KR100429443B1 - 다층배선판의제조방법 - Google Patents

다층배선판의제조방법 Download PDF

Info

Publication number
KR100429443B1
KR100429443B1 KR1019970006666A KR19970006666A KR100429443B1 KR 100429443 B1 KR100429443 B1 KR 100429443B1 KR 1019970006666 A KR1019970006666 A KR 1019970006666A KR 19970006666 A KR19970006666 A KR 19970006666A KR 100429443 B1 KR100429443 B1 KR 100429443B1
Authority
KR
South Korea
Prior art keywords
insulating layer
interlayer insulating
multilayer wiring
wiring board
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1019970006666A
Other languages
English (en)
Korean (ko)
Other versions
KR19980018040A (ko
Inventor
요시까즈 다끼구찌
히로유끼 오비야
도루 다까하시
다이스께 시로야마
겐지 다자와
Original Assignee
도오꾜오까고오교 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP6908396A external-priority patent/JPH09237976A/ja
Priority claimed from JP22076796A external-priority patent/JPH1051142A/ja
Priority claimed from JP24262596A external-priority patent/JPH1070371A/ja
Priority claimed from JP24262496A external-priority patent/JPH1070366A/ja
Priority claimed from JP27747596A external-priority patent/JPH10107446A/ja
Application filed by 도오꾜오까고오교 가부시끼가이샤 filed Critical 도오꾜오까고오교 가부시끼가이샤
Publication of KR19980018040A publication Critical patent/KR19980018040A/ko
Application granted granted Critical
Publication of KR100429443B1 publication Critical patent/KR100429443B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0011Working of insulating substrates or insulating layers
    • H05K3/0044Mechanical working of the substrate, e.g. drilling or punching
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00Interconnections in chips, wafers or substrates
    • H10W20/01Manufacture or treatment
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4644Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01Dielectrics
    • H05K2201/0137Materials
    • H05K2201/0166Polymeric layer used for special processing, e.g. resist for etching insulating material or photoresist used as a mask during plasma etching
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/02Details related to mechanical or acoustic processing, e.g. drilling, punching, cutting, using ultrasound
    • H05K2203/025Abrading, e.g. grinding or sand blasting
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00Stock material or miscellaneous articles
    • Y10S428/901Printed circuit
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/24Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24917Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Manufacturing Of Printed Wiring (AREA)
KR1019970006666A 1996-02-29 1997-02-28 다층배선판의제조방법 Expired - Fee Related KR100429443B1 (ko)

Applications Claiming Priority (10)

Application Number Priority Date Filing Date Title
JP6908396A JPH09237976A (ja) 1996-02-29 1996-02-29 多層配線板の製造方法
JP96-69083 1996-02-29
JP96-220767 1996-08-05
JP22076796A JPH1051142A (ja) 1996-08-05 1996-08-05 多層配線板の製造方法
JP24262596A JPH1070371A (ja) 1996-08-26 1996-08-26 多層配線板の製造方法
JP96-242625 1996-08-26
JP96-242624 1996-08-26
JP24262496A JPH1070366A (ja) 1996-08-26 1996-08-26 多層配線板の製造方法
JP96-277475 1996-08-27
JP27747596A JPH10107446A (ja) 1996-09-27 1996-09-27 多層配線板の製造方法

Publications (2)

Publication Number Publication Date
KR19980018040A KR19980018040A (ko) 1998-06-05
KR100429443B1 true KR100429443B1 (ko) 2004-06-16

Family

ID=27524158

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019970006666A Expired - Fee Related KR100429443B1 (ko) 1996-02-29 1997-02-28 다층배선판의제조방법

Country Status (5)

Country Link
US (2) US6010956A (https=)
EP (1) EP0793406B1 (https=)
KR (1) KR100429443B1 (https=)
DE (1) DE69734947T2 (https=)
TW (1) TW322680B (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101415400B1 (ko) * 2009-08-20 2014-08-01 씨엠케이 가부시키가이샤 프린트 배선판의 제조방법

