KR100651303B1 - High-strength high-conductivity copper alloy - Google Patents

Abstract

Copper alloy microstructure, containing, in mass%, 0.01 to 0.5% Fe, 0.01 to 0.3% P and the remaining copper and unavoidable impurities, and Fe / P, which is a mass ratio of Fe and P, is 0.5 to 6.0. The volume fraction of the dispersoids having an average particle diameter in the range of 1 nm to 20 nm is 1.0% or more and the number thereof is 300 pieces / μm ² or more. Cu-Fe-P alloy ensures high strength and high conductivity at the same time.

Description

High Strength High Conductivity Copper Alloy {HIGH-STRENGTH HIGH-CONDUCTIVITY COPPER ALLOY}

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a copper alloy having high strength and high conductivity, and, for example, relates to a copper alloy which is suitable as a raw material of an IC lead frame for semiconductor devices. Meanwhile, although the copper alloy according to the present invention is used in various fields, the following description will be mainly focused on the case where the copper alloy according to the present invention is used for an IC lead frame which is a semiconductor component.

As a copper alloy for IC lead frames, Cu-Fe-P alloys are generally used. For example, a copper alloy (C19210 alloy) containing 0.05 to 0.15% Fe and 0.025 to 0.040% P, or 2.1 to 2.6% Fe, 0.015 to 0.15% P, and 0.05 to 0.20% Zn The alloy (CDA194 alloy) is widely used as an international standard alloy because of its excellent strength, conductivity and thermal conductivity among copper alloys.

In recent years, the cross-sectional area of an IC lead frame is decreasing with the increase in the capacity, miniaturization, and high functionality of a semiconductor device. Accordingly, copper alloy parts used in IC lead frames used in these semiconductor devices are also required to have higher strength, conductivity and thermal conductivity. These are applicable not only to IC lead frames, but also to copper alloys used for conductive parts such as connectors, terminals, switches, and replays in other electrical and electronic components.

The advantage of Cu-Fe-P alloys is that they have high electrical conductivity, but they have increased the content of Fe and P or added third elements such as Sn, Mg, and Ca for high strength. However, increasing the amount of these elements increases the strength, but inevitably lowers the electrical conductivity. Therefore, by controlling the composition of copper alloys alone, Cu-Fe-P alloys having a good balance of high electrical conductivity and high strength, or both of them, are required in accordance with the above-mentioned trends of large capacity, miniaturization, and high functionality of semiconductor devices. It was difficult to do.

In order to overcome this difficulty, it has conventionally been proposed to control the microstructure of Cu—Fe—P alloys and the precipitation state of dispersed particles (crystals and precipitate particles). For example, Japanese Patent Application Laid-Open No. 285261/2000 has a Fe content of 1.0 to 3.0% of Fe and a volume fraction of 0.5 to 10% of the dispersed particles having an average particle diameter of 0.05 μm to 10 μm, indicating strength stability and softening resistance. This excellent copper alloy is proposed.

In addition, a copper alloy in which the amount of the compound having a small particle size is increased has also been proposed. For example, Japanese Patent Application Laid-Open No. 130755/1998 contains 0.05 to 3.5% of Fe and 0.01 to 1.0% of P, the particle diameter of which is less than 0.02 μm (small particles) and 0.02 μm to 100 μm (large particles). ), A high strength, highly conductive copper alloy with a ratio of small to large particles is proposed. In addition, a high strength, high softening resistance copper alloy containing 0.5 to 5% of Fe and 0.01 to 0.2% of P and having a ratio of larger particles having a particle diameter of 100 GPa or more and small particles of less than 100 GPa of 0.004 to 1.000 or less Proposed.

In addition, Japanese Patent Laid-Open No. 220594/1994 contains 0.01 to 0.3% Fe, 0.005 to 0.4% P, 1.5 to 5% Zn, 0.2 to 2.5% Sn, Fe-P-based compounds and the like. The technique for improving the strength and softening resistance has also been proposed, which is defined to be 150 kPa or less so as not to coarsen. In addition, Japanese Patent Laid-Open No. 178670/2000 has a total of Fe and P of 0.05 to 2%, containing 5 to 35% of Zn and 0.1 to 3% of Sn, and having a Fe-P system of 0.2 μm or less. A high strength, highly conductive copper alloy in which the compound is uniformly dispersed is proposed.

