KR100740407B1 - 기판 처리 장치 및 기판 처리 방법 - Google Patents

기판 처리 장치 및 기판 처리 방법 Download PDF

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Publication number
KR100740407B1
KR100740407B1 KR1020060015755A KR20060015755A KR100740407B1 KR 100740407 B1 KR100740407 B1 KR 100740407B1 KR 1020060015755 A KR1020060015755 A KR 1020060015755A KR 20060015755 A KR20060015755 A KR 20060015755A KR 100740407 B1 KR100740407 B1 KR 100740407B1
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KR
South Korea
Prior art keywords
liquid
substrate
fluid
gas
nozzle
Prior art date
Application number
KR1020060015755A
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English (en)
Korean (ko)
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KR20060095464A (ko
Inventor
가즈오 조다이
Original Assignee
다이니폰 스크린 세이조우 가부시키가이샤
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Publication of KR20060095464A publication Critical patent/KR20060095464A/ko
Application granted granted Critical
Publication of KR100740407B1 publication Critical patent/KR100740407B1/ko

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    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47J—KITCHEN EQUIPMENT; COFFEE MILLS; SPICE MILLS; APPARATUS FOR MAKING BEVERAGES
    • A47J27/00—Cooking-vessels
    • A47J27/12—Multiple-unit cooking vessels
    • A47J27/13—Tier cooking-vessels
    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47J—KITCHEN EQUIPMENT; COFFEE MILLS; SPICE MILLS; APPARATUS FOR MAKING BEVERAGES
    • A47J27/00—Cooking-vessels
    • A47J27/002—Construction of cooking-vessels; Methods or processes of manufacturing specially adapted for cooking-vessels
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S220/00—Receptacles
    • Y10S220/912—Cookware, i.e. pots and pans

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  • Engineering & Computer Science (AREA)
  • Food Science & Technology (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Weting (AREA)
KR1020060015755A 2005-02-28 2006-02-17 기판 처리 장치 및 기판 처리 방법 KR100740407B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2005-00054750 2005-02-28
JP2005054750A JP4514140B2 (ja) 2005-02-28 2005-02-28 基板処理装置及び基板処理方法

Publications (2)

Publication Number Publication Date
KR20060095464A KR20060095464A (ko) 2006-08-31
KR100740407B1 true KR100740407B1 (ko) 2007-07-16

Family

ID=36947126

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020060015755A KR100740407B1 (ko) 2005-02-28 2006-02-17 기판 처리 장치 및 기판 처리 방법

Country Status (4)

Country Link
JP (1) JP4514140B2 (zh)
KR (1) KR100740407B1 (zh)
CN (1) CN100378914C (zh)
TW (1) TWI274607B (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4502854B2 (ja) * 2005-03-22 2010-07-14 株式会社高田工業所 基板の処理装置及び処理方法
JP4850775B2 (ja) * 2007-05-07 2012-01-11 大日本スクリーン製造株式会社 基板処理装置
JP2009147260A (ja) * 2007-12-18 2009-07-02 Dainippon Screen Mfg Co Ltd 基板処理装置
EP2133636B1 (en) * 2008-06-09 2012-01-25 Consejo Superior De Investigaciones Científicas Absorber and absorber-evaporator assembly for absorption machines and lithium bromide - water absorption machines that integrate said absorber and absorber-evaporator assembly
KR101086517B1 (ko) 2008-10-15 2011-11-23 다이니폰 스크린 세이조우 가부시키가이샤 기판 처리 장치
JP6329380B2 (ja) * 2014-02-07 2018-05-23 株式会社ジャパンディスプレイ 液晶表示装置の製造方法および製造装置
JP6658195B2 (ja) * 2016-03-28 2020-03-04 大日本印刷株式会社 エッチング方法およびエッチング装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11305184A (ja) 1998-04-23 1999-11-05 Advanced Display Inc 液晶表示パネルの製造方法およびこれに用いられる洗浄装置
KR20010018028A (ko) * 1999-08-17 2001-03-05 윤종용 커버에 분사 노즐이 구비된 웨이퍼 세척 장치
KR20040080980A (ko) * 2003-03-12 2004-09-20 다이닛뽕스크린 세이조오 가부시키가이샤 기판 처리방법 및 기판 처리장치

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3323385B2 (ja) * 1995-12-21 2002-09-09 大日本スクリーン製造株式会社 基板洗浄装置および基板洗浄方法
JP3185753B2 (ja) * 1998-05-22 2001-07-11 日本電気株式会社 半導体装置の製造方法
FR2797405B1 (fr) * 1999-08-12 2001-10-26 Coillard Sa Ets Bac de rincage a liquide ultra propre
JP2004074021A (ja) * 2002-08-19 2004-03-11 Dainippon Screen Mfg Co Ltd 基板処理装置及び基板洗浄ユニット
JP2004095926A (ja) * 2002-09-02 2004-03-25 Dainippon Screen Mfg Co Ltd 基板処理装置
JP4275968B2 (ja) * 2003-03-07 2009-06-10 芝浦メカトロニクス株式会社 基板の洗浄処理装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11305184A (ja) 1998-04-23 1999-11-05 Advanced Display Inc 液晶表示パネルの製造方法およびこれに用いられる洗浄装置
KR20010018028A (ko) * 1999-08-17 2001-03-05 윤종용 커버에 분사 노즐이 구비된 웨이퍼 세척 장치
KR20040080980A (ko) * 2003-03-12 2004-09-20 다이닛뽕스크린 세이조오 가부시키가이샤 기판 처리방법 및 기판 처리장치

Also Published As

Publication number Publication date
TW200630169A (en) 2006-09-01
CN100378914C (zh) 2008-04-02
JP2006245051A (ja) 2006-09-14
JP4514140B2 (ja) 2010-07-28
CN1828826A (zh) 2006-09-06
KR20060095464A (ko) 2006-08-31
TWI274607B (en) 2007-03-01

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