JP7005364B2 - Projection optical system, exposure equipment, manufacturing method and adjustment method of articles - Google Patents

Projection optical system, exposure equipment, manufacturing method and adjustment method of articles Download PDF

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JP7005364B2
JP7005364B2 JP2018012947A JP2018012947A JP7005364B2 JP 7005364 B2 JP7005364 B2 JP 7005364B2 JP 2018012947 A JP2018012947 A JP 2018012947A JP 2018012947 A JP2018012947 A JP 2018012947A JP 7005364 B2 JP7005364 B2 JP 7005364B2
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optical system
lens
projection optical
magnification
mirror
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JP2019132907A5 (en
JP2019132907A (en
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尚司 池本
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Canon Inc
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Canon Inc
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Priority to CN201910065482.1A priority patent/CN110095946B/en
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B15/00—Optical objectives with means for varying the magnification
    • G02B15/14—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0626—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using three curved mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Description

本発明は、投影光学系、露光装置、物品の製造方法及び調整方法に関する。 The present invention relates to a projection optical system, an exposure apparatus , a method for manufacturing an article, and a method for adjusting the article.

半導体デバイスやフラットパネルディスプレイ（ＦＰＤ）などのデバイスは、フォトリソグラフィ工程を経て製造される。フォトリソグラフィ工程は、マスク又はレチクル（原版）のパターンを、レジスト（感光剤）が塗布されたガラスプレートやウエハなどの基板に投影し、かかる基板を露光する露光工程を含む。ＦＰＤの製造においては、反射鏡を含む投影光学系（所謂、オフナー光学系）を有する露光装置が一般的に用いられている。 Devices such as semiconductor devices and flat panel displays (FPDs) are manufactured through a photolithography process. The photolithography step includes an exposure step of projecting a mask or reticle (original plate) pattern onto a substrate such as a glass plate or wafer coated with a resist (photosensitive agent) to expose the substrate. In the manufacture of FPDs, an exposure apparatus having a projection optical system (so-called Offner optical system) including a reflecting mirror is generally used.

露光装置では、複数のフォトリソグラフィ工程を介して、基板上に複数のパターンを重ね合わせて形成する。従って、基板上のパターンに対してマスクのパターンを高精度に重ね合わせて基板を露光することが重要となる。但し、複数のフォトリソグラフィ工程を経ることでマスクや基板が伸縮し、基板上のパターンとマスクのパターンとの間に倍率誤差が生じる場合がある。この場合、基板上に複数のパターンを重ね合わせて形成すると、複数のパターン間に重ね合わせ誤差が生じてしまう。 In the exposure apparatus, a plurality of patterns are superimposed and formed on a substrate via a plurality of photolithography steps. Therefore, it is important to superimpose the mask pattern on the pattern on the substrate with high accuracy to expose the substrate. However, the mask or the substrate may expand or contract as a result of undergoing a plurality of photolithography steps, and a magnification error may occur between the pattern on the substrate and the pattern of the mask. In this case, if a plurality of patterns are superimposed and formed on the substrate, an overlay error occurs between the plurality of patterns.

そこで、このような倍率誤差を、非点収差の発生を抑えながら補正することが可能な投影光学系が提案されている（特許文献１参照）。また、副作用を実質的に抑えながら非点収差を補正することが可能な投影光学系も提案されている（特許文献２参照）。 Therefore, a projection optical system capable of correcting such a magnification error while suppressing the occurrence of astigmatism has been proposed (see Patent Document 1). Further, a projection optical system capable of correcting astigmatism while substantially suppressing side effects has also been proposed (see Patent Document 2).

特許第５５９５００１号公報Japanese Patent No. 5595001 特許第４５４７７１４号公報Japanese Patent No. 4547714

しかしながら、特許文献１に開示された投影光学系は、倍率を補正する方向（例えば、縦横方向）の非点収差の発生を抑制することはできるが、倍率を補正する方向に対して斜めの方向の非点収差を補正することができない。また、特許文献２に開示された投影光学系は、オフナー光学系ではなく、２回結像系であるため、光学系及びそれを有する露光装置の大型化や装置占有面積（フットプリント）の拡大などを招いてしまう。露光装置に用いられる投影光学系には、光学系を大型化することなく、倍率や非点収差を高精度に補正可能であることが要求されている。 However, the projection optical system disclosed in Patent Document 1 can suppress the occurrence of astigmatism in the direction for correcting the magnification (for example, the vertical and horizontal directions), but is in a direction oblique to the direction for correcting the magnification. Astigmatism cannot be corrected. Further, since the projection optical system disclosed in Patent Document 2 is not an Offner optical system but a double imaging system, the optical system and the exposure apparatus having the optical system are increased in size and the occupied area (footprint) of the apparatus is expanded. And so on. The projection optical system used in the exposure apparatus is required to be able to correct the magnification and astigmatism with high accuracy without increasing the size of the optical system.

本発明は、このような従来技術の課題に鑑みてなされ、倍率や非点収差を補正するのに有利な投影光学系を提供することを例示的目的とする。 The present invention has been made in view of such problems of the prior art, and it is an exemplary object to provide an advantageous projection optical system for correcting magnification and astigmatism.

上記目的を達成するために、本発明の一側面としての投影光学系は、物体面からの光を、第１平面鏡、第１凹面鏡、凸面鏡、第２凹面鏡、第２平面鏡の順に反射して像面に結像させる投影光学系であって、前記物体面と前記第１平面鏡との間に配置され、鉛直方向に定義される第１方向と直交する第２方向における前記投影光学系の倍率を補正する第１光学系と、前記第２平面鏡と前記像面との間に配置され、前記第１方向及び前記第２方向と直交する第３方向における前記投影光学系の倍率を補正する第２光学系と、を有し、前記第１光学系は、前記第１方向に沿って並べられた、前記第２方向及び前記第３方向に異なるパワーを有する第１レンズ及び第２レンズを含み、前記第２光学系は、前記第１方向に沿って並べられた、前記第２方向及び前記第３方向に異なるパワーを有する第３レンズ及び第４レンズを含み、前記第１方向に平行な第１軸まわりに前記第１レンズ及び前記第２レンズの少なくとも一方のレンズを回転させる第１回転部と、前記第１方向に平行な第２軸まわりに前記第３レンズ及び前記第４レンズの少なくとも一方のレンズを回転させる第２回転部と、を更に有することを特徴とする。 In order to achieve the above object, the projection optical system as one aspect of the present invention reflects light from an object surface in the order of a first plane mirror, a first concave mirror, a convex mirror, a second concave mirror, and a second plane mirror. A projection optical system that forms an image on a surface, and the magnification of the projection optical system in a second direction that is arranged between the object surface and the first plane mirror and is orthogonal to the first direction defined in the vertical direction. A second optical system to be corrected and a second lens arranged between the second plane mirror and the image plane to correct the magnification of the projection optical system in the first direction and the third direction orthogonal to the second direction. The first optical system comprises an optical system and a first lens and a second lens arranged along the first direction and having different powers in the second direction and the third direction. The second optical system includes a third lens and a fourth lens arranged along the first direction and having different powers in the second direction and the third direction, and is parallel to the first direction. A first rotating portion that rotates at least one of the first lens and the second lens around one axis, and at least the third lens and the fourth lens around the second axis parallel to the first direction. It is characterized by further having a second rotating portion for rotating one lens .

本発明の更なる目的又はその他の側面は、以下、添付図面を参照して説明される好ましい実施形態によって明らかにされるであろう。 Further objects or other aspects of the invention will be manifested in the preferred embodiments described below with reference to the accompanying drawings.

本発明によれば、例えば、倍率や非点収差を補正するのに有利な投影光学系を提供することができる。 According to the present invention, for example, it is possible to provide an advantageous projection optical system for correcting a magnification or astigmatism.

本発明の第１実施形態における露光装置の構成を示す概略図である。It is a schematic diagram which shows the structure of the exposure apparatus in 1st Embodiment of this invention. 図１に示す露光装置の第１レンズ群及び第２レンズ群のそれぞれの構成の一例を示す図である。It is a figure which shows an example of the structure of each of the 1st lens group and the 2nd lens group of the exposure apparatus shown in FIG. 図１に示す露光装置の投影光学系の非点収差の補正を説明するための図である。It is a figure for demonstrating the correction of astigmatism of the projection optical system of the exposure apparatus shown in FIG. 本発明の第２実施形態における投影光学系の構成を示す概略図である。It is a schematic diagram which shows the structure of the projection optical system in 2nd Embodiment of this invention. 図２に示す投影光学系の第１レンズ群、第２レンズ群及び第３レンズ群のそれぞれを駆動した際に発生する非点収差及び倍率成分の発生量を示す図である。It is a figure which shows the amount of astigmatism and the magnification component generated when each of the 1st lens group, the 2nd lens group and the 3rd lens group of the projection optical system shown in FIG. 2 is driven. 図２に示す投影光学系の非点収差の補正を説明するためのフローチャートである。It is a flowchart for demonstrating the correction of astigmatism of the projection optical system shown in FIG.

以下、添付図面を参照して、本発明の好適な実施の形態について説明する。なお、各図において、同一の部材については同一の参照番号を付し、重複する説明は省略する。 Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings. In addition, in each figure, the same reference number is given to the same member, and duplicate description is omitted.

＜第１実施形態＞
図１は、第１実施形態における露光装置ＥＸの構成を示す概略図である。露光装置ＥＸは、半導体デバイスやフラットパネルディスプレイ（ＦＰＤ）の製造工程であるフォトリソグラフィ工程に用いられるリソグラフィ装置である。露光装置ＥＸは、例えば、マスク９（原版）と基板１７とを同期して走査して、マスク９に形成されたパターンを基板１７に転写する走査型の露光装置（スキャナー）である。 <First Embodiment>
FIG. 1 is a schematic view showing the configuration of the exposure apparatus EX according to the first embodiment. The exposure apparatus EX is a lithography apparatus used in a photolithography process, which is a manufacturing process of a semiconductor device or a flat panel display (FPD). The exposure apparatus EX is, for example, a scanning type exposure apparatus (scanner) that synchronizes the mask 9 (original plate) and the substrate 17 and transfers the pattern formed on the mask 9 to the substrate 17.

露光装置ＥＸは、図１に示すように、照明光学系ＩＬと、投影光学系ＰＯと、制御部ＣＵとを有する。また、露光装置ＥＸは、投影光学系ＰＯの物体面ＯＰに配置されたマスク９を保持して移動可能なマスクステージ（不図示）と、投影光学系ＰＯの像面ＩＰに配置された基板１７を保持して移動可能な基板ステージ（不図示）とを有する。なお、本実施形態では、鉛直方向にＺ軸（のマイナス方向）を定義し、Ｚ軸に直交し、且つ、互いに直交する方向にＸ軸及びＹ軸を定義する。本実施形態では、Ｙ方向は、走査方向であり、Ｘ方向は、走査方向と直交する方向である。 As shown in FIG. 1, the exposure apparatus EX includes an illumination optical system IL, a projection optical system PO, and a control unit CU. Further, the exposure apparatus EX has a mask stage (not shown) that can hold and move the mask 9 arranged on the object surface OP of the projection optical system PO, and a substrate 17 arranged on the image plane IP of the projection optical system PO. Has a movable substrate stage (not shown). In this embodiment, the Z-axis (minus direction) is defined in the vertical direction, and the X-axis and the Y-axis are defined in the directions orthogonal to the Z-axis and orthogonal to each other. In the present embodiment, the Y direction is the scanning direction, and the X direction is the direction orthogonal to the scanning direction.

