JP5595015B2 - Projection optical system, exposure apparatus, and device manufacturing method - Google Patents

Projection optical system, exposure apparatus, and device manufacturing method Download PDF

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JP5595015B2
JP5595015B2 JP2009261319A JP2009261319A JP5595015B2 JP 5595015 B2 JP5595015 B2 JP 5595015B2 JP 2009261319 A JP2009261319 A JP 2009261319A JP 2009261319 A JP2009261319 A JP 2009261319A JP 5595015 B2 JP5595015 B2 JP 5595015B2
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optical system
projection optical
optical member
parallel plate
refractive
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JP2011108793A5 (en
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文靖 大野
恭一 宮▲崎▼
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Canon Inc
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes

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  • Engineering & Computer Science (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Description

本発明は、投影光学系、露光装置およびそれを使ってデバイスを製造するデバイス製造方法に関する。 The present invention relates to a projection optical system, an exposure apparatus, and a device manufacturing method for manufacturing a device using the same.

ＦＰＤ（フラットパネルディスプレイ）や半導体デバイスなどのデバイスは、フォトリソグラフィ工程を経て製造される。このリソグラフィ工程において、投影光学系を有する露光装置が使用される。近年におけるディスプレイの高精細化に伴って、露光装置には、解像性能および重ね合わせ精度の向上が求められている。解像性能の低下は、例えば、投影光学系の非点収差によって引き起こされうる。重ね合わせ精度の低下は、例えば、基板の伸縮によって引き起こされうる。基板の伸縮は、温度環境の変化によって、或いは、基板が現像等のプロセスを経ることによって起こりうる。一般的にデバイスは複数の層を重ね合わせて構成されるので、基板に伸縮が発生すると、基板に既に形成されているパターンとその上に新たに形成されるパターンとの重ね合わせ精度が低下する。特許文献１には、基板に伸縮が発生した場合に、投影光学系に組み込まれた光学薄体を変形させることによって重ね合わせ誤差を補正することが記載されている。   Devices such as FPD (flat panel display) and semiconductor devices are manufactured through a photolithography process. In this lithography process, an exposure apparatus having a projection optical system is used. With the recent increase in definition of displays, exposure apparatuses are required to improve resolution performance and overlay accuracy. The degradation of the resolution performance can be caused by, for example, astigmatism of the projection optical system. A decrease in overlay accuracy can be caused by, for example, expansion / contraction of the substrate. The expansion and contraction of the substrate can occur due to a change in temperature environment or through a process such as development. In general, since a device is configured by overlapping a plurality of layers, when the substrate expands or contracts, the overlay accuracy between a pattern already formed on the substrate and a pattern newly formed thereon decreases. . Japanese Patent Application Laid-Open No. H10-228707 describes correcting an overlay error by deforming an optical thin body incorporated in a projection optical system when expansion or contraction occurs in a substrate.

特開平８−３０６６１８号公報JP-A-8-306618

重ね合わせ精度を向上させるために、投影光学系のディストーションが調整されうる。この場合におけるディストーションの調整は、投影光学系の結像倍率を変化させることを目的とするものである。ディストーションの調整は、例えば、投影光学系に含まれる光学部材を変形させることによってなされうる。しかしながら、例えば、光学部材を変形させることによって投影光学系のディストーションが所望の状態に調整されたとしても、それによって非点収差が大きくなって解像性能が低下するのであれば、収率の向上は望めない。同様に、投影光学系の非点収差を調整したときにディストーションが所望の状態からずれるのあれば、収率の向上は望めない。   In order to improve the overlay accuracy, the distortion of the projection optical system can be adjusted. The purpose of the distortion adjustment in this case is to change the imaging magnification of the projection optical system. The distortion can be adjusted, for example, by deforming an optical member included in the projection optical system. However, for example, even if the distortion of the projection optical system is adjusted to a desired state by deforming the optical member, if the astigmatism increases and the resolution performance decreases, the yield is improved. Can't hope. Similarly, if the distortion shifts from a desired state when the astigmatism of the projection optical system is adjusted, an improvement in yield cannot be expected.

本発明は、上記の課題認識を契機としてなされたものであり、ディストーションおよび非点収差のうちの一方を調整したことによる他方への影響を低減することを目的とする。   The present invention has been made with the above problem recognition as an opportunity, and it is an object of the present invention to reduce the influence on one of distortion and astigmatism that has been adjusted.

