JP3344700B2 - High-strength, high-conductivity copper alloy sheet for leadframes with excellent heat treatment during press punching - Google Patents

High-strength, high-conductivity copper alloy sheet for leadframes with excellent heat treatment during press punching

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Publication number
JP3344700B2
JP3344700B2 JP15088798A JP15088798A JP3344700B2 JP 3344700 B2 JP3344700 B2 JP 3344700B2 JP 15088798 A JP15088798 A JP 15088798A JP 15088798 A JP15088798 A JP 15088798A JP 3344700 B2 JP3344700 B2 JP 3344700B2
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Japan
Prior art keywords
copper alloy
strength
residual stress
less
punching
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JP15088798A
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Japanese (ja)
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JPH11343527A (en
Inventor
洋介 三輪
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Kobe Steel Ltd
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Kobe Steel Ltd
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  • Lead Frames For Integrated Circuits (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、リードフレームに
用いられる高強度、高導電性銅合金板に関するものであ
り、より詳しくは、打抜き加工を含む複数の剪断加工に
よりリードフレームを製造する際、剪断加工時に生じた
残留応力が焼鈍により容易に除去でき、しかも軟化しに
くい高強度、高導電性リードフレーム用銅合金板に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a high-strength, high-conductivity copper alloy plate used for a lead frame , and more particularly, to a lead frame formed by a plurality of shearing processes including a punching process. The present invention relates to a high-strength, high-conductivity copper alloy plate for a lead frame , which can easily remove residual stress generated at the time of shearing by annealing at the time of manufacturing, and is hardly softened.

【0002】[0002]

【従来の技術】従来、一般に上記のリードフレーム
は、強度、伸び、導電性、耐熱性、Agめっき性、Sn
めっき及びはんだの耐熱剥離性などの特徴を具備するこ
とが要求されている。このことから、これらの特性をも
った、例えばC19400(Cu−2.3wt%Fe−
0.03wt%P−0.1wt%Zn)やC19210
(Cu−0.1wt%Fe−0.03wt%P)をはじ
め、その他多くの銅合金がその製造に用いられている。
2. Description of the Related Art Conventionally, the above-mentioned lead frames generally have strength, elongation, conductivity, heat resistance, Ag plating property, Sn plating,
It is required to have features such as heat-peelability of plating and solder. From these facts, for example, C19400 (Cu-2.3 wt% Fe-
0.03 wt% P-0.1 wt% Zn) and C19210
Many other copper alloys, including (Cu-0.1 wt% Fe-0.03 wt% P), are used for their production.

【0003】[0003]

【発明が解決しようとする課題】一方、最近の各種電気
電子機器の軽薄短小化及び実装密度の向上要求に対し
て、使用部品の小形化、リード間距離の縮小などが加速
している。そのため、例えばリードフレームのプレスに
よる打ち抜き加工において、打抜き後のリードツイス
ト、リードシフト、リード段差などが小さいことが求め
られている。これらリードの平坦性ともいうべき性能を
確保するため、プレス打ち抜き時の剪断により発生する
残留応力が小さいことが要求されている。
On the other hand, in response to recent demands for reduction in the weight and thickness of various electric and electronic devices and improvement in mounting density, the use of smaller parts and a shorter distance between leads have been accelerated. For this reason, for example, in punching of a lead frame by pressing, it is required that a lead twist, a lead shift, a lead level difference, and the like after punching be small. In order to ensure the performance which can be called the flatness of these leads, it is required that residual stress generated by shearing during press punching be small.

