 2008-12-17 露光装置

Country Status (4)

Country Link
US (1) US8294874B2 (enExample)
JP (1) JP5335397B2 (enExample)
KR (1) KR101037278B1 (enExample)
TW (1) TWI414898B (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5335397B2 (ja) * 2008-02-15 2013-11-06 キヤノン株式会社 露光装置
WO2023282214A1 (ja) * 2021-07-05 2023-01-12 株式会社ニコン 空間光変調ユニットおよび露光装置

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57133447A (en) * 1981-02-12 1982-08-18 Canon Inc Variable magnification optical device
US4372670A (en) * 1981-02-23 1983-02-08 Xerox Corporation Precession scanning system
US5614988A (en) * 1993-12-06 1997-03-25 Nikon Corporation Projection exposure apparatus and method with a plurality of projection optical units
JPH09293676A (ja) * 1996-04-24 1997-11-11 Nikon Corp 投影光学系及び投影露光装置
JPH1064807A (ja) * 1996-08-19 1998-03-06 Nikon Corp 縮小投影走査型露光装置
DE19757074A1 (de) 1997-12-20 1999-06-24 Zeiss Carl Fa Projektionsbelichtungsanlage und Belichtungsverfahren
KR20010075157A (ko) * 1998-09-17 2001-08-09 오노 시게오 투영광학계의 조정방법
KR100827874B1 (ko) * 2000-05-22 2008-05-07 가부시키가이샤 니콘 노광 장치, 노광 장치의 제조 방법, 노광 방법, 마이크로 장치의 제조 방법, 및 디바이스의 제조 방법
TWI232348B (en) * 2001-12-26 2005-05-11 Pentax Corp Projection aligner
SE0200547D0 (sv) * 2002-02-25 2002-02-25 Micronic Laser Systems Ab An image forming method and apparatus
JP4707924B2 (ja) 2002-08-30 2011-06-22 株式会社ニコン 投影光学系、露光装置、及びマイクロデバイスの製造方法
JP4490165B2 (ja) * 2004-05-18 2010-06-23 大日本印刷株式会社 露光装置
US7283210B2 (en) * 2005-03-22 2007-10-16 Nikon Corporation Image shift optic for optical system
JP4984810B2 (ja) * 2006-02-16 2012-07-25 株式会社ニコン 露光方法、露光装置及びフォトマスク
JP4952182B2 (ja) * 2006-03-20 2012-06-13 株式会社ニコン 走査型露光装置、マイクロデバイスの製造方法、走査露光方法、及びマスク
WO2007119292A1 (ja) * 2006-03-20 2007-10-25 Nikon Corporation 反射屈折投影光学系、反射屈折光学装置、走査露光装置、マイクロデバイスの製造方法
US20080165333A1 (en) * 2007-01-04 2008-07-10 Nikon Corporation Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method
JP5335397B2 (ja) * 2008-02-15 2013-11-06 キヤノン株式会社 露光装置

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