Families Citing this family (66)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100609364B1 (ko) * 1997-03-25 2006-08-08 이 아이 듀폰 디 네모아 앤드 캄파니 디스플레이 패널용 필드 이미터 캐소드 배면판 구조물, 그제조 방법, 및 그를 포함하는 디스플레이 패널
US6096635A (en) * 1997-10-21 2000-08-01 Microjet Technology Co., Ltd. Method for creating via hole in chip
US6156221A (en) * 1998-10-02 2000-12-05 International Business Machines Corporation Copper etching compositions, processes and products derived therefrom
US6387736B1 (en) * 1999-04-26 2002-05-14 Agilent Technologies, Inc. Method and structure for bonding layers in a semiconductor device
US6451127B1 (en) * 1999-06-01 2002-09-17 Motorola, Inc. Conductive paste and semiconductor component having conductive bumps made from the conductive paste
JP2001007468A (ja) * 1999-06-24 2001-01-12 Nec Kansai Ltd 配線基板,多層配線基板およびその製造方法
US20040034134A1 (en) * 1999-08-26 2004-02-19 Lamb James E. Crosslinkable fill compositions for uniformly protecting via and contact holes
KR100708491B1 (ko) 1999-08-26 2007-04-16 브레우어 사이언스 인코포레이션 듀얼 다마신 공정을 위한 개선된 충전 조성물을 포함하는 기판구조체, 충전조성물의 도포방법, 충전조성물의 적합성 결정방법, 및 전구체 구조체
DE19961103C2 (de) * 1999-12-17 2002-03-14 Infineon Technologies Ag Dielektrische Füllung von elektrischen Verdrahtungsebenen und Verfahren zur Herstellung einer elektrischen Verdrahtung
US6340608B1 (en) * 2000-07-07 2002-01-22 Chartered Semiconductor Manufacturing Ltd. Method of fabricating copper metal bumps for flip-chip or chip-on-board IC bonding on terminating copper pads
JP2004523886A (ja) * 2000-08-15 2004-08-05 ワールド・プロパティーズ・インコーポレイテッド 多層回路および該回路を製造する方法
DE60114426T2 (de) * 2000-08-15 2006-07-13 Dsm Ip Assets B.V. Klebstoffzusammensetzung für optische platten
US6748650B2 (en) * 2001-06-27 2004-06-15 Visteon Global Technologies, Inc. Method for making a circuit assembly having an integral frame
TW544882B (en) * 2001-12-31 2003-08-01 Megic Corp Chip package structure and process thereof
TW503496B (en) * 2001-12-31 2002-09-21 Megic Corp Chip packaging structure and manufacturing process of the same
US6673698B1 (en) * 2002-01-19 2004-01-06 Megic Corporation Thin film semiconductor package utilizing a glass substrate with composite polymer/metal interconnect layers
TW584950B (en) 2001-12-31 2004-04-21 Megic Corp Chip packaging structure and process thereof
US20050236182A1 (en) * 2002-06-04 2005-10-27 Noriki Hayashi Board for printed wiring, printed wiring board, and method for manufacturing them
JP3941609B2 (ja) * 2002-07-03 2007-07-04 株式会社デンソー 多層基板形成用素板の検査装置及び検査方法
US20040011555A1 (en) * 2002-07-22 2004-01-22 Chiu Tsung Chin Method for manufacturing printed circuit board with stacked wires and printed circuit board manufacturing according to the mehtod
US20040192876A1 (en) * 2002-11-18 2004-09-30 Nigel Hacker Novolac polymer planarization films with high temparature stability
CN100459060C (zh) * 2003-02-05 2009-02-04 株式会社半导体能源研究所 显示装置的制造方法
EP1592052A4 (en) * 2003-02-05 2014-04-23 Semiconductor Energy Lab PROCESS FOR DISPLAY PRODUCTION
EP1592054A4 (en) * 2003-02-05 2010-08-25 Semiconductor Energy Lab DISPLAY METHOD
WO2004070809A1 (ja) * 2003-02-06 2004-08-19 Semiconductor Energy Laboratory Co., Ltd. 表示装置の作製方法
WO2004070822A1 (ja) * 2003-02-06 2004-08-19 Semiconductor Energy Laboratory Co., Ltd. 半導体装置及び表示装置の製造方法
JP3791616B2 (ja) * 2003-02-06 2006-06-28 セイコーエプソン株式会社 配線基板、電気光学装置及びその製造方法並びに電子機器
KR101032338B1 (ko) * 2003-02-06 2011-05-06 가부시키가이샤 한도오따이 에네루기 켄큐쇼 표시장치의 제작방법
US20040211979A1 (en) * 2003-04-24 2004-10-28 Konica Minolta Holdings, Inc. Circuit board and method for manufacturing the circuit board
FR2856552B1 (fr) * 2003-06-23 2005-10-21 Imphy Ugine Precision Procede de fabrication de pieces pour composants electroniques passifs et pieces obtenues
EP1649322A4 (en) * 2003-07-17 2007-09-19 Honeywell Int Inc PLANARIZATION FILMS FOR ADVANCED MICRO-ELECTRONIC APPLICATIONS AND EQUIPMENT AND METHOD FOR THE PRODUCTION THEREOF
US20060205223A1 (en) * 2004-12-30 2006-09-14 Smayling Michael C Line edge roughness reduction compatible with trimming
US8071888B2 (en) * 2005-03-11 2011-12-06 Toyo Ink. Mfg. Co., Ltd. Electrically conductive ink, electrically conductive circuit, and non-contact-type medium
JP4997105B2 (ja) * 2005-05-23 2012-08-08 イビデン株式会社 プリント配線板およびその製造方法
KR100735411B1 (ko) * 2005-12-07 2007-07-04 삼성전기주식회사 배선기판의 제조방법 및 배선기판
KR100744244B1 (ko) * 2005-12-28 2007-07-30 동부일렉트로닉스 주식회사 반도체 소자의 구리배선 제조 방법
US20070161255A1 (en) * 2006-01-06 2007-07-12 Wilfred Pau Method for etching with hardmask
US8637980B1 (en) 2007-12-18 2014-01-28 Rockwell Collins, Inc. Adhesive applications using alkali silicate glass for electronics
US8581108B1 (en) 2006-08-23 2013-11-12 Rockwell Collins, Inc. Method for providing near-hermetically coated integrated circuit assemblies
US8617913B2 (en) 2006-08-23 2013-12-31 Rockwell Collins, Inc. Alkali silicate glass based coating and method for applying
US8076185B1 (en) 2006-08-23 2011-12-13 Rockwell Collins, Inc. Integrated circuit protection and ruggedization coatings and methods
US8084855B2 (en) * 2006-08-23 2011-12-27 Rockwell Collins, Inc. Integrated circuit tampering protection and reverse engineering prevention coatings and methods
US7915527B1 (en) 2006-08-23 2011-03-29 Rockwell Collins, Inc. Hermetic seal and hermetic connector reinforcement and repair with low temperature glass coatings
US8166645B2 (en) 2006-08-23 2012-05-01 Rockwell Collins, Inc. Method for providing near-hermetically coated, thermally protected integrated circuit assemblies
US8174830B2 (en) * 2008-05-06 2012-05-08 Rockwell Collins, Inc. System and method for a substrate with internal pumped liquid metal for thermal spreading and cooling
JP2008140886A (ja) * 2006-11-30 2008-06-19 Shinko Electric Ind Co Ltd 配線基板及びその製造方法
US8034718B2 (en) * 2006-12-12 2011-10-11 International Business Machines Corporation Method to recover patterned semiconductor wafers for rework
US8363189B2 (en) * 2007-12-18 2013-01-29 Rockwell Collins, Inc. Alkali silicate glass for displays
SG154342A1 (en) * 2008-01-08 2009-08-28 Opulent Electronics Internat P Insulated metal substrate fabrication
US8221089B2 (en) * 2008-09-12 2012-07-17 Rockwell Collins, Inc. Thin, solid-state mechanism for pumping electrically conductive liquids in a flexible thermal spreader
US8017872B2 (en) * 2008-05-06 2011-09-13 Rockwell Collins, Inc. System and method for proportional cooling with liquid metal
US8616266B2 (en) * 2008-09-12 2013-12-31 Rockwell Collins, Inc. Mechanically compliant thermal spreader with an embedded cooling loop for containing and circulating electrically-conductive liquid
US8650886B2 (en) * 2008-09-12 2014-02-18 Rockwell Collins, Inc. Thermal spreader assembly with flexible liquid cooling loop having rigid tubing sections and flexible tubing sections
US8205337B2 (en) * 2008-09-12 2012-06-26 Rockwell Collins, Inc. Fabrication process for a flexible, thin thermal spreader
US8119040B2 (en) 2008-09-29 2012-02-21 Rockwell Collins, Inc. Glass thick film embedded passive material
TW201031532A (en) * 2009-02-26 2010-09-01 Taiwan Decor Technology Co Heat transfer-printing film and heat transfer-printing method utilizing the same
TW201216801A (en) * 2010-10-01 2012-04-16 Hung-Ming Lin Manufacturing method of circuit board
KR20130050057A (ko) * 2011-11-07 2013-05-15 삼성전기주식회사 코일 부품의 제조 방법
CN102612276A (zh) * 2012-03-13 2012-07-25 惠州中京电子科技股份有限公司 多层 hdi线路板的微孔制作工艺
US9435915B1 (en) 2012-09-28 2016-09-06 Rockwell Collins, Inc. Antiglare treatment for glass
TWI462672B (zh) * 2013-02-08 2014-11-21 Ichia Tech Inc 前驅基板、軟性印刷電路板及其製造方法
JP5649150B1 (ja) * 2014-07-17 2015-01-07 日本エレクトロプレイテイング・エンジニヤース株式会社 無電解メッキ用前処理液および無電解メッキ方法
US11039541B2 (en) * 2014-11-16 2021-06-15 Nano Dimension Technologies, Ltd. Double-sided and multilayered printed circuit board fabrication using inkjet printing
KR20160093403A (ko) * 2015-01-29 2016-08-08 엘지이노텍 주식회사 전자파차폐구조물
JP7210901B2 (ja) * 2017-06-26 2023-01-24 味の素株式会社 樹脂組成物層
CN110416076B (zh) * 2019-06-05 2021-11-12 福建省福联集成电路有限公司 一种改善金属线路断裂的方法及器件