制御部ＣＵは、例えば、ＣＰＵやメモリなどを含むコンピュータ（情報処理装置）で構成され、記憶部（不図示）に記憶されたプログラムに従って露光装置ＥＸの各部を統括的に制御する。制御部ＣＵは、基板１７を露光する露光処理及び露光処理に関連する様々な処理を制御する。 The control unit CU is composed of, for example, a computer (information processing device) including a CPU, a memory, and the like, and collectively controls each part of the exposure device EX according to a program stored in the storage unit (not shown). The control unit CU controls the exposure process for exposing the substrate 17 and various processes related to the exposure process.

照明光学系ＩＬは、例えば、第１コンデンサーレンズ３と、フライアイレンズ４と、第２コンデンサーレンズ５と、スリット規定部材６と、結像光学系７と、平面ミラー８とを含み、光源ＬＳからの光でマスク９を照明する。光源ＬＳは、例えば、水銀ランプ１と、楕円ミラー２とを含む。スリット規定部材６は、マスク９の照明範囲（即ち、マスク９を照明するスリット光の断面形状）を規定する。結像光学系７は、スリット規定部材６によって規定されるスリットを物体面ＯＰに結像させるように配置されている。平面ミラー８は、照明光学系ＩＬにおいて光路を折り曲げる。 The illumination optical system IL includes, for example, a first condenser lens 3, a fly-eye lens 4, a second condenser lens 5, a slit defining member 6, an imaging optical system 7, and a plane mirror 8, and is a light source LS. Illuminate the mask 9 with the light from. The light source LS includes, for example, a mercury lamp 1 and an elliptical mirror 2. The slit defining member 6 defines the illumination range of the mask 9 (that is, the cross-sectional shape of the slit light that illuminates the mask 9). The imaging optical system 7 is arranged so as to form an image of a slit defined by the slit defining member 6 on the object surface OP. The planar mirror 8 bends an optical path in the illumination optical system IL.

投影光学系ＰＯは、マスク９のパターンを基板１７に投影して基板１７を露光する。投影光学系ＰＯは、等倍結像光学系、拡大結像光学系及び縮小結像光学系のいずれの光学系で構成されてもよいが、本実施形態では、等倍結像光学系として構成されている。また、投影光学系ＰＯは、物体面側及び像面側で主光線が平行となる。換言すれば、投影光学系ＰＯは、物体面ＯＰ及び像面ＩＰにおいてテレセントリックである。 The projection optical system PO projects the pattern of the mask 9 onto the substrate 17 to expose the substrate 17. The projection optical system PO may be composed of any of the same-magnification imaging optical system, the magnifying image-forming optical system, and the reduced-magnification imaging optical system, but in the present embodiment, it is configured as the same-magnification imaging optical system. Has been done. Further, in the projection optical system PO, the main rays are parallel on the object surface side and the image surface side. In other words, the projection optical system PO is telecentric in the object plane OP and the image plane IP.

投影光学系ＰＯは、物体面ＯＰから像面ＩＰまでの光路において、物体面側から順に配置された第１平面鏡１１と、第１凹面鏡１２と、凸面鏡１３と、第２凹面鏡１４と、第２平面鏡１５とを含む。投影光学系ＰＯは、物体面ＯＰからの光を、第１平面鏡１１、第１凹面鏡１２、凸面鏡１３、第２凹面鏡１４、第２平面鏡１５の順に反射して像面ＩＰに結像させる。 The projection optical system PO includes a first plane mirror 11, a first concave mirror 12, a convex mirror 13, a second concave mirror 14, and a second mirror arranged in order from the object surface side in the optical path from the object surface OP to the image surface IP. Includes a plane mirror 15. The projection optical system PO reflects the light from the object surface OP in the order of the first plane mirror 11, the first concave mirror 12, the convex mirror 13, the second concave mirror 14, and the second plane mirror 15 to form an image on the image plane IP.

投影光学系ＰＯにおいて、物体面ＯＰと第１平面鏡１１との間の光路と、第２平面鏡１５と像面ＩＰとの間の光路とは、平行である。また、第１平面鏡１１の反射面を含む平面と、第２平面鏡１５の反射面を含む平面とは、９０度の角度をなす。本実施形態では、第１平面鏡１１と第２平面鏡１５とが別体で構成されているが、第１平面鏡１１と第２平面鏡１５とが一体的に構成されていてもよい。同様に、本実施形態では、第１凹面鏡１２と第２凹面鏡１４とが別体で構成されているが、第１凹面鏡１２と第２凹面鏡１４とが一体的に構成されていてもよい。 In the projection optical system PO, the optical path between the object surface OP and the first plane mirror 11 and the optical path between the second plane mirror 15 and the image plane IP are parallel. Further, the plane including the reflection surface of the first plane mirror 11 and the plane including the reflection surface of the second plane mirror 15 form an angle of 90 degrees. In the present embodiment, the first plane mirror 11 and the second plane mirror 15 are configured separately, but the first plane mirror 11 and the second plane mirror 15 may be integrally configured. Similarly, in the present embodiment, the first concave mirror 12 and the second concave mirror 14 are configured separately, but the first concave mirror 12 and the second concave mirror 14 may be integrally configured.

投影光学系ＰＯは、図１に示すように、物体面ＯＰと第１平面鏡１１との間の光路に配置された第１レンズ群１０を含む。第１レンズ群１０は、物体面ＯＰと第１平面鏡１１との間の光路に沿った方向、即ち、鉛直方向に定義される第１方向（Ｚ方向）と直交する第２方向（Ｙ方向）における投影光学系ＯＰの倍率を補正する第１光学系である。第１レンズ群１０は、第１方向に沿って並べられた、第２方向及び第３方向に異なるパワーを有する第１レンズ及び第２レンズとして、シリンドリカルレンズ１０ａ及びシリンドリカルレンズ１０ｂを含む。図２（ａ）に示すように、シリンドリカルレンズ１０ａは、Ｙ方向に曲率を有する凸シリンドリカル面を含み、シリンドリカルレンズ１０ｂは、Ｙ方向に曲率を有する凹シリンドリカル面を含む。シリンドリカルレンズ１０ａとシリンドリカルレンズ１０ｂとは、Ｚ方向に間隔を隔てて、且つ、Ｚ方向の間隔を変更可能に配置されている。また、シリンドリカルレンズ１０ａとシリンドリカルレンズ１０ｂとは、それぞれのシリンドリカル面を平行に対向させた状態（互いが有するパワーの方向が一致する状態）を基準状態として配置されている。 As shown in FIG. 1, the projection optical system PO includes a first lens group 10 arranged in an optical path between an object surface OP and a first plane mirror 11. The first lens group 10 is a direction along an optical path between the object surface OP and the first plane mirror 11, that is, a second direction (Y direction) orthogonal to the first direction (Z direction) defined in the vertical direction. This is the first optical system that corrects the magnification of the projection optical system OP in. The first lens group 10 includes a cylindrical lens 10a and a cylindrical lens 10b as a first lens and a second lens having different powers in the second direction and the third direction arranged along the first direction. As shown in FIG. 2A, the cylindrical lens 10a includes a convex cylindrical surface having a curvature in the Y direction, and the cylindrical lens 10b includes a concave cylindrical surface having a curvature in the Y direction. The cylindrical lens 10a and the cylindrical lens 10b are arranged so as to be spaced apart in the Z direction and the distance in the Z direction can be changed. Further, the cylindrical lens 10a and the cylindrical lens 10b are arranged with their respective cylindrical surfaces facing each other in parallel (a state in which the directions of powers possessed by each other coincide with each other) as a reference state.

また、投影光学系ＰＯは、図１に示すように、第２平面鏡１５と像面ＩＰとの間の光路に配置された第２レンズ群１６を含む。第２レンズ群１６は、第２平面鏡１５と像面ＩＰとの間の光路に沿った方向、即ち、鉛直方向に定義される第１方向（Ｚ方向）及び第２方向（Ｙ方向）と直交する第３方向（Ｘ方向）における投影光学系ＯＰの倍率を補正する第２光学系である。第２レンズ群１６は、第１方向に沿って並べられた、第２方向及び第３方向に異なるパワーを有する第３レンズ及び第４レンズとして、シリンドリカルレンズ１６ａ及びシリンドリカルレンズ１６ｂを含む。図２（ｂ）に示すように、シリンドリカルレンズ１６ａは、Ｘ方向に曲率を有する凸シリンドリカル面を含み、シリンドリカルレンズ１６ｂは、Ｘ方向に曲率を有する凹シリンドリカル面を含む。シリンドリカルレンズ１６ａとシリンドリカルレンズ１６ｂとは、Ｚ方向に間隔を隔てて、且つ、Ｚ方向の間隔を変更可能に配置されている。また、シリンドリカルレンズ１６ａとシリンドリカルレンズ１６ｂとは、それぞれのシリンドリカル面を平行に対向させた状態（互いが有するパワーの方向が一致する状態）を基準状態として配置されている。 Further, as shown in FIG. 1, the projection optical system PO includes a second lens group 16 arranged in an optical path between the second plane mirror 15 and the image plane IP. The second lens group 16 is orthogonal to the direction along the optical path between the second plane mirror 15 and the image plane IP, that is, the first direction (Z direction) and the second direction (Y direction) defined in the vertical direction. This is a second optical system that corrects the magnification of the projection optical system OP in the third direction (X direction). The second lens group 16 includes a cylindrical lens 16a and a cylindrical lens 16b as a third lens and a fourth lens having different powers in the second direction and the third direction arranged along the first direction. As shown in FIG. 2B, the cylindrical lens 16a includes a convex cylindrical surface having a curvature in the X direction, and the cylindrical lens 16b includes a concave cylindrical surface having a curvature in the X direction. The cylindrical lens 16a and the cylindrical lens 16b are arranged so as to be spaced apart in the Z direction and the distance in the Z direction can be changed. Further, the cylindrical lens 16a and the cylindrical lens 16b are arranged with their respective cylindrical surfaces facing each other in parallel (a state in which the directions of powers possessed by each other coincide with each other) as a reference state.

投影光学系ＰＯは、第１レンズ群１０によって投影光学系ＰＯのＹ方向の倍率を補正するために、シリンドリカルレンズ１０ａとシリンドリカルレンズ１０ｂとのＺ方向における間隔を変更する機能を実現する第１駆動機構４０を含む。第１駆動機構４０は、シリンドリカルレンズ１０ａとシリンドリカルレンズ１０ｂとのＺ方向における間隔を変更するために、シリンドリカルレンズ１０ａ及び１０ｂの一方をＺ方向に移動させる。 The projection optical system PO is a first drive that realizes a function of changing the distance between the cylindrical lens 10a and the cylindrical lens 10b in the Z direction in order to correct the magnification in the Y direction of the projection optical system PO by the first lens group 10. Includes mechanism 40. The first drive mechanism 40 moves one of the cylindrical lenses 10a and 10b in the Z direction in order to change the distance between the cylindrical lens 10a and the cylindrical lens 10b in the Z direction.