【0004】また、これとともに発生した残留応力を小
さくする技術も開発された。この技術はリード打ち抜き
に際して、リード側面を打ち抜いて後、リード先端を切
り落とさずに束ねたままの状態で、一度、数秒〜数分間
の短時間熱処理(焼鈍)を行い、リード側面を打ち抜い
た時に生じた残留応力を逃がし、続いて、残留応力が小
さくなった時点でリード先端部を切り落とし、平坦性を
確保するという技術である。この技術を適用する場合、
打ち抜き加工途中の焼鈍により残留応力の除去が容易に
行われると同時に、リードフレーム材料自身を軟化させ
ないことが必要である。材料自身の軟化が生じた場合に
は、この後のリード先端部の切り落としの際に強度が足
りずに変形したり、たとえリードフレームに加工できた
としても、その後のIC組立工程で変形しやすく取り扱
いが困難になり、生産性の低下につながってしまう。従
って、プレス打ち抜きにより発生する残留応力が小さ
く、打ち抜き加工途中の焼鈍により残留応力の除去が容
易に行われ、また、この焼鈍時に材料自身の軟化が起こ
りにくい材料が必要とされている。
Further, a technique for reducing the residual stress generated along with this has been developed. This technology occurs when the lead side is punched out, after a side surface of the lead is punched out, a short time heat treatment (annealing) for a few seconds to several minutes is performed once in a state where the lead ends are not cut off and bundled, and the lead side surfaces are punched out. Then, the residual stress is released, and then, when the residual stress becomes small, the lead tip is cut off to ensure flatness. When applying this technology,
It is necessary that the residual stress is easily removed by annealing during the punching process, and that the lead frame material itself is not softened. If the material itself softens, it may be deformed due to insufficient strength at the time of cutting off the lead tip after this, or it may be easily deformed in the subsequent IC assembly process even if it can be processed into a lead frame Handling becomes difficult, leading to a decrease in productivity. Therefore, there is a need for a material that has a small residual stress generated by press punching, easily removes the residual stress by annealing during the punching process, and is unlikely to be softened during the annealing.

【0005】最近では、特開平2−111829号公報
において、Fe及びSn並びにP、Zn、Si、Sb、
In、Al、Mn、Ni、Mgのうちの1種以上を含む
組成とし、かつFe析出物のサイズを制御した、耐熱性
に富むリードフレーム用銅合金が提案されている。ま
た、特許第2673967号公報では、Fe、P、Z
n、Mg、Snの組成を制御した、高強度を有する半導
体装置のCu合金製リードフレーム材が提案されてい
る。しかしながら、特開平2−111829号公報に
は、その銅合金が耐熱性に富むことは記載されている
が、強度、導電性、打ち抜き時の残留応力、さらには、
打ち抜き加工により発生した残留応力の除去のしやすさ
といった特性については全く触れられていない。また、
特許第2673967号公報では、その銅合金が高強
度、高導電性及び耐熱性を有することが記載されている
が、やはり、打ち抜き時の残留応力、打ち抜き加工によ
り発生した残留応力の除去のしやすさといった特性につ
いては全く触れられていない。
[0005] Recently, in Japanese Patent Application Laid-Open No. Hei 2-111829, Fe and Sn and P, Zn, Si, Sb,
A heat-resistant copper alloy for lead frames, which has a composition containing at least one of In, Al, Mn, Ni, and Mg, and controls the size of Fe precipitates, has been proposed. In Japanese Patent No. 2673967, Fe, P, Z
A Cu alloy lead frame material for a semiconductor device having high strength, in which the composition of n, Mg, and Sn is controlled, has been proposed. However, JP-A-2-111829 describes that the copper alloy is rich in heat resistance, but it has strength, conductivity, residual stress at the time of punching, and furthermore,
No mention is made of characteristics such as ease of removal of residual stress generated by punching. Also,
Japanese Patent No. 2673967 describes that the copper alloy has high strength, high conductivity and heat resistance. However, it is also easy to remove residual stress at the time of punching and residual stress generated by punching. No such property is mentioned at all.

【0006】本発明は、リードフレーム用銅合金板とし
て要求される強度、導電率、はんだ付け性、めっき性な
どの特性を通常の銅合金板以上に維持しながら、打ち抜
き時に発生する残留応力が小さく、また、その打ち抜き
加工で発生した残留応力が打ち抜き途中の焼鈍により除
去しやすく、さらに、その焼鈍時に軟化しにくく耐熱性
のよい銅合金板を得ることを目的とする。
The present invention relates to a method for producing a copper alloy sheet for a lead frame, which maintains the properties such as strength, conductivity, solderability, and plating properties that are higher than those of an ordinary copper alloy sheet. It is an object of the present invention to obtain a copper alloy plate which has a small residual stress, which is easily removed by the annealing during the punching process during the punching process, and which is not easily softened during the annealing and has good heat resistance.