本発明の１つの側面は、原版のパターンを基板に投影する投影光学系に係り、前記投影光学系は、光路を折り曲げる第１鏡および第２鏡と、前記投影光学系の物体面と前記第１鏡との間に配置された第１光学部材と、前記投影光学系の像面と前記第２鏡との間に配置された第２光学部材とを備え、前記第１光学部材および前記第２光学部材のうちの一方は、パワーを有し、移動可能な屈折光学部材であり、他方は、変形可能な平行平板であり、前記屈折光学部材の位置を変更することによって発生する前記投影光学系のディストーションおよび非点収差のうちの一方が、前記平行平板を変形させることによって低減され、又は、前記平行平板を変形させることによって発生する前記投影光学系のディストーションおよび非点収差のうちの一方が、前記屈折光学部材の位置を変更することによって低減される。One aspect of the present invention relates to a projection optical system that projects an original pattern onto a substrate. The projection optical system includes a first mirror and a second mirror that bend an optical path, an object surface of the projection optical system, and the first surface. A first optical member disposed between the first mirror and a second optical member disposed between the image plane of the projection optical system and the second mirror; and the first optical member and the first optical member. One of the two optical members is a refractive optical member that has power and is movable, and the other is a parallel plate that can be deformed, and the projection optical generated by changing the position of the refractive optical member One of distortion and astigmatism of the system is reduced by deforming the parallel plate, or one of distortion and astigmatism of the projection optical system generated by deforming the parallel plate It is reduced by changing the position of the refractive optical element.

本発明によれば、例えば、ディストーションおよび非点収差のうちの一方を調整したことによる他方への影響を低減することができる。   According to the present invention, for example, the influence on one of distortion and astigmatism can be reduced.

本発明の１つの実施形態の露光装置の概略構成を示す図である。It is a figure which shows schematic structure of the exposure apparatus of one Embodiment of this invention. 投影光学系のディストーションと非点収差を例示する図である。It is a figure which illustrates the distortion and astigmatism of a projection optical system. 屈折光学部材を例示する図である。It is a figure which illustrates a refractive optical member. 投影光学系のディストーションの補正を例示する図である。It is a figure which illustrates correction | amendment of the distortion of a projection optical system. 投影光学系のディストーションと非点収差を例示する図である。It is a figure which illustrates the distortion and astigmatism of a projection optical system. 投影光学系の非点収差の補正を例示する図である。It is a figure which illustrates correction | amendment of astigmatism of a projection optical system.

以下に、本発明の実施形態を添付図面を参照しながら説明する。   Embodiments of the present invention will be described below with reference to the accompanying drawings.

図１を参照しながら本発明の１つの実施形態の露光装置について説明する。露光装置１００は、照明系ＩＬと、投影光学系ＰＯと、原版駆動機構１０と、基板駆動機構１２と、制御部２３とを備える。照明系ＩＬは、例えば、光源ＬＳ、第１コンデンサーレンズ３、フライアイレンズ４、第２コンデンサーレンズ５、スリット規定部材６、結像光学系７、平面鏡８を含みうる。光源ＬＳは、例えば、水銀ランプ１と、楕円ミラー２とを含みうる。スリット規定部材６は、原版９の照明範囲（即ち、原版９を照明するスリット形状光の断面形状）を規定する。結像光学系７は、スリット規定部材６によって規定されるスリットを物体面に結像させるように配置されている。平面鏡８は、照明系ＩＬにおいて光路を折り曲げる。照明系ＩＬに備えられる光源ＬＳは、生産されるデバイスにより最適なものが選択可能であり、液晶パネルの製造では高圧水銀ランプなどが用いられるが、本発明の効果は使用する光源に限定されるものではない。   An exposure apparatus according to one embodiment of the present invention will be described with reference to FIG. The exposure apparatus 100 includes an illumination system IL, a projection optical system PO, an original plate driving mechanism 10, a substrate driving mechanism 12, and a control unit 23. The illumination system IL may include, for example, a light source LS, a first condenser lens 3, a fly-eye lens 4, a second condenser lens 5, a slit defining member 6, an imaging optical system 7, and a plane mirror 8. The light source LS can include, for example, a mercury lamp 1 and an elliptical mirror 2. The slit defining member 6 defines the illumination range of the original 9 (that is, the cross-sectional shape of slit-shaped light that illuminates the original 9). The imaging optical system 7 is disposed so that the slit defined by the slit defining member 6 is imaged on the object plane. The plane mirror 8 bends the optical path in the illumination system IL. As the light source LS provided in the illumination system IL, an optimum light source LS can be selected depending on a device to be produced, and a high-pressure mercury lamp or the like is used in manufacturing a liquid crystal panel. However, the effect of the present invention is limited to the light source to be used. It is not a thing.