また、投影光学系ＰＯは、第２レンズ群１６によって投影光学系ＰＯのＸ方向の倍率を補正するために、シリンドリカルレンズ１６ａとシリンドリカルレンズ１６ｂとのＺ方向における間隔を変更する機能を実現する第２駆動機構５０を含む。第２駆動機構５０は、シリンドリカルレンズ１６ａとシリンドリカルレンズ１６ｂとのＺ方向における間隔を変更するために、シリンドリカルレンズ１６ａ及び１６ｂの一方をＺ方向に移動させる。 Further, the projection optical system PO realizes a function of changing the distance between the cylindrical lens 16a and the cylindrical lens 16b in the Z direction in order to correct the magnification of the projection optical system PO in the X direction by the second lens group 16. 2 Drive mechanism 50 is included. The second drive mechanism 50 moves one of the cylindrical lenses 16a and 16b in the Z direction in order to change the distance between the cylindrical lens 16a and the cylindrical lens 16b in the Z direction.

本実施形態では、第１レンズ群１０によって投影光学系ＰＯのＸ方向の倍率を補正し、第２レンズ群１６によって投影光学系ＰＯのＹ方向の倍率を補正しているが、これに限定されるものではない。具体的には、第１レンズ群１０によって投影光学系ＰＯのＹ方向の倍率を補正し、第２レンズ群１６によって投影光学系ＰＯのＸ方向の倍率を補正してもよい。この場合、第１レンズ群１０が図２（ｂ）に示すシリンドリカルレンズ１６ａ及び１６ｂを含み、第２レンズ群１６が図２（ａ）に示すシリンドリカルレンズ１０ａ及び１０ｂを含むようにすればよい。 In the present embodiment, the first lens group 10 corrects the magnification in the X direction of the projection optical system PO, and the second lens group 16 corrects the magnification in the Y direction of the projection optical system PO, but the present invention is limited to this. It's not something. Specifically, the first lens group 10 may correct the magnification of the projection optical system PO in the Y direction, and the second lens group 16 may correct the magnification of the projection optical system PO in the X direction. In this case, the first lens group 10 may include the cylindrical lenses 16a and 16b shown in FIG. 2B, and the second lens group 16 may include the cylindrical lenses 10a and 10b shown in FIG. 2A.

本実施形態では、第１レンズ群１０及び第２レンズ群１６を用いて投影光学系ＰＯの非点収差も補正することができるように、シリンドリカルレンズ１０ａ及び１０ｂの一方、及び、シリンドリカルレンズ１６ａ及び１６ｂの一方を回転可能に構成している。本実施形態では、シリンドリカルレンズ１０ａ及び１０ｂの一方を回転させる機能を第１駆動機構４０で実現し、シリンドリカルレンズ１６ａ及び１６ｂの一方を回転させる機能を第２駆動機構５０で実現している。具体的には、第１駆動機構４０（第１回転部）は、図２（ａ）に示すように、Ｚ方向（物体面ＯＰと第１平面鏡１１との間の光路）に平行な第１軸まわりにシリンドリカルレンズ１０ａ及び１０ｂの一方を回転させる。また、第２駆動機構５０（第２回転部）は、図２（ｂ）に示すように、Ｚ方向（第２平面鏡１５と像面ＩＰとの間の光路）に平行な第２軸まわりにシリンドリカルレンズ１６ａ及び１６ｂの一方を回転させる。なお、本実施形態では、第１駆動機構４０でシリンドリカルレンズ１０ａ及び１０ｂの一方を回転させ、第２駆動機構５０でシリンドリカルレンズ１６ａ及び１６ｂの一方を回転させているが、これに限定されるものではない。第１駆動機構４０とは別にシリンドリカルレンズ１０ａ及び１０ｂの一方を回転させる第１回転部を設け、第２駆動機構５０とは別にシリンドリカルレンズ１６ａ及び１６ｂの一方を回転させる第２回転部を設けてもよい。 In the present embodiment, one of the cylindrical lenses 10a and 10b, the cylindrical lens 16a, and the like, so that the astigmatism of the projection optical system PO can also be corrected by using the first lens group 10 and the second lens group 16. One of 16b is configured to be rotatable. In the present embodiment, the function of rotating one of the cylindrical lenses 10a and 10b is realized by the first drive mechanism 40, and the function of rotating one of the cylindrical lenses 16a and 16b is realized by the second drive mechanism 50. Specifically, as shown in FIG. 2A, the first drive mechanism 40 (first rotating portion) is the first one parallel to the Z direction (the optical path between the object surface OP and the first plane mirror 11). One of the cylindrical lenses 10a and 10b is rotated around the axis. Further, as shown in FIG. 2B, the second drive mechanism 50 (second rotating portion) is arranged around the second axis parallel to the Z direction (the optical path between the second plane mirror 15 and the image plane IP). One of the cylindrical lenses 16a and 16b is rotated. In the present embodiment, one of the cylindrical lenses 10a and 10b is rotated by the first drive mechanism 40, and one of the cylindrical lenses 16a and 16b is rotated by the second drive mechanism 50, but the present invention is limited to this. is not it. A first rotating portion for rotating one of the cylindrical lenses 10a and 10b is provided separately from the first drive mechanism 40, and a second rotating portion for rotating one of the cylindrical lenses 16a and 16b is provided separately from the second drive mechanism 50. May be good.

例えば、シリンドリカルレンズ１０ａ及び１０ｂのうち、シリンドリカルレンズ１０ａを、Ｚ方向に平行な第１軸まわりに回転させると、Ｘ方向及びＹ方向とは異なる第４方向（斜め４５度方向）に曲率成分が発生する。これにより、図３（ａ）に示すように、第４方向の倍率成分と、第４方向の非点収差と、ＸＹ平面内の第４方向に直交する第５方向（斜め１３５度方向）の非点収差成分とが発生する。また、シリンドリカルレンズ１６ａ及び１６ｂのうち、シリンドリカルレンズ１６ａを、Ｚ方向に平行な第２軸まわりに回転させると、図３（ｂ）に示すように、第４方向の倍率成分と、第４方向の非点収差と、第５方向の非点収差成分とが発生する。 For example, among the cylindrical lenses 10a and 10b, when the cylindrical lens 10a is rotated around the first axis parallel to the Z direction, the curvature component is generated in the fourth direction (diagonal 45 degree direction) different from the X direction and the Y direction. Occur. As a result, as shown in FIG. 3A, the magnification component in the fourth direction, the astigmatism in the fourth direction, and the fifth direction (diagonal 135 degree direction) orthogonal to the fourth direction in the XY plane. Astigmatism components occur. Further, among the cylindrical lenses 16a and 16b, when the cylindrical lens 16a is rotated around the second axis parallel to the Z direction, as shown in FIG. 3B, the magnification component in the fourth direction and the fourth direction Astigmatism and the astigmatism component in the fifth direction are generated.

投影光学系ＰＯは、本実施形態では、凸面鏡１３を中心に対称な光学系である。従って、物体面近傍及び像面近傍の対称な関係にある光学系、即ち、シリンドリカルレンズを対称な位置に駆動することで、ディストーション成分が互いのシリンドリカルレンズで打ち消される。また、回転させるシリンドリカルレンズのシリンドリカル面の曲率の方向をＸ方向からＹ方向に変更すると、かかるシリンドリカルレンズを回転させることで発生する倍率成分及び非点収差成分の正負が反転する。更に、回転させるシリンドリカルレンズのシリンドリカル面の形状を凸から凹に変更すると、かかるシリンドリカルレンズを回転させることで発生する倍率成分及び非点収差成分の正負が反転する。 In the present embodiment, the projection optical system PO is an optical system symmetrical with respect to the convex mirror 13. Therefore, by driving the optical system having a symmetrical relationship between the vicinity of the object surface and the vicinity of the image plane, that is, the cylindrical lens at a symmetrical position, the distortion components are canceled by each other's cylindrical lenses. Further, when the direction of the curvature of the cylindrical surface of the cylindrical lens to be rotated is changed from the X direction to the Y direction, the positive and negative of the magnification component and the astigmatism component generated by rotating the cylindrical lens are reversed. Further, when the shape of the cylindrical surface of the rotating cylindrical lens is changed from convex to concave, the positive and negative of the magnification component and the astigmatism component generated by rotating the cylindrical lens are reversed.

そこで、本実施形態では、Ｘ方向に曲率を有する凸シリンドリカル面を含むシリンドリカルレンズ１０ａを第１軸まわりに時計回りに回転させ、Ｙ方向に曲率を有する凸シリンドリカル面を含むシリンドリカルレンズ１６ａを第２軸まわりに時計回りに回転させる。これにより、図３（ｃ）に示すように、倍率成分の発生を抑制しながら、斜め４５度方向の非点収差成分（第２方向（Ｙ方向）及び第３方向（Ｘ方向）から４５度回転した方向の非点収差）を発生させることができる。 Therefore, in the present embodiment, the cylindrical lens 10a including the convex cylindrical surface having a curvature in the X direction is rotated clockwise around the first axis, and the cylindrical lens 16a including the convex cylindrical surface having the curvature in the Y direction is second. Rotate clockwise around the axis. As a result, as shown in FIG. 3C, the astigmatism component in the diagonal 45 degree direction (45 degrees from the second direction (Y direction) and the third direction (X direction)) while suppressing the generation of the magnification component. Astigmatism in the direction of rotation) can be generated.

従って、投影光学系ＰＯの倍率を補正することで生じる投影光学系ＰＯの非点収差が打ち消されるように、第１駆動機構４０及び第２駆動機構５０（によるシリンドリカルレンズ１０ａ及び１６ａの回転）を制御部ＣＵで制御することができる。例えば、投影光学系ＰＯの倍率を目標値に補正することで生じる非点収差を打ち消すために必要となる、シリンドリカルレンズ１０ａ及び１６ａのそれぞれの回転量を求め、かかる回転量に基づいて第１駆動機構４０及び第２駆動機構５０を制御する。この際、シリンドリカルレンズ１０ａと、シリンドリカルレンズ１６ａとを同時に回転させるとよい。これにより、投影光学系ＰＯの倍率や非点収差を高精度に補正することができる。 Therefore, the first drive mechanism 40 and the second drive mechanism 50 (rotation of the cylindrical lenses 10a and 16a by the rotation) are performed so as to cancel the astigmatism of the projection optical system PO caused by correcting the magnification of the projection optical system PO. It can be controlled by the control unit CU. For example, the respective rotation amounts of the cylindrical lenses 10a and 16a, which are necessary for canceling the astigmatism caused by correcting the magnification of the projection optical system PO to the target value, are obtained, and the first drive is performed based on the rotation amount. It controls the mechanism 40 and the second drive mechanism 50. At this time, it is preferable to rotate the cylindrical lens 10a and the cylindrical lens 16a at the same time. As a result, the magnification and astigmatism of the projection optical system PO can be corrected with high accuracy.