【0007】[0007]

【課題を解決するための手段】本発明に係る高強度、高
導電性リードフレーム用銅合金板は、Fe:0.05〜
3.0wt%、P:0.01〜0.4wt%、Ni:
0.001〜0.5wt%、Sn:0.005〜2.0
wt%、Zn:0.005〜5.0wt%、Si:0.
01wt%未満、O:100ppm以下、H:10pp
以下、残部が実質的にCuと不可避不純物からなり、
特にプレス打ち抜き加工の途中で残留応力除去焼鈍が行
われるリードフレームに用いられる銅合金板である。
の銅合金は、さらに、Mn、Zr、Cr、Al、Inの
うち1種又は2種以上を合計で0.001〜0.1wt
%、含有することができる。上記の銅合金において、不
可避不純物として、Mg、Co、Ca、Ag、Cd、B
e、Ti、Au、Pt、Hf、Th、Li、Na、K、
Sr、Pd、W、S、C、Nb、V、Y、Mo、Pb、
Ga、Ge、As、Se、Sb、Bi、Te、B、C
e、ミッシュメタルの合計が0.005wt%以下に制
限されていることが望ましい。
The copper alloy plate for a high-strength, high-conductivity lead frame according to the present invention has a Fe: 0.05 to
3.0 wt%, P: 0.01 to 0.4 wt%, Ni:
0.001 to 0.5 wt%, Sn: 0.005 to 2.0
wt%, Zn: 0.005 to 5.0 wt%, Si: 0.
Less than 01 wt%, O: 100 ppm or less, H: 10 pp
m or less, the balance substantially consists of Cu and unavoidable impurities ,
In particular, annealing for removing residual stress is performed during press stamping.
This is a copper alloy plate used for a lead frame. The copper alloy further contains one or more of Mn, Zr, Cr, Al, and In in a total amount of 0.001 to 0.1 wt.
%, Can be contained. In the above copper alloy, Mg, Co, Ca, Ag, Cd, B
e, Ti, Au, Pt, Hf, Th, Li, Na, K,
Sr, Pd, W, S, C, Nb, V, Y, Mo, Pb,
Ga, Ge, As, Se, Sb, Bi, Te, B, C
e, it is desirable that the total amount of misch metal is limited to 0.005 wt% or less.

【0008】[0008]

【発明の実施の形態】次に、本発明合金において成分を
上記の通りに限定した理由を以下に説明する。 <Fe>Feには、Pとの化合物を形成し合金中に析出
したり、Fe単体で合金中に析出することで、合金の強
度及び耐熱性を確保する作用がある。しかし、その含有
量が0.05wt%未満であると所望の強度及び耐熱性
が得られず、一方、3.0wt%を越える割合で含有さ
せると合金中に粗大なFe析出物が形成されるようにな
り、熱間圧延時の加工性が低下すると共に、製品の曲げ
加工性及び導電率の低下が著しくなり、好ましくない。
従って、Fe含有量は0.05〜3.0wt%とする。
Next, the reasons for limiting the components in the alloy of the present invention as described above will be described below. <Fe> Fe has a function of forming a compound with P and precipitating in the alloy or precipitating Fe alone in the alloy, thereby ensuring the strength and heat resistance of the alloy. However, if the content is less than 0.05 wt%, desired strength and heat resistance cannot be obtained, while if the content is more than 3.0 wt%, coarse Fe precipitates are formed in the alloy. As a result, the workability during hot rolling is reduced, and the bending workability and electrical conductivity of the product are significantly reduced, which is not preferable.
Therefore, the Fe content is set to 0.05 to 3.0 wt%.

【0009】<P>PはFeとの化合物を生成し、合金
中に析出して強度及び耐熱性を向上させる。また後述す
るNiとの化合物も生成し、合金中に析出して剪断加工
性を向上させる。Pの含有量が0.01wt%未満の場
合は、化合物の析出が不十分であるため、所望の強度、
耐熱性並びに剪断加工性が得られない。一方、Pの含有
量が0.4wt%を越える場合には、熱間加工時の加工
性が低下するとともに導電率の低下が生じるため、好ま
しくない。従って、Pの含有量は0.01〜0.4wt
%とする。
<P> P forms a compound with Fe and precipitates in the alloy to improve strength and heat resistance. In addition, a compound with Ni, which will be described later, is generated and precipitates in the alloy to improve the shearing property. When the content of P is less than 0.01 wt%, precipitation of the compound is insufficient, so that the desired strength,
Heat resistance and shearability cannot be obtained. On the other hand, if the content of P exceeds 0.4 wt%, it is not preferable because the workability during hot working is lowered and the conductivity is lowered. Therefore, the content of P is 0.01 to 0.4 wt.
%.

