KR100742424B1 - 세슘 디스펜서 및 세슘 디스펜서의 사용 방법 - Google Patents

세슘 디스펜서 및 세슘 디스펜서의 사용 방법 Download PDF

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Publication number
KR100742424B1
KR100742424B1 KR1020037000536A KR20037000536A KR100742424B1 KR 100742424 B1 KR100742424 B1 KR 100742424B1 KR 1020037000536 A KR1020037000536 A KR 1020037000536A KR 20037000536 A KR20037000536 A KR 20037000536A KR 100742424 B1 KR100742424 B1 KR 100742424B1
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South Korea
Prior art keywords
cesium
dispenser
mixture
delete delete
oled
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KR1020037000536A
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English (en)
Korean (ko)
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KR20030038666A (ko
Inventor
클라우디오 보피토
루카 토이아
로레나 카타네오
Original Assignee
사에스 게터스 에스.페.아.
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/12—Manufacture of electrodes or electrode systems of photo-emissive cathodes; of secondary-emission electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
    • C30B23/02—Epitaxial-layer growth
    • C30B23/06—Heating of the deposition chamber, the substrate or the materials to be evaporated
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional radiating surfaces
    • H05B33/22—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/30—Doping active layers, e.g. electron transporting layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Luminescent Compositions (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
  • Drying Of Gases (AREA)
  • Laminated Bodies (AREA)
  • Silicates, Zeolites, And Molecular Sieves (AREA)
  • Catalysts (AREA)
  • Compounds Of Unknown Constitution (AREA)
KR1020037000536A 2001-05-15 2002-05-07 세슘 디스펜서 및 세슘 디스펜서의 사용 방법 Expired - Lifetime KR100742424B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
ITMI2001A000995 2001-05-15
IT2001MI000995A ITMI20010995A1 (it) 2001-05-15 2001-05-15 Dispensatori di cesio e processo per il loro uso
PCT/IT2002/000301 WO2002093664A2 (en) 2001-05-15 2002-05-07 Cesium dispensers and process for the use thereof

Publications (2)

Publication Number Publication Date
KR20030038666A KR20030038666A (ko) 2003-05-16
KR100742424B1 true KR100742424B1 (ko) 2007-07-24

Family

ID=11447659

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020037000536A Expired - Lifetime KR100742424B1 (ko) 2001-05-15 2002-05-07 세슘 디스펜서 및 세슘 디스펜서의 사용 방법

Country Status (13)

