TW200710577A - Photosensitive composition and color filter formed from the same - Google Patents

Photosensitive composition and color filter formed from the same

Info

Publication number
TW200710577A
TW200710577A TW095115076A TW95115076A TW200710577A TW 200710577 A TW200710577 A TW 200710577A TW 095115076 A TW095115076 A TW 095115076A TW 95115076 A TW95115076 A TW 95115076A TW 200710577 A TW200710577 A TW 200710577A
Authority
TW
Taiwan
Prior art keywords
photosensitive composition
color filter
filter formed
same
coloring agent
Prior art date
Application number
TW095115076A
Other languages
Chinese (zh)
Other versions
TWI340295B (en
Inventor
Mitsuru Kondo
Masaru Shida
Hiroyuki Ohnishi
Kiyoshi Uchikawa
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200710577A publication Critical patent/TW200710577A/en
Application granted granted Critical
Publication of TWI340295B publication Critical patent/TWI340295B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)

Abstract

A photosensitive composition capable of forming a black matrix and/or a coloring layer with a high adhesiveness and an excellent quality, and a color filter formed from the photosensitive composition are provided. A coloring agent-containing photosensitive composition containing (a) a coloring agent, (b) a photopolymerization-inducible compound, (c) a photopolymerization initiator, and (d) an adhesion enhancer is used in which the adhesion enhancer (d) is a silane compound having a nitrogen-containing with one hydrogen atom or less bound to the nitrogen atom.
TW095115076A 2005-05-24 2006-04-27 Photosensitive composition and color filter formed from the same TWI340295B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005151663A JP4657808B2 (en) 2005-05-24 2005-05-24 Photosensitive composition and color filter formed from the photosensitive composition

Publications (2)

Publication Number Publication Date
TW200710577A true TW200710577A (en) 2007-03-16
TWI340295B TWI340295B (en) 2011-04-11

Family

ID=37443510

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095115076A TWI340295B (en) 2005-05-24 2006-04-27 Photosensitive composition and color filter formed from the same

Country Status (4)

Country Link
JP (1) JP4657808B2 (en)
KR (2) KR20060121694A (en)
CN (1) CN1869816B (en)
TW (1) TWI340295B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI427335B (en) * 2007-03-29 2014-02-21 Fujifilm Corp Color filter and method for producing the same

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100904068B1 (en) 2007-09-04 2009-06-23 제일모직주식회사 Photosensitive resin composition for color filter and color filter using same
KR101282516B1 (en) * 2009-11-18 2013-07-04 코오롱인더스트리 주식회사 Photopolymerizable resin composition
KR101258453B1 (en) * 2010-12-09 2013-04-26 에스에스씨피 주식회사 UV curable resin composition for BLU light guide plate and light guide plate
CN103814419B (en) * 2011-09-15 2017-12-08 松下知识产权经营株式会社 Common-mode noise filter and its manufacture method
WO2013089403A1 (en) * 2011-12-13 2013-06-20 주식회사 동진쎄미켐 Photoresist composition
KR102025099B1 (en) * 2011-12-13 2019-09-25 주식회사 동진쎄미켐 Photoresist composition
CN102827526B (en) * 2012-08-23 2015-04-15 京东方科技集团股份有限公司 High-impedance material, and display substrate black matrix and liquid crystal display apparatus containing same
KR102084218B1 (en) * 2013-07-11 2020-03-04 동우 화인켐 주식회사 composition for forming patterns of non-display part
TWI489213B (en) * 2013-10-22 2015-06-21 Chi Mei Corp Photosensitive resin composition, color filter and liquid crystal display device having the same
TWI484296B (en) * 2013-12-03 2015-05-11 Chi Mei Corp Photosensitive resin composition, color filter and method for manufacturing the same, liquid crystal display apparatus
JP6401529B2 (en) * 2014-07-15 2018-10-10 東京応化工業株式会社 Photosensitive composition
JP6423215B2 (en) * 2014-09-18 2018-11-14 株式会社Adeka Photocurable composition
JP6424052B2 (en) * 2014-09-25 2018-11-14 東京応化工業株式会社 Photosensitive resin composition
JP7440224B2 (en) * 2019-08-21 2024-02-28 太陽ホールディングス株式会社 Positive photosensitive resin composition
KR20220136155A (en) 2021-03-31 2022-10-07 닛테츠 케미컬 앤드 머티리얼 가부시키가이샤 Photosensitive resin composition for black resist, light-shielding layer cured thereof, and manufacturing method of color filter with them

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06287456A (en) * 1993-04-05 1994-10-11 Dainippon Ink & Chem Inc Active energy ray curing composition and its usage
JPH10142794A (en) * 1996-11-14 1998-05-29 Hitachi Chem Co Ltd Photosensitive solution for forming colored image and manufacture of color filter by using the same and color filter
JPH11160526A (en) * 1997-11-26 1999-06-18 Jsr Corp Radiation sensitive composition for color filter
JP2000035670A (en) * 1998-07-21 2000-02-02 Sumitomo Chem Co Ltd Colored photosensitive resin composition
JP2001033955A (en) * 1999-07-26 2001-02-09 Nippon Synthetic Chem Ind Co Ltd:The Pattern forming method
JP2003064293A (en) * 2001-08-29 2003-03-05 Dainippon Ink & Chem Inc Pigment-dispersed composition for color filter, pigment- dispersed resist and color filter
JP2004069754A (en) * 2002-08-01 2004-03-04 Tokyo Ohka Kogyo Co Ltd Photopolymerizable black composition and black pattern forming method
JP4276923B2 (en) * 2003-02-27 2009-06-10 富士フイルム株式会社 Photocurable colored resin composition and color filter using the same
TWI342983B (en) * 2003-07-16 2011-06-01 Sumitomo Chemical Co Coloring photosensitive resin composition

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI427335B (en) * 2007-03-29 2014-02-21 Fujifilm Corp Color filter and method for producing the same

Also Published As

Publication number Publication date
TWI340295B (en) 2011-04-11
CN1869816B (en) 2011-10-19
KR20060121694A (en) 2006-11-29
JP2006330209A (en) 2006-12-07
CN1869816A (en) 2006-11-29
JP4657808B2 (en) 2011-03-23
KR20080007209A (en) 2008-01-17
KR100932186B1 (en) 2009-12-16

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