KR100932186B1 - 감광성 조성물 및 이 감광성 조성물로 형성되는 컬러필터 - Google Patents
감광성 조성물 및 이 감광성 조성물로 형성되는 컬러필터 Download PDFInfo
- Publication number
- KR100932186B1 KR100932186B1 KR1020070140708A KR20070140708A KR100932186B1 KR 100932186 B1 KR100932186 B1 KR 100932186B1 KR 1020070140708 A KR1020070140708 A KR 1020070140708A KR 20070140708 A KR20070140708 A KR 20070140708A KR 100932186 B1 KR100932186 B1 KR 100932186B1
- Authority
- KR
- South Korea
- Prior art keywords
- group
- photosensitive composition
- color filter
- acrylate
- colorant
- Prior art date
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optical Filters (AREA)
- Materials For Photolithography (AREA)
Abstract
Description
Claims (7)
- (a) 착색제, (b) 광중합성 화합물, (c) 광중합 개시제, 및 (d) 밀착증강제를 함유하는 착색제함유 감광성 조성물로서,(b) 광중합성 화합물은 하기 화학식 1로 나타내어지는 화합물로부터 선택되고,[화학식 1](식 중, n은 1~20의 정수, X는 하기 화학식 2로 나타내어지는 기, Y는 디카르복시산 무수물로부터 카르복시산 무수물기(-CO-O-CO-)를 제거한 잔기, Z는 테트라카르복시산이무수물으로부터 2개의 카르복시산 무수물기를 제거한 잔기이다)[화학식 2](d) 밀착증강제는, 하기 화학식 3[화학식 3](식 중, R1 및 R2는 수소 또는 유기기를 나타내며(단, R1 및 R2 중 적어도 하나는 유기기이다), R3, R4, 및 R5는 서로 독립하여 탄소수 1~6의 알콕시기 또는 유기기를 나타낸다(단, R3, R4, 및 R5의 적어도 하나는 알콕시기이며, n은 1~6의 정수를 나타낸다))으로 나타내어지는 것을 특징으로 하는 감광성 조성물.
- 삭제
- 제 1 항에 있어서,상기 R1 및 R2는 유기기인 것을 특징으로 하는 감광성 조성물.
- 제 1 항 또는 제 3 항에 있어서,상기 R1 및 R2의 적어도 하나는 전자 공여성기인 것을 특징으로 하는 감광성 조성물.
- 제 1 항에 있어서.상기 R1 및 R2의 적어도 하나는 페닐기인 것을 특징으로 하는 감광성 조성물.
- 제 1 항에 있어서,상기 (a) 착색제는 차광제인 것을 특징으로 하는 감광성 조성물.
- 제 1 항에 기재된 감광성 조성물로 형성된 착색층을 가지는 것을 특징으로 하는 컬러필터.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2005-00151663 | 2005-05-24 | ||
JP2005151663A JP4657808B2 (ja) | 2005-05-24 | 2005-05-24 | 感光性組成物および該感光性組成物から形成されたカラーフィルタ |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020060045676A Division KR20060121694A (ko) | 2005-05-24 | 2006-05-22 | 감광성 조성물 및 이 감광성 조성물로 형성되는 컬러필터 |
Publications (2)
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KR20080007209A KR20080007209A (ko) | 2008-01-17 |
KR100932186B1 true KR100932186B1 (ko) | 2009-12-16 |
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Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
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KR1020060045676A KR20060121694A (ko) | 2005-05-24 | 2006-05-22 | 감광성 조성물 및 이 감광성 조성물로 형성되는 컬러필터 |
KR1020070140708A KR100932186B1 (ko) | 2005-05-24 | 2007-12-28 | 감광성 조성물 및 이 감광성 조성물로 형성되는 컬러필터 |
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KR1020060045676A KR20060121694A (ko) | 2005-05-24 | 2006-05-22 | 감광성 조성물 및 이 감광성 조성물로 형성되는 컬러필터 |
Country Status (4)
Country | Link |
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JP (1) | JP4657808B2 (ko) |
KR (2) | KR20060121694A (ko) |
CN (1) | CN1869816B (ko) |
TW (1) | TWI340295B (ko) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5030638B2 (ja) * | 2007-03-29 | 2012-09-19 | 富士フイルム株式会社 | カラーフィルタ及びその製造方法 |
KR100904068B1 (ko) | 2007-09-04 | 2009-06-23 | 제일모직주식회사 | 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터 |
KR101282516B1 (ko) * | 2009-11-18 | 2013-07-04 | 코오롱인더스트리 주식회사 | 감광성 수지 조성물 |
KR101258453B1 (ko) * | 2010-12-09 | 2013-04-26 | 에스에스씨피 주식회사 | 자외선 경화형 blu 도광판 조성물 및 도광판 |