原版駆動機構１０は、投影光学系ＰＯの物体面に原版９を配置し、該物体面において原版９を走査する。基板駆動機構１２は、投影光学系ＰＯの像面に基板１１を配置し、該像面において基板１１を走査する。投影光学系ＰＯは、物体面に配置される原版９のパターンを像面に配置される基板１１に投影し、これにより基板１１が露光される。   The original drive mechanism 10 arranges the original 9 on the object plane of the projection optical system PO, and scans the original 9 on the object plane. The substrate driving mechanism 12 arranges the substrate 11 on the image plane of the projection optical system PO, and scans the substrate 11 on the image plane. The projection optical system PO projects the pattern of the original plate 9 arranged on the object plane onto the substrate 11 arranged on the image plane, whereby the substrate 11 is exposed.

投影光学系ＰＯは、等倍結像光学系、拡大結像光学系および縮小結像光学系のいずれとしても構成されうるが、等倍結像光学系として構成されることが好ましい。投影光学系ＰＯは、物体面から像面に至る光路に、物体面から順に配置された第１平面鏡１３、凹面鏡１４、凸面鏡１６、凹面鏡１４、第２平面鏡１７を有する。ここで、第１平面鏡１３と凸面鏡１６との間に配置される凹面鏡１４と、凸面鏡１６と第２平面鏡１７との間に配置される凹面鏡１４とは、一体化されていてもよいし、別体であってもよい。第１平面鏡１３の鏡面を含む平面と第２平面鏡１７の鏡面を含む平面とは、互いに９０度の角度をなす。第１平面鏡１３と第２平面鏡１７とは、一体的に形成されてもよい。投影光学系ＰＯはまた、凹面鏡１４と凸面鏡１６との間に配置された屈折光学系１５を有する。   The projection optical system PO can be configured as any one of an equal magnification imaging optical system, an enlarged imaging optical system, and a reduced imaging optical system, but is preferably configured as an equal magnification imaging optical system. The projection optical system PO has a first plane mirror 13, a concave mirror 14, a convex mirror 16, a concave mirror 14, and a second plane mirror 17 arranged in this order from the object plane in the optical path from the object plane to the image plane. Here, the concave mirror 14 disposed between the first plane mirror 13 and the convex mirror 16 and the concave mirror 14 disposed between the convex mirror 16 and the second plane mirror 17 may be integrated with each other. It may be a body. The plane including the mirror surface of the first plane mirror 13 and the plane including the mirror surface of the second plane mirror 17 form an angle of 90 degrees with each other. The first plane mirror 13 and the second plane mirror 17 may be integrally formed. The projection optical system PO also has a refractive optical system 15 disposed between the concave mirror 14 and the convex mirror 16.

投影光学系ＰＯはまた、その物体面（或いは原版駆動機構１０）と第１平面鏡１３の間に第１光学部材としてのパワーを有する屈折光学部材１８を有し、その像面（或いは基板駆動機構１２）と第２平面鏡１７との間に第２光学部材としての平行平板２１を有する。屈折光学部材１８は、第１駆動機構としての駆動機構１９により保持され、平行平板２１は、第２駆動機構としての駆動機構２０によって保持されている。駆動機構１９は、制御部２３からの指令に応答して屈折光学部材１８の位置を調整するように構成され、駆動機構２０は、制御部２３からの指令に応答して平行平板２１を変形させるように構成される。以上とは逆に、第１光学部材を平行平板とし、該平行平板を変形させる第２駆動機構によって該平行平板を変形させ、第２光学部材をパワーを有する屈折光学部材とし、該屈折光学部材の位置を調整する第１駆動機構によって該屈折光学部材の位置を調整してもよい。   The projection optical system PO also includes a refractive optical member 18 having power as a first optical member between the object plane (or the original plate driving mechanism 10) and the first plane mirror 13, and the image plane (or substrate driving mechanism). 12) and the second plane mirror 17 have a parallel plate 21 as a second optical member. The refractive optical member 18 is held by a drive mechanism 19 as a first drive mechanism, and the parallel plate 21 is held by a drive mechanism 20 as a second drive mechanism. The drive mechanism 19 is configured to adjust the position of the refractive optical member 18 in response to a command from the control unit 23, and the drive mechanism 20 deforms the parallel plate 21 in response to a command from the control unit 23. Configured as follows. Contrary to the above, the first optical member is a parallel plate, the parallel plate is deformed by a second drive mechanism that deforms the parallel plate, and the second optical member is a refractive optical member having power, and the refractive optical member The position of the refractive optical member may be adjusted by a first driving mechanism that adjusts the position of the refractive optical member.

