JP2013219089A5

JP2013219089A5 -

Info

Publication number: JP2013219089A5
Application number: JP2012085893A
Authority: JP
Filing date: 2012-04-04
Publication date: 2015-05-28

Description

上記の目的を達成する本発明の一つの側面に係る光学系は、物体面から像面に至る光路に配置され、前記物体面に配置された物体の像を前記像面に投影する投影光学系の倍率およびフォーカスを調整する光学系であって、
前記投影光学系の光軸に直交する平面と前記平面の反対面に曲面とを有する第１光学素子と、
前記第１光学素子の前記曲面に対向する曲面を有する第２光学素子と、
前記投影光学系の光軸に直交する第１の方向に母線を持つシリンドリカル面を有する第３光学素子と、
前記第１の方向に母線を持ち前記第３光学素子の前記シリンドリカル面に対向するシリンドリカル面と、当該シリンドリカル面の反対面に前記投影光学系の光軸に直交する平面と、を有する第４光学素子と、
を備え、
前記第２光学素子は、前記曲面の反対面に前記第１の方向に対して勾配を持った傾斜平面を有し、
前記第３光学素子は、前記シリンドリカル面の反対面に、前記第２光学素子の傾斜平面と対向し、前記第２光学素子の前記傾斜平面に対して平行な傾斜平面を有することを特徴とする。
An optical system according to one aspect of the present invention that achieves the above object is disposed in an optical path from an object plane to an image plane, and projects an image of the object disposed on the object plane onto the image plane. An optical system for adjusting the magnification and focus of
A first optical element having a plane orthogonal to the optical axis of the projection optical system and a curved surface opposite to the plane;
A second optical element having a curved surface against countercurrent to the song surface of the first optical element,
A third optical element having a cylindrical surface having a generating line in a first direction perpendicular to the optical axis of the projection optical system;
4 having a cylindrical surface against countercurrent to the cylindrical surface of the third optical element has a generatrix in the first direction, and a plane perpendicular to the optical axis of the projection optical system on the opposite side of the cylindrical surface, the An optical element;
With
The second optical element has an inclined plane having a gradient with respect to the first direction on the opposite surface of the curved surface,
The third optical element has an inclined plane parallel to the inclined plane of the second optical element and opposite to the inclined plane of the second optical element on the opposite surface of the cylindrical surface. .

Claims

An optical system that is arranged in an optical path from an object plane to an image plane and adjusts the magnification and focus of a projection optical system that projects an image of the object arranged on the object plane onto the image plane,
A first optical element having a plane orthogonal to the optical axis of the projection optical system and a curved surface opposite to the plane;
A second optical element having a curved surface against countercurrent to the song surface of the first optical element,
A third optical element having a cylindrical surface having a generating line in a first direction perpendicular to the optical axis of the projection optical system;
4 having a cylindrical surface against countercurrent to the cylindrical surface of the third optical element has a generatrix in the first direction, and a plane perpendicular to the optical axis of the projection optical system on the opposite side of the cylindrical surface, the An optical element;
With
The second optical element has an inclined plane having a gradient with respect to the first direction on the opposite surface of the curved surface,
The third optical element has an inclined plane parallel to the inclined plane of the second optical element and opposite to the inclined plane of the second optical element on the opposite surface of the cylindrical surface. Optical system.

Adjusting the magnification of the projection optical system by adjusting at least one of an interval between the first optical element and the second optical element and an interval between the third optical element and the fourth optical element. The optical system according to claim 1.

The focus of the projection optical system is adjusted by moving the third optical element in a state where the inclined plane of the third optical element is parallel to the inclined plane of the second optical element. Item 3. The optical system according to Item 1 or 2.

The distance between the first optical element and the second optical element can be adjusted by moving the first optical element in the optical axis direction of the projection optical system,
The distance between the third optical element and the fourth optical element can be adjusted by moving the fourth optical element in the optical axis direction of the projection optical system,
4. The optical system according to claim 1, wherein a magnification of the projection optical system is adjusted by movement of the first optical element and movement of the fourth optical element. 5.

The third optical element is movable in a direction in which the inclined plane of the third optical element is parallel to the inclined plane of the second optical element;
When the third optical element moves, the fourth optical element is movable in the optical axis direction of the projection optical system so as to maintain a distance between the third optical element and the fourth optical element. ,
5. The optical system according to claim 1, wherein the focus of the projection optical system is adjusted by movement of the third optical element and movement of the fourth optical element.

The curved surface of the first optical element is a concave cylindrical surface having a first curvature and having a generating line in a second direction orthogonal to the optical axis direction of the projection optical system and the first direction;
6. The curved surface of the second optical element is a convex cylindrical surface having the first curvature and having a generatrix in the second direction. The optical system described.

The curved surface of the first optical element is a concave spherical surface having a first curvature;
The optical system according to claim 1, wherein the curved surface of the second optical element is a convex spherical surface having the first curvature.

The curved surface of the first optical element is a convex cylindrical surface having a first curvature and having a generating line in a second direction orthogonal to the optical axis direction of the projection optical system and the first direction;
6. The curved surface of the second optical element is a concave cylindrical surface having the first curvature and having a generatrix in the second direction. Optical system.

The curved surface of the first optical element is a convex spherical surface having a first curvature;
6. The optical system according to claim 1, wherein the curved surface of the second optical element is a concave spherical surface having the first curvature.

The cylindrical surface of the third optical element is a concave cylindrical surface having a second curvature;
10. The optical system according to claim 1, wherein the cylindrical surface of the fourth optical element is a convex cylindrical surface having the second curvature.

The cylindrical surface of the third optical element is a convex cylindrical surface having a second curvature;
The optical system according to any one of claims 1 to 9, wherein the cylindrical surface of the fourth optical element is a concave cylindrical surface having the second curvature.

An exposure apparatus having a projection optical system that projects a mask pattern onto a substrate,
An exposure apparatus comprising: the projection optical system comprising the optical system according to any one of claims 1 to 11.

A device manufacturing method comprising:
A step of exposing a substrate coated with a photosensitive agent by an exposure apparatus according to claim 12;
Developing the photosensitive agent;
A device manufacturing method comprising: