KR100967185B1 - 이음매 없는 엠보싱 표면 및 이음매 없는 엠보싱표면으로부터 다른 표면으로 데이터를 전사하는 방법 - Google Patents
이음매 없는 엠보싱 표면 및 이음매 없는 엠보싱표면으로부터 다른 표면으로 데이터를 전사하는 방법 Download PDFInfo
- Publication number
- KR100967185B1 KR100967185B1 KR1020080077483A KR20080077483A KR100967185B1 KR 100967185 B1 KR100967185 B1 KR 100967185B1 KR 1020080077483 A KR1020080077483 A KR 1020080077483A KR 20080077483 A KR20080077483 A KR 20080077483A KR 100967185 B1 KR100967185 B1 KR 100967185B1
- Authority
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- South Korea
- Prior art keywords
- polyimide
- embossing
- light
- pattern
- present
- Prior art date
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- 238000004049 embossing Methods 0.000 title claims abstract description 55
- 238000000034 method Methods 0.000 title claims abstract description 42
- 239000000463 material Substances 0.000 claims abstract description 80
- 229920001721 polyimide Polymers 0.000 claims abstract description 71
- 239000004642 Polyimide Substances 0.000 claims abstract description 66
- 238000010438 heat treatment Methods 0.000 claims abstract description 5
- 238000004528 spin coating Methods 0.000 claims description 3
- 238000013007 heat curing Methods 0.000 claims 1
- 230000008901 benefit Effects 0.000 abstract description 3
- 238000012546 transfer Methods 0.000 description 20
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 19
- 230000008569 process Effects 0.000 description 19
- 238000000576 coating method Methods 0.000 description 13
- 239000011248 coating agent Substances 0.000 description 12
- 239000010408 film Substances 0.000 description 11
- 238000004519 manufacturing process Methods 0.000 description 11
- 229920002120 photoresistant polymer Polymers 0.000 description 11
- 229910052751 metal Inorganic materials 0.000 description 10
- 239000002184 metal Substances 0.000 description 10
- 229910052759 nickel Inorganic materials 0.000 description 10
- 230000007246 mechanism Effects 0.000 description 9
- 238000005266 casting Methods 0.000 description 7
- 238000007646 gravure printing Methods 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- 230000005855 radiation Effects 0.000 description 6
- 235000019589 hardness Nutrition 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 239000000872 buffer Substances 0.000 description 4
- 239000003623 enhancer Substances 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 238000011068 loading method Methods 0.000 description 4
- 239000002253 acid Substances 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- 230000008092 positive effect Effects 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000005670 electromagnetic radiation Effects 0.000 description 2
- 230000002452 interceptive effect Effects 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 150000004984 aromatic diamines Chemical class 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000994 depressogenic effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000001548 drop coating Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 238000007765 extrusion coating Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 238000010137 moulding (plastic) Methods 0.000 description 1
- 150000002815 nickel Chemical class 0.000 description 1
- 239000012457 nonaqueous media Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000013557 residual solvent Substances 0.000 description 1
- 238000007761 roller coating Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 239000007779 soft material Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000003039 volatile agent Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000003799 water insoluble solvent Substances 0.000 description 1
- 239000003021 water soluble solvent Substances 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/08—Forme preparation by embossing, e.g. with a typewriter
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0015—Production of aperture devices, microporous systems or stamps
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H1/0276—Replicating a master hologram without interference recording
- G03H1/028—Replicating a master hologram without interference recording by embossing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/08—Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
- G03H1/0891—Processes or apparatus adapted to convert digital holographic data into a hologram
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Holo Graphy (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
Abstract
Description
Claims (12)
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- 이음매 없는 엠보싱 표면으로부터 다른 표면으로 데이터를 전사하는 방법으로서,(a) 홀로그래픽 데이터를 형성하는 광에 의한 패턴 형성이 가능한(photodefinable) 폴리이미드 재료(polyimide material)를 포토 마스크를 사용하지 않고 노광하는 단계로서, 상기 홀로그래픽 데이터를 형성하는 것은 상기 이음매 없는 엠보싱 표면에서 픽셀 단위(pixel-by-pixel) 방법으로 레이저 빔들이 간섭하는 것을 포함하며,(b) 상기 노광된 재료를 현상하여 상기 홀로그래픽 데이터를 포함하는 이음매 없는 엠보싱 표면을 형성하는 단계와,(c) 상기 이음매 없는 엠보싱 표면을 열 경화(heat curing)하는 단계와,(d) 상기 이음매 없는 엠보싱 표면을 사용하여 상기 홀로그래픽 데이터를 다른 표면에 전사하는 단계를 포함하는, 이음매 없는 엠보싱 표면으로부터 다른 표면으로 데이터를 전사하는 방법.