However, the technique of controlling the precipitation state of Fe and P-containing compounds (dispersed particles) of these Cu-Fe-P alloys is finer than those specified by these techniques, such as Fe and P-containing compounds having an average particle diameter of 20 nm or less. Attention is not paid to dispersed particles of.

Certainly, there are several prescribed methods in each of the above-mentioned documents containing dispersed particles of Fe and P-containing compounds having a fine average particle diameter of 20 nm or less. However, none of the techniques for controlling the precipitation state of these Fe and P-containing compounds controls the magnification of the TEM (transmission electron microscope) so that dispersed particles such as Fe and P-containing compounds having a fine average particle diameter of 20 nm or less can be observed. It is not. In addition, even when the magnification is defined, the magnification is limited to a maximum of 10,000 times. At 10,000-fold TEM, these fine dispersed particles cannot be observed. In order to quantitatively accurately grasp the state (size or number) of dispersed particles having a fine average particle diameter of 20 nm or less, observation by TEM at least 100,000 times magnification is necessary.

Therefore, each of the above document technologies does not substantially grasp the dispersed particles themselves such as Fe and P-containing compounds having a fine average particle diameter of 20 nm or less, or do not substantially recognize the influence of these fine dispersed particles on the copper alloy properties. .

In addition, Japanese Patent Laid-Open Publication Nos. 285261/2002 and 324935/1998 in the above-described document technology have a Fe content of more than 0.5%, and Japanese Patent Laid-Open Publication Nos. 220594/1994 and 178670/2000 refer to Zn. Or high Sn content. Therefore, as described above, in order to increase the content of Fe or P, or add a third element for high strength in common with the prior art. For this reason, even if it increases a fine dispersion particle, an electrical conductivity will necessarily fall.

Therefore, in the above-described prior art, high strength and high conductivity are incompatible, and Cu-Fe having a good balance of high conductivity and high strength required for the large capacity, miniaturization, and high functionality of the semiconductor device described above, or both of these characteristics are compatible. There is a limit to the realization of the -P alloy.

The present invention is to solve such a problem, to provide a Cu-Fe-P alloy having both high strength and high conductivity.

In order to achieve the above object, the gist of the present invention is that the high-strength high conductivity copper alloy contains 0.01% to 0.5% Fe, 0.01% to 0.3% P, and the remaining amount of copper and unavoidable impurities, A copper alloy having a mass ratio of Fe / P of 0.5 to 6.0, wherein the volume fraction of the dispersed particles having an average particle diameter of 1 nm to 20 nm in the copper alloy microstructure is 1.0% or more, and the number thereof is 300 / μm ² or more. .

In the present invention, the Cu-Fe-P alloy, which has not been known or recognized the effects or effects imparted to the copper alloy properties so far, dispersed particles such as fine Fe and P-containing compounds having an average particle diameter of 20 nm or less, the volume Specified in fraction and number, it is present in as many copper alloy microstructures as possible.

Thereby, with a relatively small content of Fe and P, the conductivity is at least 80% IACS at the hardness of 140 to 150 Hv level (from 480 to 530 MPa at tensile strength), or at a hardness of 160 Hv (at least 570 MPa at tensile strength). It is possible to provide a high strength high conductivity Cu-Fe-P alloy having a conductivity of 75% IACS or higher.

<Copper Alloy Microstructure>

The dispersed particles in the present invention means dispersed particles having an average particle diameter of 1 nm to 20 nm when the copper alloy microstructure is observed with a transmission electron microscope of 100,000 times. The main component of the dispersed particles is a Fe-P compound, and is mainly composed of Fe and P-containing compounds by adding Fe, Cu-Fe compounds and the like to the main component.

