KR100999779B1 - 발광소자, 발광소자의 제조방법 및 발광소자 패키지 - Google Patents
발광소자, 발광소자의 제조방법 및 발광소자 패키지 Download PDFInfo
- Publication number
- KR100999779B1 KR100999779B1 KR20100009211A KR20100009211A KR100999779B1 KR 100999779 B1 KR100999779 B1 KR 100999779B1 KR 20100009211 A KR20100009211 A KR 20100009211A KR 20100009211 A KR20100009211 A KR 20100009211A KR 100999779 B1 KR100999779 B1 KR 100999779B1
- Authority
- KR
- South Korea
- Prior art keywords
- light emitting
- passivation layer
- layer
- emitting structure
- conductive semiconductor
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 15
- 238000002161 passivation Methods 0.000 claims abstract description 140
- 239000004065 semiconductor Substances 0.000 claims abstract description 58
- 238000004519 manufacturing process Methods 0.000 claims abstract description 8
- 238000000605 extraction Methods 0.000 claims description 31
- 230000003287 optical effect Effects 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 150
- 239000000758 substrate Substances 0.000 description 18
- 239000000463 material Substances 0.000 description 17
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 8
- 239000010931 gold Substances 0.000 description 6
- 239000007789 gas Substances 0.000 description 5
- 239000011777 magnesium Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 239000006117 anti-reflective coating Substances 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- VRIVJOXICYMTAG-IYEMJOQQSA-L iron(ii) gluconate Chemical compound [Fe+2].OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C([O-])=O.OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C([O-])=O VRIVJOXICYMTAG-IYEMJOQQSA-L 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 150000004767 nitrides Chemical class 0.000 description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 3
- XCZXGTMEAKBVPV-UHFFFAOYSA-N trimethylgallium Chemical compound C[Ga](C)C XCZXGTMEAKBVPV-UHFFFAOYSA-N 0.000 description 3
- 229910019897 RuOx Inorganic materials 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 229910001092 metal group alloy Inorganic materials 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910018229 Al—Ga Inorganic materials 0.000 description 1
- OMKCMEGHMLKVPM-UHFFFAOYSA-N CC=CC=C[Mg] Chemical compound CC=CC=C[Mg] OMKCMEGHMLKVPM-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000002835 absorbance Methods 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- QHMGJGNTMQDRQA-UHFFFAOYSA-N dotriacontane Chemical group CCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCC QHMGJGNTMQDRQA-UHFFFAOYSA-N 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000005496 eutectics Effects 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- CNQCVBJFEGMYDW-UHFFFAOYSA-N lawrencium atom Chemical compound [Lr] CNQCVBJFEGMYDW-UHFFFAOYSA-N 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000001451 molecular beam epitaxy Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 239000004038 photonic crystal Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000002096 quantum dot Substances 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- IBEFSUTVZWZJEL-UHFFFAOYSA-N trimethylindium Chemical compound C[In](C)C IBEFSUTVZWZJEL-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000000927 vapour-phase epitaxy Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Images
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V3/00—Globes; Bowls; Cover glasses
- F21V3/04—Globes; Bowls; Cover glasses characterised by materials, surface treatments or coatings
- F21V3/049—Patterns or structured surfaces for diffusing light, e.g. frosted surfaces
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/44—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V3/00—Globes; Bowls; Cover glasses
- F21V3/02—Globes; Bowls; Cover glasses characterised by the shape
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21Y—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21K, F21L, F21S and F21V, RELATING TO THE FORM OR THE KIND OF THE LIGHT SOURCES OR OF THE COLOUR OF THE LIGHT EMITTED
- F21Y2115/00—Light-generating elements of semiconductor light sources
- F21Y2115/10—Light-emitting diodes [LED]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1203—Rectifying Diode
- H01L2924/12032—Schottky diode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/20—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
- H01L33/22—Roughened surfaces, e.g. at the interface between epitaxial layers
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Led Devices (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20100009211A KR100999779B1 (ko) | 2010-02-01 | 2010-02-01 | 발광소자, 발광소자의 제조방법 및 발광소자 패키지 |
EP11151633.2A EP2355190B1 (en) | 2010-02-01 | 2011-01-21 | Passivated light emitting device |
US13/016,217 US8071973B2 (en) | 2010-02-01 | 2011-01-28 | Light emitting device having a lateral passivation layer |
CN201110036295.4A CN102163675B (zh) | 2010-02-01 | 2011-02-01 | 发光器件 |
US13/241,984 US8148734B2 (en) | 2010-02-01 | 2011-09-23 | Light emitting device having a lateral passivation layer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20100009211A KR100999779B1 (ko) | 2010-02-01 | 2010-02-01 | 발광소자, 발광소자의 제조방법 및 발광소자 패키지 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR100999779B1 true KR100999779B1 (ko) | 2010-12-08 |
Family
ID=43512609
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR20100009211A KR100999779B1 (ko) | 2010-02-01 | 2010-02-01 | 발광소자, 발광소자의 제조방법 및 발광소자 패키지 |
Country Status (4)
Country | Link |
---|---|
US (2) | US8071973B2 (zh) |
EP (1) | EP2355190B1 (zh) |
KR (1) | KR100999779B1 (zh) |
CN (1) | CN102163675B (zh) |
Cited By (3)
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---|---|---|---|---|
WO2012123998A1 (en) * | 2011-03-15 | 2012-09-20 | Kabushiki Kaisha Toshiba | Semiconductor light emitting device and method for manufacturing the same |
CN102738248A (zh) * | 2011-04-11 | 2012-10-17 | 昆山中辰矽晶有限公司 | 光电组件及其制造方法 |
KR101916124B1 (ko) * | 2011-12-22 | 2018-11-08 | 엘지이노텍 주식회사 | 발광소자, 발광 소자 제조방법 및 발광 소자 패키지 |
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KR100993094B1 (ko) * | 2010-02-01 | 2010-11-08 | 엘지이노텍 주식회사 | 발광소자 및 발광소자 패키지 |
TWI495120B (zh) * | 2011-02-09 | 2015-08-01 | Sino American Silicon Prod Inc | 光電元件及其製造方法 |
JP2012231000A (ja) * | 2011-04-26 | 2012-11-22 | Toshiba Corp | 半導体発光装置 |
EP3361517B1 (en) * | 2011-09-16 | 2021-06-23 | Seoul Viosys Co., Ltd. | Light emitting diode |
TWI458122B (zh) * | 2011-11-23 | 2014-10-21 | Toshiba Kk | 半導體發光元件 |
DE102013102621A1 (de) | 2013-03-14 | 2014-09-18 | Osram Opto Semiconductors Gmbh | Optoelektronisches Halbleiterbauelement und Verfahren zur Herstellung eines optoelektronischen Halbleiterbauelements |
US9887324B2 (en) | 2013-09-16 | 2018-02-06 | Lg Innotek Co., Ltd. | Light emitting device package |
CN103700746B (zh) * | 2013-12-10 | 2017-01-04 | 西安交通大学 | 一种发光半导体器件 |
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JP6185415B2 (ja) * | 2014-03-27 | 2017-08-23 | 株式会社東芝 | 半導体発光装置 |
TWM495624U (zh) * | 2014-09-15 | 2015-02-11 | Genesis Photonics Inc | 發光元件結構 |
KR20160149363A (ko) | 2015-06-17 | 2016-12-28 | 삼성전자주식회사 | 반도체 발광소자 |
US11282981B2 (en) * | 2017-11-27 | 2022-03-22 | Seoul Viosys Co., Ltd. | Passivation covered light emitting unit stack |
US10312414B1 (en) * | 2017-12-01 | 2019-06-04 | Innolux Corporation | Light emitting unit and display device |
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2010
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- 2011-01-21 EP EP11151633.2A patent/EP2355190B1/en active Active
- 2011-01-28 US US13/016,217 patent/US8071973B2/en active Active
- 2011-02-01 CN CN201110036295.4A patent/CN102163675B/zh active Active
- 2011-09-23 US US13/241,984 patent/US8148734B2/en active Active
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2012123998A1 (en) * | 2011-03-15 | 2012-09-20 | Kabushiki Kaisha Toshiba | Semiconductor light emitting device and method for manufacturing the same |
CN103403888A (zh) * | 2011-03-15 | 2013-11-20 | 株式会社东芝 | 半导体发光器件及用于制造其的方法 |
US8941124B2 (en) | 2011-03-15 | 2015-01-27 | Kabushiki Kaisha Toshiba | Semiconductor light emitting device and method for manufacturing same |
TWI478392B (zh) * | 2011-03-15 | 2015-03-21 | Toshiba Kk | 半導體發光裝置及其製造方法 |
KR101530142B1 (ko) * | 2011-03-15 | 2015-06-18 | 가부시끼가이샤 도시바 | 반도체 발광 장치 및 그 제조 방법 |
CN102738248A (zh) * | 2011-04-11 | 2012-10-17 | 昆山中辰矽晶有限公司 | 光电组件及其制造方法 |
KR101916124B1 (ko) * | 2011-12-22 | 2018-11-08 | 엘지이노텍 주식회사 | 발광소자, 발광 소자 제조방법 및 발광 소자 패키지 |
Also Published As
Publication number | Publication date |
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EP2355190A2 (en) | 2011-08-10 |
US8148734B2 (en) | 2012-04-03 |
EP2355190B1 (en) | 2019-06-12 |
US20110186813A1 (en) | 2011-08-04 |
US20120012878A1 (en) | 2012-01-19 |
EP2355190A3 (en) | 2014-09-03 |
CN102163675B (zh) | 2015-06-17 |
CN102163675A (zh) | 2011-08-24 |
US8071973B2 (en) | 2011-12-06 |
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