JP2001207229A - Copper alloy for electronic material - Google Patents

Copper alloy for electronic material

Info

Publication number
JP2001207229A
JP2001207229A JP2000018319A JP2000018319A JP2001207229A JP 2001207229 A JP2001207229 A JP 2001207229A JP 2000018319 A JP2000018319 A JP 2000018319A JP 2000018319 A JP2000018319 A JP 2000018319A JP 2001207229 A JP2001207229 A JP 2001207229A
Authority
JP
Japan
Prior art keywords
conductivity
strength
copper alloy
bendability
weight ratio
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000018319A
Other languages
Japanese (ja)
Inventor
Tetsuo Maki
哲生 牧
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Mining Holdings Inc
Eneos Corp
Original Assignee
Nippon Mining and Metals Co Ltd
Nippon Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Mining and Metals Co Ltd, Nippon Mining Co Ltd filed Critical Nippon Mining and Metals Co Ltd
Priority to JP2000018319A priority Critical patent/JP2001207229A/en
Priority to KR1020000065758A priority patent/KR20010077917A/en
Priority to TW090100100A priority patent/TW500813B/en
Priority to CNB01103064XA priority patent/CN1191590C/en
Publication of JP2001207229A publication Critical patent/JP2001207229A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • C22C9/06Alloys based on copper with nickel or cobalt as the next major constituent
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/08Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of copper or alloys based thereon
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/02Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
    • H01B1/026Alloys based on copper

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Conductive Materials (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a copper alloy having good bendability as well as high strength and electric conductivity. SOLUTION: This alloy has a composition containing, by mass, 1.5 to 3.5% Ni and 0.35 to 1.0% Si, furthermore containing 0.005 to 0.1% Fe and/or one or more kinds of Zr, Cr, Ti and Mo of 0.005 to 0.2% in total, in which, by a weight ratio, Ni/Si is also controlled to 3 to 7, and the balance Cu with inevitable impurities.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は,強度,導電性,さ
らには良好な曲げ加工性および打ち抜き加工性を有する
電子材料用銅合金に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a copper alloy for electronic materials having strength, conductivity, and good bendability and punchability.

【0002】[0002]

【従来の技術】リードフレーム,端子,コネクター等に
使用される電子材料用銅合金には,製品の基本特性とし
て高い強度及び高い電気伝導性又は熱伝導性を両立させ
ることが要求される。さらに近年の電子部品の小型化,
高集積化が一層要求されることから素材の薄板化が必要
とされ,リードフレーム,端子,コネクターにおいて
は,リード数等の増加,狭ピッチ化が進んでいる。さら
には部品形状の複雑化及び組立て・実装における信頼性
向上の要求から,使用される材料には機械的強度と電気
伝導性が優れている他に,良好な曲げ加工性が求められ
ている。
2. Description of the Related Art Copper alloys for electronic materials used in lead frames, terminals, connectors and the like are required to have both high strength and high electrical or thermal conductivity as basic characteristics of products. In addition, recent miniaturization of electronic components,
As higher integration is required, the thickness of the material is required to be reduced, and lead frames, terminals, and connectors are increasing in the number of leads and the pitch is becoming narrower. In addition, due to the complexity of component shapes and the demand for improved reliability in assembly and mounting, the materials used are required to have excellent mechanical strength and electrical conductivity, as well as good bending workability.

【0003】近年電子材料用銅合金としては従来のりん
青銅,黄銅等に代表される固溶強化型銅合金に代わり,
高強度及び高導電性の観点から,時効硬化型の銅合金の
使用量が増加している。時効硬化型銅合金は溶体化処理
された過飽和固溶体を時効処理することにより,微細な
析出物が均一に分散して,合金の強度が高くなると同時
に,銅中の固溶元素量が減少し電気伝導性が向上する。
従って強度,ばね性などの機械的性質に優れ,しかも電
気伝導性,熱伝導性が良好な材料として使用される。時
効硬化型銅合金のうち,Cu−Ni−Si系銅合金は高強度と
高導電率とを併せ持つ代表的な銅合金であり,電子機器
用材料として実用化されている。
In recent years, copper alloys for electronic materials have been replaced by solid solution strengthened copper alloys represented by conventional phosphor bronze and brass.
From the viewpoint of high strength and high conductivity, the amount of age hardening type copper alloy is increasing. Age-hardened copper alloys are subjected to aging of a solution-treated supersaturated solid solution, whereby fine precipitates are uniformly dispersed and the strength of the alloy is increased. Conductivity is improved.
Therefore, it is used as a material having excellent mechanical properties such as strength and spring property, as well as good electrical and thermal conductivity. Among the age hardening type copper alloys, Cu-Ni-Si based copper alloy is a typical copper alloy having both high strength and high electrical conductivity, and has been put to practical use as a material for electronic devices.

【0004】[0004]

【発明が解決しようとする課題】Cu−Ni−Si系合金は,
銅マトリックス中に微細なNi−Si系金属間化合物粒子が
析出することにより強度と導電率が上昇する。しかしな
がら,添加するNiおよびSiの割合が低濃度の組成では十
分な電気伝導性は得られるものの強度が不足し,一方高
濃度組成では十分な強度は得られるが導電率の低下と更
には曲げ加工などの成形性の低下が起こり易くなるとい
った不具合があった。強度と加工性を確保するために,
Sn等の他元素が添加される場合があるが,導電率が大き
く低下する。
SUMMARY OF THE INVENTION Cu-Ni-Si alloys are:
Precipitation of fine Ni-Si intermetallic compound particles in the copper matrix increases strength and electrical conductivity. However, a composition with a low concentration of Ni and Si added provides sufficient electrical conductivity but lacks strength, while a composition with a high concentration provides sufficient strength, but has a reduced conductivity and further bending. However, there was a problem that the moldability was easily lowered. To ensure strength and workability,
Although other elements such as Sn may be added, the conductivity is greatly reduced.

【0005】一般に合金の曲げ加工性は結晶粒度と関連
があると言われており,結晶粒度が小さいほど曲げ性が
良いとされている。しかし結晶粒度を小さく調整する場
合,製造条件を制御しても未再結晶部分が混合した混粒
組織となりやすく,その結果,曲げ性が低下すると言っ
た問題が生じる。本発明は上述した問題解決のためにな
されたもので,十分な強度及び電気伝導度を有するCu−
Ni−Si系合金において,曲げ加工性にも優れた電子材料
用銅合金を提供することを目的としている。
It is generally said that the bendability of an alloy is related to the grain size, and it is said that the smaller the grain size, the better the bendability. However, when the crystal grain size is adjusted to be small, a mixed grain structure in which unrecrystallized portions are mixed easily even when manufacturing conditions are controlled, resulting in a problem that bendability is reduced. SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems, and has been developed in order to solve the above problems.
An object of the present invention is to provide a copper alloy for electronic materials that is excellent in bending workability in Ni-Si alloys.

【0006】[0006]

【課題を解決するための手段】上記問題を解決するため
に本発明者は, Cu−Ni−Si系合金に関する研究を重ね
たところ,Cu−Ni−Si系合金にFeおよび/またはZr,C
r,Ti,Moのいずれか一種以上を添加し成分調整を行っ
た上で,必要に応じMg,Zn,Sn,Al,P,Mn,AgまたはB
eを含有させることにより電子材料用銅合金として好適
な素材を提供できることを見出した。
Means for Solving the Problems In order to solve the above problems, the present inventor repeatedly conducted research on Cu-Ni-Si based alloys, and found that Cu-Ni-Si based alloys contained Fe and / or Zr, C
After adjusting the composition by adding at least one of r, Ti, and Mo, Mg, Zn, Sn, Al, P, Mn, Ag or B
It has been found that a material suitable as a copper alloy for electronic materials can be provided by including e.