Such fine dispersed particles are newly produced during the production of a copper alloy, for example, after annealing after cold rolling. That is, these fine dispersed particles form a compound phase finely precipitated from the copper matrix by annealing. Therefore, it is different from the coarse dispersed particles produced during casting and originally present in the copper alloy microstructure. For this reason, these fine dispersed particles cannot be observed unless a copper alloy microstructure is observed by a transmission electron microscope of 100,000 times or more.

In the present invention, it is defined that the volume fraction of such fine dispersed particles is 1.0% or more and the number thereof is 300 / μm ² or more. The pinning capability of inhibiting the displacement or disappearance of the dislocations of these finely dispersed particles is surprisingly greater than that of the finely dispersed particles. For this reason, in the Cu-Fe-P alloy, the said pinning ability becomes high and high intensity | strength can be attained by making disperse particles, such as fine Fe and P containing compounds with an average particle diameter of 20 nm or less, exist in the copper alloy microstructure as much as possible.

In addition, the finely dispersed particles having an average particle diameter of 20 nm or less have a significantly lower conductivity reduction effect of the copper alloy than the finer dispersed particles. Therefore, the intensity | strength of a copper alloy can be raised rather than reducing the electrical conductivity of a copper alloy rather than a finer dispersed particle.

The pinning ability of the crude dispersed particles having an average particle diameter of more than 20 nm is low as described above. Therefore, it is required to set the upper limit of the average particle diameter of the dispersed particles defined in the present invention to 20 nm. On the other hand, in the case of dispersed particles having an average particle diameter of less than 1 nm, detection and measurement are difficult even with a 100,000 times transmission electron microscope, and the pinning ability is inversely weakened. Therefore, in this invention, it is prescribed | regulated that the minimum of the average particle diameter of a dispersed particle shall be 1 nm.

If the volume fraction of such fine dispersed particles is less than 1.0%, or the number thereof is less than 300 / μm ² , the number of particles to be effective is insufficient, and the hardness is 140 to 150 Hv level (480 to 530 MPa at tensile strength). High strength) is not obtained. Moreover, when there are few fine dispersion particles like this invention in a specific chemical composition, it is more likely to exist as a crude fine dispersion particle than this. For this reason, the conductivity is low, and the conductivity is 80% IACS or more at the hardness level of 140 to 150 Hv (the level of 480 to 530 MPa at the tensile strength) or at the hardness level of 160 Hv (the level is at least 570 MPa the tensile strength). High strength and high conductivity above 75% IACS cannot be achieved.

In addition, the present invention defines the amount of fine dispersed particles having an average particle diameter of 1 nm to 20 nm. However, if this requirement is satisfied, it is permissible that coarse dispersed particles having an average particle diameter of more than 20 nm in the copper alloy microstructures themselves are acceptable in a range that does not impair the object of the present invention.

In the present invention, the particle diameter d of the dispersed particles is an average value of the maximum diameters of the dispersed particles. That is, the average particle diameter referred to in this invention is the value which averaged each particle diameter d of each dispersed particle in the observation visual field in a 100,000-time transmission electron microscope. Of course, the measurement results of a plurality of fields of view may also be averaged.

In the same manner, the number of the dispersed particles was calculated by averaging the number of measurements per 1 μm ² of each dispersed particle (analyzing the image obtained by observation) in the observation field of a 100,000 times transmission electron microscope. to be. Of course, it is also acceptable to average the measurement results of multiple fields of view.

In the same manner, in the volume fraction of the dispersed particles according to the present invention, a dispersion having an average particle diameter of 1 nm to 20 nm, occupying a field of view (1 μm ² ) of 1 μm × 1 μm in the field of view observed at 100,000 times transmission electron microscope. The area ratio of the particles is obtained, and the value is taken as the volume fraction of the dispersed particles.