また、本実施形態では、Ｘ方向に曲率を有する凸シリンドリカル面を含むシリンドリカルレンズ１０ａ、及び、Ｙ方向に曲率を有する凸シリンドリカル面を含むシリンドリカルレンズ１６ａを回転させているが、これに限定されるものではない。上述したように、Ｘ方向に曲率を有する凹シリンドリカル面を含むシリンドリカルレンズ１０ｂ、及び、Ｙ方向に曲率を有する凹シリンドリカル面を含むシリンドリカルレンズ１６ｂを回転させても、回転方向を反時計回りにすることで同様な効果が得られる。 Further, in the present embodiment, the cylindrical lens 10a including the convex cylindrical surface having a curvature in the X direction and the cylindrical lens 16a including the convex cylindrical surface having a curvature in the Y direction are rotated, but the present invention is limited thereto. It's not a thing. As described above, even if the cylindrical lens 10b including the concave cylindrical surface having a curvature in the X direction and the cylindrical lens 16b including the concave cylindrical surface having a curvature in the Y direction are rotated, the rotation direction is counterclockwise. The same effect can be obtained by doing so.

更に、シリンドリカルレンズ１０ａ及び１０ｂの一方を回転させる軸となる第１軸と、シリンドリカルレンズ１６ａ及び１６ｂの一方を回転させる軸となる第２軸とは、同一の直線上に存在するとよい。これにより、シリンドリカルレンズ１０ａ及び１０ｂの一方、及び、シリンドリカルレンズ１６ａ及び１６ｂの一方を回転させることによって発生する倍率成分を更に抑制することができる。 Further, the first axis, which is the axis for rotating one of the cylindrical lenses 10a and 10b, and the second axis, which is the axis for rotating one of the cylindrical lenses 16a and 16b, may be present on the same straight line. Thereby, the magnification component generated by rotating one of the cylindrical lenses 10a and 10b and one of the cylindrical lenses 16a and 16b can be further suppressed.

また、本実施形態では、シリンドリカルレンズ１０ａ及び１０ｂの一方やシリンドリカルレンズ１６ａ及び１６ｂの一方をアクチュエータなどの駆動機構で回転させる場合を想定して説明したが、これに限定されるものではない。例えば、投影光学系ＰＯの倍率を補正することで生じる投影光学系ＰＯの非点収差が打ち消されるように、シリンドリカルレンズ１０ａ及び１０ｂの一方やシリンドリカルレンズ１６ａ及び１６ｂの一方を基準状態から回転させた状態で配置させてよい。換言すれば、このような状態の投影光学系やそれを有する露光装置も本発明の一側面を構成する。なお、この場合には、シリンドリカルレンズ１０ａ及び１０ｂの一方やシリンドリカルレンズ１６ａ及び１６ｂの一方を基準状態から回転させた状態で固定するために、ネジや接着剤などの固定部材を用いるとよい。 Further, in the present embodiment, the description has been made assuming that one of the cylindrical lenses 10a and 10b and one of the cylindrical lenses 16a and 16b are rotated by a drive mechanism such as an actuator, but the present invention is not limited thereto. For example, one of the cylindrical lenses 10a and 10b and one of the cylindrical lenses 16a and 16b were rotated from the reference state so as to cancel the astigmatism of the projection optical system PO caused by correcting the magnification of the projection optical system PO. It may be arranged in a state. In other words, the projection optical system in such a state and the exposure apparatus having the projection optical system thereof also constitute one aspect of the present invention. In this case, in order to fix one of the cylindrical lenses 10a and 10b and one of the cylindrical lenses 16a and 16b in a state of being rotated from the reference state, it is preferable to use a fixing member such as a screw or an adhesive.

＜第２実施形態＞
図４を参照して、第２実施形態における露光装置について説明する。第２実施形態における露光装置は、第１実施形態における露光装置ＥＸと比較して、投影光学系ＰＯの構成が異なる。図４は、本実施形態における投影光学系ＰＯの構成を示す概略図である。 <Second Embodiment>
The exposure apparatus according to the second embodiment will be described with reference to FIG. The exposure apparatus according to the second embodiment has a different configuration of the projection optical system PO as compared with the exposure apparatus EX according to the first embodiment. FIG. 4 is a schematic view showing the configuration of the projection optical system PO in the present embodiment.

本実施形態において、投影光学系ＰＯは、物体面ＯＰから像面ＩＰまでの光路において、物体面側から順に配置された第１平面鏡２２と、第１凹面鏡２３と、凸面鏡２４と、第２凹面鏡２５と、第２平面鏡２６とを含む。投影光学系ＰＯは、物体面ＯＰからの光を、第１平面鏡２２、第１凹面鏡２３、凸面鏡２４、第２凹面鏡２５、第２平面鏡２６の順に反射して像面ＩＰに結像させる。 In the present embodiment, the projection optical system PO is a first plane mirror 22, a first concave mirror 23, a convex mirror 24, and a second concave mirror arranged in order from the object surface side in the optical path from the object surface OP to the image surface IP. 25 and a second plane mirror 26 are included. The projection optical system PO reflects the light from the object surface OP in the order of the first plane mirror 22, the first concave mirror 23, the convex mirror 24, the second concave mirror 25, and the second plane mirror 26 to form an image on the image plane IP.

投影光学系ＰＯにおいて、物体面ＯＰと第１平面鏡２２との間の光路と、第２平面鏡２６と像面ＩＰとの間の光路とは、平行である。また、第１平面鏡２２の反射面を含む平面と、第２平面鏡２６の反射面を含む平面とは、９０度の角度をなす。本実施形態では、第１平面鏡２２と第２平面鏡２６とが別体で構成されているが、第１平面鏡２２と第２平面鏡２６とが一体的に構成されていてもよい。同様に、本実施形態では、第１凹面鏡２３と第２凹面鏡２５とが別体で構成されているが、第１凹面鏡２３と第２凹面鏡２５とが一体的に構成されていてもよい。 In the projection optical system PO, the optical path between the object surface OP and the first plane mirror 22 and the optical path between the second plane mirror 26 and the image plane IP are parallel. Further, the plane including the reflection surface of the first plane mirror 22 and the plane including the reflection surface of the second plane mirror 26 form an angle of 90 degrees. In the present embodiment, the first plane mirror 22 and the second plane mirror 26 are configured separately, but the first plane mirror 22 and the second plane mirror 26 may be integrally configured. Similarly, in the present embodiment, the first concave mirror 23 and the second concave mirror 25 are configured separately, but the first concave mirror 23 and the second concave mirror 25 may be integrally configured.

投影光学系ＰＯは、図４に示すように、物体面ＯＰと第１平面鏡２２との間の光路に配置された第１レンズ群２１を含む。第１レンズ群２１は、物体面ＯＰと第１平面鏡２２との間の光路に沿った方向、即ち、鉛直方向に定義される第１方向（Ｚ方向）と直交する第２方向（Ｙ方向）における投影光学系ＯＰの倍率を補正する第１光学系である。第１レンズ群２１は、第１方向に沿って並べられた、第２方向及び第３方向に異なるパワーを有する第１レンズ及び第２レンズとして、シリンドリカルレンズ２１ａ及びシリンドリカルレンズ２１ｂを含む。シリンドリカルレンズ２１ａは、Ｙ方向に曲率を有する凸シリンドリカル面を含み、シリンドリカルレンズ２１ｂは、Ｙ方向に曲率を有する凹シリンドリカル面を含む。シリンドリカルレンズ２１ａとシリンドリカルレンズ２１ｂとは、Ｚ方向に間隔を隔てて、且つ、Ｚ方向の間隔を変更可能に配置されている。また、シリンドリカルレンズ２１ａとシリンドリカルレンズ２１ｂとは、それぞれのシリンドリカル面を平行に対向させた状態（互いが有するパワーの方向が一致する状態）を基準状態として配置されている。 As shown in FIG. 4, the projection optical system PO includes a first lens group 21 arranged in an optical path between the object surface OP and the first plane mirror 22. The first lens group 21 is a direction along an optical path between the object surface OP and the first plane mirror 22, that is, a second direction (Y direction) orthogonal to the first direction (Z direction) defined in the vertical direction. This is the first optical system that corrects the magnification of the projection optical system OP in. The first lens group 21 includes a cylindrical lens 21a and a cylindrical lens 21b as a first lens and a second lens having different powers in the second direction and the third direction arranged along the first direction. The cylindrical lens 21a includes a convex cylindrical surface having a curvature in the Y direction, and the cylindrical lens 21b includes a concave cylindrical surface having a curvature in the Y direction. The cylindrical lens 21a and the cylindrical lens 21b are arranged so as to be spaced apart in the Z direction and the distance in the Z direction can be changed. Further, the cylindrical lens 21a and the cylindrical lens 21b are arranged with their respective cylindrical surfaces facing each other in parallel (a state in which the directions of powers possessed by each other coincide with each other) as a reference state.

また、投影光学系ＰＯは、図４に示すように、第２平面鏡２６と像面ＩＰとの間の光路に配置された第２レンズ群２８を含む。第２レンズ群２８は、鉛直方向に定義される第１方向（Ｚ方向）及び第２方向（Ｙ方向）と直交する第３方向（Ｘ方向）における投影光学系ＯＰの倍率を補正する第２光学系である。第２レンズ群２８は、第１方向に沿って並べられた、第２方向及び第３方向に異なるパワーを有する第３レンズ及び第４レンズとして、シリンドリカルレンズ２８ａ及びシリンドリカルレンズ２８ｂを含む。シリンドリカルレンズ２８ａは、Ｘ方向に曲率を有する凸シリンドリカル面を含み、シリンドリカルレンズ２８ｂは、Ｘ方向に曲率を有する凹シリンドリカル面を含む。シリンドリカルレンズ２８ａとシリンドリカルレンズ２８ｂとは、Ｚ方向に間隔を隔てて、且つ、Ｚ方向の間隔を変更可能に配置されている。また、シリンドリカルレンズ２８ａとシリンドリカルレンズ２８ｂとは、それぞれのシリンドリカル面を平行に対向させた状態（互いが有するパワーの方向が一致する状態）を基準状態として配置されている。 Further, as shown in FIG. 4, the projection optical system PO includes a second lens group 28 arranged in an optical path between the second plane mirror 26 and the image plane IP. The second lens group 28 corrects the magnification of the projection optical system OP in the first direction (Z direction) defined in the vertical direction and the third direction (X direction) orthogonal to the second direction (Y direction). It is an optical system. The second lens group 28 includes a cylindrical lens 28a and a cylindrical lens 28b as a third lens and a fourth lens having different powers in the second direction and the third direction arranged along the first direction. The cylindrical lens 28a includes a convex cylindrical surface having a curvature in the X direction, and the cylindrical lens 28b includes a concave cylindrical surface having a curvature in the X direction. The cylindrical lens 28a and the cylindrical lens 28b are arranged so as to be spaced apart in the Z direction and the distance in the Z direction can be changed. Further, the cylindrical lens 28a and the cylindrical lens 28b are arranged with their respective cylindrical surfaces facing each other in parallel (a state in which the directions of powers possessed by each other coincide with each other) as a reference state.