【0007】即ち本発明は,上記知見を基にして完成さ
れたもので,(1)1.5〜3.5%のNi,0.35〜1.0%のSi,
0.005〜0.1%のFeを含有し,且つ重量比でNi/Si=3〜7
になるように調整し,残部がCu及び不可避的不純物から
なることを特徴とする強度,導電性および曲げ加工性の
優れた電子材料用銅合金。 (2)1.5〜3.5%のNi,0.35〜1.0%のSiを含有し更にZr,C
r,Ti,Moのいずれか1種以上を総量で0.005〜0.2%含有
し,且つ重量比でNi/Si=3〜7になるように調整し,残
部がCu及び不可避的不純物からなることを特徴とする強
度,導電性および曲げ加工性の優れた電子材料用銅合
金。
That is, the present invention has been completed on the basis of the above findings. (1) 1.5-3.5% Ni, 0.35-1.0% Si,
Contains 0.005-0.1% Fe, and Ni / Si = 3-7 by weight
A copper alloy for electronic materials with excellent strength, conductivity and bendability, with the balance being adjusted to become Cu and inevitable impurities. (2) 1.5-3.5% Ni, 0.35-1.0% Si, Zr, C
Adjust so that the total content of at least one of r, Ti, and Mo is 0.005 to 0.2%, and the weight ratio is Ni / Si = 3 to 7, and the balance consists of Cu and unavoidable impurities. A copper alloy for electronic materials with excellent strength, conductivity and bending properties.

【0008】(3)1.5〜3.5%のNi,0.35〜1.0%のSi,
0.005〜0.1%のFeを含有し更にZr,Cr,Ti,Moのいずれ
か1種以上を総量で0.005〜0.2%含有し, 且つ重量比でN
i/Si=3〜7になるように調整し,残部がCu及び不可避
的不純物からなることを特徴とする強度,導電性および
曲げ加工性の優れた電子材料用銅合金。 (4)1.5〜3.5%のNi,0.35〜1.0%のSi,0.005〜0.1%の
Feを含有し,更に必要に応じMg,Zn,Sn,Al,P,Mn,A
gまたはBeのうち1種以上を総量で0.005〜2.0%含有し,
且つ重量比でNi/Si=3〜7になるように調整し,残部が
Cu及び不可避的不純物からなることを特徴とする強度,
導電性および曲げ加工性の優れた電子材料用銅合金。
(3) 1.5-3.5% Ni, 0.35-1.0% Si,
0.005 to 0.1% Fe and at least one of Zr, Cr, Ti and Mo in a total amount of 0.005 to 0.2%, and N in weight ratio
A copper alloy for electronic materials with excellent strength, conductivity and bendability, characterized in that i / Si is adjusted to 3 to 7 and the balance consists of Cu and unavoidable impurities. (4) 1.5-3.5% Ni, 0.35-1.0% Si, 0.005-0.1%
Fe, Mg, Zn, Sn, Al, P, Mn, A
containing at least one of g or Be in a total amount of 0.005 to 2.0%,
And adjust so that Ni / Si = 3 ~ 7 by weight ratio, and the rest is
Strength consisting of Cu and unavoidable impurities,
Copper alloy for electronic materials with excellent conductivity and bending workability.

【0009】(5)1.5〜3.5%のNi,0.35〜1.0%のSiを
含有し更にZr,Cr,Ti,Moのいずれか1種以上を総量で
0.005〜0.2%含有し,更に必要に応じMg,Zn,Sn,Al,
P,Mn,AgまたはBeのうち1種以上を総量で0.005〜2.0%
含有し,且つ重量比でNi/Si=3〜7になるように調整
し,残部がCu及び不可避的不純物からなることを特徴と
する強度,導電性および曲げ加工性の優れた電子材料用
銅合金。 (6)1.5〜3.5%のNi,0.35〜1.0%のSi,0.005〜0.1%の
Feを含有し更にZr,Cr,Ti,Moのいずれか1種以上を総
量で0.005〜0.2%含有し,更に必要に応じMg,Zn,Sn,A
l,P,Mn,AgまたはBeのうち1種以上を総量で0.005〜
2.0%含有し,且つ重量比でNi/Si=3〜7になるように調
整し,残部がCu及び不可避的不純物からなることを特徴
とする強度,導電性および曲げ加工性の優れた電子材料
用銅合金を提供するものである。
(5) 1.5 to 3.5% Ni, 0.35 to 1.0% Si, and at least one of Zr, Cr, Ti and Mo in total
0.005 to 0.2%, and Mg, Zn, Sn, Al,
0.005 to 2.0% in total of at least one of P, Mn, Ag or Be
Copper for electronic materials with excellent strength, conductivity and bendability characterized by containing and adjusting the weight ratio of Ni / Si to 3-7, with the balance being Cu and unavoidable impurities alloy. (6) 1.5-3.5% Ni, 0.35-1.0% Si, 0.005-0.1%
Fe is contained, and at least one of Zr, Cr, Ti, and Mo is contained in a total amount of 0.005 to 0.2%, and Mg, Zn, Sn, A
at least one of l, P, Mn, Ag or Be in a total amount of 0.005 to
Electronic material with excellent strength, conductivity and bendability, characterized by containing 2.0% and adjusting the weight ratio of Ni / Si to 3-7, with the balance being Cu and unavoidable impurities The present invention provides a copper alloy for use.