<Component Composition of Copper Alloy>

The reason for limitation of the chemical composition of the copper alloy according to the present invention is explained below. The chemical composition of the copper alloy according to the present invention basically contains 0.01% to 0.5% Fe, 0.01% to 0.3% P, and the remaining amount of copper and unavoidable impurities in mass% for high strength and high conductivity, and Fe and P The copper alloy whose Fe / P is a mass ratio of 05-6.0.

 As described above, as a means of increasing the content of Fe and P or increasing the amount of added elements of third elements such as Sn, Mg, Ca, etc. by conventionally employing for high strength, the strength is increased, but the conductivity is inevitably increased. Degrades. In addition, it is also a great advantage of the present invention that high strength and high electrical conductivity can be achieved according to the definition of the finely dispersed particles described above, even without employing means for increasing the amount of elements to increase the high strength.

It is only acceptable to contain 0.005 to 0.5% Zn and / or 0.001 to 0.5% Sn in the range which does not impair such high strength and high electrical conductivity of the present invention and, if necessary.

<0.01 to 0.5% Fe>

Fe is an element necessary to precipitate as fine dispersion particles of the present invention in a copper alloy to improve strength and softening resistance. When the Fe content is less than 0.01%, the fine dispersed particles of the present invention are insufficient. For this reason, in order to effectively exhibit effects, such as high strength, Fe content of 0.01% or more is required. However, if Fe is excessively contained in excess of 0.5%, high electrical conductivity cannot be achieved. In addition, if the precipitation amount of the dispersed particles is to be increased for the high electrical conductivity, the precipitated particles are made to be coarse and the present invention lacks finely dispersed particles. For this reason, intensity | strength falls and high strength and high electric conductivity are incompatible. Therefore, the Fe content is in the range of 0.01 to 0.5%.

<0.01 to 0.3% of P>

P is an element which has an oxidation effect and forms dispersion particle | grains with said Fe, and improves the strength and softening resistance of a copper alloy. At a content of less than 0.01%, the fine dispersed particles defined in the present invention are lacking. For this reason, P content of 0.01% or more is required in order to exhibit effects, such as high strength effectively. On the other hand, when P contains excessively more than 0.3%, electrical conductivity will fall, high electrical conductivity will not be achieved and hot workability will also fall. Therefore, content of P is made into the range of 0.01-0.3 mass%.

<Fe / P of 0.5 to 6.0>

In order to precipitate the fine dispersed particles defined in the present invention according to the prescribed amount, the present invention also defines not only the respective content ranges of Fe and P, but also Fe / P, which is a mass ratio of Fe and P. When Fe / P is less than 0.5, P becomes excess and melt | dissolves in a copper matrix, electric conductivity falls, and high electrical conductivity cannot be achieved. On the other hand, when Fe / P exceeds 6.0, on the contrary, since Fe is excessive and it produces | generates as a crude single-crystal Fe particle, intensity | strength falls. Thus, Fe / P was determined in the range of 0.5 to 6.0.

<0.005 to 0.5% Zn>

Zn is an element effective in improving the thermal peeling resistance of Sn plating and solder used for joining electronic components and suppressing thermal peeling. In order to exhibit such an effect effectively, it is preferable to contain Zn 0.005% or more. However, when Zn is excessively contained in excess of 0.5%, not only does the wet-spreadability of molten Sn or solder deteriorate, but also the conductivity is greatly reduced. Therefore, Zn is optionally contained in the range of 0.005 to 0.5%.

<0.001 to 0.5% Sn>

Sn contributes to the strength improvement of the copper alloy. In order to exhibit such an effect effectively, it is preferable to contain Sn 0.001% or more. However, when Sn contains excessively more than 0.5%, the effect will be saturated and electric conductivity will be reduced significantly. Therefore, Sn is selectively contained in 0.001 to 0.5 mass%.

In addition, for example, elements such as Al, Cr, Ti, Be, V, Nb, Mo, W, Mg, and Ni are impurities, and in addition to easily forming crude dispersed particles, the conductivity is also easily caused. Therefore, it is preferable to make it the extremely small content of 0.5 mass% or less in total amount. In addition, elements such as B, C, Na, S, Ca, As, Se, Cd, In, Sb, Pb, Bi, and MM (misch metal) contained in trace amounts in the copper alloy also lower the conductivity. Easy to cause. For this reason, it is preferable to control to the extremely small content of 0.1 mass% or less in these total amounts.