更に、投影光学系ＰＯは、図４に示すように、第２平面鏡２６と像面ＩＰとの間の光路、詳細には、第２平面鏡２６と第２レンズ群２８との間の光路に配置された第３レンズ群２７を含む。なお、第３レンズ群２７は、物体面ＩＰと第１平面鏡２１との間の光路に配置されてもよい。第３レンズ群２７は、第２方向（Ｙ方向）及び第３方向（Ｘ方向）において同一の倍率（等方倍率）で投影光学系ＰＯの倍率を補正する第３光学系である。第３レンズ群２７は、Ｚ方向に間隔を隔てて、且つ、Ｚ方向の間隔を変更可能に配置された平凸レンズ２７ａ及び平凹レンズ２７ｂを含む。また、平凸レンズ２７ａと平凹レンズ２７ｂとは、それぞれの球面を平行に対向させた状態で配置されている。 Further, as shown in FIG. 4, the projection optical system PO is arranged in the optical path between the second plane mirror 26 and the image plane IP, specifically, in the optical path between the second plane mirror 26 and the second lens group 28. The third lens group 27 is included. The third lens group 27 may be arranged in the optical path between the object surface IP and the first plane mirror 21. The third lens group 27 is a third optical system that corrects the magnification of the projection optical system PO at the same magnification (isotropic magnification) in the second direction (Y direction) and the third direction (X direction). The third lens group 27 includes a plano-convex lens 27a and a plano-concave lens 27b that are spaced apart in the Z direction and the spacing in the Z direction can be changed. Further, the plano-convex lens 27a and the plano-concave lens 27b are arranged so that their spherical surfaces face each other in parallel.

投影光学系ＰＯは、第１レンズ群２１によって投影光学系ＰＯのＹ方向の倍率を補正するために、シリンドリカルレンズ２１ａとシリンドリカルレンズ２１ｂとのＺ方向における間隔を変更する機能を実現する第１駆動機構６０を含む。第１駆動機構６０は、シリンドリカルレンズ２１ａとシリンドリカルレンズ２１ｂとのＺ方向における間隔を変更するために、シリンドリカルレンズ２１ａ及び２１ｂの一方をＺ方向に移動させる。また、第１駆動機構６０は、本実施形態では、Ｚ方向（物体面ＯＰと第１平面鏡２２との間の光路）に平行な第１軸まわりにシリンドリカルレンズ２１ａ及び２１ｂの一方を回転させる機能も有する。 The projection optical system PO is a first drive that realizes a function of changing the distance between the cylindrical lens 21a and the cylindrical lens 21b in the Z direction in order to correct the magnification in the Y direction of the projection optical system PO by the first lens group 21. Includes mechanism 60. The first drive mechanism 60 moves one of the cylindrical lenses 21a and 21b in the Z direction in order to change the distance between the cylindrical lens 21a and the cylindrical lens 21b in the Z direction. Further, in the present embodiment, the first drive mechanism 60 has a function of rotating one of the cylindrical lenses 21a and 21b around the first axis parallel to the Z direction (the optical path between the object surface OP and the first plane mirror 22). Also has.

また、投影光学系ＰＯは、第２レンズ群２８によって投影光学系ＰＯのＸ方向の倍率を補正するために、シリンドリカルレンズ２８ａとシリンドリカルレンズ２８ｂとのＺ方向における間隔を変更する機能を実現する第２駆動機構７０を含む。第２駆動機構７０は、シリンドリカルレンズ２８ａとシリンドリカルレンズ２８ｂとのＺ方向における間隔を変更するために、シリンドリカルレンズ２８ａ及び２８ｂの一方をＺ方向に移動させる。また、第２駆動機構７０は、本実施形態では、Ｚ方向（第２平面鏡２６と像面ＩＰとの間の光路）に平行な第２軸まわりにシリンドリカルレンズ２８ａ及び２８ｂの一方を回転させる機能も有する。 Further, the projection optical system PO realizes a function of changing the distance between the cylindrical lens 28a and the cylindrical lens 28b in the Z direction in order to correct the magnification of the projection optical system PO in the X direction by the second lens group 28. 2 Drive mechanism 70 is included. The second drive mechanism 70 moves one of the cylindrical lenses 28a and 28b in the Z direction in order to change the distance between the cylindrical lens 28a and the cylindrical lens 28b in the Z direction. Further, in the present embodiment, the second drive mechanism 70 has a function of rotating one of the cylindrical lenses 28a and 28b around the second axis parallel to the Z direction (the optical path between the second plane mirror 26 and the image plane IP). Also has.

更に、投影光学系ＰＯは、第３レンズ群２７によって投影光学系ＰＯのＸ方向及びＹ方向の倍率を補正するために、平凸レンズ２７ａと平凹レンズ２７ｂとのＺ方向における間隔を変更する機能を実現する第３駆動機構８０を含む。第３駆動機構８０は、平凸レンズ２７ａと平凹レンズ２７ｂとのＺ方向における間隔を変更するために、平凸レンズ２７ａ及び２７ｂの一方をＺ方向に移動させる。 Further, the projection optical system PO has a function of changing the distance between the plano-convex lens 27a and the plano-concave lens 27b in the Z direction in order to correct the magnification in the X direction and the Y direction of the projection optical system PO by the third lens group 27. The third drive mechanism 80 to be realized is included. The third drive mechanism 80 moves one of the plano-convex lenses 27a and 27b in the Z direction in order to change the distance between the plano-convex lens 27a and the plano-concave lens 27b in the Z direction.

図５は、第１レンズ群２１、第２レンズ群２８及び第３レンズ群２７のそれぞれを構成する各レンズを駆動した際に発生する非点収差及び倍率成分の発生量を示す図である。図５に示すように、第１レンズ群２１において、シリンドリカルレンズ２１ａとシリンドリカルレンズ２１ｂとのＺ方向における間隔を変更すると、Ｘ方向とＹ方向に非点収差量Ａが発生し、Ｙ方向に倍率成分量－Ｄが発生する。一方、シリンドリカルレンズ２１ａ及び２１ｂの一方をＺ方向に平行な第１軸まわりに回転させると、斜め４５度方向と斜め１３５度方向に非点収差量Ｂが発生し、斜め４５度方向に倍率成分量Ｅが発生し、斜め１３５度方向に倍率成分量Ｆが発生する。 FIG. 5 is a diagram showing the amount of astigmatism and magnification component generated when each lens constituting each of the first lens group 21, the second lens group 28, and the third lens group 27 is driven. As shown in FIG. 5, when the distance between the cylindrical lens 21a and the cylindrical lens 21b in the Z direction is changed in the first lens group 21, astigmatism amount A is generated in the X direction and the Y direction, and the magnification is increased in the Y direction. Component amount-D is generated. On the other hand, when one of the cylindrical lenses 21a and 21b is rotated around the first axis parallel to the Z direction, an astigmatism amount B is generated in the 45-degree diagonal direction and the 135-degree diagonal direction, and the magnification component is in the 45-degree diagonal direction. The amount E is generated, and the magnification component amount F is generated in the diagonal 135 degree direction.

また、図５に示すように、第２レンズ群２８において、シリンドリカルレンズ２８ａとシリンドリカルレンズ２８ｂとのＺ方向における間隔を変更すると、Ｘ方向とＹ方向に非点収差量Ａが発生し、Ｘ方向に倍率成分量－Ｃが発生する。一方、シリンドリカルレンズ２８ａ及び２８ｂの一方をＺ方向に平行な第２軸まわりに回転させると、斜め４５度方向と斜め１３５度方向に非点収差量Ｂが発生し、斜め４５度方向に倍率成分量－Ｅが発生し、斜め１３５度方向に倍率成分量－Ｆが発生する。 Further, as shown in FIG. 5, when the distance between the cylindrical lens 28a and the cylindrical lens 28b in the Z direction is changed in the second lens group 28, astigmatism amount A is generated in the X direction and the Y direction, and the astigmatism amount A is generated in the X direction. Magnification component amount-C is generated. On the other hand, when one of the cylindrical lenses 28a and 28b is rotated around the second axis parallel to the Z direction, astigmatism amount B is generated in the diagonal 45-degree direction and the diagonal 135-degree direction, and the magnification component is in the diagonal 45-degree direction. The amount-E is generated, and the magnification component amount-F is generated in the diagonal 135 degree direction.

また、図５に示すように、第３レンズ群２７において、平凸レンズ２７ａと平凹レンズ２７ｂとのＺ方向における間隔を変更すると、Ｘ方向に倍率成分量－Ｃが発生し、Ｙ方向に倍率成分量－Ｄが発生する。 Further, as shown in FIG. 5, when the distance between the plano-convex lens 27a and the plano-concave lens 27b in the Z direction is changed in the third lens group 27, the magnification component amount −C is generated in the X direction and the magnification component is generated in the Y direction. Quantity-D is generated.

ここで、第１レンズ群２１、第２レンズ群２８及び第３レンズ群２７を用いて、Ｘ方向とＹ方向に非点収差量２Ａを発生させる方法について説明する。まず、第１レンズ群２１において、Ｘ方向とＹ方向に非点収差量Ａを発生させるように、シリンドリカルレンズ２１ａとシリンドリカルレンズ２１ｂとのＺ方向における間隔を変更する。この際、第１レンズ群２１で発生する他成分として、Ｙ方向に倍率成分量－Ｄが発生する。 Here, a method of generating the astigmatism amount 2A in the X direction and the Y direction by using the first lens group 21, the second lens group 28, and the third lens group 27 will be described. First, in the first lens group 21, the distance between the cylindrical lens 21a and the cylindrical lens 21b in the Z direction is changed so as to generate the astigmatism amount A in the X direction and the Y direction. At this time, as another component generated in the first lens group 21, a magnification component amount −D is generated in the Y direction.

次いで、第２レンズ群２８において、Ｘ方向とＹ方向に非点収差量Ａを発生させるように、シリンドリカルレンズ２８ａとシリンドリカルレンズ２８ｂとのＺ方向における間隔を変更する。この際、第２レンズ群２８で発生する他成分として、Ｘ方向に倍率成分量－Ｃが発生する。 Next, in the second lens group 28, the distance between the cylindrical lens 28a and the cylindrical lens 28b in the Z direction is changed so as to generate the astigmatism amount A in the X direction and the Y direction. At this time, as another component generated in the second lens group 28, the magnification component amount −C is generated in the X direction.

次いで、第３レンズ群２７において、第１レンズ群２１で発生したＹ方向の倍率成分を打ち消すために、Ｙ方向に倍率成分量Ｄを発生させるように、平凸レンズ２７ａと平凹レンズ２７ｂとのＺ方向における間隔を変更する。この際、第３レンズ群２７で発生する他成分として、Ｘ方向に倍率成分量Ｃが発生する。従って、第２レンズ群２８で発生したＸ方向の倍率成分も打ち消すことができる。その結果、Ｘ方向とＹ方向に非点収差量２Ａだけが発生することになる。 Next, in the third lens group 27, in order to cancel the magnification component in the Y direction generated in the first lens group 21, the Z of the plano-convex lens 27a and the plano-concave lens 27b so as to generate the magnification component amount D in the Y direction. Change the spacing in the direction. At this time, the magnification component amount C is generated in the X direction as another component generated in the third lens group 27. Therefore, the magnification component in the X direction generated in the second lens group 28 can also be canceled. As a result, only the astigmatism amount 2A is generated in the X direction and the Y direction.

