KR100528330B1 - 무기 분말의 코팅방법 및 이에 의하여 제조된 코팅된무기입자 - Google Patents
무기 분말의 코팅방법 및 이에 의하여 제조된 코팅된무기입자 Download PDFInfo
- Publication number
- KR100528330B1 KR100528330B1 KR10-2003-0010415A KR20030010415A KR100528330B1 KR 100528330 B1 KR100528330 B1 KR 100528330B1 KR 20030010415 A KR20030010415 A KR 20030010415A KR 100528330 B1 KR100528330 B1 KR 100528330B1
- Authority
- KR
- South Korea
- Prior art keywords
- powder
- inorganic powder
- coated
- coating
- alcohol
- Prior art date
Links
- 239000000843 powder Substances 0.000 title claims abstract description 301
- 238000000576 coating method Methods 0.000 title claims abstract description 79
- 239000011248 coating agent Substances 0.000 title claims abstract description 61
- 238000000034 method Methods 0.000 title claims abstract description 40
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims abstract description 58
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 43
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 43
- 229910052751 metal Inorganic materials 0.000 claims abstract description 36
- 239000002184 metal Substances 0.000 claims abstract description 36
- 239000002245 particle Substances 0.000 claims abstract description 29
- -1 amine compound Chemical class 0.000 claims abstract description 26
- 238000010438 heat treatment Methods 0.000 claims abstract description 22
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 22
- 150000003839 salts Chemical class 0.000 claims abstract description 20
- 229910000000 metal hydroxide Inorganic materials 0.000 claims abstract description 15
- 150000004692 metal hydroxides Chemical class 0.000 claims abstract description 15
- 238000003756 stirring Methods 0.000 claims abstract description 11
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 10
- 238000002156 mixing Methods 0.000 claims abstract description 4
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 29
- 238000004519 manufacturing process Methods 0.000 claims description 21
- 150000001875 compounds Chemical class 0.000 claims description 11
- 238000001035 drying Methods 0.000 claims description 11
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 8
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 claims description 8
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 claims description 6
- 125000004432 carbon atom Chemical group C* 0.000 claims description 6
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 claims description 6
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 claims description 6
- 239000002002 slurry Substances 0.000 claims description 6
- 229910052804 chromium Inorganic materials 0.000 claims description 5
- 239000002131 composite material Substances 0.000 claims description 5
- 229910052802 copper Inorganic materials 0.000 claims description 5
- 229910052735 hafnium Inorganic materials 0.000 claims description 5
- 229910052742 iron Inorganic materials 0.000 claims description 5
- 229910052745 lead Inorganic materials 0.000 claims description 5
- 229910052748 manganese Inorganic materials 0.000 claims description 5
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 229910052719 titanium Inorganic materials 0.000 claims description 5
- 229910052720 vanadium Inorganic materials 0.000 claims description 5
- 238000005406 washing Methods 0.000 claims description 5
- 229910052725 zinc Inorganic materials 0.000 claims description 5
- 229910052726 zirconium Inorganic materials 0.000 claims description 5
- KDSNLYIMUZNERS-UHFFFAOYSA-N 2-methylpropanamine Chemical compound CC(C)CN KDSNLYIMUZNERS-UHFFFAOYSA-N 0.000 claims description 4
- JJYPMNFTHPTTDI-UHFFFAOYSA-N 3-methylaniline Chemical compound CC1=CC=CC(N)=C1 JJYPMNFTHPTTDI-UHFFFAOYSA-N 0.000 claims description 4
- HVBSAKJJOYLTQU-UHFFFAOYSA-N 4-aminobenzenesulfonic acid Chemical compound NC1=CC=C(S(O)(=O)=O)C=C1 HVBSAKJJOYLTQU-UHFFFAOYSA-N 0.000 claims description 4