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3681474A (en) * 1969-09-12 1972-08-01 Richardson Co Electrical substrates
JPS55103554A (en) * 1979-02-02 1980-08-07 Sumitomo Chem Co Ltd Photosensitive resin composition for sand blast resist
EP0019391B1 (en) * 1979-05-12 1982-10-06 Fujitsu Limited Improvement in method of manufacturing electronic device having multilayer wiring structure
JP2881963B2 (ja) * 1990-05-25 1999-04-12 ソニー株式会社 配線基板及びその製造方法
US5851681A (en) * 1993-03-15 1998-12-22 Hitachi, Ltd. Wiring structure with metal wiring layers and polyimide layers, and fabrication process of multilayer wiring board
US5485038A (en) * 1993-07-15 1996-01-16 Hughes Aircraft Company Microelectronic circuit substrate structure including photoimageable epoxy dielectric layers
TW341022B (en) * 1995-11-29 1998-09-21 Nippon Electric Co Interconnection structures and method of making same
JP2830812B2 (ja) * 1995-12-27 1998-12-02 日本電気株式会社 多層プリント配線板の製造方法
US5993945A (en) * 1996-05-30 1999-11-30 International Business Machines Corporation Process for high resolution photoimageable dielectric
US5997997A (en) * 1997-06-13 1999-12-07 International Business Machines Corp. Method for reducing seed deposition in electroless plating