次に、第１レンズ群２１及び第２レンズ群２８を用いて、斜め４５度方向と斜め１３５度方向に非点収差量２Ｂを発生させる方法について説明する。まず、第１レンズ群２１において、斜め４５度方向と斜め１３５度方向に非点収差量Ｂを発生させるように、シリンドリカルレンズ２１ａ及び２１ｂの一方をＺ方向に平行な第１軸まわりに回転させる。この際、第１レンズ群２１で発生する他成分として、斜め４５度方向に倍率成分量Ｅが発生し、斜め１３５度方向に倍率成分量Ｆが発生する。 Next, a method of generating the astigmatism amount 2B in the diagonal 45-degree direction and the diagonal 135-degree direction will be described using the first lens group 21 and the second lens group 28. First, in the first lens group 21, one of the cylindrical lenses 21a and 21b is rotated around the first axis parallel to the Z direction so as to generate the astigmatism amount B in the diagonal 45-degree direction and the diagonal 135-degree direction. .. At this time, as other components generated in the first lens group 21, the magnification component amount E is generated in the oblique 45-degree direction, and the magnification component amount F is generated in the oblique 135-degree direction.

次いで、第２レンズ群２８において、斜め４５度方向と斜め１３５度方向に非点収差量Ｂを発生させるように、シリンドリカルレンズ２８ａ及び２８ｂの一方をＺ方向に平行な第２軸まわりに回転させる。この際、第２レンズ群２８で発生する他成分として、斜め４５度方向に倍率成分量－Ｅが発生し、斜め１３５度方向に倍率成分量－Ｆが発生する。従って、第１レンズ群２１及び第２レンズ群２８のそれぞれで発生した他成分である斜め４５度方向の倍率成分及び斜め１３５度の倍率成分が打ち消され、斜め４５度方向と斜め１３５度方向に非点収差量２Ｂだけが発生することになる。 Next, in the second lens group 28, one of the cylindrical lenses 28a and 28b is rotated around the second axis parallel to the Z direction so as to generate the astigmatism amount B in the diagonal 45-degree direction and the diagonal 135-degree direction. .. At this time, as other components generated in the second lens group 28, the magnification component amount −E is generated in the oblique 45 degree direction, and the magnification component amount −F is generated in the oblique 135 degree direction. Therefore, the other components generated in the first lens group 21 and the second lens group 28, that is, the magnification component in the diagonal 45 degree direction and the magnification component in the diagonal 135 degree are canceled, and the magnification component in the diagonal 45 degree direction and the diagonal 135 degree direction are canceled. Only the astigmatism amount 2B will be generated.

次に、第１レンズ群２１、第２レンズ群２８及び第３レンズ群２７を用いて、Ｘ方向に倍率成分量２Ｃを発生させる方法について説明する。まず、第２レンズ群２８において、Ｘ方向に倍率成分量Ｃを発生させるように、シリンドリカルレンズ２８ａとシリンドリカルレンズ２８ｂとのＺ方向における間隔を変更する。この際、第２レンズ群２８で発生する他成分として、Ｘ方向とＹ方向に非点収差量－Ａが発生する。 Next, a method of generating the magnification component amount 2C in the X direction will be described using the first lens group 21, the second lens group 28, and the third lens group 27. First, in the second lens group 28, the distance between the cylindrical lens 28a and the cylindrical lens 28b in the Z direction is changed so as to generate the magnification component amount C in the X direction. At this time, astigmatism amount −A is generated in the X direction and the Y direction as another component generated in the second lens group 28.

次いで、第３レンズ群２７において、Ｘ方向に倍率成分量Ｃを発生させるように、平凸レンズ２７ａと平凹レンズ２７ｂとのＺ方向における間隔を変更する。この際、第３レンズ群２７で発生する他成分として、Ｙ方向に倍率成分量Ｄが発生する。 Next, in the third lens group 27, the distance between the plano-convex lens 27a and the plano-concave lens 27b in the Z direction is changed so as to generate the magnification component amount C in the X direction. At this time, the magnification component amount D is generated in the Y direction as another component generated in the third lens group 27.

次いで、第１レンズ群２１において、第３レンズ群２７で発生したＹ方向の倍率成分を打ち消すために、Ｙ方向に倍率成分量－Ｄを発生させるように、シリンドリカルレンズ２１ａとシリンドリカルレンズ２１ｂとのＺ方向における間隔を変更する。この際、第１レンズ群２１で発生する他成分として、Ｘ方向とＹ方向に非点収差量Ａが発生する。従って、残存していたＸ方向とＹ方向の非点収差量－Ａも打ち消され、Ｘ方向の倍率成分量２Ｃだけが発生することになる。 Next, in the first lens group 21, the cylindrical lens 21a and the cylindrical lens 21b are used so as to generate the magnification component amount −D in the Y direction in order to cancel the magnification component in the Y direction generated in the third lens group 27. Change the interval in the Z direction. At this time, astigmatism amount A is generated in the X direction and the Y direction as another component generated in the first lens group 21. Therefore, the remaining astigmatism amount −A in the X direction and the Y direction is also canceled, and only the magnification component amount 2C in the X direction is generated.

次に、第１レンズ群２１、第２レンズ群２８及び第３レンズ群２７を用いて、Ｙ方向に倍率成分量２Ｄを発生させる方法について説明する。まず、第１レンズ群２１において、Ｙ方向に倍率成分量Ｄを発生させるように、シリンドリカルレンズ２１ａとシリンドリカルレンズ２１ｂとのＺ方向における間隔を変更する。この際、第１レンズ群２１で発生する他成分として、Ｘ方向とＹ方向に非点収差量－Ａが発生する。 Next, a method of generating the magnification component amount 2D in the Y direction will be described using the first lens group 21, the second lens group 28, and the third lens group 27. First, in the first lens group 21, the distance between the cylindrical lens 21a and the cylindrical lens 21b in the Z direction is changed so as to generate the magnification component amount D in the Y direction. At this time, astigmatism amount −A is generated in the X direction and the Y direction as another component generated in the first lens group 21.

次いで、第３レンズ群２７において、Ｘ方向に倍率成分量Ｄを発生させるように、平凸レンズ２７ａと平凹レンズ２７ｂとのＺ方向における間隔を変更する。この際、第３レンズ群２７で発生する他成分として、Ｘ方向に倍率成分量Ｃが発生する。 Next, in the third lens group 27, the distance between the plano-convex lens 27a and the plano-concave lens 27b in the Z direction is changed so as to generate the magnification component amount D in the X direction. At this time, the magnification component amount C is generated in the X direction as another component generated in the third lens group 27.

次いで、第２レンズ群２８において、第３レンズ群２７で発生したＸ方向の倍率成分を打ち消すために、Ｘ方向に倍率成分量－Ｃを発生させるように、シリンドリカルレンズ２８ａとシリンドリカルレンズ２８ｂとのＺ方向における間隔を変更する。この際、第２レンズ群２８で発生する他成分として、Ｘ方向とＹ方向に非点収差量Ａが発生する。従って、残存していたＸ方向とＹ方向の非点収差量－Ａも打ち消され、Ｙ方向の倍率成分量２Ｄだけが発生することになる。 Next, in the second lens group 28, in order to cancel the magnification component in the X direction generated in the third lens group 27, the cylindrical lens 28a and the cylindrical lens 28b are combined so as to generate the magnification component amount −C in the X direction. Change the interval in the Z direction. At this time, astigmatism amount A is generated in the X direction and the Y direction as another component generated in the second lens group 28. Therefore, the remaining astigmatism amount −A in the X direction and the Y direction is also canceled, and only the magnification component amount 2D in the Y direction is generated.

上述した４つの方法を組み合わせることによって、Ｘ方向とＹ方向の非点収差成分、斜め４５度方向と斜め１３５度方向の非点収差成分、Ｘ方向の倍率成分及びＹ方向の倍率成分の４つの成分（収差）を同時に、且つ、独立して補正することができる。換言すれば、第１レンズ群２１、第２レンズ群２８及び第３レンズ群２７を用いて、投影光学系ＰＯの倍率が目標値となり、且つ、投影光学系ＰＯの非点収差が目標値となるようにすることができる。具体的には、投影光学系ＰＯの倍率が目標値となり、且つ、投影光学系ＰＯの非点収差が目標値となるように、制御部ＣＵにおいて、第１レンズ群２１、第２レンズ群２８及び第３レンズ群２７の各レンズの駆動、即ち、以下の（１）乃至（５）を制御する。
（１）シリンドリカルレンズ２１ａとシリンドリカルレンズ２１ｂとのＺ方向における間隔
（２）シリンドリカルレンズ２８ａとシリンドリカルレンズ２８ｂとのＺ方向における間隔
（３）平凸レンズ２７ａと平凹レンズ２７ｂとのＺ方向における間隔
（４）シリンドリカルレンズ２１ａ及び２１ｂの一方の回転角
（５）シリンドリカルレンズ２８ａ及び２８ｂの一方の回転角
以下、図６を参照して、投影光学系ＰＯの非点収差の補正（調整）について説明する。投影光学系ＰＯの非点収差の補正は、上述したように、制御部ＣＵが露光装置ＥＸの各部を統括的に制御することで行われる。 By combining the above four methods, there are four components: astigmatism component in the X and Y directions, astigmatism component in the 45 degree and 135 degree directions, magnification component in the X direction, and magnification component in the Y direction. The components (aberrations) can be corrected simultaneously and independently. In other words, using the first lens group 21, the second lens group 28, and the third lens group 27, the magnification of the projection optical system PO is the target value, and the astigmatism of the projection optical system PO is the target value. Can be. Specifically, in the control unit CU, the first lens group 21 and the second lens group 28 are set so that the magnification of the projection optical system PO becomes the target value and the astigmatism of the projection optical system PO becomes the target value. And the drive of each lens of the third lens group 27, that is, the following (1) to (5) are controlled.
(1) Spacing between the cylindrical lens 21a and the cylindrical lens 21b in the Z direction (2) Spacing between the cylindrical lens 28a and the cylindrical lens 28b in the Z direction (3) Spacing between the plano-convex lens 27a and the plano-concave lens 27b in the Z direction (4) ) One rotation angle of the cylindrical lenses 21a and 21b (5) One rotation angle of the cylindrical lenses 28a and 28b Hereinafter, correction (adjustment) of astigmatism of the projection optical system PO will be described with reference to FIG. As described above, the correction of the astigmatism of the projection optical system PO is performed by the control unit CU comprehensively controlling each unit of the exposure apparatus EX.

Ｓ６０２では、露光装置ＥＸに設けられている計測部（不図示）を用いて、投影光学系ＰＯを介した複数のパターン（Ｘ方向とＹ方向、斜め４５度方向と斜め１３５度方向）の焦点位置を計測する。 In S602, the focal point of a plurality of patterns (X direction and Y direction, oblique 45 degree direction and oblique 135 degree direction) via the projection optical system PO by using the measurement unit (not shown) provided in the exposure apparatus EX. Measure the position.

