KR100783714B1 - 코팅재 조성물 및 그것에 의해 형성된 피막을 가지는 물품 - Google Patents
코팅재 조성물 및 그것에 의해 형성된 피막을 가지는 물품 Download PDFInfo
- Publication number
- KR100783714B1 KR100783714B1 KR1020047005964A KR20047005964A KR100783714B1 KR 100783714 B1 KR100783714 B1 KR 100783714B1 KR 1020047005964 A KR1020047005964 A KR 1020047005964A KR 20047005964 A KR20047005964 A KR 20047005964A KR 100783714 B1 KR100783714 B1 KR 100783714B1
- Authority
- KR
- South Korea
- Prior art keywords
- film
- coating
- refractive index
- material composition
- coating material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/18—Layered products comprising a layer of synthetic resin characterised by the use of special additives
- B32B27/20—Layered products comprising a layer of synthetic resin characterised by the use of special additives using fillers, pigments, thixotroping agents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/02—Polysilicates
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J5/00—Details relating to vessels or to leading-in conductors common to two or more basic types of discharge tubes or lamps
- H01J5/02—Vessels; Containers; Shields associated therewith; Vacuum locks
- H01J5/16—Optical or photographic arrangements structurally combined with the vessel
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2305/00—Condition, form or state of the layers or laminate
- B32B2305/72—Cured, e.g. vulcanised, cross-linked
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2327/00—Polyvinylhalogenides
- B32B2327/12—Polyvinylhalogenides containing fluorine
- B32B2327/18—PTFE, i.e. polytetrafluoroethylene
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2211/00—Plasma display panels with alternate current induction of the discharge, e.g. AC-PDPs
- H01J2211/20—Constructional details
- H01J2211/34—Vessels, containers or parts thereof, e.g. substrates
- H01J2211/44—Optical arrangements or shielding arrangements, e.g. filters or lenses
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
- Y10T428/249971—Preformed hollow element-containing
- Y10T428/249974—Metal- or silicon-containing element
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
- Y10T428/249981—Plural void-containing components
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
- Y10T428/249987—With nonvoid component of specified composition
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Paints Or Removers (AREA)
- Surface Treatment Of Optical Elements (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001327878 | 2001-10-25 | ||
| JPJP-P-2001-00327878 | 2001-10-25 | ||
| PCT/JP2002/010981 WO2003035780A1 (en) | 2001-10-25 | 2002-10-23 | Coating material composition and article having coating film formed therewith |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020077000050A Division KR20070011650A (ko) | 2001-10-25 | 2002-10-23 | 코팅재 조성물 및 그것에 의해 형성된 피막을 가지는 물품 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20040058222A KR20040058222A (ko) | 2004-07-03 |
| KR100783714B1 true KR100783714B1 (ko) | 2007-12-07 |
Family
ID=19144035
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020047005964A Expired - Fee Related KR100783714B1 (ko) | 2001-10-25 | 2002-10-23 | 코팅재 조성물 및 그것에 의해 형성된 피막을 가지는 물품 |
| KR1020077000050A Ceased KR20070011650A (ko) | 2001-10-25 | 2002-10-23 | 코팅재 조성물 및 그것에 의해 형성된 피막을 가지는 물품 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020077000050A Ceased KR20070011650A (ko) | 2001-10-25 | 2002-10-23 | 코팅재 조성물 및 그것에 의해 형성된 피막을 가지는 물품 |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US20050109238A1 (cg-RX-API-DMAC7.html) |
| EP (1) | EP1447433B1 (cg-RX-API-DMAC7.html) |
| KR (2) | KR100783714B1 (cg-RX-API-DMAC7.html) |
| TW (1) | TWI302559B (cg-RX-API-DMAC7.html) |
| WO (1) | WO2003035780A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (63)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW574110B (en) | 2001-10-25 | 2004-02-01 | Matsushita Electric Works Ltd | Composite thin film holding substrate, transparent conductive film holding substrate, and panel light emitting body |
| JP4404769B2 (ja) * | 2002-08-15 | 2010-01-27 | 富士フイルム株式会社 | 反射防止フィルム、偏光板、及び画像表示装置 |
| JP4069369B2 (ja) * | 2002-09-25 | 2008-04-02 | 信越化学工業株式会社 | 反射防止膜及び反射防止膜の製造方法 |
| DE10336041A1 (de) * | 2003-08-01 | 2005-02-17 | Merck Patent Gmbh | Optisches Schichtsystem mit Antireflexeigenschaften |
| JP4475016B2 (ja) | 2003-06-30 | 2010-06-09 | 東レ株式会社 | ハードコートフィルム、反射防止フィルムおよび画像表示装置 |
| US7034923B2 (en) * | 2004-01-21 | 2006-04-25 | Asml Netherlands B.V. | Optical element, lithographic apparatus comprising such optical element and device manufacturing method |
| US7695781B2 (en) * | 2004-02-16 | 2010-04-13 | Fujifilm Corporation | Antireflective film, polarizing plate including the same, image display unit including the same and method for producing antireflective film |
| EP1724613A4 (en) * | 2004-03-09 | 2009-06-24 | Teijin Dupont Films Japan Ltd | ANTIREFLECTION LAYER AND PROCESS FOR MANUFACTURING THE SAME |
| JP2005314616A (ja) * | 2004-04-30 | 2005-11-10 | Shin Etsu Chem Co Ltd | シリコーンコーティング組成物及び被覆物品 |
| TWI261046B (en) * | 2004-10-08 | 2006-09-01 | Ind Tech Res Inst | Resin composition with low dielectric constant filler for high frequency substrate |
| KR20070095359A (ko) * | 2004-12-24 | 2007-09-28 | 마츠시다 덴코 가부시키가이샤 | 액정 표시 장치용 광학 적층 필름 |
| US7709551B2 (en) | 2005-06-02 | 2010-05-04 | Lg Chem, Ltd. | Coating composition for film with low refractive index and film prepared therefrom |
| JP4883383B2 (ja) * | 2005-06-02 | 2012-02-22 | 旭硝子株式会社 | 中空状SiO2を含有する分散液、塗料組成物及び反射防止塗膜付き基材 |
| US8029871B2 (en) * | 2005-06-09 | 2011-10-04 | Hoya Corporation | Method for producing silica aerogel coating |
| WO2007018360A1 (en) * | 2005-08-09 | 2007-02-15 | Seoul Opto Device Co., Ltd. | Ac light emitting diode and method for fabricating the same |
| US20070047087A1 (en) * | 2005-08-25 | 2007-03-01 | Fuji Photo Film Co., Ltd. | Optical film, polarizing plate and image display device |
| WO2007037276A1 (ja) * | 2005-09-29 | 2007-04-05 | Dai Nippon Printing Co., Ltd. | 反射防止膜 |
| KR101073261B1 (ko) | 2005-12-15 | 2011-10-12 | 주식회사 엘지화학 | 친수성 보조제 |
| KR20070099840A (ko) * | 2006-04-05 | 2007-10-10 | 삼성에스디아이 주식회사 | 태양 전지 및 이의 제조 방법 |
| US20070243370A1 (en) * | 2006-04-05 | 2007-10-18 | Fujifilm Corporation | Optical film, polarizing plate and image display device |
| KR100981575B1 (ko) | 2006-07-10 | 2010-09-10 | 주식회사 엘지화학 | 오염 제거가 용이한 디스플레이 반사 방지용 코팅 조성물 |
| KR100981018B1 (ko) * | 2006-07-10 | 2010-09-07 | 주식회사 엘지화학 | Uv 경화형의 디스플레이 반사 방지용 코팅 조성물 |
| US20080072956A1 (en) * | 2006-09-07 | 2008-03-27 | Guardian Industries Corp. | Solar cell with antireflective coating comprising metal fluoride and/or silica and method of making same |
| CN101192478B (zh) * | 2006-12-01 | 2010-08-11 | 深圳富泰宏精密工业有限公司 | 背光键盘 |
| US7821637B1 (en) | 2007-02-22 | 2010-10-26 | J.A. Woollam Co., Inc. | System for controlling intensity of a beam of electromagnetic radiation and method for investigating materials with low specular reflectance and/or are depolarizing |
| US7767253B2 (en) | 2007-03-09 | 2010-08-03 | Guardian Industries Corp. | Method of making a photovoltaic device with antireflective coating |
| US8237047B2 (en) | 2007-05-01 | 2012-08-07 | Guardian Industries Corp. | Method of making a photovoltaic device or front substrate for use in same with scratch-resistant coating and resulting product |
| US20090092745A1 (en) * | 2007-10-05 | 2009-04-09 | Luca Pavani | Dopant material for manufacturing solar cells |
| JP5437662B2 (ja) * | 2008-03-03 | 2014-03-12 | 学校法人慶應義塾 | 反射防止膜及びその形成方法 |
| JP2010123542A (ja) * | 2008-11-21 | 2010-06-03 | Toshiba Lighting & Technology Corp | 高圧放電ランプ用拡散膜の塗布用液剤及び高圧放電ランプ |
| TWI605276B (zh) | 2009-04-15 | 2017-11-11 | 3M新設資產公司 | 光學結構及包含該光學結構之顯示系統 |
| US8999052B2 (en) * | 2009-08-07 | 2015-04-07 | Panasonic Corporation | Method for producing fine mesoporous silica particles, fine mesoporous silica particles, liquid dispersion of fine mesoporous silica particles, composition containing fine mesoporous silica particles and molded article containing fine mesoporous silica particles |
| US9556341B2 (en) * | 2009-09-18 | 2017-01-31 | Lg Chem, Ltd. | Porous structure for forming anti-fingerprint coating, method of forming anti-fingerprint coating, substrate comprising the anti-finger-print coating formed by the method, and product comprising the substrate |
| EP2514718A4 (en) * | 2009-12-18 | 2013-09-04 | Kao Corp | METHOD FOR PRODUCING MESOPOROUS SILICONE ARTICLES |
| US8609068B2 (en) | 2010-02-24 | 2013-12-17 | J.M. Huber Corporation | Continuous silica production process and silica product prepared from same |
| US9201259B2 (en) * | 2010-03-19 | 2015-12-01 | Lg Display Co., Ltd. | Touch sensing type liquid crystal display device and method of fabricating the same |
| FR2958081B1 (fr) | 2010-03-23 | 2012-04-27 | Polyrise | Dispositifs photovoltaiques comportant une couche anti-reflet a base d'objets disperses presentant des domaines d'indices de refraction distincts |
| CA2805204A1 (en) * | 2010-07-13 | 2012-01-19 | Theta Chemicals Limited | A doped material |
| DE102010034913B4 (de) * | 2010-08-20 | 2023-03-30 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Strahlung emittierendes Bauelement und Verfahren zur Herstellung des Strahlung emittierenden Bauelements |
| US8393707B2 (en) | 2010-08-24 | 2013-03-12 | Sunpower Corporation | Apparatuses and methods for removal of ink buildup |
| TWI534458B (zh) * | 2010-10-20 | 2016-05-21 | 3M新設資產公司 | 經保護之低折射率光學元件 |
| US9028605B2 (en) * | 2011-02-25 | 2015-05-12 | J.M. Huber Corporation | Coating compositions comprising spheroid silica or silicate |
| TWI572481B (zh) * | 2011-04-01 | 2017-03-01 | Asahi Glass Co Ltd | Glass plate with low reflective film |
| KR101322820B1 (ko) * | 2011-07-26 | 2013-10-28 | 한국세라믹기술원 | 복합무기필러 및 복합무기필러가 포함된 도료 조성물 및 이를 이용한 도료 조성물의 제조방법 |
| KR101941445B1 (ko) * | 2011-12-27 | 2019-04-15 | 엘지디스플레이 주식회사 | 저반사 고경도 코팅막 및 이를 이용한 표시 장치 |
| KR102285627B1 (ko) * | 2012-02-02 | 2021-08-04 | 닛산 가가쿠 가부시키가이샤 | 저굴절율 막형성용 조성물 |
| US8852333B2 (en) | 2012-02-06 | 2014-10-07 | Nano And Advanced Materials Institute Limited | Multi-functional environmental coating composition with mesoporous silica nanomaterials |
| CA2872446A1 (en) | 2012-05-22 | 2013-11-28 | Dsm Ip Assets B.V. | Composition and process for making a porous inorganic oxide coating |
| KR101523819B1 (ko) * | 2012-09-04 | 2015-05-28 | (주)엘지하우시스 | 실록산 화합물을 포함하는 반사 방지 코팅 조성물, 이를 이용한 반사 방지 필름 |