- ALYNCZNDIQEVRV-UHFFFAOYSA-N 4-aminobenzoic acid Chemical compound NC1=CC=C(C(O)=O)C=C1 ALYNCZNDIQEVRV-UHFFFAOYSA-N 0.000 claims description 4
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 4
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 claims description 4
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 claims description 4
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 claims description 4
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 claims description 4
- AFBPFSWMIHJQDM-UHFFFAOYSA-N N-methylaniline Chemical compound CNC1=CC=CC=C1 AFBPFSWMIHJQDM-UHFFFAOYSA-N 0.000 claims description 4
- BHHGXPLMPWCGHP-UHFFFAOYSA-N Phenethylamine Chemical compound NCCC1=CC=CC=C1 BHHGXPLMPWCGHP-UHFFFAOYSA-N 0.000 claims description 4
- WGQKYBSKWIADBV-UHFFFAOYSA-N benzylamine Chemical compound NCC1=CC=CC=C1 WGQKYBSKWIADBV-UHFFFAOYSA-N 0.000 claims description 4
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 claims description 4
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 claims description 4
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 claims description 4
- RNVCVTLRINQCPJ-UHFFFAOYSA-N o-toluidine Chemical compound CC1=CC=CC=C1N RNVCVTLRINQCPJ-UHFFFAOYSA-N 0.000 claims description 4
- 230000001590 oxidative effect Effects 0.000 claims description 4
- RZXMPPFPUUCRFN-UHFFFAOYSA-N p-toluidine Chemical compound CC1=CC=C(N)C=C1 RZXMPPFPUUCRFN-UHFFFAOYSA-N 0.000 claims description 4
- 229910052763 palladium Inorganic materials 0.000 claims description 4
- KIDHWZJUCRJVML-UHFFFAOYSA-N putrescine Chemical compound NCCCCN KIDHWZJUCRJVML-UHFFFAOYSA-N 0.000 claims description 4
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 claims description 4
- 150000001242 acetic acid derivatives Chemical class 0.000 claims description 3
- 125000001931 aliphatic group Chemical group 0.000 claims description 3
- 150000004703 alkoxides Chemical class 0.000 claims description 3
- 150000001805 chlorine compounds Chemical group 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 3
- 150000002823 nitrates Chemical class 0.000 claims description 3
- 238000002360 preparation method Methods 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 150000003467 sulfuric acid derivatives Chemical class 0.000 claims description 3
- DNIAPMSPPWPWGF-GSVOUGTGSA-N (R)-(-)-Propylene glycol Chemical compound C[C@@H](O)CO DNIAPMSPPWPWGF-GSVOUGTGSA-N 0.000 claims description 2
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 claims description 2
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 claims description 2
- RQEUFEKYXDPUSK-UHFFFAOYSA-N 1-phenylethylamine Chemical compound CC(N)C1=CC=CC=C1 RQEUFEKYXDPUSK-UHFFFAOYSA-N 0.000 claims description 2
- IAHOUQOWMXVMEH-UHFFFAOYSA-N 2,4,6-trinitroaniline Chemical compound NC1=C([N+]([O-])=O)C=C([N+]([O-])=O)C=C1[N+]([O-])=O IAHOUQOWMXVMEH-UHFFFAOYSA-N 0.000 claims description 2
- AOPBDRUWRLBSDB-UHFFFAOYSA-N 2-bromoaniline Chemical compound NC1=CC=CC=C1Br AOPBDRUWRLBSDB-UHFFFAOYSA-N 0.000 claims description 2
- AKCRQHGQIJBRMN-UHFFFAOYSA-N 2-chloroaniline Chemical compound NC1=CC=CC=C1Cl AKCRQHGQIJBRMN-UHFFFAOYSA-N 0.000 claims description 2
- DPJCXCZTLWNFOH-UHFFFAOYSA-N 2-nitroaniline Chemical compound NC1=CC=CC=C1[N+]([O-])=O DPJCXCZTLWNFOH-UHFFFAOYSA-N 0.000 claims description 2
- DHYHYLGCQVVLOQ-UHFFFAOYSA-N 3-bromoaniline Chemical compound NC1=CC=CC(Br)=C1 DHYHYLGCQVVLOQ-UHFFFAOYSA-N 0.000 claims description 2
- PNPCRKVUWYDDST-UHFFFAOYSA-N 3-chloroaniline Chemical compound NC1=CC=CC(Cl)=C1 PNPCRKVUWYDDST-UHFFFAOYSA-N 0.000 claims description 2
- XJCVRTZCHMZPBD-UHFFFAOYSA-N 3-nitroaniline Chemical compound NC1=CC=CC([N+]([O-])=O)=C1 XJCVRTZCHMZPBD-UHFFFAOYSA-N 0.000 claims description 2
- WDFQBORIUYODSI-UHFFFAOYSA-N 4-bromoaniline Chemical compound NC1=CC=C(Br)C=C1 WDFQBORIUYODSI-UHFFFAOYSA-N 0.000 claims description 2