【0010】<Ni>NiはPとの化合物を生成し、合
金中に析出して剪断加工性を向上させ、結果、プレス打
ち抜き加工時に生じる残留応力を小さくする。この化合
物が合金中に分散されていると、母材との金属学的な連
続性がないため剪断加工時に応力を集中的に受けてミク
ロクラックの発生源となり、剪断加工性を著しく向上さ
せ、ひいては残留応力を低く抑えることができる。Ni
の含有量が0.001wt%未満の場合は化合物が非常
に微細にしか析出せず、所望の剪断加工性が得られな
い。一方、Niの含有量が0.5wt%を越える場合に
はNi−Pの粗大化合物として析出し、剪断加工性の向
上には寄与するものの曲げ加工性が低下する。また、導
電率の低下も生じるため好ましくない。従って、Niの
含有量は0.001〜0.5wt%とする。
<Ni> Ni forms a compound with P and precipitates in the alloy to improve the shear workability, and as a result, reduces the residual stress generated during press punching. When this compound is dispersed in the alloy, there is no metallurgical continuity with the base material, so stress is intensively received during shearing and becomes a source of microcracks, significantly improving shearing workability, Consequently, the residual stress can be kept low. Ni
When the content of is less than 0.001 wt%, the compound precipitates only very finely, and the desired shear workability cannot be obtained. On the other hand, when the content of Ni exceeds 0.5 wt%, it precipitates as a coarse compound of Ni—P, which contributes to the improvement of the shearing workability but decreases the bending workability. In addition, the conductivity is undesirably reduced. Therefore, the content of Ni is set to 0.001 to 0.5 wt%.

【0011】<Sn>Snは、合金中に固溶することで
強度を向上させるのみならず、Fe−P析出物又はFe
析出物と共存した状態で耐熱性を向上させる。一方、S
nを添加しても残留応力を除去するための処理温度が上
昇することはないので、剪断加工時の残留応力を除去す
るための焼鈍時に、余り軟化させることなく残留応力の
除去を行うことができる。この特性は、Snの含有量が
0.005wt%未満では十分でない。一方、Snの含
有量が2.0wt%を超えると導電率の低下が激しく好
ましくない。従って、Snの含有量は0.005〜2.
0wt%とする。 <Zn>Znは銅合金のはんだ及びSnめっきの耐熱剥
離性を改善する。しかし、含有量が0.005wt%未
満の場合、所望の効果が得られない。一方、その含有量
が5.0wt%を越えるとはんだ濡れ性が低下する。ま
た、導電率の低下も激しくなる。従って、Znの含有量
は0.005〜5.0wt%とする。
<Sn> Sn not only improves the strength by forming a solid solution in the alloy, but also forms an Fe—P precipitate or Fe.
Improves heat resistance in the state of coexistence with precipitates. On the other hand, S
Since the processing temperature for removing the residual stress does not rise even if n is added, it is possible to remove the residual stress without excessively softening during annealing for removing the residual stress during shearing. it can. This property is not sufficient if the Sn content is less than 0.005 wt%. On the other hand, if the Sn content exceeds 2.0 wt%, the conductivity is drastically reduced, which is not preferable. Therefore, the content of Sn is 0.005 to 2.
0 wt%. <Zn> Zn improves the heat-peeling resistance of copper alloy solder and Sn plating. However, if the content is less than 0.005 wt%, the desired effect cannot be obtained. On the other hand, if the content exceeds 5.0% by weight, the solder wettability decreases. In addition, the decrease in conductivity also becomes severe. Therefore, the content of Zn is set to 0.005 to 5.0 wt%.