| KR101507208B1 (ko) * | 2012-11-07 | 2015-04-07 | (주)엘지하우시스 | 실록산 화합물을 포함하는 초친수성 반사방지 코팅 조성물, 이를 이용한 초친수성 반사방지 필름 및 이의 제조방법 |
| US20150323711A1 (en) * | 2012-11-30 | 2015-11-12 | Sharp Kabushiki Kaisha | Scatterer substrate |
| FR3000487B1 (fr) * | 2012-12-28 | 2015-02-13 | Saint Gobain | Substrat transparent, notamment substrat verrier, revetu par au moins une couche poreuse au moins bifonctionnelle, procede de fabrication et applications |
| KR101578914B1 (ko) * | 2013-03-15 | 2015-12-18 | 주식회사 엘지화학 | 플라스틱 필름 |
| JP6153093B2 (ja) * | 2013-09-03 | 2017-06-28 | 株式会社豊田中央研究所 | 反射防止膜及びその製造方法 |
| JP6562841B2 (ja) * | 2014-01-31 | 2019-08-21 | 日本碍子株式会社 | 多孔質板状フィラー |
| KR102191211B1 (ko) * | 2014-02-28 | 2020-12-15 | 서울반도체 주식회사 | 발광 다이오드 패키지 |
| CN106688120B (zh) * | 2014-09-10 | 2018-09-11 | 日产化学工业株式会社 | 电荷传输性清漆 |
| EP3026469B1 (en) * | 2014-11-27 | 2023-01-11 | Canon Kabushiki Kaisha | Optical element and method for producing optical element |
| JP2016027430A (ja) * | 2015-10-26 | 2016-02-18 | 豊田通商株式会社 | 光透過性組成物 |
| CN109535780A (zh) * | 2017-08-15 | 2019-03-29 | 中国科学院上海硅酸盐研究所 | 一种超亲水氧化硅涂料及其制备方法 |
| KR102478820B1 (ko) * | 2018-03-30 | 2022-12-19 | 엘지이노텍 주식회사 | 열전 모듈 |
| KR102284041B1 (ko) * | 2019-06-21 | 2021-08-02 | 주식회사 미림 | 내스크래치성이 우수한 친수성 코팅 조성물 |
| CN111208588B (zh) * | 2020-01-15 | 2021-08-31 | 深圳中天银河科技有限公司 | 自除尘监控摄像镜头镜片及其制备方法 |
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| KR20000019115A (ko) * | 1998-09-08 | 2000-04-06 | 성재갑 | 투명한 대전방지 내마모성 피복 조성물 및 그의 제조방법 |
| JP2001233611A (ja) * | 2000-02-24 | 2001-08-28 | Catalysts & Chem Ind Co Ltd | シリカ系微粒子、該微粒子分散液の製造方法、および被膜付基材 |
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| US4610863A (en) * | 1985-09-04 | 1986-09-09 | The United States Of America As Represented By The United States Department Of Energy | Process for forming transparent aerogel insulating arrays |
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| DE4038784A1 (de) * | 1990-12-05 | 1992-06-11 | Basf Ag | Verbundschaumstoffe mit niedriger waermeleitfaehigkeit |
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2002
- 2002-10-23 EP EP02770239A patent/EP1447433B1/en not_active Expired - Lifetime
- 2002-10-23 KR KR1020047005964A patent/KR100783714B1/ko not_active Expired - Fee Related
- 2002-10-23 WO PCT/JP2002/010981 patent/WO2003035780A1/ja not_active Ceased
- 2002-10-23 US US10/492,532 patent/US20050109238A1/en not_active Abandoned
- 2002-10-23 KR KR1020077000050A patent/KR20070011650A/ko not_active Ceased
- 2002-10-24 TW TW091124799A patent/TWI302559B/zh not_active IP Right Cessation
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2007
- 2007-03-30 US US11/730,269 patent/US20070190305A1/en not_active Abandoned
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| JPH1161043A (ja) * | 1997-08-07 | 1999-03-05 | Catalysts & Chem Ind Co Ltd | 多孔質シリカ系被膜形成用塗布液、被膜付基材および短繊維状シリカ |
| KR20000019115A (ko) * | 1998-09-08 | 2000-04-06 | 성재갑 | 투명한 대전방지 내마모성 피복 조성물 및 그의 제조방법 |
| JP2001233611A (ja) * | 2000-02-24 | 2001-08-28 | Catalysts & Chem Ind Co Ltd | シリカ系微粒子、該微粒子分散液の製造方法、および被膜付基材 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2003035780A1 (en) | 2003-05-01 |
| US20050109238A1 (en) | 2005-05-26 |
| TWI302559B (cg-RX-API-DMAC7.html) | 2008-11-01 |
| EP1447433A1 (en) | 2004-08-18 |
| KR20040058222A (ko) | 2004-07-03 |
| KR20070011650A (ko) | 2007-01-24 |
| EP1447433A4 (en) | 2005-05-11 |
| US20070190305A1 (en) | 2007-08-16 |
| EP1447433B1 (en) | 2011-10-05 |
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