<Production method>

Next, preferable manufacturing conditions for making a copper alloy microstructure into the structure prescribed | regulated by this invention are demonstrated below. It is unnecessary to change the manufacturing process itself of the copper alloy of this invention largely, and it can manufacture in the same process as a conventional method. That is, the copper alloy molten metal adjusted to the compound composition is cast as mentioned above. After the ingot is chamfered, hot rolling is performed after heating or homogenizing heat treatment, and the plate is cooled by water after hot rolling. Thereafter, primary cold rolling referred to as intermediate rolling is performed, followed by annealing and washing, followed by finishing (cold) and cold rolling to obtain a copper alloy sheet having a product sheet thickness or the like.

Here, in order to control so that the volume fraction of the above-mentioned dispersed particle whose average particle diameter may be 1 nm-20 nm may be 1.0% or more, and the number thereof is 300 pieces / micrometer ² or more, it depends on manufacture. Annealing under the following conditions is effective.

That is, as described above, the fine dispersed particles in the present invention form a new finely precipitated compound from the copper matrix by annealing. In order to precipitate such fine dispersed particles, the copper alloy is annealed after primary cold rolling.

In order to obtain the high electric conductivity by only one annealing, it is essential to increase the annealing temperature. When the annealing temperature is increased, the amount of the dispersed particles that precipitate is increased, resulting in growth and roughening of the dispersed particles. Therefore, by dividing the annealing into a plurality of times, and controlling the annealing temperature per time to 430 ℃ or less to obtain a high conductivity, while suppressing the growth and coarsening of the dispersed particles, the fine molecular structure composed of the finely dispersed particles It is desirable to control the annealing process to form

In addition, when cold rolling is performed between these annealing and annealing, the lattice defects increase due to cold rolling and become precipitation nuclei in the subsequent annealing, so that the crystal-precipitation forms of the finely dispersed particles are easily obtained.

Therefore, if these conditions are taken into consideration, in the manufacturing process of the copper alloy, a process such as repeating cold rolling and annealing twice until the final cold rolling followed by (final) cold rolling is used to determine the finely dispersed particles. -Precipitation form is preferable at the point which is easy to be obtained.

The holding time of maximum temperature in an annealing process is 0.5 to 20 hours. If the holding time is less than 0.5 hour, the amount of precipitation is insufficient and the conductivity is not improved. In contrast, if the holding time exceeds 20 hours, the precipitated particles grow and are coarsened even when the temperature is 430 ° C or lower.

Example

Hereinafter, an embodiment according to the present invention will be described. The copper alloy of each composition shown in following Table 1 was casted, the copper alloy plate was manufactured, and each characteristic was evaluated. Moreover, in the copper alloy plates of each composition shown in Table 1, as elements other than what is shown in Table 1, the total amount of elements, such as Al, Cr, Ti, Be, V, Nb, Mo, W, Mg, Ni, etc. Was 0.5 mass% or less. In addition, elements such as B, C, Na, S, Ca, As, Se, Cd, In, Sb, Pb, Bi, and MM (Mishmetal) contained in trace amounts in the copper alloy are also 0.1 in these total amounts. It was below mass%.

The manufacturing method of a specific copper alloy plate is as follows. The copper alloy was melted and refined in a coreless furnace and then cast by semi-continuous casting to obtain an ingot having a thickness of 70 mm, a width of 200 mm and a length of 500 mm. And each ingot was surface-treated and heated, and it hot-rolled until the thickness became 16 mm at the temperature of 950 degreeC. After the surface of the hot rolled plate was removed to remove the oxidized scale, as shown in Table 1, the number of annealing of each example was repeated cold rolling and annealing one to three times. equivalence). Thereafter, a copper alloy plate was applied to the final cold rolling to obtain a copper alloy plate having a thickness of 0.2 mm. The higher annealing temperature during repeated annealing is described as the highest annealing temperature, and the maximum annealing temperature is shown in Table 1 for each example.