【0012】<Si>Siは、Niとの化合物を生成し
合金中に析出する。しかしながら、Siの含有量が0.
01wt%を越えた場合、NiはSiとの化合物を形成
するのに使用され、Ni−Pの化合物の形成を阻害して
しまう。結果、Ni−Pの化合物によって得られるはず
の剪断加工性を阻害する。また、導電率の低下も激しい
ため好ましくない。従って、Siの含有量は0.01w
t%未満に制限する。そのためには必要に応じて溶湯中
にOを吹き込み、不純物Siを浮上させノロと共に除去
するとよい。 <O>OはPと反応しやすい。Oが100ppmを越え
た場合、反応したPは上述したNiとの化合物を形成で
きなくなる。結果、剪断加工性向上の効果が得られな
い。従って、Oの含有量は「100ppm以下」とす
る。 <H量>Hは、O量が10ppm以上含有されている場
合、H量が10ppmを越えてくると、鋳造時の冷却過
程でOと結び付いて水蒸気となり、この水蒸気が鋳塊中
にブローホール欠陥を生じてしまう。したがって、Hの
含有量は「10ppm以下、好ましくは4ppm以下、
さらに好ましくは2ppm以下」とする。O、Hの低減
については、必要に応じて溶湯を木炭被覆下でArバブ
リングを行うとよい。
<Si> Si forms a compound with Ni and precipitates in the alloy. However, when the content of Si is 0.1.
If the content exceeds 01 wt%, Ni is used to form a compound with Si, and inhibits the formation of a Ni-P compound. As a result, the shearing property that would be obtained by the Ni-P compound is impaired. In addition, the electric conductivity is drastically reduced, which is not preferable. Therefore, the content of Si is 0.01 w
Limit to less than t%. For this purpose, O may be blown into the molten metal as necessary to float the impurity Si and remove it together with the slag. <O> O easily reacts with P. When O exceeds 100 ppm, the reacted P cannot form the above-mentioned compound with Ni. As a result, the effect of improving the shearability cannot be obtained. Therefore, the content of O is set to “100 ppm or less”. <H content> When H content exceeds 10 ppm, H is combined with O in the cooling process during casting to form steam, and this steam becomes blowhole in the ingot. It causes defects. Therefore, the content of H is "10 ppm or less, preferably 4 ppm or less,
More preferably, it is 2 ppm or less. As for the reduction of O and H, Ar bubbling may be performed on the molten metal under charcoal coating as necessary.

【0013】<Mn、Zr、Cr、Al、In>Mn、
Zr、Cr、Al、Inも、Snと同様の残留応力除去
と耐熱性の向上効果を示す。0.001wt%未満では
その効果が十分でなく、0.1wt%を超えると導電率
の低下が激しく好ましくない。従って、これらの元素の
含有量は総量で0.001〜0.1wt%とする。
<Mn, Zr, Cr, Al, In> Mn,
Zr, Cr, Al, and In also exhibit the same effects of removing residual stress and improving heat resistance as Sn. If the amount is less than 0.001% by weight, the effect is not sufficient, and if it exceeds 0.1% by weight, the electric conductivity is greatly reduced, which is not preferable. Therefore, the content of these elements is set to 0.001 to 0.1 wt% in total.

【0014】<その他>Mg、Co、Ca、Ag、C
d、Be、Ti、Au、Pt、Hf、Th、Li、N
a、K、Sr、Pd、W、S、C、Nb、V、Y、M
o、Pb、Ga、Ge、As、Se、Sb、Bi、T
e、B、Ce、ミッシュメタルは、その含有量が合計で
0.005wt%を越えた場合、固溶したこれらの原子
がSn原子と転位との相互作用を阻害するためと考えら
れるが、上述したSn原子の耐熱性向上効果を妨げ、剪
断加工時の残留応力を除去するための焼鈍時に、材料を
軟化させることなく残留応力を除去することが難しくな
る。従って、これらの元素の含有量は合計で0.005
wt%以下とする。
<Others> Mg, Co, Ca, Ag, C
d, Be, Ti, Au, Pt, Hf, Th, Li, N
a, K, Sr, Pd, W, S, C, Nb, V, Y, M
o, Pb, Ga, Ge, As, Se, Sb, Bi, T
When the total content of e, B, Ce, and misch metal exceeds 0.005 wt%, it is considered that these solid-dissolved atoms hinder the interaction between Sn atoms and dislocations. This prevents the effect of improving the heat resistance of the Sn atoms and makes it difficult to remove the residual stress without softening the material during annealing for removing the residual stress during shearing. Therefore, the content of these elements is 0.005 in total.
wt% or less.

【0015】[0015]

【実施例】次に、本発明に係る高強度、高導電性リード
フレーム用銅合金板の実施例について、その比較例及び
従来例とともに説明する。表1〜3に示す組成の銅合金
をクリプトル炉にて木炭被覆下で大気溶解し、ブックモ
ールドに鋳造して50mm×80mm×200mmの鋳
塊を作製した。この鋳塊を約900℃にて熱間圧延し、
直ちに水中急冷し、厚さ15mmの熱延材を作製した。
この熱延材の表面の酸化スケールを除去するため、軽く
表面切削した後、冷間圧延−熱処理を1回以上くり返し
て行った後、冷間圧延を行い厚さ0.25mm、幅60
mmの条を作製した。
Next, a high-strength, high-conductivity lead according to the present invention.
Examples of a copper alloy plate for a frame will be described together with comparative examples and a conventional example. A copper alloy having a composition shown in Tables 1 to 3 was melted in the air under a charcoal coating in a kryptor furnace, and cast into a book mold to produce an ingot of 50 mm × 80 mm × 200 mm. This ingot is hot-rolled at about 900 ° C.
Immediately, it was quenched in water to produce a hot-rolled material having a thickness of 15 mm.
In order to remove the oxide scale on the surface of the hot-rolled material, the surface was lightly cut, cold-rolled and heat-treated repeatedly at least once, and then cold-rolled to a thickness of 0.25 mm and a width of 60 mm.
mm strips were made.