Country Link
US (2) US6753648B2 (enExample)
EP (1) EP1419542B1 (enExample)
JP (1) JP4087715B2 (enExample)
KR (1) KR100742424B1 (enExample)
CN (1) CN100459219C (enExample)
AT (1) ATE322744T1 (enExample)
AU (1) AU2002309256A1 (enExample)
CA (1) CA2430941C (enExample)
DE (1) DE60210478T2 (enExample)
IT (1) ITMI20010995A1 (enExample)
MY (1) MY132034A (enExample)
TW (1) TWI284001B (enExample)
WO (1) WO2002093664A2 (enExample)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ITMI20010995A1 (it) * 2001-05-15 2002-11-15 Getters Spa Dispensatori di cesio e processo per il loro uso
WO2002093249A1 (fr) 2001-05-17 2002-11-21 Daikin Industries, Ltd. Materiau optique non lineaire contenant un polymere fluore
ITMI20021904A1 (it) * 2002-09-06 2004-03-07 Getters Spa Elemento accessorio per dispensatori di metalli alcalini
EP1585159A4 (en) * 2003-01-17 2006-12-13 Hamamatsu Photonics Kk ALKALI METAL PRODUCTION AGENTS, ALKALI METAL PRODUCERS, PHOTOELECTRIC SURFACE, ELECTRON EMISSION SURFACE SECONDARY, ELECTRON TUBE, METHOD FOR PRODUCING A PHOTO ELECTRIC SURFACE, METHOD FOR PRODUCING A SECONDARY ELECTRON EMISSION SURFACE AND METHOD FOR PRODUCING AN ELECTRON TUBE
WO2004066337A1 (ja) 2003-01-17 2004-08-05 Hamamatsu Photonics K.K. アルカリ金属発生剤、アルカリ金属発生器、光電面、二次電子放出面、電子管、光電面の製造方法、二次電子放出面の製造方法及び電子管の製造方法
JP4440887B2 (ja) 2003-01-17 2010-03-24 浜松ホトニクス株式会社 アルカリ金属発生剤、アルカリ金属発生器、光電面の製造方法、二次電子放出面の製造方法及び電子管の製造方法
JP4312555B2 (ja) * 2003-09-18 2009-08-12 富士フイルム株式会社 真空蒸着用ルツボおよび蛍光体シート製造装置
US7540978B2 (en) 2004-08-05 2009-06-02 Novaled Ag Use of an organic matrix material for producing an organic semiconductor material, organic semiconductor material and electronic component
ITMI20041736A1 (it) * 2004-09-10 2004-12-10 Getters Spa Miscele per l'evaporazione del litio e dispensatori di litio
DE602004006275T2 (de) 2004-10-07 2007-12-20 Novaled Ag Verfahren zur Dotierung von einem Halbleitermaterial mit Cäsium
ITMI20042279A1 (it) * 2004-11-24 2005-02-24 Getters Spa Sistema dispensatore di metalli alcalini in grado di dispensare quantita' elevate di metalli
US7625601B2 (en) * 2005-02-04 2009-12-01 Eastman Kodak Company Controllably feeding organic material in making OLEDs
US20060269656A1 (en) * 2005-05-26 2006-11-30 Eastman Kodak Company Reducing contamination in OLED processing systems
EP1727221B1 (de) 2005-05-27 2010-04-14 Novaled AG Transparente organische Leuchtdiode
EP1780816B1 (en) 2005-11-01 2020-07-01 Novaled GmbH A method for producing an electronic device with a layer structure and an electronic device
EP1939320B1 (de) 2005-12-07 2013-08-21 Novaled AG Verfahren zum Abscheiden eines Aufdampfmaterials
EP1806795B1 (de) 2005-12-21 2008-07-09 Novaled AG Organisches Bauelement
ITMI20060444A1 (it) 2006-03-13 2007-09-14 Getters Spa Uso di composizioni magnesio-rame per l'evaporazione di magnesio e dispensatori di magnesio
TWI353677B (en) 2006-03-21 2011-12-01 Novaled Ag Method for preparing doped organic semiconductor m
AT502678B1 (de) 2006-03-24 2007-05-15 Alvatec Alkali Vacuum Technolo Alkalimetall- oder erdalkalimetall- verdampferquelle
DK2529622T3 (en) * 2006-09-22 2018-05-07 Pharmacyclics Llc INHIBITORS OF BRUTON-TYROSINKINASE
ITMI20061872A1 (it) * 2006-09-29 2008-03-30 Getters Spa SCHERMO ELETTROLUMINECìSCENTE ORGANICO E PROCESSO PER LA SUA PRODUZIONE
ITMI20070301A1 (it) * 2007-02-16 2008-08-17 Getters Spa Supporti comprendenti materiali getter e sorgenti di metalli alcalini o alcalino-terrosi per sistemi di termoregolazione basati su effetto tunnel
ITMI20112051A1 (it) * 2011-11-11 2013-05-12 Getters Spa Composizione organico-inorganica per il rilascio in fase vapore di metalli alcalini ed alcalino-terrosi
US9491802B2 (en) * 2012-02-17 2016-11-08 Honeywell International Inc. On-chip alkali dispenser
ITMI20131171A1 (it) * 2013-07-11 2015-01-11 Getters Spa Erogatore migliorato di vapori metallici
WO2015097894A1 (ja) * 2013-12-27 2015-07-02 パイオニア株式会社 発光素子及び発光素子の製造方法
CN105483397B (zh) * 2015-11-26 2017-12-26 北京有色金属研究总院 一种低温可控放铯的铯释放剂和其所用释放器的制备方法
USD814314S1 (en) * 2016-10-07 2018-04-03 S.C. Johnson & Son, Inc. Cartridge
USD821224S1 (en) * 2016-10-07 2018-06-26 S. C. Johnson & Son, Inc. Cartridge
CN110444463B (zh) * 2019-08-12 2020-11-10 电子科技大学 一种微电流铯离子源

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3578834A (en) 1966-12-13 1971-05-18 Getters Spa Generation of alkali metals
US3598384A (en) 1968-09-13 1971-08-10 Getters Spa Metal vapor generators
EP0130803A2 (en) * 1983-06-29 1985-01-09 Stauffer Chemical Company Graphite intercalated alkali metal vapour sources
EP0360317A1 (en) * 1988-09-02 1990-03-28 Koninklijke Philips Electronics N.V. Alkali metal vapour dispenser
JPH06231727A (ja) * 1993-02-03 1994-08-19 Fuji Photo Film Co Ltd 閃光放電管用陰極材及びその製造方法
EP0949696A2 (en) * 1998-04-08 1999-10-13 Idemitsu Kosan Company Limited Organic electroluminescent device

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US2117735A (en) 1936-10-01 1938-05-17 Rca Corp Getter
US2424512A (en) * 1944-08-08 1947-07-22 Nat Res Corp Production of alkali metals and their oxides
US3096211A (en) * 1959-03-31 1963-07-02 Emi Ltd Alkali metal generators
US3203901A (en) * 1962-02-15 1965-08-31 Porta Paolo Della Method of manufacturing zirconiumaluminum alloy getters
NL6913692A (enExample) 1968-09-13 1970-03-17
US3658713A (en) * 1968-11-12 1972-04-25 Tokyo Shibaura Electric Co Alkali metal generating agents
US3663121A (en) 1969-05-24 1972-05-16 Getters Spa Generation of metal vapors
US4146497A (en) 1972-12-14 1979-03-27 S.A.E.S. Getters S.P.A. Supported getter
US4275330A (en) * 1979-03-08 1981-06-23 General Electric Company Electric discharge lamp having a cathode with cesium metal oxide
IT1115156B (it) * 1979-04-06 1986-02-03 Getters Spa Leghe zr-fe per l'assorbimento di idrogeno a basse temperature
US4233936A (en) 1979-05-08 1980-11-18 Rca Corporation Alkali metal dispenser
IT1173866B (it) 1984-03-16 1987-06-24 Getters Spa Metodo perfezionato per fabbricare dispositivi getter non evarobili porosi e dispositivi getter cosi' prodotti
US5606219A (en) * 1992-12-25 1997-02-25 Fuji Photo Film Co., Ltd. Cathode for electronic flash tube
ATE314394T1 (de) 1993-08-13 2006-01-15 Uab Research Foundation Verfahren und zusammensetzungen zur stimulation und inhibition der aktivität von tgf-beta
JPH0978058A (ja) 1995-09-08 1997-03-25 Pioneer Electron Corp 有機エレクトロルミネッセンス素子
EP1119222B1 (en) 1996-11-29 2004-06-02 Idemitsu Kosan Company Limited Organic electroluminescent device
JPH10270171A (ja) 1997-01-27 1998-10-09 Junji Kido 有機エレクトロルミネッセント素子
JPH11329347A (ja) * 1998-05-08 1999-11-30 Erebamu:Kk 放電ランプ及びその製造方法
ITMI20010995A1 (it) * 2001-05-15 2002-11-15 Getters Spa Dispensatori di cesio e processo per il loro uso

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3578834A (en) 1966-12-13 1971-05-18 Getters Spa Generation of alkali metals
US3598384A (en) 1968-09-13 1971-08-10 Getters Spa Metal vapor generators
EP0130803A2 (en) * 1983-06-29 1985-01-09 Stauffer Chemical Company Graphite intercalated alkali metal vapour sources
EP0360317A1 (en) * 1988-09-02 1990-03-28 Koninklijke Philips Electronics N.V. Alkali metal vapour dispenser
JPH06231727A (ja) * 1993-02-03 1994-08-19 Fuji Photo Film Co Ltd 閃光放電管用陰極材及びその製造方法
EP0949696A2 (en) * 1998-04-08 1999-10-13 Idemitsu Kosan Company Limited Organic electroluminescent device

Also Published As

Publication number Publication date
ATE322744T1 (de) 2006-04-15
WO2002093664A3 (en) 2003-02-06
CN1531839A (zh) 2004-09-22
ITMI20010995A1 (it) 2002-11-15
US20040001916A1 (en) 2004-01-01
DE60210478T2 (de) 2006-10-05
CA2430941C (en) 2009-12-29
JP2004532932A (ja) 2004-10-28
TWI284001B (en) 2007-07-11
WO2002093664A8 (en) 2003-03-06
KR20030038666A (ko) 2003-05-16
CA2430941A1 (en) 2002-11-21
EP1419542B1 (en) 2006-04-05
DE60210478D1 (de) 2006-05-18
US6753648B2 (en) 2004-06-22
HK1068495A1 (zh) 2005-04-29
US20040206205A1 (en) 2004-10-21
ITMI20010995A0 (it) 2001-05-15
MY132034A (en) 2007-09-28
EP1419542A2 (en) 2004-05-19
AU2002309256A1 (en) 2002-11-25
WO2002093664A2 (en) 2002-11-21
CN100459219C (zh) 2009-02-04
JP4087715B2 (ja) 2008-05-21

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