投影光学系ＰＯの物体面と第１平面鏡１３の間に配置される光学部材を第１光学部材、投影光学系ＰＯの像面と第２平面鏡１７との間に配置される光学部材を第２光学部材として定義することができる。この定義において、第１光学部材および第２光学部材のうちの一方は、パワーを有する屈折光学部材であり、第１光学部材および第２光学部材のうちの他方は、平行平板でありうる。   An optical member disposed between the object plane of the projection optical system PO and the first plane mirror 13 is a first optical member, and an optical member disposed between the image plane of the projection optical system PO and the second plane mirror 17 is a second optical member. It can be defined as an optical member. In this definition, one of the first optical member and the second optical member may be a refractive optical member having power, and the other of the first optical member and the second optical member may be a parallel plate.

投影光学系ＰＯはまた、第２平面鏡１７と平行平板２１との間に、追加の屈折光学系２２を有してもよい。追加の屈折光学系２２は、投影光学系ＰＯの結像性能の改善のために設けられうる。追加の屈折光学系２２は、平行平板２１と投影光学系ＰＯの像面との間に配置されてもよい。投影光学系ＰＯはさらに、原版駆動機構１０と屈折光学部材１８との間に、追加の屈折光学系２４を有してもよい。追加の屈折光学系２４は投影光学系ＰＯの結像性能の改善のために設けられうる。追加の屈折光学系２４は、屈折光学部材１８と第１の平面鏡１３の間に配置されてもよい。   The projection optical system PO may also include an additional refractive optical system 22 between the second plane mirror 17 and the parallel plate 21. The additional refractive optical system 22 can be provided to improve the imaging performance of the projection optical system PO. The additional refractive optical system 22 may be disposed between the parallel plate 21 and the image plane of the projection optical system PO. The projection optical system PO may further include an additional refractive optical system 24 between the original plate driving mechanism 10 and the refractive optical member 18. The additional refractive optical system 24 can be provided for improving the imaging performance of the projection optical system PO. The additional refractive optical system 24 may be disposed between the refractive optical member 18 and the first plane mirror 13.

投影光学系ＰＯは、光軸外の円弧状に良像域を有し、その良像域が基板の露光のために使用される。図１において、凸面鏡１６から凹面鏡１４に向かう方向をｙ軸の正方向、基板１１から原版９に向かう方向をｚ軸の正方向、ｙ軸とｚ軸に対して右手系をなす向きをｘ軸とする。   The projection optical system PO has a good image area in an arc shape outside the optical axis, and the good image area is used for exposure of the substrate. In FIG. 1, the direction from the convex mirror 16 to the concave mirror 14 is the positive direction of the y axis, the direction from the substrate 11 to the original plate 9 is the positive direction of the z axis, and the direction that forms the right-handed system with respect to the y axis and the z axis is the x axis. And