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101415400B1 (ko) * 2009-08-20 2014-08-01 씨엠케이 가부시키가이샤 프린트 배선판의 제조방법

Also Published As

Publication number Publication date
US6228465B1 (en) 2001-05-08
EP0793406A1 (en) 1997-09-03
TW322680B (https=) 1997-12-11
US6010956A (en) 2000-01-04
DE69734947D1 (de) 2006-02-02
KR19980018040A (ko) 1998-06-05
EP0793406B1 (en) 2005-12-28
DE69734947T2 (de) 2006-08-24

Similar Documents

Publication Publication Date Title
KR100429443B1 (ko) 다층배선판의제조방법
CN100387103C (zh) 多层印刷电路板和半导体器件
KR100833723B1 (ko) 다층프린트배선판 및 다층프린트배선판의 제조 방법
KR100855529B1 (ko) 다층프린트배선판 및 그 제조방법
CN100358401C (zh) 印刷电路板及其制造方法
EP1318708A2 (en) Resin filler and multilayer printed wiring board
KR100673338B1 (ko) 도포용 롤코터 및 이를 이용한 인쇄회로기판의 제조방법
WO2000003570A1 (en) Printed-circuit board and method of manufacture thereof
JP3495627B2 (ja) ビルドアップ多層プリント配線板およびその製造方法
JP4582892B2 (ja) 多層プリント配線板およびその製造方法
JPH11177237A (ja) ビルドアップ多層プリント配線板とその製造方法
JP2002271040A (ja) 多層プリント配線板の製造方法
JPH10275980A (ja) 多層配線板の製造方法、および多層配線板
JP2001168529A (ja) 多層プリント配線板及び多層プリント配線板の製造方法
JPH09237976A (ja) 多層配線板の製造方法
JP2000307024A (ja) プリント配線板の製造方法
JP4370490B2 (ja) ビルドアップ多層プリント配線板及びその製造方法
JPH10107446A (ja) 多層配線板の製造方法
JPH1070366A (ja) 多層配線板の製造方法
JPH1070371A (ja) 多層配線板の製造方法
JP2000208903A (ja) プリント配線板およびその製造方法
JP4743974B2 (ja) 樹脂フィルムおよび多層プリント配線板の製造方法
JP3071733B2 (ja) 多層印刷配線板の製造方法
JP2002134891A (ja) プリント配線板の製造方法
JPH1051142A (ja) 多層配線板の製造方法

Legal Events

Date Code Title Description
PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

A201 Request for examination
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U11-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

FPAY Annual fee payment

Payment date: 20070411

Year of fee payment: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

LAPS Lapse due to unpaid annual fee
PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20080420

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20080420

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000