【0010】[0010]

【発明の実施の形態】次に本発明において銅合金の組成
範囲を前記の如くに限定した理由をその作用とともに説
明する。 (1)NiおよびSi Ni及びSiは,時効処理を行うことによりNiとSiが相互に
微細にNi2Siを主とした金属間化合物の析出粒子を形成
し,合金の強度を著しく増加させる一方,電気伝導度も
高く維持する。ただしNi含有量が1.5%未満又はSi含有量
が0.35%未満の場合は,他方の成分を添加しても所望と
する強度が得られず,またNi含有量が3.5%を超え又はSi
含有量が1.0%を超える場合は,十分な強度が得られる
ものの所望とする電気伝導性が低くなってしまい,さら
には強度の向上に寄与しない粗大なNi−Si系粒子(晶出
物及び析出物)が母相中に生成し,曲げ加工性,エッチ
ング性及びめっき性の低下を招く。よって,Niの含有量
を1.5〜3.5%,Siの含有量を0.35〜1.0%と定めた。
Next, the reason why the composition range of the copper alloy in the present invention is limited as described above will be described together with its operation. (1) Ni and Si Ni and Si are subjected to aging treatment to form fine particles of intermetallic compounds, mainly Ni 2 Si, mutually finely, thereby significantly increasing the strength of the alloy. , Maintain high electrical conductivity. However, if the Ni content is less than 1.5% or the Si content is less than 0.35%, the desired strength cannot be obtained even if the other component is added.
If the content exceeds 1.0%, sufficient strength is obtained, but the desired electrical conductivity is reduced, and coarse Ni-Si-based particles (crystallized material) that do not contribute to the improvement of the strength are obtained. And precipitates) are formed in the matrix, which causes deterioration in bending workability, etching property and plating property. Therefore, the content of Ni is set to 1.5 to 3.5%, and the content of Si is set to 0.35 to 1.0%.

【0011】Si量とNi量の重量比(Ni/Siと記す)を3
〜7と規定する理由は,合金中のNiとSiの重量比を,金
属間化合物であるNi2SiのNiとSiの濃度比に近づけるこ
とにより時効処理後の電気伝導性をより高めることがで
きるためである。Ni/Siが3未満ではNi2Si組成に対しSi
濃度が過剰となるため電気伝導度が低下するのに加え,
マトリックス中の固溶Si量が増加することにより熱処理
時に材料表面にSi酸化皮膜が生成し易くなり半田付け性
およびめっき性が劣化の原因となる。
The weight ratio of the amount of Si to the amount of Ni (referred to as Ni / Si) is 3
The reason for defining as ~ 7 is that by increasing the weight ratio of Ni and Si in the alloy to the concentration ratio of Ni and Si in the intermetallic compound Ni 2 Si, the electrical conductivity after aging treatment can be further increased. This is because it can be done. If Ni / Si is less than 3, the ratio of Si to Ni 2 Si
In addition to the decrease in electrical conductivity due to excessive concentration,
When the amount of solid solution Si in the matrix increases, an Si oxide film easily forms on the surface of the material during heat treatment, which causes deterioration in solderability and plating property.

【0012】Ni2Si組成に対する重量比はNi/Si=4であ
るが,前記理由から固溶Si量をできるだけ低減させるた
め, Ni2Si組成に対しNi量は若干過剰気味のほうがよ
い。しかしNi/Siが7を超えるとNi2Si組成に対し過剰Ni
量が多くなるため所望とする電気伝導度が得られない。
従って良好な電気伝導性を得るためのSiとNiの重量比は
Ni/Si=3〜7であり,4.5が最も好ましい。
Although the weight ratio to the Ni 2 Si composition is Ni / Si = 4, the Ni content should be slightly excessive with respect to the Ni 2 Si composition in order to reduce the amount of solid solution Si as much as possible. But Ni / Si is more than 7 when the Ni 2 Si excess relative composition Ni
The desired amount of electrical conductivity cannot be obtained due to the large amount.
Therefore, the weight ratio of Si and Ni for obtaining good electrical conductivity is
Ni / Si = 3-7, with 4.5 being most preferred.

