TW200630169A - Apparatus and method of treating substrate - Google Patents

Apparatus and method of treating substrate

Info

Publication number
TW200630169A
TW200630169A TW095102440A TW95102440A TW200630169A TW 200630169 A TW200630169 A TW 200630169A TW 095102440 A TW095102440 A TW 095102440A TW 95102440 A TW95102440 A TW 95102440A TW 200630169 A TW200630169 A TW 200630169A
Authority
TW
Taiwan
Prior art keywords
substrate
liquid
supplied
treatment
last process
Prior art date
Application number
TW095102440A
Other languages
Chinese (zh)
Other versions
TWI274607B (en
Inventor
Kazuo Jodai
Original Assignee
Dainippon Screen Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Mfg filed Critical Dainippon Screen Mfg
Publication of TW200630169A publication Critical patent/TW200630169A/en
Application granted granted Critical
Publication of TWI274607B publication Critical patent/TWI274607B/en

Links

Classifications

    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47J—KITCHEN EQUIPMENT; COFFEE MILLS; SPICE MILLS; APPARATUS FOR MAKING BEVERAGES
    • A47J27/00—Cooking-vessels
    • A47J27/12—Multiple-unit cooking vessels
    • A47J27/13—Tier cooking-vessels
    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47J—KITCHEN EQUIPMENT; COFFEE MILLS; SPICE MILLS; APPARATUS FOR MAKING BEVERAGES
    • A47J27/00—Cooking-vessels
    • A47J27/002—Construction of cooking-vessels; Methods or processes of manufacturing specially adapted for cooking-vessels
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S220/00—Receptacles
    • Y10S220/912—Cookware, i.e. pots and pans

Landscapes

  • Engineering & Computer Science (AREA)
  • Food Science & Technology (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Weting (AREA)

Abstract

To perform a treatment which reduces adverse influences due to treatment liquid, treatment liquid in the last process which remains on a substrate is performed, while preventing that rinse liquid flows backwards to the processing tank of a previous process to the substrate, even in a case where the treatment liquid, the treatment liquid which is hard to remove from the substrate in the last process is given, etc. In the processing chamber of a washing treatment, rinse liquid is supplied from an inlet nozzle (20) toward the substrate conveyance direction downstream to the front surface of the substrate (W) under conveyance, and a permutation mode from the processing liquid, the treatment liquid supplied at the last process to the rinse liquid is performed, and two fluids which have gas and liquids are supplied throughout the substrate width of the surface, which crosses in the substrate conveyance direction from the two fluid nozzles (21) to the front surface of the substrate (W), after this rinse liquid has been supplied. The two fluids which have the gas and the liquids are supplied from the two-fluid nozzle (21) throughout along the substrate width of the surface, which crosses in the substrate conveyance direction, and the processing liquid of the last process which still remains on the substrate front surface is removed.
TW095102440A 2005-02-28 2006-01-23 Apparatus and method of treating substrate TWI274607B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005054750A JP4514140B2 (en) 2005-02-28 2005-02-28 Substrate processing apparatus and substrate processing method

Publications (2)

Publication Number Publication Date
TW200630169A true TW200630169A (en) 2006-09-01
TWI274607B TWI274607B (en) 2007-03-01

Family

ID=36947126

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095102440A TWI274607B (en) 2005-02-28 2006-01-23 Apparatus and method of treating substrate

Country Status (4)

Country Link
JP (1) JP4514140B2 (en)
KR (1) KR100740407B1 (en)
CN (1) CN100378914C (en)
TW (1) TWI274607B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI424517B (en) * 2007-12-18 2014-01-21 Dainippon Screen Mfg Substrate processing device
TWI467643B (en) * 2007-05-07 2015-01-01 Screen Holdings Co Ltd Substrate processing device

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4502854B2 (en) * 2005-03-22 2010-07-14 株式会社高田工業所 Substrate processing apparatus and processing method
JP5244230B2 (en) * 2008-06-09 2013-07-24 コンセジョ スペリオール デ インベスティガショネス シエンティフィカス Absorber, absorber-evaporator assembly for absorber, and lithium bromide-water absorber incorporating said absorber and absorber-evaporator assembly
KR101086517B1 (en) 2008-10-15 2011-11-23 다이니폰 스크린 세이조우 가부시키가이샤 Apparatus for treating a substrate
JP6329380B2 (en) * 2014-02-07 2018-05-23 株式会社ジャパンディスプレイ Manufacturing method and manufacturing apparatus for liquid crystal display device
JP6658195B2 (en) * 2016-03-28 2020-03-04 大日本印刷株式会社 Etching method and etching apparatus

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3323385B2 (en) * 1995-12-21 2002-09-09 大日本スクリーン製造株式会社 Substrate cleaning apparatus and substrate cleaning method
JP3517585B2 (en) 1998-04-23 2004-04-12 株式会社アドバンスト・ディスプレイ Liquid crystal display panel manufacturing method and cleaning device used for the same
JP3185753B2 (en) * 1998-05-22 2001-07-11 日本電気株式会社 Method for manufacturing semiconductor device
FR2797405B1 (en) * 1999-08-12 2001-10-26 Coillard Sa Ets ULTRA CLEAN LIQUID RINSING BIN
KR20010018028A (en) * 1999-08-17 2001-03-05 윤종용 Wafer cleaning apparatus with blow nozzle in cover
JP2004074021A (en) * 2002-08-19 2004-03-11 Dainippon Screen Mfg Co Ltd Substrate processing apparatus and substrate cleaning unit
JP2004095926A (en) * 2002-09-02 2004-03-25 Dainippon Screen Mfg Co Ltd Substrate treatment equipment
JP4275968B2 (en) * 2003-03-07 2009-06-10 芝浦メカトロニクス株式会社 Substrate cleaning processing equipment
JP2004273984A (en) * 2003-03-12 2004-09-30 Dainippon Screen Mfg Co Ltd Method and device for substrate processing

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI467643B (en) * 2007-05-07 2015-01-01 Screen Holdings Co Ltd Substrate processing device
TWI424517B (en) * 2007-12-18 2014-01-21 Dainippon Screen Mfg Substrate processing device

Also Published As

Publication number Publication date
JP4514140B2 (en) 2010-07-28
CN1828826A (en) 2006-09-06
KR20060095464A (en) 2006-08-31
TWI274607B (en) 2007-03-01
CN100378914C (en) 2008-04-02
JP2006245051A (en) 2006-09-14
KR100740407B1 (en) 2007-07-16

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees