KR100269416B1 - 기판 처리 장치 - Google Patents

기판 처리 장치 Download PDF

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Publication number
KR100269416B1
KR100269416B1 KR1019980012268A KR19980012268A KR100269416B1 KR 100269416 B1 KR100269416 B1 KR 100269416B1 KR 1019980012268 A KR1019980012268 A KR 1019980012268A KR 19980012268 A KR19980012268 A KR 19980012268A KR 100269416 B1 KR100269416 B1 KR 100269416B1
Authority
KR
South Korea
Prior art keywords
liquid
substrate
opening
drying
nozzle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
KR1019980012268A
Other languages
English (en)
Korean (ko)
Other versions
KR19990006382A (ko
Inventor
미쯔아키 요시타니
Original Assignee
이시다 아키라
다이닛뽕스크린 세이조오 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 이시다 아키라, 다이닛뽕스크린 세이조오 가부시키가이샤 filed Critical 이시다 아키라
Publication of KR19990006382A publication Critical patent/KR19990006382A/ko
Application granted granted Critical
Publication of KR100269416B1 publication Critical patent/KR100269416B1/ko
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0408—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/32—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations between different workstations
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0085—Apparatus for treatments of printed circuits with liquids not provided for in groups H05K3/02 - H05K3/46; conveyors and holding means therefor

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
KR1019980012268A 1997-06-20 1998-04-07 기판 처리 장치 Expired - Lifetime KR100269416B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP97-164623 1997-06-20
JP9164623A JPH1116871A (ja) 1997-06-20 1997-06-20 基板処理装置

Publications (2)

Publication Number Publication Date
KR19990006382A KR19990006382A (ko) 1999-01-25
KR100269416B1 true KR100269416B1 (ko) 2000-12-01

Family

ID=15796723

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019980012268A Expired - Lifetime KR100269416B1 (ko) 1997-06-20 1998-04-07 기판 처리 장치

Country Status (2)

Country Link
JP (1) JPH1116871A (https=)
KR (1) KR100269416B1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001284310A (ja) * 2000-03-31 2001-10-12 Shibaura Mechatronics Corp 基板の処理装置及び処理方法
KR100432053B1 (ko) * 2001-07-05 2004-05-17 (주)케이.씨.텍 건조장치
JP4365192B2 (ja) * 2003-11-25 2009-11-18 住友精密工業株式会社 搬送式基板処理装置
KR100725038B1 (ko) * 2005-06-22 2007-06-07 세메스 주식회사 기판 처리 장치

Also Published As

Publication number Publication date
JPH1116871A (ja) 1999-01-22
KR19990006382A (ko) 1999-01-25

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