- 제 8 항에 있어서, 상기 (a) 단계 이전에 상기 재료를 롤러에 도포하는 단계 를 더 포함하는, 이음매 없는 엠보싱 표면으로부터 다른 표면으로 데이터를 전사하는 방법.
- 제 9 항에 있어서, 상기 재료를 상기 롤러에 도포하는 단계는 상기 롤러에 상기 재료를 스핀 코팅(spin-coating)하는 단계를 포함하는, 이음매 없는 엠보싱 표면으로부터 다른 표면으로 데이터를 전사하는 방법.
- 제 9 항에 있어서, 상기 (a) 단계에서 상기 롤러는 회전하고 레이저 광원이 직선으로 이동하는, 이음매 없는 엠보싱 표면으로부터 다른 표면으로 데이터를 전사하는 방법.
- 제 8 항 내지 제 11 항 중 어느 한 항에 있어서, 상기 (a) 단계 이후에 가열에 의하여 상기 재료를 미리 경화시키는 단계를 더 포함하는, 이음매 없는 엠보싱 표면으로부터 다른 표면으로 데이터를 전사하는 방법.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/692,075 US7923173B1 (en) | 2000-10-19 | 2000-10-19 | Photo definable polyimide film used as an embossing surface |
US09/692,075 | 2000-10-19 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020010062659A Division KR20020033405A (ko) | 2000-10-19 | 2001-10-11 | 엠보싱 표면으로 사용되는, 광으로 윤곽을 한정하는폴리이미드 필름 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20080077951A KR20080077951A (ko) | 2008-08-26 |
KR100967185B1 true KR100967185B1 (ko) | 2010-07-05 |
Family
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Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020010062659A KR20020033405A (ko) | 2000-10-19 | 2001-10-11 | 엠보싱 표면으로 사용되는, 광으로 윤곽을 한정하는폴리이미드 필름 |
KR1020080077483A KR100967185B1 (ko) | 2000-10-19 | 2008-08-07 | 이음매 없는 엠보싱 표면 및 이음매 없는 엠보싱표면으로부터 다른 표면으로 데이터를 전사하는 방법 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020010062659A KR20020033405A (ko) | 2000-10-19 | 2001-10-11 | 엠보싱 표면으로 사용되는, 광으로 윤곽을 한정하는폴리이미드 필름 |
Country Status (11)
Country | Link |
---|---|
US (1) | US7923173B1 (ko) |
EP (1) | EP1199602A3 (ko) |
JP (1) | JP2002182403A (ko) |
KR (2) | KR20020033405A (ko) |
CN (1) | CN100462871C (ko) |
AU (1) | AU765124B2 (ko) |
BR (1) | BR0104531A (ko) |
CA (1) | CA2359385C (ko) |
MX (1) | MXPA01010531A (ko) |
NZ (1) | NZ514835A (ko) |
TW (1) | TW526148B (ko) |
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US7190387B2 (en) | 2003-09-11 | 2007-03-13 | Bright View Technologies, Inc. | Systems for fabricating optical microstructures using a cylindrical platform and a rastered radiation beam |
JP2006317776A (ja) * | 2005-05-13 | 2006-11-24 | Sony Corp | カラーフィルタの製造方法、および固体撮像装置の製造方法 |
US20070223074A1 (en) | 2005-07-26 | 2007-09-27 | Harris Ken R | Hybrid reflection hologram |
WO2007109626A2 (en) * | 2006-03-17 | 2007-09-27 | Harris Ken R | Hybrid reflection hologram |