- QSNSCYSYFYORTR-UHFFFAOYSA-N 4-chloroaniline Chemical compound NC1=CC=C(Cl)C=C1 QSNSCYSYFYORTR-UHFFFAOYSA-N 0.000 claims description 2
- TYMLOMAKGOJONV-UHFFFAOYSA-N 4-nitroaniline Chemical compound NC1=CC=C([N+]([O-])=O)C=C1 TYMLOMAKGOJONV-UHFFFAOYSA-N 0.000 claims description 2
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 claims description 2
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 claims description 2
- 125000002723 alicyclic group Chemical group 0.000 claims description 2
- 229960004050 aminobenzoic acid Drugs 0.000 claims description 2
- 125000003118 aryl group Chemical group 0.000 claims description 2
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical compound C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 claims description 2
- JJWLVOIRVHMVIS-UHFFFAOYSA-N isopropylamine Chemical compound CC(C)N JJWLVOIRVHMVIS-UHFFFAOYSA-N 0.000 claims description 2
- 239000007788 liquid Substances 0.000 claims description 2
- NCBZRJODKRCREW-UHFFFAOYSA-N m-anisidine Chemical compound COC1=CC=CC(N)=C1 NCBZRJODKRCREW-UHFFFAOYSA-N 0.000 claims description 2
- 229940018564 m-phenylenediamine Drugs 0.000 claims description 2
- VMPITZXILSNTON-UHFFFAOYSA-N o-anisidine Chemical compound COC1=CC=CC=C1N VMPITZXILSNTON-UHFFFAOYSA-N 0.000 claims description 2
- BHAAPTBBJKJZER-UHFFFAOYSA-N p-anisidine Chemical compound COC1=CC=C(N)C=C1 BHAAPTBBJKJZER-UHFFFAOYSA-N 0.000 claims description 2
- 229910001404 rare earth metal oxide Inorganic materials 0.000 claims description 2
- BHRZNVHARXXAHW-UHFFFAOYSA-N sec-butylamine Chemical compound CCC(C)N BHRZNVHARXXAHW-UHFFFAOYSA-N 0.000 claims description 2
- 229950000244 sulfanilic acid Drugs 0.000 claims description 2
- YBRBMKDOPFTVDT-UHFFFAOYSA-N tert-butylamine Chemical compound CC(C)(C)N YBRBMKDOPFTVDT-UHFFFAOYSA-N 0.000 claims description 2
- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 claims 2
- 229940035422 diphenylamine Drugs 0.000 claims 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 abstract description 171
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 abstract description 9
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 abstract description 8
- 239000010410 layer Substances 0.000 description 46
- 239000000243 solution Substances 0.000 description 29
- LLZRNZOLAXHGLL-UHFFFAOYSA-J titanic acid Chemical compound O[Ti](O)(O)O LLZRNZOLAXHGLL-UHFFFAOYSA-J 0.000 description 27
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 22
- 230000002776 aggregation Effects 0.000 description 16
- 238000001878 scanning electron micrograph Methods 0.000 description 14
- 238000004220 aggregation Methods 0.000 description 12
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 11
- 230000006911 nucleation Effects 0.000 description 11
- 238000010899 nucleation Methods 0.000 description 11
- 238000004458 analytical method Methods 0.000 description 9
- 239000000463 material Substances 0.000 description 9
- 238000005245 sintering Methods 0.000 description 8
- 239000007864 aqueous solution Substances 0.000 description 7
- 239000011247 coating layer Substances 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- 239000010936 titanium Substances 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- 150000001412 amines Chemical class 0.000 description 5
- 238000010669 acid-base reaction Methods 0.000 description 4
- 238000005054 agglomeration Methods 0.000 description 4
- 239000002612 dispersion medium Substances 0.000 description 4
- OPQCEZJIHDNSLT-UHFFFAOYSA-N butan-1-ol;n-ethylethanamine Chemical compound CCCCO.CCNCC OPQCEZJIHDNSLT-UHFFFAOYSA-N 0.000 description 3
- 239000003985 ceramic capacitor Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000002425 crystallisation Methods 0.000 description 3
- 230000008025 crystallization Effects 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 150000004679 hydroxides Chemical class 0.000 description 3
