TW200834258A - Projection optical apparatus, exposure method and apparatus, and device manufacturing method - Google Patents
Projection optical apparatus, exposure method and apparatus, and device manufacturing methodInfo
- Publication number
- TW200834258A TW200834258A TW096147452A TW96147452A TW200834258A TW 200834258 A TW200834258 A TW 200834258A TW 096147452 A TW096147452 A TW 096147452A TW 96147452 A TW96147452 A TW 96147452A TW 200834258 A TW200834258 A TW 200834258A
- Authority
- TW
- Taiwan
- Prior art keywords
- mask
- projection optical
- substrate
- line segment
- pattern
- Prior art date
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
The present invention provides a projection exposure apparatus for minimizing the size of a mask pattern when forming a magnified image of the mask pattern on an object with a plurality of projection optical systems. The projection exposure apparatus relateively moves a mask (MA) and a substrate (PT), and forms a magnified image of a pattern of the mask (MA) on the substrate (PT). The apparatus includes projection optical systems (PL1, PL2) having the same enlargement magnification and forming an image of the pattern of the mask (MA) on the substrate (PT); a first line segment formed by connecting view points (a, b) of the projection optical systems (PL1, PL2) on the mask (MA); and a second line segment formed by connecting conjugate points (A, B) of the view points on the substrate (PT). The first line segment and the second line segment form corresponding sides of two similar figures of which a magnification ratio is the magnification.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US87845207P | 2007-01-04 | 2007-01-04 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200834258A true TW200834258A (en) | 2008-08-16 |
TWI432914B TWI432914B (en) | 2014-04-01 |
Family
ID=41484243
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW096147452A TWI432914B (en) | 2007-01-04 | 2007-12-12 | Projection optical apparatus, exposure method and apparatus, and device manufacturing method |
Country Status (2)
Country | Link |
---|---|
CN (1) | CN101611352B (en) |
TW (1) | TWI432914B (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8755029B2 (en) | 2008-10-03 | 2014-06-17 | National Chiao Tung University | Immersion lithography apparatus and tank thereof |
TWI770570B (en) * | 2019-08-21 | 2022-07-11 | 日商斯庫林集團股份有限公司 | Drawing method and drawing apparatus |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103969958B (en) * | 2013-01-25 | 2016-03-30 | 上海微电子装备有限公司 | A kind of many exposure field splicing system and method |
JP6399739B2 (en) * | 2013-09-27 | 2018-10-03 | キヤノン株式会社 | Exposure apparatus, exposure method, and device manufacturing method |
CN105116692B (en) * | 2015-09-24 | 2018-03-09 | 京东方科技集团股份有限公司 | A kind of exposure device and exposure method |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19757074A1 (en) * | 1997-12-20 | 1999-06-24 | Zeiss Carl Fa | Projection exposure system and exposure method |
JP4323863B2 (en) * | 2003-05-22 | 2009-09-02 | 大日本スクリーン製造株式会社 | Pattern drawing device |
-
2007
- 2007-12-12 TW TW096147452A patent/TWI432914B/en active
- 2007-12-25 CN CN2007800492610A patent/CN101611352B/en active Active
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8755029B2 (en) | 2008-10-03 | 2014-06-17 | National Chiao Tung University | Immersion lithography apparatus and tank thereof |
TWI770570B (en) * | 2019-08-21 | 2022-07-11 | 日商斯庫林集團股份有限公司 | Drawing method and drawing apparatus |
Also Published As
Publication number | Publication date |
---|---|
TWI432914B (en) | 2014-04-01 |
CN101611352B (en) | 2012-07-18 |
CN101611352A (en) | 2009-12-23 |
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