EP1999513A4 (en) * | 2006-03-28 | 2010-03-10 | Lg Chemical Ltd | METHOD FOR FORMING NANOSTRUCTURE AND SUBSTRATE WITH STRUCTURE MADE USING THE PROCESS |
JP2015501381A (ja) * | 2011-10-19 | 2015-01-15 | ユニピクセル ディスプレイズ,インコーポレーテッド | 光を透過する円筒状マスターを用いて柔軟な基板に微細な導体線を形成するフォトパターニング法 |
JP2013231878A (ja) * | 2012-04-27 | 2013-11-14 | Fujifilm Corp | 硬化層又は硬化パターンの形成方法、及び、カラーフィルタの製造方法、並びに、これらを用いて製造されるカラーフィルタ、固体撮像素子、及び、液晶表示装置 |
CN103482563B (zh) * | 2012-06-14 | 2016-03-09 | 比亚迪股份有限公司 | 一种mems微结构的制备方法 |
CN113625526A (zh) * | 2020-05-08 | 2021-11-09 | 光群雷射科技股份有限公司 | 无缝全像图图案转移方法 |
TWI822997B (zh) * | 2020-05-08 | 2023-11-21 | 光群雷射科技股份有限公司 | 無縫全像圖圖案轉移方法 |
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KR20000006480A (ko) * | 1998-06-26 | 2000-01-25 | 에프. 아. 프라저, 에른스트 알테르 (에. 알테르), 한스 페터 비틀린 (하. 페. 비틀린), 피. 랍 보프, 브이. 스펜글러, 페. 아에글러 | 신규o-아실옥심광개시제 |
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- 2001-10-11 KR KR1020010062659A patent/KR20020033405A/ko not_active Application Discontinuation
- 2001-10-16 BR BR0104531-8A patent/BR0104531A/pt not_active Application Discontinuation
- 2001-10-16 NZ NZ514835A patent/NZ514835A/en unknown
- 2001-10-16 CN CNB011365439A patent/CN100462871C/zh not_active Expired - Lifetime
- 2001-10-17 CA CA002359385A patent/CA2359385C/en not_active Expired - Lifetime
- 2001-10-17 MX MXPA01010531A patent/MXPA01010531A/es active IP Right Grant
- 2001-10-19 JP JP2001322576A patent/JP2002182403A/ja active Pending
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KR20000006480A (ko) * | 1998-06-26 | 2000-01-25 | 에프. 아. 프라저, 에른스트 알테르 (에. 알테르), 한스 페터 비틀린 (하. 페. 비틀린), 피. 랍 보프, 브이. 스펜글러, 페. 아에글러 | 신규o-아실옥심광개시제 |
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Publication number | Publication date |
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AU7826401A (en) | 2002-05-02 |
BR0104531A (pt) | 2002-05-21 |
MXPA01010531A (es) | 2003-05-19 |
EP1199602A3 (en) | 2003-08-27 |
EP1199602A2 (en) | 2002-04-24 |
TW526148B (en) | 2003-04-01 |
CA2359385C (en) | 2008-10-07 |
CN100462871C (zh) | 2009-02-18 |
KR20020033405A (ko) | 2002-05-06 |
JP2002182403A (ja) | 2002-06-26 |
NZ514835A (en) | 2002-04-26 |
KR20080077951A (ko) | 2008-08-26 |
CA2359385A1 (en) | 2002-04-19 |
US7923173B1 (en) | 2011-04-12 |
CN1357802A (zh) | 2002-07-10 |
AU765124B2 (en) | 2003-09-11 |
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