【0013】(2)Fe Feは融点が高いため鋳造時の凝固および凝固後の冷却段
階で微細に晶出・析出し,本発明合金の主要成分である
Ni,Siの化合物が晶出・析出する際に微細なFe粒子が核
となり,Ni−Si粒子の粗大化を抑制する効果がある。ま
た冷間圧延後に行われる再結晶を伴う焼鈍過程におい
て,マトリックス中に分布しているFe粒子がピン止め効
果により粒界移動を阻止し,再結晶粒の粗大化を抑制す
る効果があるため,微細で均一な再結晶組織を得ること
ができる。
(2) Fe Since Fe has a high melting point, it is finely crystallized and precipitated in the solidification during casting and in the cooling stage after solidification, and is a main component of the alloy of the present invention.
When Fe and Ni compounds are crystallized and precipitated, fine Fe particles serve as nuclei, and have the effect of suppressing the coarsening of Ni-Si particles. In addition, in the annealing process with recrystallization after cold rolling, Fe particles distributed in the matrix have the effect of preventing grain boundary movement by the pinning effect and suppressing the coarsening of recrystallized grains. A fine and uniform recrystallized structure can be obtained.

【0014】従って結晶粒度を微細にすることにより合
金の曲げ性を改善することができる。さらにFeは合金の
強度および耐熱性を向上させる効果もある。しかしFe含
有量が0.005%未満ではいずれの効果も得られず,0.1%を
超えると導電性が低下しさらにマトリックス中のFe粒子
が粗大化し,曲げ性およびめっき性が低下するためFeの
含有量を0.005〜0.1%と定めた。
Therefore, the bendability of the alloy can be improved by reducing the crystal grain size. Further, Fe has the effect of improving the strength and heat resistance of the alloy. However, if the Fe content is less than 0.005%, none of the effects can be obtained, and if it exceeds 0.1%, the conductivity is reduced, the Fe particles in the matrix are coarsened, and the bendability and the plating property are reduced. Was determined to be 0.005 to 0.1%.

【0015】(3) Zr,Cr,Ti,Mo Zr,Cr,Ti,Moはいずれも高融点元素であるため,Feと
同様にNi−Si粒子粗大化の抑制効果および再結晶を伴う
焼鈍において微細な結晶組織が得られるために曲げ性改
善の効果がある。Zr,Cr,Ti,Moは複合して添加するこ
ともできるが,その含有量が総量で0.005%未満では前記
作用に所望の効果が得られず,0.2%を超えると加工性が
低下するとともに導電性が低下する。よってZr,Cr,T
i,Mo添加量は総量で0.005〜0.2%と定めた。
(3) Zr, Cr, Ti, Mo Since Zr, Cr, Ti, and Mo are all high-melting elements, they have the same effect as Fe in suppressing the coarsening of Ni-Si particles and in annealing involving recrystallization. Since a fine crystal structure is obtained, there is an effect of improving bendability. Zr, Cr, Ti, and Mo can be added in combination. However, if the total content is less than 0.005%, the desired effect cannot be obtained. If it exceeds 0.2%, workability is reduced. The conductivity decreases. Therefore, Zr, Cr, T
The total amount of i and Mo added was determined to be 0.005 to 0.2%.

【0016】(4)Mg,Zn,Sn,Al,P,Mn,AgまたはB
e Mg,Zn,Sn,Al,P,Mn,AgまたはBeには,Cu−Ni−Si
系銅合金の強度及び耐熱性を改善する作用がある。ま
た,これらの中でZnには,半田接合部の耐熱性を改善
する効果もあり, さらにMg,Al及びMnは熱間圧延性を
改善する効果も有する。この理由は,これらの元素が硫
黄との親和性が強いため硫黄と化合物を形成し,熱間圧
延割れの原因となるインゴット粒界への硫黄の偏析を軽
減するためである。
(4) Mg, Zn, Sn, Al, P, Mn, Ag or B
e Cu-Ni-Si is used for Mg, Zn, Sn, Al, P, Mn, Ag or Be.
It has the effect of improving the strength and heat resistance of the system copper alloy. Of these, Zn has the effect of improving the heat resistance of the solder joint, and Mg, Al and Mn also have the effect of improving the hot rolling property. The reason for this is that these elements have a strong affinity for sulfur and form a compound with sulfur, thereby reducing the segregation of sulfur at the ingot grain boundary, which causes hot rolling cracking.