- 239000002609 medium Substances 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- 229910001252 Pd alloy Inorganic materials 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 235000011114 ammonium hydroxide Nutrition 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000010954 inorganic particle Substances 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 238000004626 scanning electron microscopy Methods 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- 239000010944 silver (metal) Substances 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 238000005118 spray pyrolysis Methods 0.000 description 2
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical class CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 1
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910003088 Ti−O−Ti Inorganic materials 0.000 description 1
- 239000011149 active material Substances 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 125000004177 diethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 230000036571 hydration Effects 0.000 description 1
- 238000006703 hydration reaction Methods 0.000 description 1
- 238000010295 mobile communication Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 150000003141 primary amines Chemical class 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/626—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
- C04B35/628—Coating the powders or the macroscopic reinforcing agents
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/13—Electrodes for accumulators with non-aqueous electrolyte, e.g. for lithium-accumulators; Processes of manufacture thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2/00—Processes or devices for granulating materials, e.g. fertilisers in general; Rendering particulate materials free flowing in general, e.g. making them hydrophobic
- B01J2/006—Coating of the granules without description of the process or the device by which the granules are obtained
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/10—Metallic powder containing lubricating or binding agents; Metallic powder containing organic material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/10—Metallic powder containing lubricating or binding agents; Metallic powder containing organic material
- B22F1/102—Metallic powder coated with organic material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/16—Metallic particles coated with a non-metal
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G23/00—Compounds of titanium
- C01G23/04—Oxides; Hydroxides
- C01G23/047—Titanium dioxide
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G53/00—Compounds of nickel
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
- C23C18/1216—Metal oxides
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Abstract
Description
Claims (18)
- (a) 알콜 용해성 금속염의 알콜 용액 및 아민 화합물의 알콜 용액을 제공하는 단계; 및(b) 무기 분말을, 물, 상기 알콜 용해성 금속염의 알콜 용액 및 상기 아민 화합물의 알콜 용액과 혼합하고 교반함으로써, 상기 알콜 용해성 금속염으로부터 생성된 금속 수산화물로 상기 무기 분말의 표면을 코팅하는 단계를 포함하는 코팅된 무기 분말의 제조 방법.
- 제1항에 있어서, 상기 (b) 단계후, 상기 무기 분말을 건조한 후, 산화성 분위기 중에서 약 300 내지 약 500℃의 온도에서 열처리하여 상기 금속 수산화물 코팅을 금속 산화물 코팅으로 전환시키는 단계를 더 포함하는 것을 특징으로 하는 코팅된 무기 분말의 제조 방법.
- 제2항에 있어서, 상기 (b) 단계후의 건조 단계와 상기 열처리 단계의 사이에 상기 금속 수산화물로 코팅된 무기 분말을 탄소수 1 내지 4의 저급 지방족 알콜로 세척하는 단계를 더 포함하는 것을 특징으로 하는 코팅된 무기 분말의 제조 방법.
- 제1항에 있어서, 상기 알콜을 기준으로 무기 분말 0.1 내지 1.5M, 상기 알콜 용해성 금속염 0.1 내지 1.5M, 상기 아민 화합물 0.2 내지 3.0M, 물 0.05M 내지 0.3M의 농도로 혼합된 후, 약 12 시간 내지 약 72 시간 동안 교반되는 것을 특징으로 하는 코팅된 무기 분말의 제조 방법.
- 제1항에 있어서, 상기 무기 분말은 알콜에 분산된 슬러리 상태 또는 상기 무기 분말 단독으로 혼합되는 것을 특징으로 하는 코팅된 무기 분말의 제조 방법.
- 제1항에 있어서, 상기 알콜은 실온에서 액상인 1가 내지 5가의 알콜 화합물 또는 그 유도체인 것을 특징으로 하는 코팅된 무기 분말의 제조 방법.
- 제6항에 있어서, 상기 알콜은 C1 내지 C7의 지방족 모노올 화합물, C6 내지 C9의 방향족 모노올 화합물, C4 내지 C7의 지환식 모노올 화합물(alicyclic mono-ol compounds), C3 내지 C7의 복소환식 모노올 화합물(heterocyclic mono-ol compounds), C2 내지 C7의 지방족 디올 화합물, 또는 C2 내지 C7의 지방족 트리올 화합물인 것을 특징으로 하는 코팅된 무기 분말의 제조 방법.