平行平板２１を駆動機構２０によって変形させることにより、その変形の形状に従ったディストーション（投影光学系ＰＯの結像倍率の変化を含む）および非点収差を投影光学系ＰＯに発生させることができる。平行平板２１をｘｙｚ座標系におけるｘの２次関数、すなわちｚ＝ａｘ２（ａは変形量をあらわす定数）に従う形状に変形させた場合の例を以下に示す。平行平板２１をｚ＝ａｘ２（ａ＞０）に従うように変形させた場合に発生する投影光学系ＰＯのディストーションが図２（ａ）に、非点収差が図２（ｂ）に例示されている。図２（ａ）、（ｂ）において、横軸は良像域内の位置ｘ（図１中のｘ軸方向における位置）を示している。図２（ａ）における縦軸はディストーションの発生量、図２（ｂ）における縦軸は非点収差の発生量を例示している。 By deforming the parallel plate 21 by the drive mechanism 20, distortion (including a change in the imaging magnification of the projection optical system PO) and astigmatism according to the deformation shape can be generated in the projection optical system PO. . An example in the case where the parallel plate 21 is deformed into a shape according to a quadratic function of x in the xyz coordinate system, that is, z = ax 2 (a is a constant representing the amount of deformation) is shown below. The distortion of the projection optical system PO generated when the parallel plate 21 is deformed so as to follow z = ax 2 (a> 0) is illustrated in FIG. 2A, and astigmatism is illustrated in FIG. 2B. Yes. 2A and 2B, the horizontal axis indicates the position x in the good image area (position in the x-axis direction in FIG. 1). The vertical axis in FIG. 2A illustrates the amount of distortion, and the vertical axis in FIG. 2B illustrates the amount of astigmatism.

第１光学部材としての屈折光学部材１８は、例えば、図３に例示されるように、ｘ軸に平行な母線を有するシリンドリカル面を有しうる。図３に例示される屈折光学部材１８を駆動機構１９によ＋ｚ方向に駆動したときに発生するディストーション、非点収差が図２（ｃ）（ｄ）に例示されている。基板の伸縮に起因する重ね合わせ誤差は、その伸縮に応じたディストーションを投影光学系ＰＯに発生させることによって低減することができる。ディトーションは、平行平板２１を変形させること、または、屈折光学部材１８の位置を変更することによって補正することができる。しかし、図２投影光学系ＰＯにディストーションを発生させると、それに応じて非点収差が発生し、解像力が低下する。   For example, as illustrated in FIG. 3, the refractive optical member 18 as the first optical member may have a cylindrical surface having a generatrix parallel to the x-axis. Distortion and astigmatism generated when the refractive optical member 18 illustrated in FIG. 3 is driven in the + z direction by the drive mechanism 19 are illustrated in FIGS. The overlay error due to the expansion / contraction of the substrate can be reduced by causing the projection optical system PO to generate distortion corresponding to the expansion / contraction. The distortion can be corrected by deforming the parallel plate 21 or changing the position of the refractive optical member 18. However, when distortion is generated in the projection optical system PO in FIG. 2, astigmatism is generated accordingly, and the resolving power is reduced.

平行平板２１をｚ＝ａｘ２（ａ＞０）に従うように変形させ、図３に例示される屈折光学部材１８をｚ方向に駆動した場合のディストーションと非点収差の発生量が図４に例示されている。図４から明らかなように、平行平板２１の変形量を表す定数ａと屈折光学部材１８の位置を適切に調整することにより、非点収差を実質的に発生させることなくディストーションを変化させることができる。よって、基板の伸縮などの原因による重ね合わせ誤差を解像力に大きな影響を与えることなく補正することができる。 FIG. 4 shows the amount of distortion and astigmatism generated when the parallel plate 21 is deformed to follow z = ax 2 (a> 0) and the refractive optical member 18 exemplified in FIG. 3 is driven in the z direction. Has been. As apparent from FIG. 4, the distortion can be changed without substantially generating astigmatism by appropriately adjusting the constant a representing the deformation amount of the parallel plate 21 and the position of the refractive optical member 18. it can. Therefore, it is possible to correct the overlay error due to the expansion / contraction of the substrate without greatly affecting the resolution.

平行平板２１をｚ＝ａｘ２（ａ＜０）に従う形状に変形させた場合に発生する投影光学系ＰＯのディストーションが図５（ａ）に、非点収差が図５（ｂ）に例示されている。平行平板２１をｚ＝ａｘ２（ａ＜０）に従う形状に変形させ、かつ屈折光学部材１８を＋ｚ方向に駆動した場合に発生するディストーションが図６（ａ）に、非点収差が図６（ｂ）に例示されている。図６（ａ）、（ｂ）から、ディストーションを実質的に変化させることなく非点収差を補正することが可能であることが分かる。 The distortion of the projection optical system PO generated when the parallel plate 21 is deformed into a shape according to z = ax 2 (a <0) is illustrated in FIG. 5A, and astigmatism is illustrated in FIG. 5B. Yes. FIG. 6A shows distortion generated when the parallel plate 21 is deformed into a shape according to z = ax 2 (a <0) and the refractive optical member 18 is driven in the + z direction, and astigmatism is shown in FIG. Illustrated in b). As can be seen from FIGS. 6A and 6B, astigmatism can be corrected without substantially changing the distortion.