CN103814419B (zh) * | 2011-09-15 | 2017-12-08 | 松下知识产权经营株式会社 | 共模噪声滤波器以及其制造方法 |
WO2013089403A1 (ko) * | 2011-12-13 | 2013-06-20 | 주식회사 동진쎄미켐 | 포토레지스트 조성물 |
KR102025099B1 (ko) * | 2011-12-13 | 2019-09-25 | 주식회사 동진쎄미켐 | 포토레지스트 조성물 |
CN102827526B (zh) * | 2012-08-23 | 2015-04-15 | 京东方科技集团股份有限公司 | 高阻抗材料以及包括该材料的显示基板黑矩阵和液晶显示装置 |
KR102084218B1 (ko) * | 2013-07-11 | 2020-03-04 | 동우 화인켐 주식회사 | 비표시부 패턴 형성용 조성물 |
TWI489213B (zh) * | 2013-10-22 | 2015-06-21 | Chi Mei Corp | 感光性樹脂組成物、彩色濾光片及其液晶顯示元件 |
TWI484296B (zh) * | 2013-12-03 | 2015-05-11 | Chi Mei Corp | 感光性樹脂組成物、彩色濾光片及其製造方法、液晶顯示裝置 |
JP6401529B2 (ja) * | 2014-07-15 | 2018-10-10 | 東京応化工業株式会社 | 感光性組成物 |
JP6423215B2 (ja) * | 2014-09-18 | 2018-11-14 | 株式会社Adeka | 光硬化性組成物 |
JP6424052B2 (ja) * | 2014-09-25 | 2018-11-14 | 東京応化工業株式会社 | 感光性樹脂組成物 |
JP7440224B2 (ja) * | 2019-08-21 | 2024-02-28 | 太陽ホールディングス株式会社 | ポジ型感光性樹脂組成物 |
KR20220136155A (ko) | 2021-03-31 | 2022-10-07 | 닛테츠 케미컬 앤드 머티리얼 가부시키가이샤 | 블랙 레지스트용 감광성 수지 조성물 및 차광막, 그리고 컬러 필터 차광막의 제조 방법 |
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JP2000035670A (ja) * | 1998-07-21 | 2000-02-02 | Sumitomo Chem Co Ltd | 着色感光性樹脂組成物 |
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JPH06287456A (ja) * | 1993-04-05 | 1994-10-11 | Dainippon Ink & Chem Inc | 活性エネルギー線硬化性組成物及びそれの使用方法 |
JPH10142794A (ja) * | 1996-11-14 | 1998-05-29 | Hitachi Chem Co Ltd | 着色画像形成用感光液、これを用いたカラーフィルターの製造法及びカラーフィルター |
JPH11160526A (ja) * | 1997-11-26 | 1999-06-18 | Jsr Corp | カラーフィルタ用感放射線性組成物 |
JP2001033955A (ja) * | 1999-07-26 | 2001-02-09 | Nippon Synthetic Chem Ind Co Ltd:The | パターン形成方法 |
JP2003064293A (ja) * | 2001-08-29 | 2003-03-05 | Dainippon Ink & Chem Inc | カラーフィルター用顔料分散組成物、顔料分散レジスト、およびカラーフィルター |
JP2004069754A (ja) * | 2002-08-01 | 2004-03-04 | Tokyo Ohka Kogyo Co Ltd | 光重合性黒色組成物及び黒色パターンの形成方法 |
JP4276923B2 (ja) * | 2003-02-27 | 2009-06-10 | 富士フイルム株式会社 | 光硬化性着色樹脂組成物及びそれを用いたカラーフィルター |
TWI342983B (en) * | 2003-07-16 | 2011-06-01 | Sumitomo Chemical Co | Coloring photosensitive resin composition |
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- 2005-05-24 JP JP2005151663A patent/JP4657808B2/ja active Active
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2006
- 2006-04-27 TW TW095115076A patent/TWI340295B/zh active
- 2006-05-22 KR KR1020060045676A patent/KR20060121694A/ko active Application Filing
- 2006-05-22 CN CN2006100809187A patent/CN1869816B/zh active Active
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- 2007-12-28 KR KR1020070140708A patent/KR100932186B1/ko active IP Right Grant
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2000035670A (ja) * | 1998-07-21 | 2000-02-02 | Sumitomo Chem Co Ltd | 着色感光性樹脂組成物 |
Also Published As
Publication number | Publication date |
---|---|
TW200710577A (en) | 2007-03-16 |
TWI340295B (en) | 2011-04-11 |
CN1869816B (zh) | 2011-10-19 |
KR20060121694A (ko) | 2006-11-29 |
JP2006330209A (ja) | 2006-12-07 |
CN1869816A (zh) | 2006-11-29 |
JP4657808B2 (ja) | 2011-03-23 |
KR20080007209A (ko) | 2008-01-17 |
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