TW200834258A - Projection optical apparatus, exposure method and apparatus, and device manufacturing method - Google Patents

Projection optical apparatus, exposure method and apparatus, and device manufacturing method

Info

Publication number
TW200834258A
TW200834258A TW096147452A TW96147452A TW200834258A TW 200834258 A TW200834258 A TW 200834258A TW 096147452 A TW096147452 A TW 096147452A TW 96147452 A TW96147452 A TW 96147452A TW 200834258 A TW200834258 A TW 200834258A
Authority
TW
Taiwan
Prior art keywords
mask
projection optical
substrate
line segment
pattern
Prior art date
Application number
TW096147452A
Other languages
Chinese (zh)
Other versions
TWI432914B (en
Inventor
Masato Kumazawa
Michio Noboru
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW200834258A publication Critical patent/TW200834258A/en
Application granted granted Critical
Publication of TWI432914B publication Critical patent/TWI432914B/en

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

The present invention provides a projection exposure apparatus for minimizing the size of a mask pattern when forming a magnified image of the mask pattern on an object with a plurality of projection optical systems. The projection exposure apparatus relateively moves a mask (MA) and a substrate (PT), and forms a magnified image of a pattern of the mask (MA) on the substrate (PT). The apparatus includes projection optical systems (PL1, PL2) having the same enlargement magnification and forming an image of the pattern of the mask (MA) on the substrate (PT); a first line segment formed by connecting view points (a, b) of the projection optical systems (PL1, PL2) on the mask (MA); and a second line segment formed by connecting conjugate points (A, B) of the view points on the substrate (PT). The first line segment and the second line segment form corresponding sides of two similar figures of which a magnification ratio is the magnification.
TW096147452A 2007-01-04 2007-12-12 Projection optical apparatus, exposure method and apparatus, and device manufacturing method TWI432914B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US87845207P 2007-01-04 2007-01-04

Publications (2)

Publication Number Publication Date
TW200834258A true TW200834258A (en) 2008-08-16
TWI432914B TWI432914B (en) 2014-04-01

Family

ID=41484243

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096147452A TWI432914B (en) 2007-01-04 2007-12-12 Projection optical apparatus, exposure method and apparatus, and device manufacturing method

Country Status (2)

Country Link
CN (1) CN101611352B (en)
TW (1) TWI432914B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8755029B2 (en) 2008-10-03 2014-06-17 National Chiao Tung University Immersion lithography apparatus and tank thereof
TWI770570B (en) * 2019-08-21 2022-07-11 日商斯庫林集團股份有限公司 Drawing method and drawing apparatus

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103969958B (en) * 2013-01-25 2016-03-30 上海微电子装备有限公司 A kind of many exposure field splicing system and method
JP6399739B2 (en) * 2013-09-27 2018-10-03 キヤノン株式会社 Exposure apparatus, exposure method, and device manufacturing method
CN105116692B (en) * 2015-09-24 2018-03-09 京东方科技集团股份有限公司 A kind of exposure device and exposure method

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19757074A1 (en) * 1997-12-20 1999-06-24 Zeiss Carl Fa Projection exposure system and exposure method
JP4323863B2 (en) * 2003-05-22 2009-09-02 大日本スクリーン製造株式会社 Pattern drawing device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8755029B2 (en) 2008-10-03 2014-06-17 National Chiao Tung University Immersion lithography apparatus and tank thereof
TWI770570B (en) * 2019-08-21 2022-07-11 日商斯庫林集團股份有限公司 Drawing method and drawing apparatus

Also Published As

Publication number Publication date
TWI432914B (en) 2014-04-01
CN101611352B (en) 2012-07-18
CN101611352A (en) 2009-12-23

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