【0016】[0016]

【表1】 [Table 1]

【0017】[0017]

【表2】 [Table 2]

【0018】[0018]

【表3】 [Table 3]

【0019】得られた条について、下記要領で強度、導
電率、耐熱温度及びはんだ耐熱剥離性を測定するととも
に、プレス打ち抜きテスト、残留応力除去テスト及び曲
げ加工性テストを実施した。その結果を表4〜5に示
す。強度は、条からJIS5号試験片を加工して引張強
さを測定し、導電率は、JISH0505に規定されて
いる方法に基づきダブルブリッジを用いて測定した。耐
熱温度は、5分間加熱してHvの低下量が加熱前のHv
に対して10%の時の温度のことである。これを耐熱温
度1とした。はんだ耐熱剥離性は、6Sn/4Pbはん
だを245±5℃×5秒にてはんだ付けした後、150
℃のオーブンで1000Hrまで加熱した。この試験片
を180゜曲げ戻しにて加工を加え加工部のはんだが剥
離するか観察した。
The obtained strips were measured for strength, electrical conductivity, heat resistance temperature and solder heat resistance peeling properties in the following manner, and were also subjected to a press punching test, a residual stress removal test and a bending workability test. The results are shown in Tables 4 and 5. The strength was measured by processing a JIS No. 5 test piece from the strip and measuring the tensile strength, and the conductivity was measured using a double bridge based on the method specified in JIS H0505. Heat resistant temperature is 5 minutes after heating, Hv decrease amount before heating
10% of the temperature. This was designated as heat-resistant temperature 1. The soldering heat-peeling resistance was 150 seconds after soldering 6Sn / 4Pb solder at 245 ± 5 ° C. × 5 seconds.
Heated to 1000 hr in an oven at ℃. This test piece was processed by bending it back by 180 °, and it was observed whether the solder in the processed portion was peeled off.

【0020】プレス打ち抜きテストは、まず、図1のよ
うに、(a)リードの一方の側をエッチングにより加工
し(斜線部分1をエッチングで抜く・・・・このときは残留
応力はゼロ)、(b)他方の側をプレスにより加工して
(斜線部分2をプレス打ち抜きする・・・・このとき残留応
力が発生)、長さ20mm、幅0.3mm、間隔1mm
のリード2本(AとB、CとD)を先端がつながった状
態に加工し、(c)そのままの状態で先端部をプレスに
より切り落とした(矢印部分3をプレス打ち抜きす
る)。このとき、リードAとB、CとDは、発生した残
留応力に応じて先端の間隔が変化する。変化した量の絶
対値をプレス打ち抜きの剪断加工により生じた残留応力
の指標とした。
In the press punching test, first, as shown in FIG. 1, (a) one side of the lead is processed by etching (the hatched portion 1 is removed by etching... At this time, the residual stress is zero). (B) The other side is processed by a press (press-punching of the hatched portion 2 ... residual stress occurs at this time), length 20 mm, width 0.3 mm, interval 1 mm
(A), (B) and (C) and (D) were processed into a state where the ends were connected, and (c) the ends were cut off with a press as it was (press-punching the arrow 3). At this time, the intervals between the tips of the leads A and B, and C and D change according to the generated residual stress. The absolute value of the changed amount was used as an index of the residual stress generated by the shearing process of press punching.