The samples were cut out from the copper alloy plates of all the examples thus obtained, and the volume fraction (%) and the number measurement, the tensile force test, the hardness measurement, and the conductivity measurement of the finely dispersed particles were performed by histological observation. These results are shown in Table 1, respectively.

In the tissue observation, the volume fraction and number of dispersed particles having an average particle diameter of 1 nm to 20 nm were measured when the microstructure of the copper alloy was observed by a transmission electron microscope of 100,000 times by the above-described measuring method.

The tensile test was performed by producing the JIS No. 13 test piece cut out parallel to a rolling direction. Hardness measurement was performed by applying a load of 0.5 Kg with a micro-Vickers hardness tester.

The electrical conductivity was processed by milling, and processed the fragment type test piece of width 10mm x length 300mm, the electrical resistance was measured by the double bridge resistance measuring apparatus, and it calculated by the average cross-sectional area method.

As is apparent from Table 1, Examples 1 to 9 of the invention contain 0.01 to 0.5% of Fe, and 0.01 to 0.3% of P, and have a copper alloy composition range in which the value of Fe / P is 0.5 to 6.0, Zn and Sn are optionally included in predetermined ranges, respectively. Moreover, the annealing in the manufacturing method was also manufactured in preferable conditions.

For this reason, in Examples 1 to 9 of the present invention, when the microstructure of the copper alloy was observed with a transmission electron microscope of 100,000 times, the volume fraction of the dispersed particles having an average particle diameter of 1 nm to 20 nm was 1.0% or more, The number is 300 pieces / μm ² or more.

As a result, the copper alloy plate has a conductivity of 83 to 80% IACS at a hardness level of 144 to 157 Hv (503 to 552 MPa in tensile strength) or a hardness of 83 to 80% IACS or a hardness of 161 to 165 Hv (at a level of 570 to 581 MPa in tensile strength). It has high conductivity with high strength of 86 to 82% IACS.

In contrast, as is apparent from Table 1, Comparative Example 10 is less than the lower limit because the Fe content of the copper alloy is 0.007%. For this reason, although annealing was performed in preferable conditions, since the volume fraction of the said micro-dispersion particle | grains is 0.8%, it is less than the lower limit, and hardness, tensile strength, and electrical conductivity are all low.

In Comparative Example 11, annealing is carried out under preferable conditions, and the volume fraction and number of the finely dispersed particles also satisfy the scope of the present invention. However, since the Fe content of the copper alloy is 0.66%, which is higher than the upper limit, the electrical conductivity is remarkably low and high strength and high electrical conductivity are not compatible.

In Comparative Example 12, the P content of the copper alloy was 0.008%, which is less than the lower limit. For this reason, although annealing is performed in preferable conditions, since the volume fraction of the said micro-dispersion particle is 0.9%, it is less than the lower limit, and hardness, tensile strength, and electrical conductivity are also low.

In Comparative Example 13, annealing is carried out under preferred conditions, and the volume fraction and number of fine dispersed particles also satisfy the scope of the present invention. However, since the P content of the copper alloy is 0.33% and higher than the upper limit, the electrical conductivity is significantly low, and high strength and high electrical conductivity are not compatible.

In the comparative example 14, although the content of Fe and P of a copper alloy satisfy | filled the scope of this invention, Fe / P was 0.31 and it is less than the minimum. For this reason, the annealing is carried out in the preferred conditions, the volume fraction and number of the fine dispersed particles also meet the scope of the present invention, the conductivity is significantly lower than the hardness and tensile strength.

In the comparative example 15, although the content of Fe and P of a copper alloy satisfy | fills the scope of this invention, Fe / P is 6.50 and exceeds the upper limit. For this reason, although annealing is performed in preferable conditions, the number of the said fine dispersion | distribution particle | grains is 250 number / micrometer <^2> and is below the lower limit. For this reason, hardness, tensile strength, and electrical conductivity are all remarkably low.