Ｓ６０４では、Ｓ６０２での計測結果に基づいて、投影光学系ＰＯの非点収差を求める。具体的には、第１工程で計測されたＸ方向とＹ方向のパターンの焦点位置差からＸ方向とＹ方向の非点収差量を求め、斜め４５度方向と斜め１３５度方向のパターンの焦点位置差から斜め４５度方向と斜め１３５度方向の非点収差量を求める。 In S604, astigmatism of the projection optical system PO is obtained based on the measurement result in S602. Specifically, the amount of astigmatism in the X and Y directions is obtained from the focal position difference between the patterns in the X and Y directions measured in the first step, and the focal point of the pattern in the 45 degree diagonal direction and the 135 degree diagonal direction is obtained. The amount of astigmatism in the 45-degree diagonal direction and the 135-degree diagonal direction is obtained from the positional difference.

Ｓ６０６では、Ｓ６０４で求めた非点収差が予め設定された許容値を超えているかどうかを判定する。Ｓ６０４で求めた非点収差が予め設定された許容値を超えていない場合には、投影光学系ＰＯの非点収差の補正を終了する。一方、Ｓ６０４で求めた非点収差が予め設定された許容値を超えている場合には、Ｓ６０８に移行する。 In S606, it is determined whether or not the astigmatism obtained in S604 exceeds a preset allowable value. If the astigmatism obtained in S604 does not exceed the preset allowable value, the correction of the astigmatism of the projection optical system PO is terminated. On the other hand, if the astigmatism obtained in S604 exceeds a preset allowable value, the process proceeds to S608.

Ｓ６０８では、Ｓ６０４で求めた非点収差に基づいて、第１レンズ群２１、第２レンズ群２７及び第３レンズ群２８の各レンズの駆動量及び回転量を求める。具体的には、Ｘ方向とＹ方向の非点収差量から、シリンドリカルレンズ２１ａ及び２１ｂの一方のＺ方向の駆動量、シリンドリカルレンズ２８ａ及び２８ｂの一方のＺ方向の駆動量、及び、平凸レンズ２７ａ及び平凹レンズ２７ｂの一方のＺ方向の駆動量を求める。また、斜め４５度方向と斜め１３５度方向の非点収差量から、シリンドリカルレンズ２１ａ及び２１ｂの一方の回転量、及び、シリンドリカルレンズ２８ａ及び２８ｂの一方の回転量を求める。 In S608, the drive amount and the rotation amount of each lens of the first lens group 21, the second lens group 27, and the third lens group 28 are obtained based on the astigmatism obtained in S604. Specifically, from the amount of astigmatism in the X and Y directions, the driving amount in the Z direction of one of the cylindrical lenses 21a and 21b, the driving amount in the Z direction of one of the cylindrical lenses 28a and 28b, and the plano-convex lens 27a. And the driving amount in the Z direction of one of the plano-concave lenses 27b is obtained. Further, the amount of rotation of one of the cylindrical lenses 21a and 21b and the amount of rotation of one of the cylindrical lenses 28a and 28b are obtained from the amount of astigmatism in the direction of 45 degrees and the amount of astigmatism in the direction of 135 degrees.

Ｓ６１０では、Ｓ６０８で求めた駆動量及び回転量に基づいて、第１レンズ群２１、第２レンズ群２７及び第３レンズ群３８の各レンズの駆動及び回転を行う。そして、Ｓ６０２に移行して、投影光学系ＰＯを介した複数のパターンの焦点位置を再度計測し、その計測結果から投影光学系ＰＯの非点収差を求め（Ｓ６０４）、かかる非点収差が許容値を超えているかどうかを判定する（Ｓ６０６）。 In S610, each lens of the first lens group 21, the second lens group 27, and the third lens group 38 is driven and rotated based on the drive amount and the rotation amount obtained in S608. Then, in the transition to S602, the focal positions of a plurality of patterns via the projection optical system PO are measured again, the astigmatism of the projection optical system PO is obtained from the measurement result (S604), and the astigmatism is permissible. It is determined whether or not the value is exceeded (S606).

このように、第１実施形態及び第２実施形態によれば、投影光学系ＰＯを大型化することなく（所謂、オフナー光学系でありながら）、倍率や非点収差を高精度に補正することができる。 As described above, according to the first embodiment and the second embodiment, the magnification and astigmatism are corrected with high accuracy without increasing the size of the projection optical system PO (although it is a so-called Offner optical system). Can be done.

本発明の実施形態における物品の製造方法は、例えば、デバイス（半導体素子、磁気記憶媒体、液晶表示素子など）などの物品を製造するのに好適である。かかる製造方法は、露光装置ＥＸを用いて、感光剤が塗布された基板を露光する工程と、露光された基板を現像する工程を含む。また、かかる製造方法は、他の周知の工程（酸化、成膜、蒸着、ドーピング、平坦化、エッチング、レジスト剥離、ダイシング、ボンディング、パッケージングなど）を含みうる。本実施形態における物品の製造方法は、従来に比べて、物品の性能、品質、生産性及び生産コストの少なくとも１つにおいて有利である。 The method for manufacturing an article according to the embodiment of the present invention is suitable for manufacturing an article such as a device (semiconductor element, magnetic storage medium, liquid crystal display element, etc.). Such a manufacturing method includes a step of exposing a substrate coated with a photosensitive agent and a step of developing the exposed substrate by using an exposure apparatus EX. In addition, such a manufacturing method may include other well-known steps (oxidation, film formation, vapor deposition, doping, flattening, etching, resist peeling, dicing, bonding, packaging, etc.). The method for producing an article in the present embodiment is advantageous in at least one of the performance, quality, productivity and production cost of the article as compared with the conventional method.

以上、本発明の好ましい実施形態について説明したが、本発明はこれらの実施形態に限定されないことはいうまでもなく、その要旨の範囲内で種々の変形及び変更が可能である。例えば、本実施形態では、第１レンズ群及び第２レンズ群がシリンドリカルレンズを含む場合を例に説明したが、第１レンズ群及び第２レンズ群は、シリンドリカルレンズに代えて、トーリックレンズを含んでいてもよい。 Although the preferred embodiments of the present invention have been described above, it goes without saying that the present invention is not limited to these embodiments, and various modifications and modifications can be made within the scope of the gist thereof. For example, in the present embodiment, the case where the first lens group and the second lens group include a cylindrical lens has been described as an example, but the first lens group and the second lens group include a toric lens instead of the cylindrical lens. You may go out.

ＥＸ：露光装置 ＯＰ：物体面 ＩＰ：像面 ＰＯ：投影光学系 １０：第１レンズ群 １０ａ、１０ｂ：シリンドリカルレンズ １１：第１平面鏡 １２：第１凹面鏡 １３：凸面鏡 １４：第２凹面鏡 １５：第２平面鏡 １６：第２レンズ群 １６ａ、１６ｂ：シリンドリカルレンズ ４０：第１駆動機構 ５０：第２駆動機構 EX: Exposure device OP: Object surface IP: Image surface PO: Projection optical system 10: First lens group 10a, 10b: Cylindrical lens 11: First plane mirror 12: First concave mirror 13: Convex mirror 14: Second concave mirror 15: First 2 plane mirror 16: 2nd lens group 16a, 16b: Cylindrical lens 40: 1st drive mechanism 50: 2nd drive mechanism

Claims (15)