【0017】Mg,Zn,Sn,Al,P,Mn,AgまたはBeの含
有量が総量で0.005%未満であると上記の効果は得られ
ず,一方総含有量が2.0%を超えると電気伝導性が著しく
低下する。そこで,これらの含有量を総量で0.005〜2.0
%と定める。上述のように,本発明に係る銅合金は,優
れた強度,電気特性を示し,更に曲げ加工性にも優れる
ものである。
If the total content of Mg, Zn, Sn, Al, P, Mn, Ag or Be is less than 0.005%, the above effects cannot be obtained. On the other hand, if the total content exceeds 2.0%, the electric conductivity will not increase. Properties are significantly reduced. Therefore, their content is 0.005 to 2.0 in total.
%. As described above, the copper alloy according to the present invention exhibits excellent strength and electrical characteristics and also has excellent bending workability.

【0018】[0018]

【実施例】以下に本発明を実施例に基ずき説明する。高
周波溶解炉にて表1に示す各種成分組成の銅合金を溶製
し,厚さ20mmのインゴットに鋳造した。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below based on embodiments. Copper alloys having various component compositions shown in Table 1 were melted in a high-frequency melting furnace and cast into ingots having a thickness of 20 mm.

【0019】[0019]

【表1】 [Table 1]

【0020】次に,このインゴットを厚さ8mmまで熱間
圧延を行い,表面のスケール除去のため面削を施した
後,冷間圧延により厚さ1mmの板とした。その後,750〜
850℃の温度で溶体化処理を行った後,0.4mmまで冷間圧
延した。そして400〜600℃の範囲において,各組成で最
高の強度が得られる温度で各5時間の時効処理を行い,
その後,さらに高強度が得られるよう,冷間圧延で厚さ
0.25mmの板とし,最後に温度400〜500℃で30秒〜1時間
の熱処理を適宜施した。
Next, the ingot was hot-rolled to a thickness of 8 mm, surface-polished to remove surface scale, and then cold-rolled into a 1 mm-thick plate. After that, 750 ~
After solution treatment at a temperature of 850 ° C, it was cold-rolled to 0.4 mm. Then, in the range of 400 to 600 ° C, perform aging treatment for 5 hours each at the temperature at which the maximum strength is obtained for each composition.
Then, cold-rolled thickness to obtain higher strength
The plate was made 0.25 mm and finally heat-treated at a temperature of 400 to 500 ° C for 30 seconds to 1 hour.

【0021】このようにして得られた各合金につき諸特
性の評価を行った。強度については引張試験機において
引張強さを測定した。電気伝導性は導電率(%IAC
S)により評価した。結晶粒度は最終の熱処理後の材料
についてJISH0501の切断法で板面に垂直な軸に沿って測
定した。曲げ性はW曲げ試験により,幅10mmの短冊試験
片を用い板厚と同じ曲げ半径で負荷荷重5トンとし,圧
延平行方向の曲げ試験(曲げ軸が圧延方向に直角)を実
施した。試験後の曲げ部表面を光学顕微鏡(倍率50倍以
上)およびSEMで観察し,良好なもの(クラックおよび
大きな肌荒れのないもの)を○,肌荒れの大きなものを
△,肌荒れが大きくクラックの発生しているものを×と
して表1中に示した。
Various properties were evaluated for each of the alloys thus obtained. Regarding the strength, the tensile strength was measured by a tensile tester. Electrical conductivity is conductivity (% IAC
S) was evaluated. The grain size of the material after the final heat treatment was measured by a cutting method according to JISH0501 along an axis perpendicular to the plate surface. The bending property was measured by a W bending test using a 10 mm wide strip specimen with a bending radius of the same thickness as the plate thickness and a load of 5 tons, and a bending test in the direction parallel to the rolling direction (the bending axis was perpendicular to the rolling direction). The surface of the bent part after the test was observed with an optical microscope (magnification of 50 times or more) and SEM. Are shown in Table 1 as x.