即ち、第１駆動機構が屈折光学部材の位置を調整することによって発生する投影光学系ＰＯのディストーションおよび非点収差のうちの一方が、第２駆動機構が平行平板を変形させることによって低減されうる。或いは、第２駆動機構が平行平板を変形させることによって発生する投影光学系ＰＯのディストーションおよび非点収差のうちの一方が、第１駆動機構が屈折光学部材の位置を調整することによって低減される。   That is, one of the distortion and astigmatism of the projection optical system PO generated by the first driving mechanism adjusting the position of the refractive optical member can be reduced by the second driving mechanism deforming the parallel plate. . Alternatively, one of the distortion and astigmatism of the projection optical system PO generated by the second drive mechanism deforming the parallel plate is reduced by adjusting the position of the refractive optical member by the first drive mechanism. .

以下、投影光学系ＰＯのディストーションの調整する例を説明する。初回のリソグラフィ工程（基板への感光剤の塗布、露光装置１００による基板の露光、現像、エッチングを含む）において、基板１１に対してデバイスパターンとともに位置合わせ用のマークを形成する。２回目のリソグラフィ工程における露光の際に、不図示の位置ずれ計測装置によって原版９と基板１１との位置ずれ量を検出する。次に、検出された位置ずれ量を補正するために必要なディストーションの量を決定する。次に、このディストーションの量が得られる平行平板２１の変形量および屈折光学部材１８の移動量（位置の調整量）を決定する。このとき、平行平板２１の変形によって発生する非点収差が屈折光学部材１８の位置の調整によって低減され、または、屈折光学部材１８の位置の調整によって発生する非点収差が平行平板２１の変形によって低減される。   Hereinafter, an example of adjusting the distortion of the projection optical system PO will be described. In an initial lithography process (including application of a photosensitive agent to the substrate, exposure of the substrate by the exposure apparatus 100, development, and etching), a mark for alignment is formed on the substrate 11 together with a device pattern. At the time of exposure in the second lithography process, a positional deviation amount between the original plate 9 and the substrate 11 is detected by a positional deviation measuring device (not shown). Next, the amount of distortion necessary for correcting the detected positional deviation amount is determined. Next, the deformation amount of the parallel plate 21 and the movement amount (position adjustment amount) of the refractive optical member 18 from which this distortion amount is obtained are determined. At this time, astigmatism caused by deformation of the parallel plate 21 is reduced by adjusting the position of the refractive optical member 18, or astigmatism generated by adjusting the position of the refractive optical member 18 is reduced by deformation of the parallel plate 21. Reduced.

以上とは逆に投影光学系ＰＯの非点収差を補正または調整する際は、平行平板２１の変形によって発生するディストーションが屈折光学部材１８の位置の調整によって低減されうる。或いは、屈折光学部材１８の位置の調整によって発生するディストーションが平行平板２１の変形によって低減されうる。   Contrary to the above, when correcting or adjusting astigmatism of the projection optical system PO, distortion caused by deformation of the parallel plate 21 can be reduced by adjusting the position of the refractive optical member 18. Alternatively, the distortion generated by adjusting the position of the refractive optical member 18 can be reduced by the deformation of the parallel plate 21.

つぎに、本発明の一実施形態のデバイス（半導体デバイス、液晶表示デバイス等）の製造方法について説明する。液晶表示デバイスは、透明電極を形成する工程を経ることにより製造される。透明電極を形成する工程は、透明導電膜が蒸着されたガラス基板に感光剤を塗布する工程と、前述の露光装置を使用して感光剤が塗布されたガラス基板を露光する工程と、ガラス基板を現像する工程を含む。本実施形態のデバイス製造方法によれば、従来よりも高品位のデバイスを製造することができる。   Next, a method for manufacturing a device (semiconductor device, liquid crystal display device, etc.) according to an embodiment of the present invention will be described. A liquid crystal display device is manufactured through a process of forming a transparent electrode. The step of forming the transparent electrode includes a step of applying a photosensitive agent to a glass substrate on which a transparent conductive film is deposited, a step of exposing the glass substrate on which the photosensitive agent is applied using the above-described exposure apparatus, and a glass substrate. The process of developing is included. According to the device manufacturing method of the present embodiment, it is possible to manufacture a higher quality device than before.