【0021】残留応力除去テストは、プレス打ち抜きテ
ストの図1(b)の状態、つまり先端がつながったまま
の状態で300〜500℃×5分の焼鈍を行い、この
後、(c)のように先端部をプレスにより切り落とし
た。切り落とした際、リードは、焼鈍で除去できなかっ
た残留応力に応じて先端の間隔が変化する。この間隔を
焼鈍温度に対してプロットし先端間隔の変化量が30μ
m以下となる最低温度を求めた。これを耐熱温度2とし
た。なお、この耐熱温度2と前記耐熱温度1とを比較
し、その差を剪断加工により発生する残留応力の除去の
しやすさの指標にできる。つまり、耐熱温度1が耐熱温
度2より高いほど、残留応力の除去がやりやすい。曲げ
加工テストは、JIS−H3130の方法で板厚と同等
の曲げ半径を有するW型の曲げ治具を用いてW曲げ加工
した。加工後のW曲げ部を目視で観察し、クラックの有
無で加工性を評価した。
In the test for removing residual stress, annealing is performed at 300 to 500 ° C. for 5 minutes in the state shown in FIG. 1B of the press punching test, that is, with the tips connected, and thereafter, as shown in FIG. The tip was cut off by pressing. When the lead is cut off, the interval between the tips of the leads changes according to the residual stress that could not be removed by annealing. This interval is plotted against the annealing temperature, and the change in the tip interval is 30 μm.
m was obtained. This was designated as heat-resistant temperature 2. The heat resistant temperature 2 is compared with the heat resistant temperature 1, and the difference can be used as an index of the easiness of removing residual stress generated by shearing. That is, as the heat-resistant temperature 1 is higher than the heat-resistant temperature 2, the residual stress can be easily removed. In the bending test, W bending was performed using a W-shaped bending jig having a bending radius equivalent to the plate thickness according to the method of JIS-H3130. The W-bent portion after processing was visually observed, and workability was evaluated based on the presence or absence of cracks.

【0022】[0022]

【表4】 [Table 4]

【0023】[0023]

【表5】 [Table 5]

【0024】[0024]

【表6】 [Table 6]

【0025】表4より、本発明の規定範囲内に入るN
o.1〜10の合金は、強度、導電率、耐熱温度、曲げ
加工性など電気電子部品が要求する特性を具備した上
で、剪断加工性が優れ(残留応力が小さい)、また、耐
熱温度1が耐熱温度2より高く、残留応力の除去が行い
やすい。一方、表5〜6をみると、比較例No.11〜
25は材料調整ができていないか、いずれかの特性が劣
ることがわかる。
From Table 4, it can be seen that N falling within the specified range of the present invention.
o. The alloys 1 to 10 have properties required for electric and electronic components such as strength, electrical conductivity, heat resistance temperature, bending workability, etc., and are excellent in shear workability (small residual stress). It is higher than the heat resistance temperature 2, and the residual stress can be easily removed. On the other hand, Tables 5 and 6 show that Comparative Example Nos. 11-
It can be seen that No. 25 has no material adjustment or one of the characteristics is inferior.

【0026】[0026]

【発明の効果】本発明によれば、リードフレーム用銅合
金板として要求される強度、導電率、はんだ付け性、め
っき性、曲げ加工性などの特性を通常の銅合金以上に維
持しながら、打ち抜き時に発生する残留応力が小さく、
また、その打ち抜き加工で発生した残留応力が打ち抜き
途中の焼鈍により除去しやすく、さらに、その焼鈍時に
軟化しにくく耐熱性のよい銅合金を得ることができる。
従って、各種電気電子機器の微細化による寸法精度に対
する厳しい要求に対応が可能となる。
According to the present invention, a copper alloy for a lead frame is provided.
The residual stress generated at the time of punching is small, while maintaining the properties such as strength, conductivity, solderability, plating properties, bending workability etc. required as a metal plate more than ordinary copper alloys,
Further, the residual stress generated by the punching can be easily removed by annealing during the punching, and a copper alloy that is hard to be softened during the annealing and has good heat resistance can be obtained.
Therefore, it is possible to meet strict requirements for dimensional accuracy due to miniaturization of various electric and electronic devices.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 プレス打ち抜きテストの手順を説明する図で
ある。
FIG. 1 is a diagram illustrating a procedure of a press punching test.