- 제1항에 있어서, 상기 무기 분말은 Ni, Cu, Pd, 및 Ag 분말로 이루어진 군에서 선택된 금속 분말인 것을 특징으로 하는 코팅된 무기 분말의 제조 방법.
- 제1항에 있어서, 상기 무기 분말은 TiO2, ZrO2, TiZrO4, Al2O3, SiO2, Y2O3, MgO, Mn3O4, MnO2, NiO, ZnO 분말 및 이들의 복합체 분말로 이루어진 군에서 선택된 금속 산화물 분말인 것을 특징으로 하는 코팅된 무기 분말의 제조 방법.
- 제1항에 있어서, 상기 아민 화합물은 메틸아민, 디메틸아민, 트리메틸아민, 에틸아민, 디에틸아민, 트리에틸아민, n-프로필아민, iso-프로필아민, n-부틸아민, sec-부틸아민, iso-부틸아민, tert-부틸아민, 시클로헥실아민, 벤질아민, α-페닐에틸아민, β-페닐에틸아민, 에틸렌디아민, 테트라메틸렌디아민, 헥사메틸렌디아민, 아닐린, 메틸아닐린, 디메틸아닐린, 디페닐아민, 트리페닐아민, o-톨루이딘, m-톨루이딘, p-톨루이딘, o-아니시딘, m-아니시딘, p-아니시딘, o-클로로아닐린, m-클로로아닐린, p-클로로아닐린, o-브로모아닐린, m-브로모아닐린, p-브로모아닐린, o-니트로아닐린, m-니트로아닐린, p-니트로아닐린, 2,4-트리니트로아닐린, 2,4,6-트리니트로아닐린, o-페닐렌디아민, m-페닐렌디아민, p-페닐렌디아민, 벤지딘, p-아미노벤조산 및 술파닐산(sulfanilic acid)로 이루어진 군에서 선택된 것을 특징으로 하는 코팅된 무기 분말의 제조 방법.
- 제1항에 있어서, 상기 알콜 용해성 금속염은 Ti, Zr, Hf, Si, V, Cr, Mn, Fe, Co, Zn 또는 Pb 금속의 클로라이드류, 설페이트류, 나이트레이트류, 아세테이트류, 알콕사이드류 또는 이들의 혼합물인 것을 특징으로 하는 코팅된 무기 분말의 제조 방법.
- 제2항에 있어서, 상기 금속 수산화물은 Ti, Zr, Hf, Si, V, Cr, Mn, Fe, Co, Zn 또는 Pb 금속의 수산화물 또는 이들의 복합 수산화물인 것을 특징으로 하는 코팅된 무기 분말의 제조 방법.
- 삭제
- 금속 산화물로 코팅된 무기 분말로서,상기 무기 분말은 자신들끼리 서로 응집되지 않는 상태로 독립적으로 존재하고, 또한 상기 금속 산화물 코팅은 상기 무기 분말의 표면에만 균일한 두께의 코팅으로서 존재할 뿐 상기 무기 분말들 사이에 클러스터링(clustering)되어 있지 않은 것을 특징으로 하는 코팅된 무기 분말.
- 제14항에 있어서, 상기 무기 분말은 Ni, Cu, Pd, 및 Ag 분말로 이루어진 군에서 선택된 금속 분말인 것을 특징으로하는 코팅된 무기 분말.
- 제14항에 있어서, 상기 무기 분말은 TiO2, ZrO2, TiZrO4, Al2O3, SiO2, Y2O3, MgO, Mn3O4, MnO2, NiO, ZnO 분말 및 이들의 복합체 분말로 이루어진 군에서 선택된 금속 산화물 분말인 것을 특징으로하는 코팅된 무기 분말.
- 제14항에 있어서, 상기 금속 산화물 코팅은 TiO2, MgO, SiO2, BaTiO3, 또는 희토류산화물로 이루어진 것을 특징으로 하는 코팅된 무기 분말.
- 제14항에 있어서, 상기 무기 분말의 평균입경은 약 10 nm ~ 100㎛이고, 상기 금속 산화물 코팅의 두께는 약 0.1 ~ 500 nm인 것을 특징으로 하는 코팅된 무기 분말.