物体面からの光を、第１平面鏡、第１凹面鏡、凸面鏡、第２凹面鏡、第２平面鏡の順に反射して像面に結像させる投影光学系であって、
前記物体面と前記第１平面鏡との間に配置され、鉛直方向に定義される第１方向と直交する第２方向における前記投影光学系の倍率を補正する第１光学系と、
前記第２平面鏡と前記像面との間に配置され、前記第１方向及び前記第２方向と直交する第３方向における前記投影光学系の倍率を補正する第２光学系と、
を有し、
前記第１光学系は、前記第１方向に沿って並べられた、前記第２方向及び前記第３方向に異なるパワーを有する第１レンズ及び第２レンズを含み、
前記第２光学系は、前記第１方向に沿って並べられた、前記第２方向及び前記第３方向に異なるパワーを有する第３レンズ及び第４レンズを含み、
前記第１方向に平行な第１軸まわりに前記第１レンズ及び前記第２レンズの少なくとも一方のレンズを回転させる第１回転部と、
前記第１方向に平行な第２軸まわりに前記第３レンズ及び前記第４レンズの少なくとも一方のレンズを回転させる第２回転部と、
を更に有することを特徴とする投影光学系。 A projection optical system that reflects light from an object surface in the order of a first plane mirror, a first concave mirror, a convex mirror, a second concave mirror, and a second plane mirror to form an image on the image surface.
A first optical system arranged between the object surface and the first plane mirror and correcting the magnification of the projection optical system in a second direction orthogonal to the first direction defined in the vertical direction.
A second optical system arranged between the second plane mirror and the image plane and correcting the magnification of the projection optical system in the first direction and the third direction orthogonal to the second direction.
Have,
The first optical system includes a first lens and a second lens arranged along the first direction and having different powers in the second direction and the third direction.
The second optical system includes a third lens and a fourth lens arranged along the first direction and having different powers in the second direction and the third direction.
A first rotating portion that rotates at least one of the first lens and the second lens around a first axis parallel to the first direction.
A second rotating portion that rotates at least one of the third lens and the fourth lens around a second axis parallel to the first direction.
A projection optical system characterized by further having. 前記第１光学系及び前記第２光学系によって前記投影光学系の倍率を補正することで生じる前記投影光学系の非点収差が低減されるように、前記第１回転部及び前記第２回転部を制御する制御部を更に有することを特徴とする請求項１に記載の投影光学系。 The first rotating portion and the second rotating portion so that the non-point aberration of the projected optical system caused by correcting the magnification of the projected optical system by the first optical system and the second optical system is reduced . The projection optical system according to claim 1, further comprising a control unit for controlling the above. 前記制御部は、前記第１レンズ及び前記第２レンズの一方と、前記第３レンズ及び前記第４レンズの一方とを同時に回転させるように、前記第１回転部及び前記第２回転部を制御することを特徴とする請求項２に記載の投影光学系。 The control unit controls the first rotation unit and the second rotation unit so that one of the first lens and the second lens and one of the third lens and the fourth lens rotate at the same time. 2. The projection optical system according to claim 2. 前記制御部は、前記第１光学系及び前記第２光学系によって前記投影光学系の倍率を目標値に補正することで生じる前記投影光学系の非点収差を打ち消すために必要となる、前記第１レンズ及び前記第２レンズの一方及び前記第３レンズ及び前記第４レンズの一方のそれぞれの回転量を求め、前記回転量に基づいて前記第１回転部及び前記第２回転部を制御することを特徴とする請求項２又は３に記載の投影光学系。 The control unit is required to cancel the astigmatism of the projection optical system caused by correcting the magnification of the projection optical system to a target value by the first optical system and the second optical system. The rotation amount of one of the 1 lens and the second lens and one of the third lens and the fourth lens is obtained, and the first rotation unit and the second rotation unit are controlled based on the rotation amount. 2. The projection optical system according to claim 2 or 3. 前記非点収差は、前記第２方向及び前記第３方向から４５度回転した方向の非点収差を含むことを特徴とする請求項２乃至４のうちいずれか１項に記載の投影光学系。 The projection optical system according to any one of claims 2 to 4, wherein the astigmatism includes astigmatism in the second direction and the direction rotated by 45 degrees from the third direction. 前記第１軸と前記第２軸とは、同一の直線上に存在することを特徴とする請求項１乃至５のうちいずれか１項に記載の投影光学系。 The projection optical system according to any one of claims 1 to 5, wherein the first axis and the second axis exist on the same straight line. 前記物体面と前記第１平面鏡との間又は前記第２平面鏡と前記像面との間に配置され、前記第２方向及び前記第３方向において同一の倍率で前記投影光学系の倍率を補正する第３光学系を更に有することを特徴とする請求項１乃至６のうちいずれか１項に記載の投影光学系。 It is arranged between the object surface and the first plane mirror or between the second plane mirror and the image plane, and corrects the magnification of the projection optical system at the same magnification in the second direction and the third direction. The projection optical system according to any one of claims 1 to 6, further comprising a third optical system. 前記第１レンズ及び前記第２レンズは、前記第１方向における間隔を変更可能であり、
前記第３レンズ及び前記第４レンズは、前記第１方向における間隔を変更可能であり、
前記第３光学系は、前記第１方向における間隔を変更可能な平凸レンズ及び平凹レンズを含み、
前記投影光学系の倍率が目標値となり、且つ、前記投影光学系の非点収差が目標値となるように、前記第１レンズと前記第２レンズとの前記第１方向における間隔、前記第３レンズと前記第４レンズとの前記第１方向における間隔、前記平凸レンズと前記平凹レンズとの前記第１方向における間隔、前記第１レンズ及び前記第２レンズの一方の回転角、及び、前記第３レンズ及び前記第４レンズの一方の回転角を制御する制御部を更に有することを特徴とする請求項７に記載の投影光学系。 The first lens and the second lens can change the distance in the first direction.
The third lens and the fourth lens can change the distance in the first direction.
The third optical system includes a plano-convex lens and a plano-concave lens whose spacing in the first direction can be changed.
The distance between the first lens and the second lens in the first direction so that the magnification of the projection optical system becomes the target value and the non-point aberration of the projection optical system becomes the target value, the third. The distance between the lens and the fourth lens in the first direction, the distance between the plano-convex lens and the plano-concave lens in the first direction, the rotation angle of one of the first lens and the second lens, and the first. The projection optical system according to claim 7, further comprising a control unit for controlling the rotation angle of one of the three lenses and the fourth lens. 前記物体面及び前記像面においてテレセントリックであることを特徴とする請求項１乃至８のうちいずれか１項に記載の投影光学系。 The projection optical system according to any one of claims 1 to 8, wherein the object surface and the image plane are telecentric. 前記第１レンズ、前記第２レンズ、前記第３レンズ及び前記第４レンズは、シリンドリカルレンズ又はトーリックレンズを含むことを特徴とする請求項１乃至９のうちいずれか１項に記載の投影光学系。 The projection optical system according to any one of claims 1 to 9, wherein the first lens, the second lens, the third lens, and the fourth lens include a cylindrical lens or a toric lens. .. 物体面からの光を、第１平面鏡、第１凹面鏡、凸面鏡、第２凹面鏡、第２平面鏡の順に反射して像面に結像させる投影光学系であって、
前記物体面と前記第１平面鏡との間に配置され、鉛直方向に定義される第１方向と直交する第２方向における前記投影光学系の倍率を補正する第１光学系と、
前記第２平面鏡と前記像面との間に配置され、前記第１方向及び前記第２方向と直交する第３方向における前記投影光学系の倍率を補正する第２光学系と、
を有し、
前記第１光学系は、前記第１方向に沿って並べられた、前記第１方向及び前記第２方向に異なるパワーを有する第１レンズ及び第２レンズを含み、
前記第２光学系は、前記第１方向に沿って並べられた、前記第１方向及び前記第２方向に異なるパワーを有する第３レンズ及び第４レンズを含み、
前記第１光学系及び前記第２光学系によって前記投影光学系の倍率を補正することで生じる前記投影光学系の非点収差が低減されるように、前記第１レンズ及び前記第２レンズの少なくとも一方のレンズは、互いが有する前記パワーの方向が一致する基準状態から回転させた状態で配置され、且つ、前記第３レンズ及び前記第４レンズの少なくとも一方のレンズは、互いが有する前記パワーの方向が一致する基準状態から回転させた状態で配置されていることを特徴とする投影光学系。 A projection optical system that reflects light from an object surface in the order of a first plane mirror, a first concave mirror, a convex mirror, a second concave mirror, and a second plane mirror to form an image on the image surface.
A first optical system arranged between the object surface and the first plane mirror and correcting the magnification of the projection optical system in a second direction orthogonal to the first direction defined in the vertical direction.
A second optical system arranged between the second plane mirror and the image plane and correcting the magnification of the projection optical system in the first direction and the third direction orthogonal to the second direction.
Have,
The first optical system includes a first lens and a second lens arranged along the first direction and having different powers in the first direction and the second direction.
The second optical system includes a third lens and a fourth lens arranged along the first direction and having different powers in the first direction and the second direction.
At least of the first lens and the second lens so that the non-point aberration of the projection optical system caused by correcting the magnification of the projection optical system by the first optical system and the second optical system is reduced . One lens is arranged in a state of being rotated from a reference state in which the directions of the powers possessed by each other coincide with each other, and at least one lens of the third lens and the fourth lens is of the power possessed by each other. A projection optical system characterized in that it is arranged in a state of being rotated from a reference state in which the directions match. 光源からの光でマスクを照明する照明光学系と、
前記マスクのパターンの像を基板に投影する請求項１乃至１１のうちいずれか１項に記載の投影光学系と、
を有することを特徴とする露光装置。 An illumination optical system that illuminates the mask with the light from the light source,
The projection optical system according to any one of claims 1 to 11, which projects an image of the mask pattern onto a substrate.
An exposure apparatus characterized by having. 請求項１２に記載の露光装置を用いて基板を露光する工程と、
露光した前記基板を現像する工程と、
現像された前記基板から物品を製造する工程と、
を有することを特徴とする物品の製造方法。 A step of exposing a substrate using the exposure apparatus according to claim 12.
The process of developing the exposed substrate and
The process of manufacturing an article from the developed substrate and
A method of manufacturing an article, characterized in that it has. 物体面からの光を、第１平面鏡、第１凹面鏡、凸面鏡、第２凹面鏡、第２平面鏡の順に反射して像面に結像させる投影光学系であり、前記物体面と前記第１平面鏡との間に配置され、鉛直方向に定義される第１方向と直交する第２方向における前記投影光学系の倍率を補正する第１光学系と、前記第２平面鏡と前記像面との間に配置され、前記第１方向及び前記第２方向と直交する第３方向における前記投影光学系の倍率を補正する第２光学系と、を有する投影光学系の調整方法であって、It is a projection optical system that reflects light from an object surface in the order of a first plane mirror, a first concave mirror, a convex mirror, a second concave mirror, and a second plane mirror to form an image on the image surface. A first optical system arranged between the two, which corrects the magnification of the projection optical system in a second direction orthogonal to the first direction defined in the vertical direction, and an arrangement between the second plane mirror and the image plane. A method for adjusting a projection optical system, which comprises a second optical system for correcting the magnification of the projection optical system in the first direction and a third direction orthogonal to the second direction.
前記第１光学系は、前記第１方向に沿って並べられた、前記第２方向及び前記第３方向に異なるパワーを有する第１レンズ及び第２レンズを含み、The first optical system includes a first lens and a second lens arranged along the first direction and having different powers in the second direction and the third direction.
前記第２光学系は、前記第１方向に沿って並べられた、前記第２方向及び前記第３方向に異なるパワーを有する第３レンズ及び第４レンズを含み、The second optical system includes a third lens and a fourth lens arranged along the first direction and having different powers in the second direction and the third direction.
前記第１光学系及び前記第２光学系によって前記投影光学系の倍率を補正することで生じる前記投影光学系の非点収差が低減されるように、前記第１方向に平行な第１軸まわりに前記第１レンズ及び前記第２レンズの少なくとも一方のレンズを回転させ、前記第１方向に平行な第２軸まわりに前記第３レンズ及び前記第４レンズの少なくとも一方のレンズを回転させることを特徴とする調整方法。Around the first axis parallel to the first direction so that the non-point aberration of the projection optical system caused by correcting the magnification of the projection optical system by the first optical system and the second optical system is reduced. At least one of the first lens and the second lens is rotated, and at least one of the third lens and the fourth lens is rotated around the second axis parallel to the first direction. Characteristic adjustment method. 物体面からの光を、第１平面鏡、第１凹面鏡、凸面鏡、第２凹面鏡、第２平面鏡の順に反射して像面に結像させる投影光学系であり、前記物体面と前記第１平面鏡との間に配置され、鉛直方向に定義される第１方向と直交する第２方向における前記投影光学系の倍率を補正する第１光学系と、前記第２平面鏡と前記像面との間に配置され、前記第１方向及び前記第２方向と直交する第３方向における前記投影光学系の倍率を補正する第２光学系と、を有する投影光学系の調整方法であって、It is a projection optical system that reflects light from an object surface in the order of a first plane mirror, a first concave mirror, a convex mirror, a second concave mirror, and a second plane mirror to form an image on the image surface. A first optical system arranged between the two, which corrects the magnification of the projection optical system in a second direction orthogonal to the first direction defined in the vertical direction, and an arrangement between the second plane mirror and the image plane. A method for adjusting a projection optical system, which comprises a second optical system for correcting the magnification of the projection optical system in the first direction and a third direction orthogonal to the second direction.
前記第１光学系は、前記第１方向に沿って並べられた、前記第２方向及び前記第３方向に異なるパワーを有する第１レンズ及び第２レンズを含み、The first optical system includes a first lens and a second lens arranged along the first direction and having different powers in the second direction and the third direction.
前記第２光学系は、前記第１方向に沿って並べられた、前記第２方向及び前記第３方向に異なるパワーを有する第３レンズ及び第４レンズを含み、The second optical system includes a third lens and a fourth lens arranged along the first direction and having different powers in the second direction and the third direction.
前記第１光学系及び前記第２光学系によって前記投影光学系の倍率を補正することで生じる前記投影光学系の非点収差が低減されるように、前記第１レンズ及び前記第２レンズの少なくとも一方のレンズを、互いが有する前記パワーの方向が一致する基準状態から回転させた状態で配置し、且つ、前記第３レンズ及び前記第４レンズの少なくとも一方のレンズを、互いが有する前記パワーの方向が一致する基準状態から回転させた状態で配置することを特徴とする調整方法。At least of the first lens and the second lens so that the non-point aberration of the projection optical system caused by correcting the magnification of the projection optical system by the first optical system and the second optical system is reduced. One lens is arranged in a state of being rotated from a reference state in which the directions of the powers possessed by each other coincide with each other, and at least one lens of the third lens and the fourth lens is of the power possessed by each other. An adjustment method characterized by arranging the lens in a rotated state from a reference state in which the directions match.
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