Claims (7)

原版のパターンを基板に投影する投影光学系であって、
光路を折り曲げる第１鏡および第２鏡と、前記投影光学系の物体面と前記第１鏡との間に配置された第１光学部材と、前記投影光学系の像面と前記第２鏡との間に配置された第２光学部材とを備え、
前記第１光学部材および前記第２光学部材のうちの一方は、パワーを有し、移動可能な屈折光学部材であり、他方は、変形可能な平行平板であり、
前記屈折光学部材の位置を変更することによって発生する前記投影光学系のディストーションおよび非点収差のうちの一方が、前記平行平板を変形させることによって低減され、又は、
前記平行平板を変形させることによって発生する前記投影光学系のディストーションおよび非点収差のうちの一方が、前記屈折光学部材の位置を変更することによって低減される、
ことを特徴とする投影光学系。 A projection optical system that projects an original pattern onto a substrate,
A first mirror and a second mirror that bend an optical path; a first optical member disposed between an object plane of the projection optical system and the first mirror; an image plane of the projection optical system; and the second mirror. A second optical member disposed between
One of the first optical member and the second optical member has a power and is a movable refractive optical member, and the other is a deformable parallel plate,
One of distortion and astigmatism of the projection optical system generated by changing the position of the refractive optical member is reduced by deforming the parallel plate, or
One of distortion and astigmatism of the projection optical system generated by deforming the parallel plate is reduced by changing the position of the refractive optical member,
A projection optical system characterized by that. 前記屈折光学部材は、シリンドリカル面を有し、
前記平行平板の変形は、前記投影光学系の光軸方向における前記平行平板の各部の位置が前記シリンドリカル面の母線に平行な方向における位置の関数に従うようになされる、
ことを特徴とする請求項１に記載の投影光学系。 The refractive optical element is to have a cylindrical surface,
The deformation of the parallel plate is such that the position of each part of the parallel plate in the optical axis direction of the projection optical system follows a function of the position in a direction parallel to the generatrix of the cylindrical surface.
The projection optical system according to claim 1. 前記屈折光学部材の位置の変更は、前記投影光学系の光軸に沿った方向になされ、前記平行平板の変形は、前記光軸に沿った方向における前記平行平板の各部の位置が前記シリンドリカル面の母線に平行な方向における位置の二次関数に従うようになされる、The position of the refractive optical member is changed in the direction along the optical axis of the projection optical system, and the deformation of the parallel plate is caused by the position of each part of the parallel plate in the direction along the optical axis being the cylindrical surface. To follow a quadratic function of the position in a direction parallel to the generatrix of
ことを特徴とする請求項２に記載の投影光学系。The projection optical system according to claim 2. 前記第１光学部材がパワーを有する屈折光学部材であり、前記第２光学部材が平行平板である、
ことを特徴とする請求項１乃至３のいずれか１項に記載の投影光学系。 The first optical member is a refractive optical member having power, and the second optical member is a parallel plate.
The projection optical system according to any one of claims 1 to 3, characterized in that. 前記第１光学部材が平行平板であり、前記第２光学部材がパワーを有する屈折光学部材である、
ことを特徴とする請求項１乃至３のいずれか１項に記載の投影光学系。 The first optical member is a parallel plate, and the second optical member is a refractive optical member having power.
The projection optical system according to any one of claims 1 to 3, characterized in that. 請求項１乃至５のいずれか１項に記載の投影光学系を有することを特徴とする露光装置。 Exposure apparatus characterized by having a projection optical system according to any one of claims 1 to 5. デバイスを製造するデバイス製造方法であって、
基板に感光剤を塗布する工程と、
請求項６に記載の露光装置を使用して前記基板を露光する工程と、
前記基板を現像する工程と、
を含むことを特徴とするデバイス製造方法。 A device manufacturing method for manufacturing a device, comprising:
Applying a photosensitive agent to the substrate;
Exposing the substrate using the exposure apparatus according to claim 6 ;
Developing the substrate;
A device manufacturing method comprising:
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CN107003615A (en) * 2014-12-02 2017-08-01 佳能株式会社 Projection optical system, exposure device and device making method

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