【0022】表1からわかるように,本発明合金は優れ
た,強度,導電性を有し,いずれも結晶粒度が微細であ
り良好な曲げ性を有している。一方,比較合金は,本発
明合金と一部組成が異なるものであるが,本発明合金と
比較すると,No.1はNi,Siとも低いため強度が劣る。N
o.2はNiが高いため導電率が劣る。 No.3はSiが高いた
め導電率および曲げ加工性が劣る。No.4,6はそれぞ
れFe,Moが低いため結晶組織が未再結晶粒と再結晶粒が
混合した混粒組織となり,また粗大なNi−Si粒子が生成
し曲げ性が低下した。No.5,7はそれぞれFe,Crが高
いためマトリックス中に粗大なFeあるいはCr粒子が生成
し曲げ性が低下した。No.8はZrとTiの合計が本発明の
範囲を超えておりZr,Tiの粒子の生成により曲げ性が低
下した。No.9は範囲を超えて副成分を含有しているた
め導電率が劣る。さらにNo.10,11は本発明合金と成分
量は同一であるが,Ni/Si比が異なり,No.10はNi/Si
比が低いため導電性が劣る。No.11はNi/Si比が大きい
ため導電率が劣る。
As can be seen from Table 1, the alloys of the present invention have excellent strength and conductivity, and all have a fine grain size and good bendability. On the other hand, the comparative alloy has a partly different composition from the alloy of the present invention. N
In the case of o.2, the conductivity is inferior because of high Ni. No. 3 is inferior in conductivity and bending workability due to high Si. In Nos. 4 and 6, Fe and Mo were low, respectively, so that the crystal structure was a mixed grain structure in which unrecrystallized grains and recrystallized grains were mixed, and coarse Ni-Si particles were formed, and the bendability was reduced. In Nos. 5 and 7, since Fe and Cr were high, coarse Fe or Cr particles were formed in the matrix, and the bendability was lowered. In No. 8, the total of Zr and Ti exceeded the range of the present invention, and the bendability was reduced due to the generation of Zr and Ti particles. No. 9 is inferior in conductivity because it contains subcomponents beyond the range. Nos. 10 and 11 have the same composition as the alloy of the present invention, but differ in the Ni / Si ratio.
Since the ratio is low, the conductivity is poor. No. 11 is inferior in conductivity because of a large Ni / Si ratio.

【0023】[0023]

【発明の効果】以上説明したように本発明合金は,優れ
た強度と電気伝導性を有し,さらには曲げ性も良好であ
り,リードフレーム,端子,コネクター等電子材料用銅
合金として好適である。
As described above, the alloy of the present invention has excellent strength and electric conductivity, and also has good bendability, and is suitable as a copper alloy for electronic materials such as lead frames, terminals and connectors. is there.