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2003-0010415A KR100528330B1 (ko) | 2003-02-19 | 2003-02-19 | 무기 분말의 코팅방법 및 이에 의하여 제조된 코팅된무기입자 |
DE102004008875A DE102004008875B4 (de) | 2003-02-19 | 2004-02-18 | Anorganisches Pulver und Verfahren zur Oberflächenbeschichtung |
JP2004042061A JP2004250793A (ja) | 2003-02-19 | 2004-02-18 | 無機粉末のコーティング方法及びこれによって製造されたコーティングされた無機粒子 |
US10/780,626 US20040161608A1 (en) | 2003-02-19 | 2004-02-19 | Method of coating the surface of an inorganic powder and a coated inorganic powder manufactured using the same |
TW093104144A TWI272318B (en) | 2003-02-19 | 2004-02-19 | A method of coating the surface of an inorganic powder and a coated inorganic powder manufactured using the same |
US11/319,450 US7745002B2 (en) | 2003-02-19 | 2005-12-29 | Method of coating the surface of an inorganic powder and a coated inorganic powder manufactured using the same |
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KR10-2003-0010415A KR100528330B1 (ko) | 2003-02-19 | 2003-02-19 | 무기 분말의 코팅방법 및 이에 의하여 제조된 코팅된무기입자 |
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KR100528330B1 true KR100528330B1 (ko) | 2005-11-16 |
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US (2) | US20040161608A1 (ko) |
JP (1) | JP2004250793A (ko) |
KR (1) | KR100528330B1 (ko) |
DE (1) | DE102004008875B4 (ko) |
TW (1) | TWI272318B (ko) |
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Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB9016690D0 (en) * | 1990-07-30 | 1990-09-12 | Tioxide Group Services Ltd | Ceramic green bodies |
JP3670395B2 (ja) * | 1996-06-10 | 2005-07-13 | 日鉄鉱業株式会社 | 多層膜被覆粉体およびその製造方法 |
DK0910549T3 (da) * | 1996-07-08 | 2001-11-19 | Rhodia Chimie Sa | Partikler af titandioxid, fremgangsmåde til fremstilling og anvendelse heraf i kosmetika, lakker og lasurer |
DE69709596T2 (de) * | 1996-09-25 | 2002-07-11 | Shoei Chemical Ind Co | Beschichtetes Metallpulver und Verfahren seiner Herstellung durch Zersetzung |
US6268054B1 (en) * | 1997-02-18 | 2001-07-31 | Cabot Corporation | Dispersible, metal oxide-coated, barium titanate materials |
KR20000001996A (ko) | 1998-06-16 | 2000-01-15 | 이형도 | 유전체 세라믹 분말의 코팅방법 |
-
2003
- 2003-02-19 KR KR10-2003-0010415A patent/KR100528330B1/ko active IP Right Grant
-
2004
- 2004-02-18 JP JP2004042061A patent/JP2004250793A/ja not_active Withdrawn
- 2004-02-18 DE DE102004008875A patent/DE102004008875B4/de not_active Expired - Fee Related
- 2004-02-19 US US10/780,626 patent/US20040161608A1/en not_active Abandoned
- 2004-02-19 TW TW093104144A patent/TWI272318B/zh not_active IP Right Cessation
-
2005
- 2005-12-29 US US11/319,450 patent/US7745002B2/en not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101365143B1 (ko) | 2012-10-30 | 2014-02-25 | 한국생산기술연구원 | 유무기 하이브리드 기법을 적용한 염료감응형 태양전지용 활성전극 페이스트 제조방법 |
KR101365144B1 (ko) | 2012-10-30 | 2014-02-25 | 한국생산기술연구원 | 금속 나노입자를 부착하여 효율을 향상시킨 염료감응형 태양전지용 활성전극 페이스트 제조방법 |
Also Published As
Publication number | Publication date |
---|---|
US20040161608A1 (en) | 2004-08-19 |
JP2004250793A (ja) | 2004-09-09 |
TW200426243A (en) | 2004-12-01 |
US20060099409A1 (en) | 2006-05-11 |
TWI272318B (en) | 2007-02-01 |
DE102004008875A1 (de) | 2004-09-09 |
US7745002B2 (en) | 2010-06-29 |
KR20040074512A (ko) | 2004-08-25 |
DE102004008875B4 (de) | 2006-06-08 |
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