Comparative Example 16, the annealing is carried out under preferred conditions and the volume fraction and number of the fine dispersed particles also satisfy the scope of the present invention. However, since the Zn content of the copper alloy is 1.2% and higher than the upper limit, the conductivity is remarkably low compared to the hardness, and the high strength and the high conductivity are not compatible. In addition, since the Zn content is high, there is a possibility that solder failure occurs.

Comparative Example 17, the annealing is carried out in the preferred conditions and the volume fraction and number of the fine dispersed particles also satisfy the scope of the present invention. However, since the Sn content of the copper alloy is 0.9%, which is higher than the upper limit, the conductivity is remarkably lower than that of the hardness and the tensile strength, and the high strength and the high conductivity are not compatible.

Comparative Example 18 has a copper alloy composition range of the present invention, but the maximum annealing temperature is 500 ° C., exceeding the preferred upper limit, the volume fraction of the fine dispersed particles is 1.8%, close to the lower limit, and the number is 200 pieces / μm. ^2, it is less than the minimum. For this reason, hardness and electrical conductivity are remarkable and low.

Although the comparative example 19 is the copper alloy composition range of this invention, the annealing frequency | count is one time and is not repeated multiple times, The number of the said fine-dispersion particle | grains is less than the minimum as 150 pieces / micrometer <^2> . For this reason, hardness, tensile strength, and electrical conductivity are all remarkably low.

In Comparative Example 20, the composition was the same as in Example 1 of the present invention and defined in the present invention, but the duration at the maximum annealing temperature was 0.2 hours, which is lower than the lower limit, and the volume fraction of the fine dispersed particles was 0.6%. Their number is 250 / μm ^2, and the volume fraction and number are lower than the lower limit. As a result, the conductivity is considerably lower than Example 1 of the invention.

Also in Comparative Example 21, the composition is the same as in Example 5 of the present invention and defined in the present invention, but the duration of the maximum annealing temperature is 30 hours, which is higher than the preferred upper limit, and the number of fine dispersed particles is 280 particles / µm ^2. Then lower than the lower limit. As a result, hardness and tensile strength are worse than Example 5 of the present invention.

Also in Comparative Example 22, the composition is the same as that of Example 9 of the present invention and defined in the present invention, but the maximum annealing temperature is 460 ° C. and higher than the preferred upper limit, and the number of fine dispersed particles is 230 / μm ^{2, and} then lower limit. low. As a result, hardness and tensile strength are inferior to Example 9 of the present invention.

From the above results, the critical significance of the composition, structure, preferred annealing conditions, etc. of the copper alloy plate according to the present invention for high strength and high conductivity is supported.

 As described above, according to the present invention, it is possible to provide a copper alloy capable of meeting the demand for high strength and high conductivity while reducing the cross-sectional area of the IC lead frame. In addition, the present invention can ensure high strength and high electrical conductivity not only for IC lead frames but also copper alloys for conductive parts such as connectors, terminals, switches, and replays in other electrical and electronic components.

The invention described above has been described with respect to preferred embodiments. However, one of ordinary skill in the art will recognize that various variations of these embodiments exist. Such modifications will fall within the scope of the invention and the appended claims.

Claims (3)

A copper alloy containing, in mass%, 0.01 to 0.5% Fe, 0.01 to 0.3% P and the balance of copper and unavoidable impurities, wherein Fe / P, the mass ratio of Fe and P, is 0.5 to 6.0, and the copper alloy microstructure A high-strength high conductivity copper alloy, characterized in that the volume fraction of the dispersoid having an average particle diameter of 1 nm to 20 nm is 1.0% or more and the number thereof is 300 / μm ² or more. The method of claim 1, A high strength high conductivity copper alloy containing 0.005 to 0.5% by mass of Zn. The method of claim 1, A high strength high conductivity copper alloy containing 0.001 to 0.5 mass% Sn further.