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】1.5〜3.5質量百分率(以下%とする)のN
i,0.35〜1.0%のSi,0.005〜0.1%のFeを含有し,且つ重
量比でNi/Si=3〜7になるように調整し,残部がCu及び
不可避的不純物からなることを特徴とする強度,導電性
および曲げ加工性の優れた電子材料用銅合金。
(1) 1.5-3.5 mass% (hereinafter referred to as%) of N
i, contains 0.35 to 1.0% Si, 0.005 to 0.1% Fe, and is adjusted to have a weight ratio of Ni / Si = 3 to 7, with the balance being Cu and unavoidable impurities. Copper alloy for electronic materials with excellent strength, conductivity and bendability.
【請求項2】1.5〜3.5%のNi,0.35〜1.0%のSiを含有し
更にZr,Cr,Ti,Moのいずれか1種以上を総量で0.005〜
0.2%含有し,且つ重量比でNi/Si=3〜7になるように調
整し,残部がCu及び不可避的不純物からなることを特徴
とする強度,導電性および曲げ加工性の優れた電子材料
用銅合金。
2. The composition contains 1.5 to 3.5% of Ni and 0.35 to 1.0% of Si, and further contains at least one of Zr, Cr, Ti and Mo in a total amount of 0.005 to 0.005%.
An electronic material with excellent strength, conductivity and bendability characterized by containing 0.2% and adjusting the weight ratio of Ni / Si to 3-7, with the balance being Cu and unavoidable impurities For copper alloy.
【請求項3】1.5〜3.5%のNi,0.35〜1.0%のSi,0.005〜
0.1%のFeを含有し更にZr,Cr,Ti,Moのいずれか1種以
上を総量で0.005〜0.2%含有し, 且つ重量比でNi/Si=
3〜7になるように調整し,残部がCu及び不可避的不純物
からなることを特徴とする強度,導電性および曲げ加工
性の優れた電子材料用銅合金。
(3) 1.5 to 3.5% Ni, 0.35 to 1.0% Si, 0.005 to
It contains 0.1% Fe, and further contains at least one of Zr, Cr, Ti, and Mo in a total amount of 0.005 to 0.2%.
A copper alloy for electronic materials with excellent strength, conductivity and bendability, adjusted to 3 to 7, with the balance being Cu and unavoidable impurities.
【請求項4】1.5〜3.5%のNi,0.35〜1.0%のSi,0.005〜
0.1%のFeを含有し,更に必要に応じMg,Zn,Sn,Al,
P,Mn,AgまたはBeのうち1種以上を総量で0.005〜2.0%
含有し,且つ重量比でNi/Si=3〜7になるように調整
し,残部がCu及び不可避的不純物からなることを特徴と
する強度,導電性および曲げ加工性の優れた電子材料用
銅合金。
(4) 1.5-3.5% Ni, 0.35-1.0% Si, 0.005-
Contains 0.1% Fe and, if necessary, Mg, Zn, Sn, Al,
0.005 to 2.0% in total of at least one of P, Mn, Ag or Be
Copper for electronic materials with excellent strength, conductivity and bendability characterized by containing and adjusting the weight ratio of Ni / Si to 3-7, with the balance being Cu and unavoidable impurities alloy.
【請求項5】1.5〜3.5%のNi,0.35〜1.0%のSiを含有し更
にZr,Cr,Ti,Moのいずれか1種以上を総量で0.005〜0.
2%含有し,更に必要に応じMg,Zn,Sn,Al,P,Mn,Ag
またはBeのうち1種以上を総量で0.005〜2.0%含有し,
且つ重量比でNi/Si=3〜7になるように調整し,残部が
Cu及び不可避的不純物からなることを特徴とする強度,
導電性および曲げ加工性の優れた電子材料用銅合金。
5. A composition containing 1.5 to 3.5% of Ni and 0.35 to 1.0% of Si and further containing at least one of Zr, Cr, Ti and Mo in a total amount of 0.005 to 0.5%.
2%, Mg, Zn, Sn, Al, P, Mn, Ag
Or containing at least one of Be in a content of 0.005 to 2.0%,
And adjust so that Ni / Si = 3 ~ 7 by weight ratio, and the rest is
Strength consisting of Cu and unavoidable impurities,
Copper alloy for electronic materials with excellent conductivity and bending workability.
【請求項6】1.5〜3.5%のNi,0.35〜1.0%のSi,0.005〜
0.1%のFeを含有し更にZr,Cr,Ti,Moのいずれか1種以
上を総量で0.005〜0.2%含有し,更に必要に応じMg,Z
n,Sn,Al,P,Mn,AgまたはBeのうち1種以上を総量で
0.005〜2.0%含有し,且つ重量比でNi/Si=3〜7になる
ように調整し,残部がCu及び不可避的不純物からなるこ
とを特徴とする強度,導電性および曲げ加工性の優れた
電子材料用銅合金。
(6) 1.5-3.5% Ni, 0.35-1.0% Si, 0.005-
It contains 0.1% Fe and contains at least one of Zr, Cr, Ti and Mo in a total amount of 0.005 to 0.2%.
at least one of n, Sn, Al, P, Mn, Ag or Be in total
Excellent in strength, conductivity and bending workability characterized by containing 0.005 to 2.0% and adjusting the weight ratio of Ni / Si to 3 to 7 with the balance being Cu and unavoidable impurities Copper alloy for electronic materials.
JP2000018319A 2000-01-27 2000-01-27 Copper alloy for electronic material Pending JP2001207229A (en)

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TW090100100A TW500813B (en) 2000-01-27 2001-01-03 Copper alloy for electronic material
CNB01103064XA CN1191590C (en) 2000-01-27 2001-01-22 Copper alloy for electronic material

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