【符号の説明】[Explanation of symbols]

1 エッチングで抜いた箇所 2、3 プレス打ち抜きした箇所 A〜D リード 1 Locations removed by etching 2, 3 Locations stamped out A to D Lead

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 プレス打ち抜き加工の途中で残留応力除
去焼鈍が行われるリードフレーム用銅合金板であり、
e:0.05〜3.0wt%、P:0.01〜0.4w
t%、Ni:0.001〜0.5wt%、Sn:0.0
05〜2.0wt%、Zn:0.005〜5.0wt
%、Si:0.01wt%未満、O:100ppm以
下、H:10ppm以下、残部が実質的にCuと不可避
不純物からなることを特徴とするプレス打ち抜き加工時
の熱処理性に優れるリードフレーム用高強度、高導電性
銅合金板
1. A method for removing residual stress during press punching.
A copper alloy sheet for a lead frame to be subjected to annealing,
e: 0.05 to 3.0 wt%, P: 0.01 to 0.4 w
t%, Ni: 0.001 to 0.5 wt%, Sn: 0.0
05 to 2.0 wt%, Zn: 0.005 to 5.0 wt%
%, Si: less than 0.01 wt%, O: 100 ppm or less, H: 10 ppm or less, the balance being substantially high strength lead frame excellent in the heat treatment at the time of stamping, characterized in that it consists Cu and inevitable impurities , High conductivity
Copper alloy plate .
【請求項2】 さらに、Mn、Zr、Cr、Al、In
のうち1種又は2種以上を合計で0.001〜0.1w
t%含有することを特徴とする請求項1に記載されたプ
レス打ち抜き加工時の熱処理性に優れるリードフレーム
高強度、高導電性銅合金板
2. Mn, Zr, Cr, Al, In
0.001 to 0.1 w in total of one or two or more
2. The lead frame according to claim 1, which is excellent in heat treatment during press punching.
For high strength, high conductivity copper alloy plate .
【請求項3】 Mg、Co、Ca、Ag、Cd、Be、
Ti、Au、Pt、Hf、Th、Li、Na、K、S
r、Pd、W、S、C、Nb、V、Y、Mo、Pb、G
a、Ge、As、Se、Sb、Bi、Te、B、Ce、
ミッシュメタルの合計が0.005wt%以下であるこ
とを特徴とする請求項1又は2に記載されたプレス打ち
抜き加工時の熱処理性に優れるリードフレーム用高強
度、高導電性銅合金板
3. Mg, Co, Ca, Ag, Cd, Be,
Ti, Au, Pt, Hf, Th, Li, Na, K, S
r, Pd, W, S, C, Nb, V, Y, Mo, Pb, G
a, Ge, As, Se, Sb, Bi, Te, B, Ce,
The high-strength, high-conductivity copper alloy sheet for a lead frame according to claim 1 or 2, wherein the total amount of the misch metal is 0.005 wt% or less.
JP15088798A 1998-06-01 1998-06-01 High-strength, high-conductivity copper alloy sheet for leadframes with excellent heat treatment during press punching Expired - Lifetime JP3344700B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15088798A JP3344700B2 (en) 1998-06-01 1998-06-01 High-strength, high-conductivity copper alloy sheet for leadframes with excellent heat treatment during press punching

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15088798A JP3344700B2 (en) 1998-06-01 1998-06-01 High-strength, high-conductivity copper alloy sheet for leadframes with excellent heat treatment during press punching

Publications (2)

Publication Number Publication Date
JPH11343527A JPH11343527A (en) 1999-12-14
JP3344700B2 true JP3344700B2 (en) 2002-11-11

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JP3465108B2 (en) * 2000-05-25 2003-11-10 株式会社神戸製鋼所 Copper alloy for electric and electronic parts
JP4041803B2 (en) * 2004-01-23 2008-02-06 株式会社神戸製鋼所 High strength and high conductivity copper alloy
JP4950584B2 (en) 2006-07-28 2012-06-13 株式会社神戸製鋼所 Copper alloy with high strength and heat resistance
KR101227315B1 (en) * 2007-08-07 2013-01-28 가부시키가이샤 고베 세이코쇼 Copper alloy sheet
JP2010285671A (en) * 2009-06-15 2010-12-24 Hitachi Cable Ltd High-strength and high-electrical conductivity copper alloy and method of producing the same
CN102251144B (en) * 2011-07-20 2013-01-02 龙工(上海)桥箱有限公司 High-strength high-wear-resistance valve plate and preparation method thereof
JP6081513B2 (en) * 2015-03-30 2017-02-15 株式会社神戸製鋼所 Copper alloy plate for heat dissipation parts
JP6283046B2 (en) * 2016-03-17 2018-02-21 株式会社神戸製鋼所 Copper alloy plate for heat dissipation parts
CN113774250B (en) * 2021-09-24 2024-05-10 佛山市顺德区精艺万希铜业有限公司 High-strength high-heat-conductivity high-corrosion-resistance copper alloy and preparation method thereof

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