JP2011108793A5

JP2011108793A5 - Projection optical system, exposure apparatus, and device manufacturing method

Info

Publication number: JP2011108793A5
Application number: JP2009261319A
Authority: JP
Filing date: 2009-11-16
Publication date: 2013-01-10
Anticipated expiration: 2029-11-16

Description

本発明は、投影光学系、露光装置およびそれを使ってデバイスを製造するデバイス製造方法に関する。 The present invention relates to a projection optical system, an exposure apparatus, and a device manufacturing method for manufacturing a device using the same.

本発明の１つの側面は、原版のパターンを基板に投影する投影光学系に係り、前記投影光学系は、光路を折り曲げる第１鏡および第２鏡と、前記投影光学系の物体面と前記第１鏡との間に配置された第１光学部材と、前記投影光学系の像面と前記第２鏡との間に配置された第２光学部材とを備え、前記第１光学部材および前記第２光学部材のうちの一方は、パワーを有し、移動可能な屈折光学部材であり、他方は、変形可能な平行平板であり、前記屈折光学部材の位置を変更することによって発生する前記投影光学系のディストーションおよび非点収差のうちの一方が、前記平行平板を変形させることによって低減され、又は、前記平行平板を変形させることによって発生する前記投影光学系のディストーションおよび非点収差のうちの一方が、前記屈折光学部材の位置を変更することによって低減される。One aspect of the present invention relates to a projection optical system that projects an original pattern onto a substrate. The projection optical system includes a first mirror and a second mirror that bend an optical path, an object surface of the projection optical system, and the first surface. A first optical member disposed between the first mirror and a second optical member disposed between the image plane of the projection optical system and the second mirror; and the first optical member and the first optical member. One of the two optical members is a refractive optical member that has power and is movable, and the other is a parallel plate that can be deformed, and the projection optical generated by changing the position of the refractive optical member One of distortion and astigmatism of the system is reduced by deforming the parallel plate, or one of distortion and astigmatism of the projection optical system generated by deforming the parallel plate It is reduced by changing the position of the refractive optical element.

Claims

A projection optical system that projects an original pattern onto a substrate,
A first mirror and a second mirror for bending the optical path; a first optical member disposed between the object plane of the projection optical system and the first mirror ; an image plane of the projection optical system; and the second mirror. and a second optical member disposed between,
Wherein one of the first optical member and the second optical member, have a power, a refractive optical member movable and the other is a deformable parallel plate,
One of the distortion and the astigmatism of the projection optical system caused by changing the position of the pre-Symbol refractive optical member is reduced by deforming the prior SL parallel plate, or,
One of the distortion and the astigmatism of the projection optical system generated by deforming the prior SL parallel plate is reduced by changing the position of the pre-Symbol refractive optical element,
A projection optical system characterized by that.

The refractive optical member has a cylindrical surface;
The projection optical system according to claim 1.

The first optical member is a refractive optical member having power, and the second optical member is a parallel plate.
The projection optical system according to claim 1, wherein the projection optical system is a projection optical system .

The first optical member is a parallel plate, and the second optical member is a refractive optical member having power.
The projection optical system according to claim 1, wherein the projection optical system is a projection optical system .

An exposure apparatus comprising the projection optical system according to claim 1.

A device manufacturing method for manufacturing a device, comprising:
Applying a photosensitive agent to the substrate;
Exposing the substrate using the exposure apparatus according to claim 5 ;
Developing the substrate;
A device manufacturing method comprising: